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11. 发明授权

US08528717B2 Printing apparatus 有权
标题翻译：印刷装置
公开(公告)号：US08528717B2
公开(公告)日：2013-09-10
申请号：US12198532
申请日：2008-08-26
申请人： Yukio Ando , Masahiro Hayashi
发明人： Yukio Ando , Masahiro Hayashi
IPC分类号： B65G15/64
CPC分类号： B41J3/4078 , B41F17/005 , B41J3/28 , B41J11/06
摘要： A printing apparatus including a pallet configured to receive a print substrate, a conveyer system configured to convey the pallet, and a plurality of work mechanisms arranged along a pallet conveying direction of the conveyer system. The work mechanisms are configured to conduct processing operations to the print substrate. The conveyer system includes an upper conveyer mechanism configured to sequentially convey the pallet to respective working positions of the work mechanisms, and a lower conveyer mechanism arranged below and along the upper conveyer mechanism. The lower conveyer mechanism is configured to convey the pallet in a direction opposite to the pallet conveying direction of the upper conveyer mechanism so that the conveyer system is structured to have an upper stage and a lower stage.
摘要翻译：一种打印装置，包括构造成接收打印基板的托盘，构造成输送托盘的输送器系统以及沿着输送器系统的托盘输送方向布置的多个工作机构。工作机构被配置为对打印基板进行处理操作。输送机系统包括上部输送机构，其构造成将托盘顺序地输送到工作机构的相应工作位置，以及下部输送机构，其布置在上部输送机构的下方并沿着该输送机构。下输送机构构造成沿着与上输送机构的托盘输送方向相反的方向输送托盘，使得输送机系统被构造成具有上段和下段。

12. 发明申请

US20130206287A1 CO-BASED ALLOY 审中-公开
标题翻译：基于合金的合金
公开(公告)号：US20130206287A1
公开(公告)日：2013-08-15
申请号：US13816905
申请日：2011-08-15
申请人： Jun Sato , Shinya Imano , Mototsugu Osaki , Shigeki Ueta , Kiyohito Ishida , Toshihiro Omori , Hiroaki Nishida , Masahiro Hayashi , Tomoki Shiota
发明人： Jun Sato , Shinya Imano , Mototsugu Osaki , Shigeki Ueta , Kiyohito Ishida , Toshihiro Omori , Hiroaki Nishida , Masahiro Hayashi , Tomoki Shiota
IPC分类号： C22F1/10 , C22C30/00 , C22C19/05
CPC分类号： C22F1/10 , C22C19/055 , C22C19/056 , C22C19/057 , C22C30/00 , F01D5/28 , F05C2201/0463 , F05D2300/17 , Y02T50/671
摘要： A Co-based alloy containing not less than 0.001 mass % and less than 0.100 mass % of C, not less than 9.0 mass % and less than 20.0 mass % of Cr, not less than 2.0 mass % and less than 5.0 mass % of Al, not less than 13.0 mass % and less than 20.0 mass % of W, and not less than 39.0 mass % and less than 55.0 mass % of Ni, with the remainder being made up by Co and unavoidable impurities, wherein the contents of Mo, Nb, Ti and Ta which are included in the unavoidable impurities are as follows: Mo
摘要翻译：含有不小于0.001质量％且小于0.100质量％的C，不小于9.0质量％且小于20.0质量％的Cr的Co基合金，不小于2.0质量％且小于5.0质量％的Al ，不小于13.0质量％且小于20.0质量％的W，不小于39.0质量％且小于55.0质量％的Ni，其余由Co和不可避免的杂质构成，其中Mo，包含在不可避免的杂质中的Nb，Ti和Ta如下：Mo <0.010质量％，Nb <0.010质量％，Ti <0.010质量％，Ta <0.010质量％。

