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11. 发明授权

US4220547A Dielectric paste for thick film capacitor 失效
标题翻译：用于厚膜电容器的电介质糊
公开(公告)号：US4220547A
公开(公告)日：1980-09-02
申请号：US971106
申请日：1978-12-19
申请人： Katsuo Abe , Noriyuki Taguchi , Nobuyuki Sugishita , Tokio Isogai
发明人： Katsuo Abe , Noriyuki Taguchi , Nobuyuki Sugishita , Tokio Isogai
IPC分类号： H05K1/16 , H01B3/02 , H01G4/12 , H01B3/12
CPC分类号： H01G4/1227
摘要： A dielectric paste for a thick film capacitor comprises barium titanate powder, glass frit, magnetite powder, an organic vehicle and a surface-active agent. A dielectric constant higher than 1,100 is obtained by firing at a temperature of 900.degree. C. or lower.
摘要翻译：用于厚膜电容器的电介质浆料包括钛酸钡粉末，玻璃料，磁铁矿粉末，有机载体和表面活性剂。通过在900℃以下的温度下烧成，得到高于1100的介电常数。

12. 发明授权

US07543546B2 Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method 失效
标题翻译：等离子体处理装置，等离子体生成用反应容器的制造方法以及等离子体处理方法
公开(公告)号：US07543546B2
公开(公告)日：2009-06-09
申请号：US10529861
申请日：2004-05-26
申请人： Tetsuji Shibata , Keiichi Yamazaki , Noriyuki Taguchi , Yasushi Sawada
发明人： Tetsuji Shibata , Keiichi Yamazaki , Noriyuki Taguchi , Yasushi Sawada
IPC分类号： C23C16/00
CPC分类号： H01J37/32009 , H01J37/32357 , H01J37/3244 , H01J37/32541 , H01J2237/3325
摘要： A plasma treatment apparatus is provided, which enables to increase a treatment area and provide good treatment uniformity. This apparatus comprises a pair of electrode plates having a plurality of through holes and an insulating plate having a plurality of through holes. The insulating plate is disposed between the electrode plates such that positions of the through holes of the electrode plates correspond to the positions of the through holes of the insulating plate. A plurality of discharge spaces are formed by the through holes of the electrode plates and the through holes of the insulating plate. By applying a voltage between the electrode plates, while supplying a plasma generation gas into the discharge spaces, plasmas are generated simultaneously in the discharge spaces, and sprayed on an object to efficiently perform a large-area, uniform plasma treatment.
摘要翻译：提供了一种能够增加处理面积并提供良好的处理均匀性的等离子体处理装置。该装置包括具有多个通孔的一对电极板和具有多个通孔的绝缘板。绝缘板设置在电极板之间，使得电极板的通孔的位置对应于绝缘板的通孔的位置。多个放电空间由电极板的通孔和绝缘板的通孔形成。通过在电极板之间施加电压，在将等离子体产生气体供应到放电空间中的同时，在放电空间中同时产生等离子体，并喷射到物体上以有效地进行大面积均匀的等离子体处理。

13. 发明授权

US07273652B2 Hollow carbon fiber and production method 失效
标题翻译：中空碳纤维及其制作方法
公开(公告)号：US07273652B2
公开(公告)日：2007-09-25
申请号：US10270447
申请日：2002-10-15
申请人： Shinji Takeda , Noriyuki Taguchi , Kazumi Kokaji , Osamu Hirai
发明人： Shinji Takeda , Noriyuki Taguchi , Kazumi Kokaji , Osamu Hirai
IPC分类号： B32B5/16
CPC分类号： B82Y30/00 , D01D5/24 , D01F9/12 , Y10S977/776 , Y10S977/788 , Y10S977/842 , Y10S977/846 , Y10T428/249953 , Y10T428/249971 , Y10T428/2913 , Y10T428/2918 , Y10T428/30
摘要： Production of hollow carbon fibers and hollow carbon particles includes baking and carbonization of polymer particles having a specified volume after deformation. A metal-deposited carbon fiber with metal deposited inside and/or outside the hollow carbon fiber is applicable to electron discharge devices. The thickness and crystallinity of the graphite layer can be freely controlled. Since almost no by-product is generated, separation and refining using a solvent is not required. A hollow carbon particle of desired shape can be produced at a high yield rate. The hollow carbon fiber represented by a carbon nano-tube can be controlled in such a way that a low resistance and uniform shape are provided so that there is an increase in the amount of electrons discharged from the hollow carbon fiber. Use of this hollow carbon fiber as an electron discharge source provides an excellent electron discharge device characterized by stable pixels.
摘要翻译：中空碳纤维和中空碳颗粒的制造包括在变形后具有规定体积的聚合物颗粒的烘烤和碳化。在中空碳纤维内部和/或外部沉积有金属的金属沉积碳纤维可应用于电子放电装置。石墨层的厚度和结晶度可以自由控制。由于几乎不产生副产物，因此不需要使用溶剂的分离和精制。可以以高产率制造所需形状的中空碳颗粒。由碳纳米管表示的中空碳纤维可以以这样的方式进行控制，使得提供低电阻和均匀的形状，使得从中空碳纤维排出的电子量增加。使用该中空碳纤维作为电子放电源提供了以稳定像素为特征的优异的电子放电装置。

