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11. 发明授权

US08207512B2 Charged particle beam apparatus and methods for capturing images using the same 有权
标题翻译：带电粒子束装置及使用该装置拍摄图像的方法
公开(公告)号：US08207512B2
公开(公告)日：2012-06-26
申请号：US12898455
申请日：2010-10-05
申请人： Chie Shishido , Mayuka Oosaki , Mitsugu Sato , Hiroki Kawada , Tatsuya Maeda
发明人： Chie Shishido , Mayuka Oosaki , Mitsugu Sato , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G21K7/00 , A61N5/00 , G21G5/00
CPC分类号： H01J37/263 , H01J37/265 , H01J37/28 , H01J2237/2826
摘要： The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement. Accordingly, the present invention provides methods for reducing the variation in the CD value caused by the variation in the electron beam landing angle with respect to the sample with an equal beam landing angle and methods for reducing the instrumental error caused by the difference in the electron beam landing angle between apparatuses.
摘要翻译：本发明提供一种用于测量捕获用于测量的图像的半导体装置等的微尺寸（CD值）的带电粒子束装置。对于本发明，使用用于校准的样品，其上在视场中排列有通过晶体各向异性蚀刻技术产生的表面上具有已知角度的多个多面体结构物体。基于每个多面体结构物体的图像上的几何变形来计算视野内的每个位置处的束着陆角。用于均衡视场内每个位置的束着陆角的光束控制参数被预先注册。当进行尺寸测量时，根据待测图案的位置在观察区域中应用登记的光束控制参数。因此，本发明提供了减少相对于具有相同束着陆角的样品的电子束着角的变化引起的CD值的变化的方法，以及用于减少由电子差异引起的仪器误差的方法设备之间的束着陆角度。

12. 发明申请

US20110278453A1 Tool-To-Tool Matching Control Method And Its System For Scanning Electron Microscope 有权
标题翻译：刀具对刀匹配控制方法及其扫描电子显微镜系统
公开(公告)号：US20110278453A1
公开(公告)日：2011-11-17
申请号：US13190847
申请日：2011-07-26
申请人： Mayuka Oosaki , Chie Shishido , Hiroki Kawada , Tatsuya Maeda
发明人： Mayuka Oosaki , Chie Shishido , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J2237/282
摘要： A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern by using each of the plural scanning electron microscopes.
摘要翻译：用于控制多个扫描电子显微镜之间的工具对工具差异的系统包括：测量单元，用于基于通过成像获得的二次电子图像提取的信息来测量多个扫描电子显微镜之间的工具对工具差异参考图案，用于监视多个扫描电子显微镜中的每一个的工具状态的工具状态监视单元和用于在屏幕上显示多个扫描电子显微镜之间的工具与工具之间的差异与工具状态之间的关系的输出单元由工具状态监视单元监视的多个扫描电子显微镜中的每一个。工具状态监视单元通过使用多个扫描电子显微镜中的每一个来对多个扫描电子显微镜中的每个扫描电子显微镜的工具状态进行监视，同时对参考图案进行成像。

13. 发明授权

US07684937B2 Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication 有权
标题翻译：精细图案特征，其设备和半导体器件制造方法的评估方法
公开(公告)号：US07684937B2
公开(公告)日：2010-03-23
申请号：US12078840
申请日：2008-04-07
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G01B5/28
CPC分类号： G01B15/08 , G01N23/2251 , G03F7/70625 , H01J2237/223 , H01J2237/2817
摘要： Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.
摘要翻译：设备提取在制造设备时需要评估的空间频率的组件，或者在细线图案上分析材料或工艺的边缘粗糙度并将其显示为索引。设备在足够长的区域上获取边缘粗糙度的数据，对与操作者在功率谱上设置的空间频率区域相对应的分量进行积分，并将其显示在长度测量SEM上。或者，设备对足够长的区域的边缘粗糙度数据进行分割，通过进行基于理论计算的统计处理和拟合来计算与任意检查区域相对应的长周期粗糙度和短周期粗糙度，并将其显示在长度测量 SEM。

14. 发明申请

US20100038535A1 Sample dimension measuring method and scanning electron microscope 有权
标题翻译：样品尺寸测量方法和扫描电子显微镜
公开(公告)号：US20100038535A1
公开(公告)日：2010-02-18
申请号：US12560091
申请日：2009-09-15
申请人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
发明人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
IPC分类号： G01Q20/00 , G01N23/00
CPC分类号： H01J37/28 , G01B15/00 , G01N23/225 , H01J2237/2814
摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.
摘要翻译：本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。或者测量的长度数据由预先存储的近似函数计算。

15. 发明授权

US07460714B2 Method and apparatus for measuring dimension using electron microscope 有权
标题翻译：使用电子显微镜测量尺寸的方法和装置
公开(公告)号：US07460714B2
公开(公告)日：2008-12-02
申请号：US11785790
申请日：2007-04-20
申请人： Chie Shishido , Mayuka Iwasaki , Hiroki Kawada
发明人： Chie Shishido , Mayuka Iwasaki , Hiroki Kawada
IPC分类号： G06K9/46 , G01N23/00
CPC分类号： G06T7/74 , G06T2207/30148
摘要： Disclosed is a scanning electron microscope (SEM) for realizing high-precision dimension measurement of a sample, such as an ArF exposure photoresist, that requires the measurement of a dimension by a low S/N signal waveform. To this end, partial waveforms (or partial images) of sample signal waveforms (or an images) acquired from a dimension measurement target sample and a sample material of the same kind are registered in advance, a measurement target signal waveform (or an image) obtained from the dimension measurement target sample and the sample registration waveform are combined, and a dimension of the dimension measurement target pattern is calculated based on the combination result.
摘要翻译：公开了一种用于实现需要通过低S / N信号波形测量尺寸的样品（例如ArF曝光光致抗蚀剂）的高精度尺寸测量的扫描电子显微镜（SEM）。为此，预先登记从维度测量目标样本和相同种类的样本材料获取的样本信号波形（或图像）的部分波形（或部分图像），测量目标信号波形（或图像）从尺寸测量目标样本和样本登记波形中获得的尺寸测量目标图案的尺寸基于组合结果被计算。