13. 发明授权

US08416822B2 Manufacturing method, surface-emitting laser device, surface-emitting laser array, optical scanner, and image forming apparatus 有权
标题翻译：制造方法，表面发射激光器件，表面发射激光器阵列，光学扫描器和成像设备
公开(公告)号：US08416822B2
公开(公告)日：2013-04-09
申请号：US13127531
申请日：2009-11-12
申请人： Hiroyoshi Shouji , Shunichi Sato , Toshihiro Ishii , Kengo Makita , Masahiro Hayashi , Toshihide Sasaki , Akihiro Itoh
发明人： Hiroyoshi Shouji , Shunichi Sato , Toshihiro Ishii , Kengo Makita , Masahiro Hayashi , Toshihide Sasaki , Akihiro Itoh
IPC分类号： H01S5/00
CPC分类号： H01S5/18361 , H01S5/0202 , H01S5/18311 , H01S5/3202 , H01S5/423 , H01S2301/173 , H01S2301/176
摘要： A manufacturing method for manufacturing a surface-emitting laser device includes the steps of forming a laminated body in which a lower reflecting mirror, a resonator structure including an active layer, and an upper reflecting layer having a selective oxidized layer are laminated on a substrate; etching the laminated body to form a mesa structure having the selective oxidized layer exposed at side surfaces thereof; selectively oxidizing the selective oxidized layer from the side surfaces of the mesa structure to form a constriction structure in which a current passing region is surrounded by an oxide; forming a separating groove at a position away from the mesa structure; passivating an outermost front surface of at least a part of the laminated body exposed when the separating groove is formed; and coating a passivated part with a dielectric body.
摘要翻译：一种制造表面发射激光器件的制造方法包括以下步骤：在基板上层压下反射镜，包括有源层的谐振器结构和具有选择性氧化层的上反射层的层叠体; 蚀刻层叠体以形成在其侧表面露出的选择性氧化层的台面结构; 从台面结构的侧面选择性地氧化选择氧化层，形成电流通过区被氧化物包围的收缩结构; 在远离台面结构的位置处形成分隔槽; 钝化形成分离槽时暴露的层叠体的至少一部分的最外表面; 并用绝缘体涂覆钝化部分。

14. 发明申请

US20130070039A1 SURFACE-EMITTING LASER DEVICE, SURFACE-EMITTING LASER ARRAY, OPTICAL SCANNER, IMAGE FORMING APPARATUS, AND METHOD FOR MANUFACTURING SURFACE-EMITTING LASER DEVICE 有权
标题翻译：表面发射激光器件，表面发射激光阵列，光学扫描仪，图像形成装置以及用于制造表面发射激光器件的方法
公开(公告)号：US20130070039A1
公开(公告)日：2013-03-21
申请号：US13379160
申请日：2011-05-18
申请人： Kazuhiro Harasaka , Shunichi Sato , Masahiro Hayashi , Akihiro Itoh , Katsunari Hanaoka
发明人： Kazuhiro Harasaka , Shunichi Sato , Masahiro Hayashi , Akihiro Itoh , Katsunari Hanaoka
IPC分类号： B41J2/435 , G02B26/08 , H01S5/00
CPC分类号： G03G15/04 , B41J2/442 , B41J2/471 , G02B26/10 , H01S5/18 , H01S5/18313 , H01S5/18355 , H01S5/18377 , H01S5/18391 , H01S5/18394 , H01S5/3202 , H01S5/423
摘要： A surface-emitting laser device includes a transparent dielectric layer provided in an emitting region and configured to cause a reflectance at a peripheral part to be different from a reflectance at a central part in the emitting region. In the surface-emitting laser device, the thickness of a contact layer is different between a region having a relatively high reflectance and a region having a relatively low reflectance in the emitting region. The contact layer is provided on the high refractive index layer of an upper multilayer film reflecting mirror, and the total optical thickness of the high refractive index layer and the contact layer in the region having the relatively low reflectance is deviated from an odd number multiple of a one quarter oscillation wavelength of laser light emitted from the emitting region.
摘要翻译：表面发射激光器件包括设置在发射区域中并被配置为使得在周边部分处的反射率与发射区域中的中心部分的反射率不同的透明电介质层。在表面发射激光器件中，接触层的厚度在具有较高反射率的区域和在发射区域中反射率相对较低的区域之间是不同的。接触层设置在上层多层膜反射镜的高折射率层上，并且具有较低反射率的区域中的高折射率层和接触层的总光学厚度偏离了从发射区域发射的激光的四分之一振荡波长。

