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11. 发明申请

US20090108197A1 Ion implanters 有权
标题翻译：离子注入机
公开(公告)号：US20090108197A1
公开(公告)日：2009-04-30
申请号：US11976429
申请日：2007-10-24
申请人： Gregory Robert Alcott , Adrian Murrell
发明人： Gregory Robert Alcott , Adrian Murrell
IPC分类号： A61N5/00 , B01D59/44
CPC分类号： H01J37/09 , H01J37/3171 , H01J2237/022
摘要： The present invention relates to components in ion implanters having surfaces, such as graphite surfaces, adjacent to the path of the ion beam through the ion implanter. Such surfaces will be prone to sputtering, and sputtered material may become entrained in the ion beam. The present invention sees the use of surfaces that are formed so as to present a series of angled faces that meet at sharp intersections. In this way, any material will be sputtered away from the ion beam.
摘要翻译：本发明涉及离子注入机中的组件，其具有与通过离子注入机的离子束的路径相邻的表面，例如石墨表面。这种表面将易于溅射，并且溅射的材料可能被夹带在离子束中。本发明看到使用形成的表面，以呈现在尖锐交点处相遇的一系列成角度的面。以这种方式，任何材料将被溅射离开离子束。

12. 发明授权

US07253424B2 Method of implanting a substrate and an ion implanter for performing the method 有权
公开(公告)号：US07253424B2
公开(公告)日：2007-08-07
申请号：US11417027
申请日：2006-05-04
申请人： Adrian Murrell , Bernard Harrison , Peter Ivor Tudor Edwards , Peter Kindersley , Craig Lowrie , Peter Michael Banks , Takao Sakase , Marvin Farley , Shu Satoh , Geoffrey Ryding
发明人： Adrian Murrell , Bernard Harrison , Peter Ivor Tudor Edwards , Peter Kindersley , Craig Lowrie , Peter Michael Banks , Takao Sakase , Marvin Farley , Shu Satoh , Geoffrey Ryding
IPC分类号： H01L21/26 , G21K5/10
CPC分类号： H01J37/3171 , H01J37/3023 , H01J49/30 , H01J2237/20228 , H01J2237/20285 , H01J2237/24507 , H01J2237/2487 , H01J2237/30488 , H01J2237/31703 , H01J2237/31708 , H01L21/67005 , H01L21/68714 , H01L21/68764
摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

13. 发明申请

US20060289800A1 Implanting a substrate using an ion beam 审中-公开
标题翻译：使用离子束植入底物
公开(公告)号：US20060289800A1
公开(公告)日：2006-12-28
申请号：US11386090
申请日：2006-03-22
申请人： Adrian Murrell , Steven Underwood , Majeed Foad
发明人： Adrian Murrell , Steven Underwood , Majeed Foad
IPC分类号： H01J37/08
CPC分类号： H01J37/3171 , H01J2237/30411
摘要： This invention relates to a method of implanting a substrate comprising scanning an ion beam relative to a substrate along a series of scan lines extending in a first direction, causing relative rotation between the substrate and the ion beam, scanning the ion beam along a second series of scan lines in a different direction. The implant recipe is changed during scanning in each direction such that different regions are produced during each scanning step. The regions so formed during the two scanning steps overlap such that different parts of the substrate receive different doses according to different recipes during the implantation process. The different recipes may result in different dopant concentrations, doping depths or even different dopant species.
摘要翻译：本发明涉及一种植入衬底的方法，包括沿着沿着第一方向延伸的一系列扫描线相对于衬底扫描离子束，引起衬底和离子束之间的相对旋转，沿着第二系列扫描离子束的扫描线在不同的方向。在每个方向的扫描期间改变植入物配方，使得在每个扫描步骤期间产生不同的区域。在两个扫描步骤期间形成的区域重叠，使得在植入过程期间根据不同配方接收不同剂量的基底。不同的配方可能导致不同的掺杂剂浓度，掺杂深度或甚至不同的掺杂物种类。