16. 发明申请

US20080215274A1 Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication 有权
标题翻译：精细图案特征，其设备和半导体器件制造方法的评估方法
公开(公告)号：US20080215274A1
公开(公告)日：2008-09-04
申请号：US12078840
申请日：2008-04-07
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G06F17/18 , G06F19/00 , G01N23/22
CPC分类号： G01B15/08 , G01N23/2251 , G03F7/70625 , H01J2237/223 , H01J2237/2817
摘要： Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.
摘要翻译：设备提取在制造设备时需要评估的空间频率的组件，或者在细线图案上分析材料或工艺的边缘粗糙度并将其显示为索引。设备在足够长的区域上获取边缘粗糙度的数据，对与操作者在功率谱上设置的空间频率区域相对应的分量进行积分，并将其显示在长度测量SEM上。或者，设备对足够长的区域的边缘粗糙度数据进行分割，通过进行基于理论计算的统计处理和拟合来计算与任意检查区域相对应的长周期粗糙度和短周期粗糙度，并将其显示在长度测量 SEM。

17. 发明授权

US07366620B2 Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication 有权
公开(公告)号：US07366620B2
公开(公告)日：2008-04-29
申请号：US11185852
申请日：2005-07-21
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G01B19/00 , G06F19/00
CPC分类号： G01B15/08 , G01N23/2251 , G03F7/70625 , H01J2237/223 , H01J2237/2817
摘要： Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.

18. 发明申请

US20070085020A1 Method for controlling charged particle beam, and charged particle beam apparatus 有权
标题翻译：用于控制带电粒子束的方法和带电粒子束装置
公开(公告)号：US20070085020A1
公开(公告)日：2007-04-19
申请号：US11607928
申请日：2006-12-04
申请人： Hiroki Kawada , Ryo Nakagaki
发明人： Hiroki Kawada , Ryo Nakagaki
IPC分类号： G01K1/08
CPC分类号： G01N23/225 , H01J37/28 , H01J2237/216
摘要： According to the invention, to achieve the above objective, there is provided a charged particle beam apparatus that creates a first image by irradiating a charged particle beam on a sample to scan a first pattern of the sample, controls on the basis of the first image the focus of the charged particle beam and the brightness and/or contrast of the image, and irradiates the charged particle beam to correctly scan a second pattern different from the first pattern by using the control conditions used to control the focus of the charged particle beam and the brightness and/or contrast of the image.
摘要翻译：根据本发明，为了实现上述目的，提供了一种带电粒子束装置，其通过在样本上照射带电粒子束来扫描样品的第一图案来产生第一图像，基于第一图像进行控制带电粒子束的焦点以及图像的亮度和/或对比度，并且通过使用用于控制带电粒子束的焦点的控制条件照射带电粒子束以正确地扫描与第一图案不同的第二图案以及图像的亮度和/或对比度。

19. 发明申请

US20060145076A1 High-accuracy pattern shape evaluating method and apparatus 有权
公开(公告)号：US20060145076A1
公开(公告)日：2006-07-06
申请号：US11322559
申请日：2006-01-03
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada
IPC分类号： G21K7/00
CPC分类号： G01N23/2251
摘要： A quantity (or dispersion value) of a distribution of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined as being due to noise.

20. 发明申请

US20050247860A1 Electron microscope, measuring method using the same, electron microscope system, and method for controlling the system 有权
标题翻译：电子显微镜，使用其的测量方法，电子显微镜系统和控制系统的方法
公开(公告)号：US20050247860A1
公开(公告)日：2005-11-10
申请号：US11119934
申请日：2005-05-03
申请人： Chie Shishido , Ryo Nakagaki , Mayuka Oosaki , Hiroki Kawada
发明人： Chie Shishido , Ryo Nakagaki , Mayuka Oosaki , Hiroki Kawada
IPC分类号： G01B15/00 , G01N23/00 , G01N23/225 , G21K7/00 , H01J37/22 , H01J37/28 , H01J40/14 , H01L21/66
CPC分类号： H01J37/28 , G01N23/225 , H01J37/222 , H01J37/263 , H01J2237/24578 , H01J2237/2817 , H01J2237/2823
摘要： The present invention relates to an electron microscope which reduces a difference in measured values that occur due to a difference in resolution that cannot be fully adjusted which exists among electron microscopes, or occurs as time elapses, and a method for measuring dimensions. An operator adapted to compensate for changes of an electron image to be generated due to a difference in probe diameter is obtained in advance from electron images of one reference sample created by electron microscopes having different resolution (probe diameter). Then a compensation-measurement electron image which is equivalent to an electron image created under the same probe diameter by applying the operator for compensation, and the compensation-measurement electron image is used for measuring the dimensions.
摘要翻译：本发明涉及一种电子显微镜，其特征在于，减少由电子显微镜中存在的不能充分调整的分辨率的差异而发生的测量值的差异，或者随着时间的推移而发生的电子显微镜以及尺寸的测定方法。从具有不同分辨率（探针直径）的电子显微镜产生的一个参考样品的电子图像预先获得适于补偿由于探针直径差引起的电子图像变化的操作者。然后通过施加用于补偿的操作者，并且使用补偿测量电子图像来测量相当于在相同探针直径下产生的电子图像的补偿测量电子图像来测量尺寸。

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