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11. 发明授权

US08908143B2 Substrate holder, lithographic apparatus, and device manufacturing method involving a heater and/or temperature sensor 有权
标题翻译：基板支架，光刻设备和涉及加热器和/或温度传感器的装置制造方法
公开(公告)号：US08908143B2
公开(公告)日：2014-12-09
申请号：US13722779
申请日：2012-12-20
申请人： Siegfried Alexander Tromp , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
发明人： Siegfried Alexander Tromp , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
IPC分类号： G03F7/20 , H01L21/683 , H01L21/66 , H01L21/67
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70875 , G03F7/7095 , H01L21/67109 , H01L21/67248 , H01L21/6838 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.
摘要翻译：用于光刻设备的衬底保持器。衬底保持器包括主体，多个毛刺和加热器和/或温度传感器。主体有一个表面。多个毛刺从表面突出并具有端面以支撑基底。加热器和/或温度传感器设置在主体表面上。衬底保持器构造成使得当衬底被支撑在端表面上时，加热器和/或温度传感器和衬底之间的热导率大于加热器和/或温度传感器与主体表面之间的热导率。

12. 发明授权

US08830441B2 Fluid handling structure, a lithographic apparatus and a device manufacturing method 有权
标题翻译：流体处理结构，光刻设备和装置制造方法
公开(公告)号：US08830441B2
公开(公告)日：2014-09-09
申请号：US13404746
申请日：2012-02-24
申请人： Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
发明人： Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70341 , Y10T29/494 , Y10T137/8593
摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating mechanism to maintain a gap of a certain size between a bottom surface of the moveable member and the facing surface independent of the size of a gap between the undersurface and the facing surface.
摘要翻译：一种流体处理结构，其构造成将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中，其中流体处理结构具有带有下表面的主体，可相对于主体移动的可移动构件，以及自动调节机构，以在所述可移动部件的底表面和所述相对表面之间保持一定尺寸的间隙，而与所述下表面和所述相对表面之间的间隙的尺寸无关。

13. 发明授权

US08767169B2 Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷装置，用于光刻设备的流体处理结构和装置制造方法
公开(公告)号：US08767169B2
公开(公告)日：2014-07-01
申请号：US13109036
申请日：2011-05-17
申请人： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
发明人： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
IPC分类号： G03B27/32 , G03B27/52 , G03B27/58 , G03F7/20
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716
摘要： A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
摘要翻译：一种光刻设备，包括：流体处理结构，其构造成在与基板台的上表面相邻的空间中容纳浸没流体;和/或位于基板台的凹部中的基板;具有平面主体的盖，其在使用中，从衬底的上表面延伸到衬底的上主表面的周边部分，以覆盖凹部的边缘与衬底的边缘之间的间隙，以及浸没流体膜破坏器，其被配置为中断在衬底台相对于流体处理结构移动期间，在盖的边缘和由流体处理结构容纳的浸没流体之间形成浸没流体的膜。

14. 发明申请

US20130189802A1 SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20130189802A1
公开(公告)日：2013-07-25
申请号：US13722779
申请日：2012-12-20
申请人： Siegfried Alexander TROMP , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
发明人： Siegfried Alexander TROMP , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
IPC分类号： H01L21/66 , H01L21/683
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70875 , G03F7/7095 , H01L21/67109 , H01L21/67248 , H01L21/6838 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.

15. 发明申请

US20110285976A1 LITHOGRAPHIC APPARATUS, FLUID HANDLING STRUCTURE FOR USE IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：液晶显示装置，液晶显示装置和液晶显示装置的制造方法
公开(公告)号：US20110285976A1
公开(公告)日：2011-11-24
申请号：US13109036
申请日：2011-05-17
申请人： Niek Jacobus Johannes ROSET , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
发明人： Niek Jacobus Johannes ROSET , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716
摘要： A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
摘要翻译：一种光刻设备，包括：流体处理结构，其构造成在与基板台的上表面相邻的空间中容纳浸没流体;和/或位于基板台的凹部中的基板;具有平面主体的盖，其在使用中，从衬底的上表面延伸到衬底的上主表面的周边部分，以覆盖凹部的边缘与衬底的边缘之间的间隙，以及浸没流体膜破坏器，其被配置为中断在衬底台相对于流体处理结构移动期间，在盖的边缘和由流体处理结构容纳的浸没流体之间形成浸没流体的膜。

16. 发明授权

US08043085B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08043085B2
公开(公告)日：2011-10-25
申请号：US12468743
申请日：2009-05-19
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Raymond Wilhelmus Louis Lafarre , Catharinus De Schiffart , Norbert Erwin Therenzo Jansen
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Raymond Wilhelmus Louis Lafarre , Catharinus De Schiffart , Norbert Erwin Therenzo Jansen
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.
摘要翻译：公开了一种压印光刻设备，其具有布置成支撑压印模板的第一支撑结构，以及附接到第一支撑结构的第一致动器，并且被布置为位于第一支撑结构和压印模板之间。第一个致动器被配置为向压印模板施加力。压印光刻设备还包括位于第二支撑结构和第一支撑结构之间的第二支撑结构和第二致动器。第二致动器构造成向第二支撑结构施加力，其中第二致动器的运动范围大于第一致动器的移动范围。