14. 发明申请

US20050191409A1 Ion beam monitoring arrangement 审中-公开
标题翻译：离子束监测装置
公开(公告)号：US20050191409A1
公开(公告)日：2005-09-01
申请号：US11029004
申请日：2005-01-05
申请人： Adrian Murrell , Bernard Harrison , Peter Edwards , Peter Kindersley , Robert Mitchell , Theodore Smick , Geoffrey Ryding , Marvin Farley , Takao Sakase
发明人： Adrian Murrell , Bernard Harrison , Peter Edwards , Peter Kindersley , Robert Mitchell , Theodore Smick , Geoffrey Ryding , Marvin Farley , Takao Sakase
IPC分类号： H01L21/265 , B05D1/00 , C23C14/00 , C23C16/00 , H01J27/00 , H01J37/244 , H01J37/304 , H01J37/317 , H01L21/425 , H01L21/66
CPC分类号： H01J37/3171 , H01J37/304 , H01J2237/30455 , H01J2237/31703
摘要： This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.
摘要翻译：本发明涉及用于离子注入机的离子束监测装置，其中期望监测用于植入的离子束的通量和/或横截面轮廓。通常期望在离子注入机中测量离子束的通量和/或横截面轮廓，以便改进对半导体晶片或类似物的离子注入的控制。本发明描述了适配晶片保持器以允许执行这种光束轮廓。衬底保持器可以逐渐地用于从下游通量监视器闭塞离子束，或者通量监视器可以位于设置有狭缝入口孔的晶片保持器上。

15. 发明授权

US06818909B2 Ion sources for ion implantation apparatus 有权
标题翻译：离子注入装置的离子源
公开(公告)号：US06818909B2
公开(公告)日：2004-11-16
申请号：US10703165
申请日：2003-11-07
申请人： Adrian Murrell , Peter Michael Banks , Andrew Allen , Neil L. Clarke , Matthew Peter Dobson
发明人： Adrian Murrell , Peter Michael Banks , Andrew Allen , Neil L. Clarke , Matthew Peter Dobson
IPC分类号： H01J4910
CPC分类号： H01J37/08 , H01J37/3171
摘要： The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
摘要翻译：本发明涉及一种用于离子注入机的离子源，其中用于提供期望离子的源材料以可装配到离子源的反应物室中的板或衬里的形式提供。

16. 发明授权

US07928413B2 Ion implanters 失效
标题翻译：离子注入机
公开(公告)号：US07928413B2
公开(公告)日：2011-04-19
申请号：US12003962
申请日：2008-01-03
申请人： Gregory Robert Alcott , Adrian Murrell
发明人： Gregory Robert Alcott , Adrian Murrell
IPC分类号： G21K5/00
CPC分类号： H01J37/3171 , H01J37/04 , H01J2237/0213 , H01J2237/022 , H01J2237/04756
摘要： The present invention relates to components in an ion implanter that may see incidence of the ion beam, such as a beam dump or a beam stop. Such components will be prone to the ions sputtering material from their surfaces, and sputtered material may become entrained in the ion beam. This entrained material is a source of contamination. The present invention provides an ion implanter comprising power supply apparatus and an ion-receiving component. The component has an opening that receives ions from an ion beam such that ions strike an internal surface. The power supply apparatus is arranged to provide an electrical bias to the internal surface to decelerate the ions prior to their striking the surface, thereby mitigating the problem of material being sputtered from the surface.
摘要翻译：本发明涉及离子注入机中的组件，其可以看到离子束的入射，例如光束倾倒或光束停止。这些组分将倾向于从它们的表面离子溅射材料，并且溅射的材料可能被夹带在离子束中。这种夹带的材料是污染源。本发明提供了一种离子注入机，其包括电源装置和离子接收部件。该组件具有从离子束接收离子的开口，使得离子撞击内表面。供电装置被布置成在离开表面之前向内表面提供电偏压以使离子减速，从而减轻从表面溅射的材料的问题。

17. 发明授权

US07838849B2 Ion implanters 有权
标题翻译：离子注入机
公开(公告)号：US07838849B2
公开(公告)日：2010-11-23
申请号：US11976429
申请日：2007-10-24
申请人： Gregory Robert Alcott , Adrian Murrell
发明人： Gregory Robert Alcott , Adrian Murrell
IPC分类号： H01J37/317 , H01L21/265
CPC分类号： H01J37/09 , H01J37/3171 , H01J2237/022
摘要： The present invention relates to components in ion implanters having surfaces, such as graphite surfaces, adjacent to the path of the ion beam through the ion implanter. Such surfaces will be prone to sputtering, and sputtered material may become entrained in the ion beam. The present invention sees the use of surfaces that are formed so as to present a series of angled faces that meet at sharp intersections. In this way, any material will be sputtered away from the ion beam.
摘要翻译：本发明涉及离子注入机中的组件，其具有与通过离子注入机的离子束的路径相邻的表面，例如石墨表面。这种表面将易于溅射，并且溅射的材料可能被夹带在离子束中。本发明看到使用形成的表面，以呈现在尖锐交点处相遇的一系列成角度的面。以这种方式，任何材料将被溅射离开离子束。

