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11. 发明授权

US07688517B2 Projection optical system and method for photolithography and exposure apparatus and method using same 失效
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US07688517B2
公开(公告)日：2010-03-30
申请号：US11907801
申请日：2007-10-17
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G02B3/00 , G02B1/06 , G02B17/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.
摘要翻译：用于紫外光的光学系统包括由对紫外线透明的材料制成的多个光学元件。至少两个光学元件用于形成至少一个具有第一限定光学元件，第二限定光学元件和液体透镜的液体透镜组，该透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中第二分隔光学元件并且包含对紫外光透明的液体。

12. 发明授权

US07688422B2 Projection optical system, exposure system, and exposure method 失效
标题翻译：投影光学系统，曝光系统和曝光方法
公开(公告)号：US07688422B2
公开(公告)日：2010-03-30
申请号：US11665490
申请日：2005-10-12
申请人： Hironori Ikezawa , Yasuhiro Omura
发明人： Hironori Ikezawa , Yasuhiro Omura
IPC分类号： G03B27/42 , G03B27/58 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G03F7/70983
摘要： An imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The imaging optical system satisfies the condition of 1
摘要翻译：成像光学系统是一种允许在液体中的平面平行板被替代的液浸式系统，而不会显着降低成像性能，同时确保边界透镜的足够高的激光电阻。成像光学系统设置有最靠近第二平面定位的第一透光构件和邻近第一光学透明构件定位的第二光学透明构件。第一光学透明构件和第二平面之间的光路可以被第一液体填充，并且第一光学透明构件和第二光学透明构件之间的光路可以被第二液体填充。成像光学系统满足1

13. 发明申请

US20090046268A1 Projection optical system, exposure apparatus, and exposure method 审中-公开
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20090046268A1
公开(公告)日：2009-02-19
申请号：US11920332
申请日：2006-05-08
申请人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
IPC分类号： G03B27/54
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

14. 发明授权

US07457042B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US07457042B2
公开(公告)日：2008-11-25
申请号：US11224062
申请日：2005-09-13
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B9/00
CPC分类号： G03F7/70241
摘要： A projection optical system which uses, for example, an ArF excimer laser beam and can ensure a good imaging performance for an extended period while avoiding the variations in refractive index and the effect of the intrinsic double refraction of a fluorite containing a high-frequency component. A projection optical system for forming the demagnified image of a first plane (R) on a second plane (W). A first light transmitting member (L23) disposed closest to the second plane side and having almost no refraction power is provided. When the distance between the first light transmitting member and the second plane is WD, a numerical aperture on the second plane side NA, and the center wavelength of a light used L×10−6, the condition 0.06
摘要翻译：一种投影光学系统，其使用例如ArF准分子激光束并且可以在延长的时间段期间确保良好的成像性能，同时避免折射率的变化以及含有高频分量的萤石的本征双折射的影响。一种用于在第二平面（W）上形成第一平面（R）的缩小图像的投影光学系统。设置最靠近第二平面侧并且几乎没有折射能力的第一透光构件（L 23）。当第一透光构件和第二平面之间的距离为WD时，第二平面侧的数值孔径NA和使用的光的中心波长为L×10 -6，条件为0.06

15. 发明申请

US20080106707A1 Exposure Apparatus, Exposure Method, and Method for Producing Device 有权
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20080106707A1
公开(公告)日：2008-05-08
申请号：US10588297
申请日：2005-02-03
申请人： Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
发明人： Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).
摘要翻译：曝光装置（EX）通过液体（LQ）在基板（P）上照射曝光光（EL）而曝光基板（P）。曝光装置（EX）具有用于保持基板（P）的基板保持器（PH），能够移动由基板保持件（PH）保持的基板（P）的基板台（PST）和温度调节系统 60），用于调节衬底保持器（PH）的温度。控制基板（P）的温度，使得基板（P）和液体（LQ）之间的温度没有差异，从而防止由液体（LQ）的温度变化引起的曝光精度的降低。

16. 发明申请

US20080049336A1 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US20080049336A1
公开(公告)日：2008-02-28
申请号：US11907797
申请日：2007-10-17
申请人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
发明人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
IPC分类号： G02B9/64 , G02B17/00 , G02B3/00 , G02B9/04 , G02B9/12 , G02B9/62
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam path of the immersion optical system. The object surface is contactable with a liquid.
摘要翻译：浸入式光学系统包括沿着浸没式光学系统的光束路径设置的多个透镜。多个透镜包括可与液体层接触的液体浸没透镜。物镜表面的光学共轭点形成在浸没式光学系统的光束路径中。物体表面可与液体接触。