15. 发明申请

US20120322116A1 METHOD FOR TRANSFORMING STRAMENOPILES 有权
标题翻译：改性方法
公开(公告)号：US20120322116A1
公开(公告)日：2012-12-20
申请号：US13497894
申请日：2010-09-24
申请人： Keishi Sakaguchi , Takanori Matsuda , Takumi Kobayashi , Makoto Ito , Naoki Nagano , Masahiro Hayashi , Daisuke Honda , Yosuke Taoka , Yuji Okita , Hitoshi Izumida , Shinichi Sugimoto
发明人： Keishi Sakaguchi , Takanori Matsuda , Takumi Kobayashi , Makoto Ito , Naoki Nagano , Masahiro Hayashi , Daisuke Honda , Yosuke Taoka , Yuji Okita , Hitoshi Izumida , Shinichi Sugimoto
IPC分类号： C12P7/64 , C12N15/79
CPC分类号： C12P7/6409 , C11C3/00 , C12N9/0071 , C12N9/0083 , C12N15/79 , C12N15/8201 , C12N15/8247 , C12P7/6427
摘要： Disclosed is a transformation method whereby an ability to produce a useful substance of a stramenopile can be improved. The method for transforming a stramenopile comprises transferring a foreign gene into the stramenopile which is a microorganism belonging to the class Labyrinthula, more specifically, to a genus Labyrinthula, Altornia, Aplanochytrium, Schizochytrium, Aurantiochytrium, Thraustochytrium, Ulkenia, etc. Said foreign gene, which is a gene relating to tolerance against an antibiotic, a colorimetric protein and/or a fatty acid desaturase (Δ5 desaturase gene, Δ12 desaturase gene and/or ω3 desaturase gene), is transferred by using the electroporation or gene-gun technique.
摘要翻译：公开了能够提高产生有机物的能力的转化方法。用于转化stramenopile的方法包括将外源基因转移到作为属于Labyrinthula类的微生物的地幔中，更具体地是属于Labyrinthula，Altornia，Aplanochytrium，Schizochytrium，Aurantiochytrium，Thraustochytrium，Ulkenia等。所述外源基因，其是与抗生素，比色蛋白质和/或脂肪酸去饱和酶（＆Dgr。5去饱和酶基因，＆Dgr; 12去饱和酶基因和/或ω3去饱和酶基因）的耐受相关的基因通过使用电穿孔或基因 - 枪技术。

16. 发明授权

US08294089B2 Time of flight mass spectrometer and charged particle detector therefor 有权
标题翻译：飞行时间质谱仪和带电粒子检测器
公开(公告)号：US08294089B2
公开(公告)日：2012-10-23
申请号：US12407451
申请日：2009-03-19
申请人： Akio Suzuki , Etsuo Iizuka , Katsutoshi Nonaka , Masahiro Hayashi , Yuuya Washiyama
发明人： Akio Suzuki , Etsuo Iizuka , Katsutoshi Nonaka , Masahiro Hayashi , Yuuya Washiyama
IPC分类号： H01J49/40
CPC分类号： H01J49/025
摘要： In a charged particle detecting apparatus 100 for which an MCP is sandwiched with an IN electrode 1 and an OUT electrode and an anode electrode and a rear cover are installed therebehind, the component members in the rear of the IN electrode 1 are arranged further inside than the IN electrode 1 when viewed from an MCP incident surface, and the charged particle detecting apparatus 100 is fixed by screwing and the like to a cabinet wall surface 330 of a TOF-MS by using a flange portion provided at a part of IN electrode 1 projected further outside than the rear component members.
摘要翻译：在其中MCP被夹在IN电极1和OUT电极以及阳极电极和后盖之间的带电粒子检测装置100中，IN电极1的后部的部件被布置在从MCP入射表面观察IN电极1，并且带电粒子检测装置100通过使用设置在IN电极1的一部分的凸缘部分通过螺钉固定到TOF-MS的柜壁表面330 远远超过后部部件。