18. 发明申请

US20090101834A1 Ion beam extraction assembly in an ion implanter 审中-公开
标题翻译：离子束提取组件在离子注入机中
公开(公告)号：US20090101834A1
公开(公告)日：2009-04-23
申请号：US11976322
申请日：2007-10-23
申请人： Lee Spraggon , Adrian Murrell
发明人： Lee Spraggon , Adrian Murrell
IPC分类号： H01J27/00
CPC分类号： H01J27/024 , H01J37/08 , H01J37/3171
摘要： The present invention relates to an ion beam extraction assembly for use in an ion beam generation apparatus such as those used, for example, in an ion implanter. An ion beam extraction assembly is provided for mounting within an ion beam generating apparatus comprising an ion source such that the extraction assembly is operable to extract ions from the ion source as an ion beam. The extraction assembly comprises an electrode assembly separate from the ion source, an electrode of the electrode assembly defining at least partly a path through the extraction assembly for passage of an ion beam. At least a part of the electrode assembly adjacent the path is tungsten and at least a part of the electrode assembly that is remote from the path is formed from a less expensive and/or lighter material.
摘要翻译：本发明涉及用于离子束产生装置中的离子束提取组件，例如用于离子注入机中的那些。提供离子束提取组件，用于安装在包括离子源的离子束发生装置内，使得提取组件可操作以从离子源提取离子作为离子束。提取组件包括与离子源分离的电极组件，电极组件的电极至少部分地限定通过提取组件的通过离子束的路径。邻近路径的电极组件的至少一部分是钨，远离路径的电极组件的至少一部分由较便宜和/或较轻的材料形成。

19. 发明授权

US06956223B2 Multi-directional scanning of movable member and ion beam monitoring arrangement therefor 有权
标题翻译：可移动构件的多方向扫描和离子束监测装置
公开(公告)号：US06956223B2
公开(公告)日：2005-10-18
申请号：US10119290
申请日：2002-04-10
申请人： Theodore H. Smick , Frank D. Roberts , Marvin Farley , Geoffrey Ryding , Takao Sakase , Adrian Murrell , Peter Edwards , Bernard Harrison
发明人： Theodore H. Smick , Frank D. Roberts , Marvin Farley , Geoffrey Ryding , Takao Sakase , Adrian Murrell , Peter Edwards , Bernard Harrison
IPC分类号： H01J37/04 , H01J37/18 , H01J37/317 , H01L21/265 , H01L21/68 , B05C5/00
CPC分类号： H01J37/20 , H01J37/18 , H01J37/3171 , H01J2237/20 , H01J2237/2006 , H01J2237/2007 , H01J2237/20221 , H01J2237/20228 , H01J2237/20278 , H01L21/682 , H01L21/6835
摘要： Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant. The Faraday 450 can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.
摘要翻译：公开了半导体处理装置，其提供基板或晶片保持器180的扫描臂60在至少两个大致正交的方向（所谓的X-Y扫描）上的移动。沿着第一方向进行的扫描纵向地穿过真空室壁中的孔口55。臂60由一个或多个线性电动机90A，90B往复运动。臂60相对于滑块100被支撑，使用支撑的空气轴承，以便相对于滑块100为臂提供悬臂支撑。进入用于臂60的真空室中的柔性馈通件130然后用作真空密封和引导件，但本身不需要提供轴承支撑件。法拉第450附接到靠近基板保持器180的臂60，以允许在植入之前和期间执行光束轮廓。法拉第450可以替代地或附加地安装在靠近衬底保持器的后部或与其相邻的90°处，以允许在植入之前执行光束轮廓，其中衬底支撑件反向或水平并且离开光束线。

20. 发明授权

US06908836B2 Method of implanting a substrate and an ion implanter for performing the method 有权
标题翻译：植入基板的方法和用于执行该方法的离子注入机
公开(公告)号：US06908836B2
公开(公告)日：2005-06-21
申请号：US10251780
申请日：2002-09-23
申请人： Adrian Murrell , Bernard Harrison , Peter Edwards , Peter Kindersley , Takao Sakase , Marvin Farley , Shu Satoh , Geoffrey Ryding
发明人： Adrian Murrell , Bernard Harrison , Peter Edwards , Peter Kindersley , Takao Sakase , Marvin Farley , Shu Satoh , Geoffrey Ryding
IPC分类号： G01N23/00 , H01J37/317 , H01L21/00 , H01L21/26 , H01L21/42
CPC分类号： H01J37/3171 , H01J2237/20228 , H01J2237/24507 , H01J2237/30488 , H01J2237/31703
摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.
摘要翻译：注入器提供相对于注入束的衬底的二维扫描，使得光束在衬底上绘制扫描线的光栅。在离开衬底的周转点处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

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