17. 发明申请

US20080018870A1 Projection Optical System, Exposure Apparatus, Exposure System, And Exposure Method 有权
标题翻译：投影光学系统，曝光装置，曝光系统和曝光方法
公开(公告)号：US20080018870A1
公开(公告)日：2008-01-24
申请号：US11793402
申请日：2005-12-09
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G03B27/68
CPC分类号： G02B26/0891 , G02B13/24 , G02B27/0068 , G03F7/70308
摘要： An exposure apparatus for performing exposure of a predetermined pattern on a photosensitive substrate, comprising an objective optical system that forms an image of the predetermined pattern in a field region of a substantially rectangular shape, in an exposure region on the photosensitive substrate; and a transformer that transforms the image formed in the exposure region, into a parallelogram.
摘要翻译：一种用于在感光基片上曝光预定图案的曝光装置，包括在感光基片上的曝光区域中形成预定图案的图像的目标光学系统，该场景区域基本为矩形; 以及将在曝光区域中形成的图像变换为平行四边形的变压器。

18. 发明授权

US07319508B2 Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices 失效
标题翻译：投影曝光装置及方法，反折射光学系统及装置制造方法
公开(公告)号：US07319508B2
公开(公告)日：2008-01-15
申请号：US11878402
申请日：2007-07-24
申请人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
发明人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G02B17/0892 , G02B13/24 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70833
摘要： A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.
摘要翻译：反折射光学系统在第二表面上形成第一表面的图像。该系统包括具有第一光轴的第一透镜，凹面镜和第二透镜的组合，该组合具有第二光轴，具有第三光轴的第三透镜，配置在光学器件中的第一反射面第一透镜和组合之间的路径，以及布置在组合和第三透镜之间的光路中的第二反射面。第一反射面的延伸面和第二反射面的延伸面的交线被设定为使得第一光轴，第二光轴和第三光轴在一点相交。此外，第一透镜和第三透镜中的至少一个是可移动的。

19. 发明申请

US20070297072A1 Projection optical system, exposure apparatus, and exposure method 审中-公开
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20070297072A1
公开(公告)日：2007-12-27
申请号：US11882208
申请日：2007-07-31
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B17/00
CPC分类号： G03F7/7015 , G02B9/34 , G02B17/0844 , G03F7/70225 , G03F7/70341 , H01L21/027
摘要： A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.
摘要翻译：投影物镜包括至少四个弯曲镜，其包括第一曲面镜，其是最光学正镜，以及沿着光路限定的第二最光学前向镜的第二曲面镜。此外，中间透镜元件物理地设置在第一和第二反射镜之间，中间透镜元件是单通式透镜。物镜在浸入中形成数值孔径至少为1.0的图像。

20. 发明授权

US06473243B1 Catadioptric imaging system and a projection exposure apparatus provided with said imaging system 有权
标题翻译：反射折射成像系统和设置有所述成像系统的投影曝光装置
公开(公告)号：US06473243B1
公开(公告)日：2002-10-29
申请号：US09644645
申请日：2000-08-24
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G03F7/70225
摘要： The object of the present invention is to provide a catadioptric imaging system, or the like, which is capable of obtaining a desired image-side NA and an image circle without increasing the size of a reflecting mirror with a smaller number of lenses. This catadioptric imaging system comprises a first imaging optical system and a second imaging optical system, wherein the first imaging optical system is provided with a positive first lens group, an aperture stop, and a positive second lens group in the order from the object side, and the second imaging optical system is provided with a primary mirror comprising a concave first reflecting surface having a first radiation transmitting portion at the center thereof, and a secondary mirror comprising a second reflecting surface having a second radiation transmitting portion at the center thereof. In this case, all of the refracting members for constituting the optical system is formed of the same optical material, or at least one of the refracting surfaces and the reflecting surfaces is formed to be aspherical, or a refracting member is disposed to be separated from the first reflecting surface or the second reflecting surface.
摘要翻译：本发明的目的是提供一种反射折射成像系统等，其能够在不增加具有较少数量的透镜的反射镜的尺寸的情况下获得期望的图像侧NA和图像圆。该反折射成像系统包括第一成像光学系统和第二成像光学系统，其中第一成像光学系统以从物体侧开始的顺序设置有正的第一透镜组，孔径光阑和正的第二透镜组，并且所述第二成像光学系统设置有主镜，所述主镜包括在其中心具有第一辐射透射部分的凹入的第一反射表面，以及包括在其中心具有第二辐射透射部分的第二反射表面的次级反射镜。在这种情况下，用于构成光学系统的所有折射构件由相同的光学材料形成，或者折射表面和反射表面中的至少一个形成为非球面，或折射构件被设置为与第一反射面或第二反射面。

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