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11. 发明授权

US08395837B2 Releasing and post-releasing processes in fabrications for micromirror array devices 有权
标题翻译：微镜阵列器件制造中的释放和释放过程
公开(公告)号：US08395837B2
公开(公告)日：2013-03-12
申请号：US11734458
申请日：2007-04-12
申请人： Hongqin Shi , Gregory Schaadt , James C. Dunphy , Dmitri Simonian , John D. Porter
发明人： Hongqin Shi , Gregory Schaadt , James C. Dunphy , Dmitri Simonian , John D. Porter
IPC分类号： G02B26/00
CPC分类号： B81B3/0005 , B81B2201/042 , B81C2201/112 , G02B26/0833 , H01L21/02046 , H01L21/02164 , H01L21/3121
摘要： A releasing and post-releasing method for making a micromirror device and a micromirror array device are disclosed herein. The releasing method removes the sacrificial materials in the micromirror and micromirror array so as to enabling movements of the movable elements in the micromirror and micromirror array device. The post-releasing method is applied to improve the performance and quality of the released micromirrors and micromirror array devices.
摘要翻译：本文公开了用于制造微镜器件和微镜阵列器件的释放和释放方法。释放方法去除了微反射镜和微镜阵列中的牺牲材料，以便使得微镜和微镜阵列器件中的可移动元件能够移动。应用后释放方法来提高释放的微镜和微镜阵列器件的性能和质量。

12. 发明申请

US20060096705A1 Removal of sacrificial materials in MEMS fabrications 审中-公开
标题翻译：去除MEMS制造中的牺牲材料
公开(公告)号：US20060096705A1
公开(公告)日：2006-05-11
申请号：US11303063
申请日：2005-12-14
申请人： Hongqin Shi , Dmitri Simonian
发明人： Hongqin Shi , Dmitri Simonian
IPC分类号： C03C25/68 , H01L21/306
CPC分类号： H01L21/31116 , B81C1/00476 , B81C2201/0132 , B82Y30/00
摘要： A method and apparatus for removing the sacrificial layers of microstructures in fabrications have been disclosed. The method comprises a plasma etching process followed by a non-energized spontaneous vapor phase etching process. The plasma and spontaneous etching processes utilize the same etchant that is capable of chemically reacting with the sacrificial material, wherein t chemical reaction is spontaneous.
摘要翻译：已经公开了用于去除制造中的微结构的牺牲层的方法和装置。该方法包括等离子体蚀刻工艺，随后是非电自动气相蚀刻工艺。等离子体和自发蚀刻工艺利用能够与牺牲材料化学反应的相同的蚀刻剂，其中t化学反应是自发的。

13. 发明申请

US20070119814A1 APPARATUS AND METHOD FOR DETECTING AN ENDPOINT IN A VAPOR PHASE ETCH 审中-公开
标题翻译：用于检测蒸气相蚀刻中的端点的装置和方法
公开(公告)号：US20070119814A1
公开(公告)日：2007-05-31
申请号：US11627026
申请日：2007-01-25
申请人： Satyadev Patel , Gregory Schaadt , Douglas MacDonald , Niles MacDonald , Hongqin Shi
发明人： Satyadev Patel , Gregory Schaadt , Douglas MacDonald , Niles MacDonald , Hongqin Shi
IPC分类号： C03C25/68 , G01L21/30 , H01L21/306 , H01L21/461 , B44C1/22
CPC分类号： H01J37/32963 , B81C1/00476 , B81C1/00587 , B81C99/0065 , B81C2201/0132 , B81C2201/0138 , H01J37/32449 , H01J37/32935
摘要： Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored; and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber
摘要翻译：通过与制造微结构中的工艺气体接触从工件材料去除层或区域的工艺通过精确地确定去除步骤的终点的能力增强。气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物; 并且可以确定去除过程的终点。气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室