17. 发明申请

US20120033251A1 Image forming apparatus, and computer program product for image forming 有权
标题翻译：图像形成装置和图像形成用计算机程序产品
公开(公告)号：US20120033251A1
公开(公告)日：2012-02-09
申请号：US13137297
申请日：2011-08-04
申请人： Daisuke Okada , Noboru Tamura , Nobuhiro Shindo , Hideaki Matsui , Hajime Kubota , Yuto Shibata , Takeo Momose , Masahiro Hayashi
发明人： Daisuke Okada , Noboru Tamura , Nobuhiro Shindo , Hideaki Matsui , Hajime Kubota , Yuto Shibata , Takeo Momose , Masahiro Hayashi
IPC分类号： G06K15/02
CPC分类号： G06F3/1239 , G06F3/1212 , G06F3/1222 , G06F3/1267 , G06F3/1273 , G06F3/1274 , G06F3/1279
摘要： An image forming apparatus includes a receiving unit; a data saving unit; a drawing data generating unit; a log storage unit that stores a processing log; an image forming unit; and a data management unit. The data management unit, when the print job is analyzed as a time designated print job; causes the data generating unit to generate the drawing data; causes the data saving unit to save the drawing data; that, when analyzed printing being enabled at the designated print time, causes the image forming unit to perform image formation based on the drawing data and causes the log storage unit to store therein a processing log; and that, when printing is analyzed as disabled at the designated print time, performs processing corresponding to a print disabled state preset and causes the log storage unit to store therein a processing log about the processing.
摘要翻译：图像形成装置包括：接收单元; 数据保存单元; 绘图数据生成单元; 存储处理日志的日志存储单元; 图像形成单元; 和数据管理单元。当打印作业被分析为时间指定打印作业时，数据管理单元; 使数据生成单元生成绘图数据; 使数据保存单元保存绘图数据; 当在指定的打印时间分析打印被启用时，使图像形成单元基于绘图数据执行图像形成，并使日志存储单元在其中存储处理日志; 并且当在指定的打印时间将打印分析为禁用时，执行与打印禁用状态预设相对应的处理，并使日志存储单元在其中存储关于处理的处理日志。

18. 发明授权

US07663113B2 Semiconductor device and radiation detector employing it 失效
标题翻译：采用它的半导体器件和辐射探测器
公开(公告)号：US07663113B2
公开(公告)日：2010-02-16
申请号：US10546698
申请日：2004-02-26
申请人： Katsumi Shibayama , Yutaka Kusuyama , Masahiro Hayashi
发明人： Katsumi Shibayama , Yutaka Kusuyama , Masahiro Hayashi
IPC分类号： G01J1/00 , A61B6/00
CPC分类号： H05K3/3436 , H01L23/15 , H01L23/49827 , H01L23/552 , H01L24/16 , H01L24/81 , H01L27/1462 , H01L27/14636 , H01L27/14658 , H01L27/14676 , H01L31/02322 , H01L2224/0345 , H01L2224/0401 , H01L2224/0603 , H01L2224/13099 , H01L2224/1403 , H01L2224/16225 , H01L2224/16235 , H01L2224/16237 , H01L2224/81801 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01022 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01039 , H01L2924/01046 , H01L2924/01047 , H01L2924/01049 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/04941 , H01L2924/09701 , H01L2924/12042 , H01L2924/12043 , H01L2924/14 , H01L2924/15312 , H01L2924/15788 , H01L2924/30105 , H01L2924/3025 , H05K1/0306 , H05K2201/0979 , H05K2203/0455 , Y02P70/613 , H01L2924/00
摘要： A wiring substrate to which a semiconductor element 10 is connected, is a wiring substrate 20 comprised of a glass substrate with through-hole groups 20d, each group consisting of a plurality of through holes 20c extending from input surface 20a to output surface 20b and formed in a predetermined array, and conductive members 21 formed on respective inner walls of the through holes 20c in each through-hole group 20d so as to establish electrical continuity between input surface 20a and output surface 20b. A bump electrode 12 of semiconductor element 10 connected to the input surface 20a corresponds to each through-hole group 20d, conductive member 21, and conductive part 22 formed in a region covering the through-hole group 20d, and is connected so that a portion of the bump electrode 12 enters into an interior of each of the through holes 20c. This provides a semiconductor device in which good connection is made between the semiconductor element and the corresponding conduction path in the wiring substrate, and a radiation detector using it.
摘要翻译：连接有半导体元件10的布线基板是由具有通孔组20d的玻璃基板构成的布线基板20，每个组由从输入表面20a延伸到输出表面20b并形成的多个通孔20c 以及形成在每个通孔组20d中的通孔20c的相应内壁上的导电构件21，以便在输入表面20a和输出表面20b之间建立电连续性。连接到输入表面20a的半导体元件10的突起电极12对应于形成在覆盖通孔组20d的区域中的每个通孔组20d，导电部件21和导电部分22，并且连接成使得部分突起电极12进入每个通孔20c的内部。这提供了一种半导体器件，其中在半导体元件和布线基板中的相应导电路径之间形成良好的连接，以及使用它的放射线检测器。