14. 发明授权

US06670766B2 Plasma treatment apparatus and plasma treatment method 失效
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US06670766B2
公开(公告)日：2003-12-30
申请号：US09863474
申请日：2001-05-24
申请人： Keiichi Yamazaki , Yukiko Inooka , Yasushi Sawada , Noriyuki Taguchi , Yoshiyuki Nakazono , Akio Nakano
发明人： Keiichi Yamazaki , Yukiko Inooka , Yasushi Sawada , Noriyuki Taguchi , Yoshiyuki Nakazono , Akio Nakano
IPC分类号： H01J724
CPC分类号： H01J37/32357
摘要： A plasma treatment apparatus and a plasma treatment method having the capability of uniformly treating an object with plasma at a high treatment speed. This apparatus includes a tubular vessel having a laterally elongated cross section, a pair of electrodes arranged such that electric flux lines develop substantially in an axial direction of the tubular vessel when one of an AC voltage and a pulse voltage is applied between the electrodes, a gas supply for supplying a streamer generation gas into the tubular vessel, a power source for applying the voltage between the electrodes to generate plural streamers of the gas in the tubular vessel, and a plasma uniformity mechanism for making the plural streamers uniform in a lateral direction of the laterally elongated cross section of the tubular vessel to provide the plasma from one end of the tubular vessel.
摘要翻译：一种等离子体处理装置和等离子体处理方法，其具有以高处理速度等离子体均匀地处理物体的能力。该装置包括具有横向细长横截面的管状容器，一对电极被布置为使得当在电极之间施加AC电压和脉冲电压之一时，电流线基本上沿管状容器的轴向方向显影，a 用于向管状容器供应流光产生气体的气体供给源，用于在电极之间施加电压的电源，以在管状容器中产生多个气流拖缆;以及等离子体均匀性机构，用于使多个拖缆在横向方向上均匀的管状容器的横向细长的横截面以从管状容器的一端提供等离子体。

15. 发明授权

US06465964B1 Plasma treatment apparatus and plasma generation method using the apparatus 失效
标题翻译：等离子体处理装置和使用该装置的等离子体生成方法
公开(公告)号：US06465964B1
公开(公告)日：2002-10-15
申请号：US09694324
申请日：2000-10-24
申请人： Noriyuki Taguchi , Yasushi Sawada , Keiichi Yamazaki , Yoshiyuki Nakazono , Yukiko Inooka , Kazuya Kitayama
发明人： Noriyuki Taguchi , Yasushi Sawada , Keiichi Yamazaki , Yoshiyuki Nakazono , Yukiko Inooka , Kazuya Kitayama
IPC分类号： H01J724
CPC分类号： H05H1/2406 , H05H2001/2456
摘要： A plasma treatment apparatus can generate atmospheric pressure plasma with reliability by help of an ignition electrode to facilitate starting the apparatus without using an expensive impedance matching device. The apparatus comprises a plasma-generation chamber having an aperture from which the plasma blows out, a gas supply unit for supplying a gas for plasma generation into the chamber, a pair of electrodes, a power source for applying an AC electric field between the electrodes to maintain the plasma in the chamber, a pulse generator for providing a pulse voltage, and the ignition electrode for applying the pulse voltage to the gas supplied in the chamber to generate the plasma.
摘要翻译：等离子体处理装置可以通过点火电极的可靠性产生大气压等离子体，以便于在不使用昂贵的阻抗匹配装置的情况下启动装置。该装置包括具有等离子体吹出的孔的等离子体生成室，用于将用于等离子体产生的气体供应到室中的气体供给单元，一对电极，用于在电极之间施加AC电场的电源以维持腔室中的等离子体，用于提供脉冲电压的脉冲发生器和用于将脉冲电压施加到在腔室中供应的气体以产生等离子体的点火电极。