14. 发明申请

US20080096313A1 Methods for Depositing, Releasing and Packaging Micro-Electromechanical Devices on Wafer Substrates 审中-公开
标题翻译：微晶基片上微机电器件的沉积，释放和封装方法
公开(公告)号：US20080096313A1
公开(公告)日：2008-04-24
申请号：US11954076
申请日：2007-12-11
申请人： Satayadev Patel , Andrew Huibers , Steve Chiang , Robert Duboc , Thomas Grobelny , Hung Nan Chen , Dietrich Dehlinger , Peter Richards , Hongqin Shi , Anthony Sun
发明人： Satayadev Patel , Andrew Huibers , Steve Chiang , Robert Duboc , Thomas Grobelny , Hung Nan Chen , Dietrich Dehlinger , Peter Richards , Hongqin Shi , Anthony Sun
IPC分类号： H01L21/48
CPC分类号： B81B7/0077 , B81B2201/042 , B81C1/00269 , B81C1/00904 , B81C2203/0118 , B82Y30/00 , G02B26/0833 , G02B26/0841 , H01L24/97 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01039 , H01L2924/01049 , H01L2924/01054 , H01L2924/01072 , H01L2924/01074 , H01L2924/01076 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/04953 , H01L2924/10329 , H01L2924/12036 , H01L2924/12042 , H01L2924/12044 , H01L2924/1461 , H01L2924/19041 , H01L2924/19042 , H01L2924/3025 , H01L2924/00
摘要： A projection system, a spatial light modulator, and a method for forming a MEMS device is disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micromirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers. The wafers can be bonded together hermetically if desired, and the pressure between the two substrates can be below atmosphere.
摘要翻译：公开了投影系统，空间光调制器和用于形成MEMS器件的方法。空间光调制器可以具有与包括微镜阵列的基板中的一个结合在一起的两个基板。在一个或两个晶片上沉积吸气剂材料和/或固体或液体润滑剂之后，两个基底可以在晶片级粘结。如果需要，晶片可以密封在一起，并且两个基板之间的压力可以低于大气。

15. 发明申请

US20050074919A1 Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates 有权
标题翻译：在晶片衬底上沉积，释放和封装微机电器件的方法
公开(公告)号：US20050074919A1
公开(公告)日：2005-04-07
申请号：US10167361
申请日：2002-06-11
申请人： Satayadev Patel , Andrew Huibers , Steve Chiang , Robert Duboc , Thomas Grobelny , Hung Chen , Dietrich Dehlinger , Peter Richards , Hongqin Shi , Anthony Sun
发明人： Satayadev Patel , Andrew Huibers , Steve Chiang , Robert Duboc , Thomas Grobelny , Hung Chen , Dietrich Dehlinger , Peter Richards , Hongqin Shi , Anthony Sun
IPC分类号： B81B3/00 , B81B7/00 , B81C1/00 , B81C3/00 , B81C99/00 , G02B26/08 , H01L21/301 , H01L21/60 , H01L23/02 , H01L23/22 , H01L23/24 , H01L21/44
CPC分类号： B81B7/0077 , B81B2201/042 , B81C1/00269 , B81C1/00904 , B81C2203/0118 , B82Y30/00 , G02B26/0833 , G02B26/0841 , H01L24/97 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01039 , H01L2924/01049 , H01L2924/01054 , H01L2924/01072 , H01L2924/01074 , H01L2924/01076 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/04953 , H01L2924/10329 , H01L2924/12036 , H01L2924/12042 , H01L2924/12044 , H01L2924/1461 , H01L2924/19041 , H01L2924/19042 , H01L2924/3025 , H01L2924/00
摘要： A projection system, a spatial light modulator, and a method for forming a MEMS device is disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micromirror array. The two substrates can be bonded at the wafer level after depositing a getter material andlor solid or liquid lubricant on one or both of the wafers. The wafers can be bonded together hermetically if desired, and the pressure between the two substrates can be below atmosphere.
摘要翻译：公开了投影系统，空间光调制器和用于形成MEMS器件的方法。空间光调制器可以具有与包括微镜阵列的基板中的一个结合在一起的两个基板。在一个或两个晶片上沉积吸气材料和固体或液体润滑剂之后，两个基底可以在晶片级结合。如果需要，晶片可以密封在一起，并且两个基板之间的压力可以低于大气。