17. 发明申请

US20090267870A1 CIRCULAR DISPLAYS 有权
标题翻译：圆形显示器
公开(公告)号：US20090267870A1
公开(公告)日：2009-10-29
申请号：US12097594
申请日：2006-12-11
申请人： Nicolaas Willem Schellingerhout , Kenny Darmadji , Raymond Wilhelmus Louis Lafarre , Hjalmar Edzer Ayco Huitema
发明人： Nicolaas Willem Schellingerhout , Kenny Darmadji , Raymond Wilhelmus Louis Lafarre , Hjalmar Edzer Ayco Huitema
IPC分类号： G09G3/20
CPC分类号： G02F1/133305 , G09F9/301
摘要： A rollable circular display device (10) is disclosed, comprising, in one embodiment, a ring-shaped display (6) expandable in two dimensions between a stored configuration and an expanded configuration and a body for winding the ring-shaped display in the stored configuration. In another embodiment, the rollable circular display device (10) comprises a housing (20), a circular display (6) expandable in two dimensions between a stored configuration in which the circular display (6) is stored within the housing (20) and an expanded configuration in which the circular display is fully viewable, and an inner cone, being arranged co-axially within the housing (20) and rotatable within the housing, wherein the circular display (6) is wound around the inner cone in the stored configuration.
摘要翻译：公开了一种可卷绕的圆形显示装置（10），在一个实施例中，包括在存储的构造和扩展构造之间可二维扩展的环形显示器（6），以及用于将所述环形显示器卷绕在所存储的组态。在另一个实施例中，可滚动圆形显示装置（10）包括壳体（20），圆形显示器（6），其可在存储的构造之间以二维扩展，其中圆形显示器（6）存储在壳体（20）内，圆形显示器是完全可见的扩展构造，以及内壳体，其同轴地设置在壳体（20）内并且可在壳体内旋转，其中圆形显示器（6）围绕存储的内锥体组态。

18. 发明授权

US07578618B2 X-ray examination device 失效
标题翻译： X光检查装置
公开(公告)号：US07578618B2
公开(公告)日：2009-08-25
申请号：US12065624
申请日：2006-09-08
申请人： Roger Anton Marie Timmermans , Raymond Wilhelmus Louis Lafarre
发明人： Roger Anton Marie Timmermans , Raymond Wilhelmus Louis Lafarre
IPC分类号： H05G1/02
CPC分类号： A61B6/4441 , A61B6/4464
摘要： The invention concerns an X-ray examination device (10) comprising an X-ray source (20), an X-ray detector (18) and a segmented carrier, where the X-ray source and the X-ray detector are rotatable together around an isocentre (32). The segmented carrier includes a main arm (12) on which the X-ray source and X-ray detector are mounted and at least one first auxiliary arm (22) to which the main arm is mounted. The first auxiliary arm is rotatable around a first rotational axis (30) through the isocentre. The present invention provides an improved X-ray examination device that allows the provision of a greater freedom of selection of inspection angles regarding a patient
摘要翻译：本发明涉及一种X射线检查装置（10），其包括X射线源（20），X射线检测器（18）和分段载体，其中X射线源和X射线检测器可一起旋转围绕一个等中心（32）。分段载体包括安装有X射线源和X射线检测器的主臂（12）和安装有主臂的至少一个第一辅助臂（22）。第一辅助臂可绕第一旋转轴线（30）通过等中心旋转。本发明提供一种改进的X射线检查装置，其允许提供关于患者的检查角度的更大的选择自由度

19. 发明申请

US20080226036A1 X-Ray Examination Device 失效
标题翻译： X射线检查装置
公开(公告)号：US20080226036A1
公开(公告)日：2008-09-18
申请号：US12065624
申请日：2006-09-08
申请人： Roger Anton Marie Timmermans , Raymond Wilhelmus Louis Lafarre
发明人： Roger Anton Marie Timmermans , Raymond Wilhelmus Louis Lafarre
IPC分类号： H05G1/02
CPC分类号： A61B6/4441 , A61B6/4464
摘要： The invention concerns an X-ray examination device (10) comprising an X-ray source (20), an X-ray detector (18) and a segmented carrier, where the X-ray source and the X-ray detector are rotatable together around an isocentre (32). The segmented carrier includes a main arm (12) on which the X-ray source and X-ray detector are mounted and at least one first auxiliary arm (22) to which the main arm is mounted. The first auxiliary arm is rotatable around a first rotational axis (30) through the isocentre. The present invention provides an improved X-ray examination device that allows the provision of a greater freedom of selection of inspection angles regarding a patient
摘要翻译：本发明涉及一种X射线检查装置（10），其包括X射线源（20），X射线检测器（18）和分段载体，其中X射线源和X射线检测器可一起旋转围绕一个等中心（32）。分段载体包括安装有X射线源和X射线检测器的主臂（12）和安装有主臂的至少一个第一辅助臂（22）。第一辅助臂可绕第一旋转轴线（30）通过等中心旋转。本发明提供一种改进的X射线检查装置，其允许提供关于患者的检查角度的更大的选择自由度

20. 发明公开

US20230251579A1 SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 审中-公开
公开(公告)号：US20230251579A1
公开(公告)日：2023-08-10
申请号：US18299534
申请日：2023-04-12
申请人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
发明人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC分类号： G03F7/00 , B23K26/354 , B23K26/342 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00 , B22F7/06
CPC分类号： G03F7/70341 , B23K26/354 , B23K26/342 , G03F7/70416 , G03F7/707 , G03F7/70708 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , G03F7/70716 , B05D3/06 , B05D5/00 , G03F7/70733 , B33Y10/00 , B33Y80/00 , B22F7/062 , G03F7/708 , B22F10/25
摘要： A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

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