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11. 发明申请

US20160071708A1 METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE USING AN ENERGETIC PARTICLE BEAM 审中-公开
标题翻译：使用能量粒子束的基板的表面处理方法和装置
公开(公告)号：US20160071708A1
公开(公告)日：2016-03-10
申请号：US14941897
申请日：2015-11-16
申请人： Boris L. Druz , Piero Sferlazzo , Roger P. Fremgen , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss
发明人： Boris L. Druz , Piero Sferlazzo , Roger P. Fremgen , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss
IPC分类号： H01J37/34 , H01J37/32 , C23C14/46
CPC分类号： H01J37/3488 , C23C14/044 , C23C14/221 , C23C14/46 , H01J37/20 , H01J37/302 , H01J37/317 , H01J37/32752 , H01J37/3441 , H01J37/3476 , H01J2237/0245 , H01J2237/045 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/30472 , H01J2237/3146
摘要： Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
摘要翻译：用能量粒子束处理衬底的方法和设备。衬底上的特征相对于能量粒子束定向，并且通过能量粒子束扫描衬底。衬底围绕其方位角对称轴周期性地被索引，同时被屏蔽以防止暴露于能量粒子束，以相对于束的主要尺寸重新定向特征。

12. 发明授权

US06716322B1 Method and apparatus for controlling film profiles on topographic features 有权
标题翻译：用于控制地形特征上的胶片轮廓的方法和装置
公开(公告)号：US06716322B1
公开(公告)日：2004-04-06
申请号：US10126928
申请日：2002-04-19
申请人： Hari Hedge , Alan V. Hayes , Boris Druz , Viktor Kanarov , Adrian J. Devasahayam , Emmanuel Lakios
发明人： Hari Hedge , Alan V. Hayes , Boris Druz , Viktor Kanarov , Adrian J. Devasahayam , Emmanuel Lakios
IPC分类号： C23C1434
CPC分类号： C23C14/225 , C23C14/044
摘要： A deposition system includes a substrate holder supporting a substrate defining at least one topographical feature. In addition, the system includes a deposition plume that is directed toward the substrate. A first profiler mask is positioned between the deposition plume and the substrate, and is shaped so as to reduce inboard/outboard asymmetry in a deposition profile associated with the feature.
摘要翻译：沉积系统包括支撑限定至少一个形貌特征的衬底的衬底保持器。此外，该系统包括指向基板的沉积羽流。第一轮廓仪掩模位于沉积羽流和基底之间，并且被成形为在与该特征相关联的沉积轮廓中减小内侧/外侧不对称。

13. 发明授权

US5969470A Charged particle source 失效
标题翻译：带电粒子源
公开(公告)号：US5969470A
公开(公告)日：1999-10-19
申请号：US745950
申请日：1996-11-08
申请人： Boris L. Druz , Alan V. Hayes , Victor Kanarov , Salvatore A. DiStefano , Emmanuel N. Lakios
发明人： Boris L. Druz , Alan V. Hayes , Victor Kanarov , Salvatore A. DiStefano , Emmanuel N. Lakios
IPC分类号： H01J27/16 , H01J37/08
CPC分类号： H01J27/16
摘要： A charged particle source applicable for etching, thin film deposition, or surface modification includes a conductive electrode for controlling the plasma potential and beam voltage, the electrode retaining long term conductivity during operation, such as by shielding or in situ cleaning during operation, and/or by being operated in pulse mode conditions capable of preventing charge accumulation in the source during ion extraction.
摘要翻译：适用于蚀刻，薄膜沉积或表面改性的带电粒子源包括用于控制等离子体电位和束电压的导电电极，电极在操作期间保持长期导电性，例如通过操作期间的屏蔽或原位清洁和/ 或通过在脉冲模式条件下工作，能够在离子提取期间防止源中的电荷累积。