16. 发明授权

US07307775B2 Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates 有权
标题翻译：在晶片衬底上沉积，释放和封装微机电器件的方法
公开(公告)号：US07307775B2
公开(公告)日：2007-12-11
申请号：US10167361
申请日：2002-06-11
申请人： Satayadev R. Patel , Andrew G. Huibers , Steve Chiang , Robert M. Duboc , Thomas J. Grobelny , Hung Nan Chen , Dietrich Dehlinger , Peter W. Richards , Hongqin Shi , Anthony Sun
发明人： Satayadev R. Patel , Andrew G. Huibers , Steve Chiang , Robert M. Duboc , Thomas J. Grobelny , Hung Nan Chen , Dietrich Dehlinger , Peter W. Richards , Hongqin Shi , Anthony Sun
IPC分类号： G02B26/00
CPC分类号： B81B7/0077 , B81B2201/042 , B81C1/00269 , B81C1/00904 , B81C2203/0118 , B82Y30/00 , G02B26/0833 , G02B26/0841 , H01L24/97 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01039 , H01L2924/01049 , H01L2924/01054 , H01L2924/01072 , H01L2924/01074 , H01L2924/01076 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/04953 , H01L2924/10329 , H01L2924/12036 , H01L2924/12042 , H01L2924/12044 , H01L2924/1461 , H01L2924/19041 , H01L2924/19042 , H01L2924/3025 , H01L2924/00
摘要： A projection system, a spatial light modulator, and a method for forming a MEMS device is disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micromirror array. The two substrates can be bonded at the wafer level after depositing a getter material andlor solid or liquid lubricant on one or both of the wafers. The wafers can be bonded together hermetically if desired, and the pressure between the two substrates can be below atmosphere.
摘要翻译：公开了投影系统，空间光调制器和用于形成MEMS器件的方法。空间光调制器可以具有与包括微镜阵列的基板中的一个结合在一起的两个基板。在一个或两个晶片上沉积吸气材料和固体或液体润滑剂之后，两个基底可以在晶片级结合。如果需要，晶片可以密封在一起，并且两个基板之间的压力可以低于大气。

17. 发明授权

US5332522A Thermotropic chiral nematic liquid crystalline copolymers 失效
标题翻译：热致度手性向列型液晶共聚物
公开(公告)号：US5332522A
公开(公告)日：1994-07-26
申请号：US55120
申请日：1993-04-29
申请人： Shaw H. Chen , John C. Mastrangelo , Hongqin Shi , Sushil Krishnamurthy
发明人： Shaw H. Chen , John C. Mastrangelo , Hongqin Shi , Sushil Krishnamurthy
IPC分类号： C08F220/30 , C08F220/36 , C08F220/38 , C09K19/38 , C09K19/52 , C09K19/12 , C09K19/30 , G02F1/13
CPC分类号： C09K19/3857 , C08F220/30 , C08F220/36 , C08F220/38 , C09K19/3852
摘要： A thermotropic chiral nematic liquid crystalline copolymer composition comprises ##STR1## wherein --NEM-- and --NEM'-- are each independently nematogenic units of formula ##STR2## wherein R is H or CH.sub.3, --Q-- is an alkylene radical having 1 to about 8 carbon atoms,--X-- is --O--, --S--, or --CH.sub.2 --, --Y-- is ##STR3## --Z is --CN, --NO.sub.2 or --N.dbd.C.dbd.S, q and r are each independently 0 or 1;wherein --CHI-- is a chiral unit of formula ##STR4## wherein R is H or CH.sub.3, --Q'-- is an alkylene radical having 1 to about 8 carbon atoms,--X'-- is --O--, --S--, or --CH.sub.2 --,--Z' is an alkoxy, aralkoxy, alkylamino, or aralkylamino radical having 4 to about 12 carbon atoms and containing at least one asymmetric carbon atom,q' and r' are each independently 0 or 1;and wherein x is the mole fraction of chiral units and (y+y') is the total mole fraction of nematogenic units in said copolymer composition, and the ratio of x to (y+y') is from about 1:50 to 1:1.This compolymer composition is employed to form an optical device.
摘要翻译：热致的手性向列型液晶共聚物组合物包含其中-NEM-和-NEM'-各自独立地具有式（II）的制剂单元，其中R是H或CH 3，-Q-是亚烷基具有1至约8个碳原子的基团，-X-为-O-，-S-或-CH 2 - ， - Y - 为-CN，-NO 2或-N = C = S，q 和r各自独立地为0或1; 其中-CHI-是式（III）的手性单元，其中R是H或CH 3，-Q'是具有1至约8个碳原子的亚烷基，-X'是-O-，-S - 或-CH 2 - ， - Z'是具有4至约12个碳原子并含有至少一个不对称碳原子的烷氧基，芳烷氧基，烷基氨基或芳烷基氨基，q'和r'各自独立地为0或1; 并且其中x是手性单元的摩尔分数，并且（y + y'）是所述共聚物组合物中的引产单元的总摩尔分数，并且x与（y + y'）的比率为约1:50至1 ：1。该共聚物组合物用于形成光学装置。

