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11. 发明授权

US06319641B2 Scanning exposure method utilizing alignment marks based on scanning direction 有权
标题翻译：基于扫描方向利用对准标记的扫描曝光方法
公开(公告)号：US06319641B2
公开(公告)日：2001-11-20
申请号：US09730590
申请日：2000-12-07
申请人： Nobutaka Magome
发明人： Nobutaka Magome
IPC分类号： G03F900
CPC分类号： G03F7/70358 , G03F7/70283 , G03F7/70425 , G03F7/70433 , G03F7/70733 , G03F9/70
摘要： A mask pattern is transferred onto a wafer by exposure with a mask stage and a wafer stage being moved synchronously. In global alignment of the mask and the wafer, the scanning direction in the present (second layer) scanning exposure is made coincident with the scanning direction in the preceding (first layer) scanning exposure. When alignment is made by calculating shot array coordinates in advance, shot array coordinates are calculated for each scanning direction.
摘要翻译：掩模图案通过用掩模台曝光并且晶片台同步移动而转印到晶片上。在掩模和晶片的全局对准中，使得当前（第二层）扫描曝光中的扫描方向与先前（第一层）扫描曝光中的扫描方向一致。通过预先计算射击阵列坐标进行对准时，针对每个扫描方向计算射击阵列坐标。

12. 发明授权

US5587794A Surface position detection apparatus 失效
标题翻译：表面位置检测装置
公开(公告)号：US5587794A
公开(公告)日：1996-12-24
申请号：US239847
申请日：1994-05-09
申请人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
发明人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
IPC分类号： G01B11/26 , G01B11/00 , G01B11/02 , G01C3/06 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7026 , G01B11/026 , G03F7/70358
摘要： A surface position detection apparatus includes a projection optical system for projecting pattern light having a predetermined pattern on a detection surface from an oblique direction to the detection surface, an imaging optical system for forming an image of the pattern light reflected by the detection surface, a light-receiving-side light-shield arranged at a position substantially conjugate with the detection surface in the imaging optical system, and having an opening portion with a predetermined shape, a scanner for scanning the pattern image formed by the imaging optical system relative to the light-receiving-side light-shield, and a detection device for the pattern light into a plurality of portions, and selectively detecting at least one such portion of the pattern light.
摘要翻译：表面位置检测装置包括：投影光学系统，用于将检测表面上具有预定图案的图案光从倾斜方向投射到检测表面;成像光学系统，用于形成由检测表面反射的图案光的图像; 光接收侧光屏配置在与成像光学系统中的检测面基本共轭的位置，具有规定形状的开口部的扫描器，用于扫描由摄像光学系统形成的图案图像相对于光接收侧光屏蔽和用于将图案光分解为多个部分的检测装置，并且选择性地检测图案光的至少一个部分。

13. 发明授权

US5504596A Exposure method and apparatus using holographic techniques 失效
标题翻译：使用全息技术的曝光方法和装置
公开(公告)号：US5504596A
公开(公告)日：1996-04-02
申请号：US169055
申请日：1993-12-20
申请人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
发明人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
IPC分类号： G03F7/20 , G03H1/00 , G03H1/26
CPC分类号： G03F7/70558 , G03F7/70625 , G03H1/00
摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.
摘要翻译：使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。

14. 发明授权

US5289231A Apparatus for manufacturing disc medium 失效
标题翻译：光盘介质制造装置
公开(公告)号：US5289231A
公开(公告)日：1994-02-22
申请号：US992772
申请日：1992-12-18
申请人： Nobutaka Magome , Hiromitsu Iwata , Junichi Morino , Toru Kiuchi
发明人： Nobutaka Magome , Hiromitsu Iwata , Junichi Morino , Toru Kiuchi
IPC分类号： G03F7/20 , G11B7/26 , G03B27/42
CPC分类号： G11B7/261 , G03F7/201 , G03F7/70075 , G03F7/70358 , G03F7/70366
摘要： This specification discloses a method of and an apparatus for manufacturing a disc medium which utilize the projection exposure technique of a stopper for lithography, rotate a circular photosensitive substrate which provides the disc medium at the same speed as a circular reticle having a pattern of information tracks while rotating the reticle, and irradiate the reticle with illuminating light of a slit-like shape or a sectoral shape extending in the diametrical direction of the circular reticle to thereby effect rotation scan exposure.
摘要翻译：本说明书公开了一种制造盘式介质的方法和装置，其利用用于光刻的止动器的投影曝光技术，旋转圆形感光基片，以与具有信息轨迹图案的圆形掩模版相同的速度提供光盘介质同时旋转掩模版，并用沿着圆形掩模版的直径方向延伸的狭缝状或扇形的照明光照射光罩，从而进行旋转扫描曝光。