14. 发明授权

US06464891B1 Method for repetitive ion beam processing with a carbon containing ion beam 有权
标题翻译：用含碳离子束重复离子束加工的方法
公开(公告)号：US06464891B1
公开(公告)日：2002-10-15
申请号：US09270998
申请日：1999-03-17
申请人： Boris L. Druz , Kurt E. Williams , Alan V. Hayes
发明人： Boris L. Druz , Kurt E. Williams , Alan V. Hayes
IPC分类号： B44C122
CPC分类号： C23C14/221 , C23C14/0605 , C23C14/564 , H01J37/321 , H01L21/67069
摘要： A method is provided for a repetitive deposition and etch of a substrate using a carbon containing ion beam in a gridded ion source. The method includes the actual ion beam processing step combined with the thermal and chemical conditioning of the ion source and a special cleaning step(s). The special cleaning step(s) effect robust removal of the precipitates accumulated in the operating source due to the decomposition of carbon containing gases such as hydrocarbons and halocarbons Precipitate removal is achieved by employing ions and radicals formed in an inert gas plasma or a mixture of inert gas and oxygen to reactively etch or bombard the precipitates.
摘要翻译：提供了一种用于在网格离子源中使用含碳离子束重复沉积和蚀刻基底的方法。该方法包括与离子源的热和化学调节结合的实际离子束处理步骤和特殊的清洁步骤。由于碳氢化合物和卤代烃等含碳气体的分解，特殊的清洗步骤可以有效地除去积聚在操作源中的沉淀物。通过使用在惰性气体等离子体中形成的离子和自由基惰性气体和氧气以反应性蚀刻或轰击沉淀物。

15. 发明授权

US6150755A Charged particle source with liquid electrode 失效
标题翻译：带电极的带电粒子源
公开(公告)号：US6150755A
公开(公告)日：2000-11-21
申请号：US358454
申请日：1999-07-21
申请人： Boris L. Druz , Alan V. Hayes , Victor Kanarov , Salvatore A. DiStefano , Emmanuel N. Lakios
发明人： Boris L. Druz , Alan V. Hayes , Victor Kanarov , Salvatore A. DiStefano , Emmanuel N. Lakios
IPC分类号： H01J27/16 , H01J37/08
CPC分类号： H01J27/16
摘要： A charged particle source includes a vessel defining an interior for containing a plasma, the vessel having an inlet communicating with the interior of the vessel and connected to a source of atoms, and an aperture through which a charged particle beam is discharged, an energy generator for communicating with the atoms in the interior of the vessel and effecting ionization of the atoms in the vessel and creating the plasma, an electrode assembly disposed in the interior of the vessel, the electrode assembly including a conductive electrode support member, a tray member associated with the support member, a conductive liquid disposed in the tray member, the liquid having a surface area and a conductor connected between the conductive liquid and a voltage source, and an ion optics assembly disposed adjacent the vessel for accelerating plasma-generated charged particles having the same polarity as the conductive liquid in the vessel while maintaining charged particles of the opposite polarity within the vessel.
摘要翻译：带电粒子源包括限定用于容纳等离子体的内部的容器，所述容器具有与容器的内部连通并连接到原子源的入口以及放电带电粒子束通过的孔，能量发生器用于与容器内部的原子连通并且实现容器中原子的离子化并产生等离子体，设置在容器内部的电极组件，电极组件包括导电电极支撑构件，与所述支撑构件一起设置在所述托盘构件中的导电液体，所述液体具有连接在所述导电液体和电压源之间的表面积和导体，以及邻近所述容器设置的离子光学组件，用于加速等离子体产生的带电粒子，所述带电粒子具有与容器中的导电液体具有相同的极性，同时保持相反极性的带电粒子船内的荣耀。

16. 发明授权

US07879201B2 Method and apparatus for surface processing of a substrate 有权
标题翻译：用于表面处理基板的方法和装置
公开(公告)号：US07879201B2
公开(公告)日：2011-02-01
申请号：US10915745
申请日：2004-08-11
申请人： Boris Druz , Viktor Kanarov , Hariharakeshave S. Hegde , Alan V. Hayes , Emmanuel Lakios
发明人： Boris Druz , Viktor Kanarov , Hariharakeshave S. Hegde , Alan V. Hayes , Emmanuel Lakios
IPC分类号： C23C14/00 , C23C14/32 , C25B9/00 , C25B11/00 , C25B13/00
CPC分类号： C23C14/044 , C23C14/221
摘要： Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.
摘要翻译：用高能粒子束处理衬底的方法和装置。光束从源极通过定位在源极和衬底之间的屏蔽件中的矩形孔引导到衬底移动平面中的处理区域。衬底上的特征与矩形孔的主要尺寸平行排列，并且衬底与孔的主要尺寸正交地移动。光束在运动过程中通过光圈撞击基板。衬底可以周期性地旋转大约180°以重新定向相对于矩形孔的主要尺寸的特征。所得到的处理轮廓关于朝向矩形孔的主要尺寸的特征的侧面对称。