18. 发明授权

US08068267B2 Speckle reduction in display systems that employ coherent light sources 有权
标题翻译：使用相干光源的显示系统中的斑点减少
公开(公告)号：US08068267B2
公开(公告)日：2011-11-29
申请号：US12241041
申请日：2008-09-30
申请人： Regis Grasser , Hongqin Shi , Terry A. Bartlett
发明人： Regis Grasser , Hongqin Shi , Terry A. Bartlett
IPC分类号： G02F1/153
CPC分类号： G02B27/48 , H01S5/0652 , H04N9/3129
摘要： Speckle effect in display system is reduced by utilizing the instability of phase-coherent light and the transmission of the instable phase-coherent light through a multi-mode optical fiber with a suitable length.
摘要翻译：通过利用相位相干光的不稳定性和通过具有适当长度的多模光纤传输不稳定的相位相干光来减少显示系统中的斑点效应。

19. 发明授权

US07189332B2 Apparatus and method for detecting an endpoint in a vapor phase etch 有权
标题翻译：用于检测气相蚀刻中的端点的装置和方法
公开(公告)号：US07189332B2
公开(公告)日：2007-03-13
申请号：US10269149
申请日：2002-10-11
申请人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Niles K. MacDonald , Hongqin Shi
发明人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Niles K. MacDonald , Hongqin Shi
IPC分类号： C23F3/12
CPC分类号： H01J37/32963 , B81C1/00476 , B81C1/00587 , B81C99/0065 , B81C2201/0132 , B81C2201/0138 , H01J37/32449 , H01J37/32935
摘要： Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber.
摘要翻译：通过与制造微结构中的工艺气体接触从工件材料去除层或区域的工艺通过精确地确定去除步骤的终点的能力增强。气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。

20. 发明授权

US06939472B2 Etching method in fabrications of microstructures 有权
标题翻译：微观结构的蚀刻方法
公开(公告)号：US06939472B2
公开(公告)日：2005-09-06
申请号：US10665998
申请日：2003-09-17
申请人： Gregory P. Schaadt , Hongqin Shi
发明人： Gregory P. Schaadt , Hongqin Shi
IPC分类号： B01D20060101 , C23F1/00 , G01R31/00 , H01L21/00 , H01L21/302 , H01L21/461
CPC分类号： B81C1/00595 , B81C2201/0132
摘要： The present invention teaches a method and apparatus for removing sacrificial materials in fabrications of microstructures using one or more selected spontaneous vapor phase etchants. The selected etchant is fed into an etch chamber containing the microstructure during each feeding cycle of a sequence of feeding cycles until the sacrificial material of the microstructure is exhausted through the chemical reaction between the etchant and the sacrificial material. Specifically, during a first feeding cycle, a first amount of selected spontaneous vapor phase etchant is fed into the etch chamber. At a second feeding cycle, a second amount of the etchant is fed into the etch chamber. The first amount and the second amount of the selected etchant may or may not be the same. The time duration of the feeding cycles are individually adjustable.
摘要翻译：本发明教导了使用一种或多种选择的自发气相蚀刻剂去除微结构制造中的牺牲材料的方法和装置。所选择的蚀刻剂在进料循环序列的每个进料循环期间被送入包含微结构的蚀刻室，直到微结构的牺牲材料通过蚀刻剂和牺牲材料之间的化学反应排出。具体地，在第一进料循环期间，将第一量的选择的自发气相蚀刻剂送入蚀刻室。在第二进料循环中，将第二量的蚀刻剂送入蚀刻室。所选择的蚀刻剂的第一量和第二量可以相同也可以不相同。进料周期的持续时间可单独调节。

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