15. 发明授权

US5160849A Diffraction-type displacement detector for alignment of mask and wafer 失效
$Diffraction-type displacement detector for alignment of mask and wafer$
标题翻译：用于对准掩模和晶片的衍射型位移检测器
公开(公告)号：US5160849A
公开(公告)日：1992-11-03
申请号：US642384
申请日：1991-01-17
申请人： Kazuya Ota , Nobutaka Magome
发明人： Kazuya Ota , Nobutaka Magome
IPC分类号： G01D5/38 , G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A displacement detector comprises a beam irradiation device for irradiating beams almost equal in wavelength on a diffraction grating provided on an object to be measured from two directions different each other, a photoelectric detector for detecting an interference intensity of specific diffracted rays generated from the diffraction grating, and a measuring device for measuring a displacement of the object to be measured with reference to a grating pitch direction of the diffraction grating according to an outgoing signal of the photoelectric detector; the photoelectric detector is equipped with a first photoelectric detector for detecting an interference intensity of diffracted rays of an angle of diffraction running in the said direction from the diffraction grating, and a second photoelectric detector for detecting an interference intensity of diffracted rays different in angle of diffraction running in the same direction from the diffraction grating; the measuring device has a first measuring portion for measuring a value corresponding to a displacement of the object to be measured according to an outgoing signal of the first photoelectric detector, and a second measuring portion for measuring a value corresponding to a displacement of the object to be measured according to an outgoing signal of the second photoelectric detector, outputting at least one mean value of the measured value of the first measuring portion and the measured value of the second measuring portion.
摘要翻译：位移检测器包括用于从设置在待测物体上的衍射光栅在两个方向彼此不同的方向照射波长几乎相等的光束照射装置，用于检测由衍射光栅产生的特定衍射光线的干涉强度的光电检测器以及测量装置，用于根据光电检测器的输出信号，根据衍射光栅的光栅间距方向测量待测物体的位移; 光电检测器配备有第一光电检测器，用于检测来自衍射光栅的沿所述方向的衍射角的衍射光线的干涉强度;以及第二光电检测器，用于检测与衍射光线的角度不同的衍射光线的干涉强度绕衍射光栅在相同方向上的衍射; 测量装置具有第一测量部分，用于根据第一光电检测器的输出信号测量对应于被测量物体的位移的值;以及第二测量部分，用于测量与物体的位移对应的值根据第二光电检测器的输出信号进行测量，输出第一测量部分的测量值和第二测量部分的测量值的至少一个平均值。

16. 再颁专利

USRE34010E Position detection apparatus 失效
公开(公告)号：USRE34010E
公开(公告)日：1992-07-28
申请号：US627925
申请日：1990-12-17
申请人： Nobutaka Magome , Yutaka Ichihara
发明人： Nobutaka Magome , Yutaka Ichihara
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7065 , G03F7/70633 , G03F9/7049
摘要： An apparatus includes a means for providing a predetermined frequency difference between two light beams and generating an optical beat with respect to interference between first and second diffracted light beams from a diffraction grating formed on a substrate, and a means for detecting a phase difference between the optical beat and a reference signal having a frequency corresponding to the frequency difference between the two light beams, and detects a position of the substrate based upon the phase difference in accordance with an optical heterodyne interference method.

17. 发明授权

US07505115B2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus 有权
标题翻译：曝光装置，制造装置的方法以及曝光装置的控制方法
公开(公告)号：US07505115B2
公开(公告)日：2009-03-17
申请号：US11366743
申请日：2006-03-03
申请人： Nobutaka Magome , Naoyuki Kobayashi
发明人： Nobutaka Magome , Naoyuki Kobayashi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70525 , G03F7/70725 , G03F7/70858 , G03F7/709
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid feeding mechanism stops the supply of the liquid when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.
摘要翻译：曝光装置通过投影光学系统和液体将图案的图像投影到基板上来曝光基板。曝光装置具有在投影光学系统和基板之间供给液体的液体供给机构。当检测到异常时，液体供给机构停止供给液体。这抑制了由于形成液浸区域的液体的泄漏而导致的衬底周边的器件和构件的影响，从而实现令人满意的曝光处理。

18. 发明申请

US20090002655A1 Exposure apparatus, exposure method, and method for producing device 审中-公开
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20090002655A1
公开(公告)日：2009-01-01
申请号：US12222792
申请日：2008-08-15
申请人： Hiroyuki Nagasaka , Nobutaka Magome
发明人： Hiroyuki Nagasaka , Nobutaka Magome
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/709
摘要： A liquid immersion exposure apparatus includes an optical member through which a substrate is exposed with an exposure beam, and a liquid supply system having a supply port from which a liquid is supplied. The liquid supply system supplies the liquid from the supply port to a space between the optical member and the substrate during the exposure. The optical member has a lyophobic surface which is lyophobic for the liquid.
摘要翻译：液浸曝光装置包括通过曝光用光束曝光基板的光学部件和具有供给液体的供给口的液体供给系统。液体供给系统在曝光期间将液体从供给口供给到光学构件和基板之间的空间。光学构件具有对于液体是疏液的疏液表面。

19. 发明授权

US07436487B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07436487B2
公开(公告)日：2008-10-14
申请号：US11345392
申请日：2006-02-02
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the liquid. The apparatus includes a bubble detector that detects air bubble or bubbles in the liquid between the projection optical system and the substrate. Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间的至少一部分并经由投影光学系统和液体将图案的图像投影到基板上来进行基板的曝光。该装置包括气泡检测器，其检测投影光学系统和基板之间的液体中的气泡或气泡。因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

20. 发明申请

US20080151203A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080151203A1
公开(公告)日：2008-06-26
申请号：US12010824
申请日：2008-01-30
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.
摘要翻译：曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。

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