17. 发明申请

US20090098306A1 Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle Beam 审中-公开
标题翻译：使用能量粒子束对基体进行表面处理的方法和装置
公开(公告)号：US20090098306A1
公开(公告)日：2009-04-16
申请号：US12212844
申请日：2008-09-18
申请人： Boris Druz , Roger P. Fremgen, JR. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
发明人： Boris Druz , Roger P. Fremgen, JR. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
IPC分类号： C23C14/24
CPC分类号： H01J37/3488 , C23C14/044 , C23C14/221 , C23C14/46 , H01J37/20 , H01J37/302 , H01J37/317 , H01J37/32752 , H01J37/3441 , H01J37/3476 , H01J2237/0245 , H01J2237/045 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/30472 , H01J2237/3146
摘要： Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
摘要翻译：用能量粒子束处理衬底的方法和设备。衬底上的特征相对于能量粒子束定向，并且通过能量粒子束扫描衬底。衬底围绕其方位角对称轴周期性地被索引，同时被屏蔽以免暴露于能量粒子束，以相对于梁的主要尺寸重新定向特征。

18. 发明授权

US09206500B2 Method and apparatus for surface processing of a substrate using an energetic particle beam 有权
标题翻译：使用能量粒子束对衬底进行表面处理的方法和装置
公开(公告)号：US09206500B2
公开(公告)日：2015-12-08
申请号：US12212844
申请日：2008-09-18
申请人： Boris Druz , Roger P. Fremgen, Jr. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
发明人： Boris Druz , Roger P. Fremgen, Jr. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
IPC分类号： C23C14/04 , C23C14/22 , H01J37/20 , H01J37/302 , H01J37/317
CPC分类号： H01J37/3488 , C23C14/044 , C23C14/221 , C23C14/46 , H01J37/20 , H01J37/302 , H01J37/317 , H01J37/32752 , H01J37/3441 , H01J37/3476 , H01J2237/0245 , H01J2237/045 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/30472 , H01J2237/3146
摘要： Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
摘要翻译：用能量粒子束处理衬底的方法和设备。衬底上的特征相对于能量粒子束定向，并且通过能量粒子束扫描衬底。衬底围绕其方位角对称轴周期性地被索引，同时被屏蔽以防止暴露于能量粒子束，以相对于束的主要尺寸重新定向特征。

19. 发明申请

US20110089022A1 METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE 审中-公开
标题翻译：基板表面处理的方法和装置
公开(公告)号：US20110089022A1
公开(公告)日：2011-04-21
申请号：US12977430
申请日：2010-12-23
申请人： Boris Druz , Viktor Kanarov , Hariharakeshave S. Hegde , Alan V. Hayes , Emmanuel Lakios
发明人： Boris Druz , Viktor Kanarov , Hariharakeshave S. Hegde , Alan V. Hayes , Emmanuel Lakios
IPC分类号： C23C14/34 , C23C14/46 , C23C14/35
CPC分类号： C23C14/044 , C23C14/221
摘要： Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.
摘要翻译：用高能粒子束处理衬底的方法和装置。光束从源极通过定位在源极和衬底之间的屏蔽件中的矩形孔引导到衬底移动平面中的处理区域。衬底上的特征与矩形孔的主要尺寸平行排列，并且衬底与孔的主要尺寸正交地移动。光束在运动过程中通过光圈撞击基板。衬底可以周期性地旋转大约180°以重新定向相对于矩形孔的主要尺寸的特征。所得到的处理轮廓关于朝向矩形孔的主要尺寸的特征的侧面对称。

20. 发明授权

US06225747B1 Charged-particle source, control system and process using gating to extract the charged particle beam 有权
标题翻译：带电粒子源，控制系统和使用门控的工艺提取带电粒子束
公开(公告)号：US06225747B1
公开(公告)日：2001-05-01
申请号：US09371061
申请日：1999-08-09
申请人： Roger P. Fremgen, Jr. , John Jacob , Alan V. Hayes , Victor Kanarov , Edward W. Ostan , Abraham J. Navy , Emmanuel N. Lakios , Genrikh Treyger
发明人： Roger P. Fremgen, Jr. , John Jacob , Alan V. Hayes , Victor Kanarov , Edward W. Ostan , Abraham J. Navy , Emmanuel N. Lakios , Genrikh Treyger
IPC分类号： H01J2702
CPC分类号： H01J37/08 , H01J27/022
摘要： A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam “on” and beam “off” states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.
摘要翻译：提出了一种用于操作带电粒子源的控制系统和过程，其实现了带有电荷的粒子束的门控，而没有机械快门，并且在光束“开”和光束“关闭”状态之间具有非常短的转换。过程和控制系统提供对带电粒子提取持续时间的非常精确的控制。

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