19. 发明授权

US07655891B2 Charged-particle detecting apparatus 有权
标题翻译：带电粒子检测装置
公开(公告)号：US07655891B2
公开(公告)日：2010-02-02
申请号：US11723951
申请日：2007-03-22
申请人： Akio Suzuki , Masahiro Hayashi , Katsutoshi Nonaka , Yuuya Washiyama
发明人： Akio Suzuki , Masahiro Hayashi , Katsutoshi Nonaka , Yuuya Washiyama
IPC分类号： H01J49/06 , G01T1/28 , G01T1/29 , H01J43/24
CPC分类号： H01J49/025
摘要： The present invention relates to a charged-particle detecting apparatus having a structure which enables adjustment of a potential distribution so as to stably maintain flight loci of charged particles without depending on a change in a voltage-applied state. The charged-particle detecting apparatus comprises a first electrode, an MCP, a second electrode, a third electrode that functions as an anode, and a rear cover arranged in order along a predetermined reference axis. The third electrode is arranged on the opposite side of the MCP with respect to the second electrode, and is electrically connected to an output signal part via a capacitor. In particular, the first electrode is arranged so as to become a part of the outer surface of the charged-particle detecting apparatus, and components positioned between the first electrode and the rear cover have contours with section sizes equal to or smaller than that of the contour of the first electrode when viewed from the first electrode side toward the rear cover.
摘要翻译：本发明涉及具有能够调整电位分布的结构的带电粒子检测装置，以便不依赖于施加电压的状态的变化来稳定地保持带电粒子的飞行轨迹。带电粒子检测装置包括第一电极，MCP，第二电极，用作阳极的第三电极和沿着预定参考轴依次排列的后盖。第三电极相对于第二电极布置在MCP的相对侧上，并且经由电容器电连接到输出信号部分。特别地，第一电极被布置成成为带电粒子检测装置的外表面的一部分，并且位于第一电极和后盖之间的部件具有等于或小于当从第一电极侧朝向后盖观察时，第一电极的轮廓。

20. 发明授权

US07507971B2 Radioactive ray detector 失效
标题翻译：放射线检测器
公开(公告)号：US07507971B2
公开(公告)日：2009-03-24
申请号：US10552705
申请日：2004-04-09
申请人： Katsumi Shibayama , Yutaka Kusuyama , Masahiro Hayashi
发明人： Katsumi Shibayama , Yutaka Kusuyama , Masahiro Hayashi
IPC分类号： G01T1/26
CPC分类号： H01L27/14661 , G01T1/2018 , H01L27/14634 , H01L31/02322
摘要： A wiring substrate section 2 is provided between a radiation detecting section 1, which is formed of a scintillator 10 and a PD array 15, and signal processing elements 30 and 32 for processing a detected signal outputted from the PD array 15, and the wiring substrate section 2 has a wiring substrate 20 which is formed of a glass material having a radiation shielding function and in which a conductive member 21 serving as a conduction path for guiding the detected signal therethrough is provided in a through hole 20c. Relative to the through hole 20c of the wiring substrate 20, the signal processing elements 30 and 32 of the signal processing section 3, located downstream of the wiring substrate 20, are each disposed in an area excluding those areas on the extension of the through holes 20c, and this allows the signal processing elements 30 and 32 not to be seen through the through holes 20c. This arrangement realizes a radiation detector which suppresses radiation made incident on the signal processing means located downstream of the wiring substrate.
摘要翻译：布线基板部分2设置在由闪烁体10和PD阵列15形成的辐射检测部分1和用于处理从PD阵列15输出的检测信号的信号处理元件30和32之间，以及布线基板部分2具有布线基板20，该布线基板20由具有辐射屏蔽功能的玻璃材料形成，并且其中用作导引检测信号的导电路径的导电部件21设置在通孔20c中。相对于布线基板20的通孔20c，位于布线基板20下游的信号处理部3的信号处理部30,32分别配置在除了贯通孔的延伸部的那些区域以外的区域 20c，并且这允许信号处理元件30和32不通过通孔20c被看到。这种布置实现了辐射检测器，其抑制入射到位于布线基板下游的信号处理装置的辐射。

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