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    • 12. 发明授权
    • Pellicle with a filter and method for production thereof
    • 具有过滤器的防护薄膜及其制造方法
    • US06436586B1
    • 2002-08-20
    • US09544333
    • 2000-04-06
    • Takashi MatsuokaYuichi HamadaMeguru Kashida
    • Takashi MatsuokaYuichi HamadaMeguru Kashida
    • G03F114
    • G03F1/64G03F7/70933G03F7/70983
    • There is disclosed a pellicle having a pellicle frame with at least one vent for controlling atmospheric pressure and a filter attached so as to cover the vent, wherein it takes 5 minutes to 180 minutes, to restore a pellicle film swelled during a step of attaching the pellicle to the exposure original plate under atmospheric pressure of 760 mmHg followed by reducing atmospheric pressure to 500 mmHg and keeping the pressure, to the original state and a method for producing it, and a pellicle with a filter having a pellicle frame with at least one vent for controlling atmospheric pressure wherein all over the inner surface of the filter attached so as to cover said vent is impregnated with a resin, and 50% by volume or more of the filter is impregnated therewith. There can be provided a pellicle with a filter having both of impurity-trapping performance and ventilating performance, and a method for producing it, and a pellicle with a filter having ventilating performance wherein impurities can be fixed without being released even under violent airflow such as air blow or the like and finer impurities can be trapped, with keeping ventilating performance.
    • 公开了一种防护薄膜组件,其具有至少一个用于控制大气压力的通风口的防护薄膜组件框架和附着以覆盖通风口的过滤器,其中需要5分钟至180分钟,以恢复在附接步骤期间膨胀的防护薄膜组件 将防护薄膜组件暴露在760mmHg的大气压下的原版上,随后将大气压降至500mmHg,并将压力保持在原始状态,及其制备方法,以及具有过滤器的防护薄膜组件,该防护薄膜组件框架具有至少一个 用于控制大气压力的排气口,其中,将覆盖所述通气口的过滤器的内表面全部浸渍在树脂中,并且浸渍50体积%以上的过滤器。 可以提供一种带有具有杂质捕获性能和通气性能的过滤器的防护薄膜及其制造方法,以及具有通风性能的过滤器的防护薄膜组件,其中即使在暴力气流下即使固定也不会释放杂质,例如 吹气等,并且可以捕获更细的杂质,同时保持通风性能。
    • 13. 发明授权
    • Frame-supported pellicle for photomask protection
    • 框架保护膜防护薄膜
    • US5723860A
    • 1998-03-03
    • US673257
    • 1996-06-28
    • Yuichi HamadaMeguru Kashida
    • Yuichi HamadaMeguru Kashida
    • G02F1/1333G03F1/64H01L21/027H01J5/02
    • G03F1/64Y10T428/249985
    • Proposed is an improvement in a frame-supported pellicle, which is a device for dust-proof protection of a photomask used in the photolithographic patterning works in the manufacture of fine electronic devices, consisting of a rigid pellicle frame, a highly transparent membrane of a plastic resin spread over and adhesively bonded to one end surface of the pellicle frame in a slack-free fashion and a layer of a pressure-sensitive adhesive formed on the other end surface of the pellicle frame to facilitate mounting of the frame-supported pellicle on the surface of a photomask and to secure the same at the correct position. The improvement comprises forming the layer of the pressure-sensitive adhesive on the end surface of the pellicle frame to have an outwardly convex surface, for example, in the form of a barrel vault instead of the flat surface in the prior art so that the troubles in the prior art due to occurrence of air gaps between the surface of the adhesive layer and the surface of the photomask unavoidable in mounting of the conventional frame-supported pellicle can be prevented to ensure completely air-tight sealing thereby. The adverse influence on the pellicle membrane due to the air-tightness of sealing by the pressure difference between the outer and inner surfaces can be overcome by providing a penetrating opening for air escape in the pellicle frame covered with a filter sheet.
    • 提出了框架支撑防护薄膜的改进,该防护薄膜组件是用于制造精细电子装置的光刻图案工艺中使用的光掩模的防尘保护装置,其由刚性防护薄膜框架,高透明度的膜 塑料树脂铺展并以无松弛的方式粘附在防护薄膜组件框架的一个端面上,并且形成在防护膜框架的另一端表面上的压敏粘合剂层,以便将框架支撑的防护薄膜组件安装在 光掩模的表面并将其固定在正确的位置。 改进之处在于,在防护薄膜组件框架的端面上形成压敏粘合剂层以具有向外凸起的表面,例如以现有技术中的平坦表面为例,而不是平坦表面,从而使故障 在现有技术中,由于在粘合剂层的表面与常规的框架支撑的防护薄膜组件的安装中不可避免的光掩模的表面之间的气隙的发生,可以防止由此发生完全不透气的密封。 可以通过在被过滤片覆盖的防护薄膜组件框架中设置用于空气逸出的穿透开口来克服由于外表面和内表面之间的压力差导致的密封气密性对防护薄膜的不利影响。
    • 15. 发明授权
    • Analyzer, sample transportation method, and computer program product
    • 分析仪,样品运输方式和计算机程序产品
    • US09134331B2
    • 2015-09-15
    • US12399461
    • 2009-03-06
    • Yuichi HamadaDaigo FukumaMasaharu Shibata
    • Yuichi HamadaDaigo FukumaMasaharu Shibata
    • G01N35/02G01N35/00
    • G01N35/0092Y10T436/114165
    • An analyzer comprising: a first measurement unit for measuring samples; a second measurement unit for measuring samples; a transportation device for transporting samples to the first measurement unit and the second measurement unit; prior sample measurement instructor for instructing to measure a predetermined sample prior to the other samples; and a transportation controller for controlling the transportation device to reserve the transportation of the other samples to the second measurement unit and to perform the other transportation operation, when the prior sample measurement instructor has instructed to measure the predetermined sample by the second measurement unit prior to the other samples, is disclosed. A sample transportation method and a computer program product are also disclosed.
    • 一种分析器,包括:用于测量样品的第一测量单元; 用于测量样品的第二测量单元; 用于将样品运送到第一测量单元和第二测量单元的运送装置; 用于指示在其他样品之前测量预定样品的先前样品测量指导者; 以及运送控制器,用于控制所述运送装置,以将所述其他样品运送到所述第二测量单元并执行所述其他运输操作,当所述现有样品测量指导者已经指示在所述第二测量单元之前测量所述预定样品时, 披露了其他样品。 还公开了一种样品运送方法和计算机程序产品。
    • 19. 发明授权
    • Lithographic pellicle
    • 平版影像
    • US08026023B2
    • 2011-09-27
    • US12414854
    • 2009-03-31
    • Yuichi Hamada
    • Yuichi Hamada
    • G03F1/14
    • G03F1/64
    • A lithographic pellicle is provided that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate adhesive provided on the other end face, wherein corners formed between a pellicle film adhesion face and exposure master plate adhesion face of the pellicle frame and inside and outside faces of the frame are subjected to C chamfering, and the chamfer dimension on the exposure master plate adhesion face is greater than C0.35 (mm) but no greater than C0.55 (mm).
    • 提供了一种平版印刷防护薄膜组件,其包括防护薄膜组件框架,通过防护薄膜粘合剂在防护薄膜框架的一个端面上延伸的防护薄膜组件和设置在另一端面上的曝光主板粘合剂,其中在防护薄膜粘附 防尘薄膜组件框架的表面和曝光母板粘合面和框架的内外表面进行C倒角,曝光母板粘合面上的倒角尺寸大于C0.35(mm)但不大于C0 .55(mm)。