16. 发明申请

US20100147464A1 PLASMA TREATMENT APPARATUS 审中-公开
标题翻译：等离子体处理装置
公开(公告)号：US20100147464A1
公开(公告)日：2010-06-17
申请号：US12527503
申请日：2008-02-13
申请人： Tetsuji Shibata , Noriyuki Taguchi , Yoshiyuki Nakazono
发明人： Tetsuji Shibata , Noriyuki Taguchi , Yoshiyuki Nakazono
IPC分类号： C23F1/08 , C23C16/00 , H05H1/24
CPC分类号： H01J37/32366 , B08B7/0035 , H01J37/32009 , H05H1/2406 , H05H2001/2418 , H05H2001/483
摘要： The present invention relates to a plasma treatment apparatus for treating an object to be treated by activating a plasma production gas by an electric discharge, and by blowing this activated plasma production gas onto the object to be treated. A covered electrode is formed by embedding a conductive layer in an insulating substrate made of a ceramic sintered body. The covered electrodes are arranged opposed to each other to form an electric discharge space in a space between the covered electrodes. A power supply is included for causing an electric discharge in the electric discharge space by applying a voltage to the conductive layers. Since no ceramic material is sprayed, it is possible to reduce the costs of the material for the covered electrodes, and to simplify the process for manufacturing the covered electrodes. The ceramic sintered body has a smaller percentage of voids and is thus denser than a coating film formed by spraying a ceramic material, which is less likely to cause dielectric breakdown during an electric discharge.
摘要翻译：等离子体处理装置技术领域本发明涉及一种等离子体处理装置，其用于通过放电来激活等离子体产生气体，并将该活化的等离子体产生气体吹送到待处理物体上来对待处理物体进行处理。覆盖电极通过在由陶瓷烧结体制成的绝缘基板中嵌入导电层而形成。被覆电极彼此相对布置，以在被覆电极之间的空间中形成放电空间。包括用于通过向导电层施加电压而在放电空间中放电的电源。由于没有喷涂陶瓷材料，因此可以降低覆盖电极的材料的成本，并且简化用于制造被覆电极的工艺。陶瓷烧结体具有较小的空隙百分比，因此比通过喷涂形成的涂膜更致密，陶瓷材料在放电期间不太可能引起电介质击穿。

17. 发明授权

US07187072B2 Fabrication process of semiconductor package and semiconductor package 失效
标题翻译：半导体封装和半导体封装的制造工艺
公开(公告)号：US07187072B2
公开(公告)日：2007-03-06
申请号：US10705706
申请日：2003-11-10
申请人： Naoki Fukutomi , Yoshiaki Tsubomatsu , Fumio Inoue , Toshio Yamazaki , Hirohito Ohhata , Shinsuke Hagiwara , Noriyuki Taguchi , Hiroshi Nomura
发明人： Naoki Fukutomi , Yoshiaki Tsubomatsu , Fumio Inoue , Toshio Yamazaki , Hirohito Ohhata , Shinsuke Hagiwara , Noriyuki Taguchi , Hiroshi Nomura
IPC分类号： H01L21/00
CPC分类号： H01L21/568 , H01L21/4803 , H01L21/56 , H01L21/561 , H01L23/3121 , H01L23/3128 , H01L23/49811 , H01L23/49816 , H01L23/4985 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/97 , H01L2221/68377 , H01L2224/16237 , H01L2224/2919 , H01L2224/32057 , H01L2224/32225 , H01L2224/32245 , H01L2224/32503 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/48228 , H01L2224/48247 , H01L2224/73204 , H01L2224/73265 , H01L2224/83001 , H01L2224/83102 , H01L2224/8319 , H01L2224/83385 , H01L2224/8381 , H01L2224/8385 , H01L2224/85001 , H01L2224/92125 , H01L2224/97 , H01L2924/01005 , H01L2924/01006 , H01L2924/01015 , H01L2924/01019 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/0105 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/01327 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/07811 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/1517 , H01L2924/15183 , H01L2924/15184 , H01L2924/15311 , H01L2924/181 , H01L2924/203 , H01L2924/351 , H05K3/20 , H01L2224/85 , H01L2924/00014 , H01L2224/83 , H01L2224/92247 , H01L2924/00 , H01L2924/00012 , H01L2924/00015 , H01L2924/0002
摘要： A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.
摘要翻译：提供了半导体封装基板，可以满足向半导体集成度高的趋势。将镍层电镀在电镀铜箔上以形成布线图案。将LSI芯片安装在铜箔上，通过引线接合连接LSI芯片和布线图案的端子，然后用半导体密封环氧树脂密封。只有铜箔用碱蚀刻剂溶解掉才能暴露镍。对于具有低铜溶力的镍剥离器，去除镍层以露出布线图案。涂覆阻焊剂，并且以使连接端子部分露出的方式形成图案。将焊球放置在布线图案的露出部分，然后熔合。布线图案通过焊球与外部印刷电路板连接。

18. 发明申请

US20060042545A1 Plasma treatment apparatus, method of producing reaction vessel for plasma generation, and plasma treatment method 失效
标题翻译：等离子体处理装置，等离子体生成用反应容器的制造方法以及等离子体处理方法
公开(公告)号：US20060042545A1
公开(公告)日：2006-03-02
申请号：US10529861
申请日：2004-05-26
申请人： Tetsuji Shibata , Keiichi Yamazaki , Noriyuki Taguchi , Yasushi Sawada
发明人： Tetsuji Shibata , Keiichi Yamazaki , Noriyuki Taguchi , Yasushi Sawada
IPC分类号： C23C16/00
CPC分类号： H01J37/32009 , H01J37/32357 , H01J37/3244 , H01J37/32541 , H01J2237/3325
摘要： A plasma treatment apparatus is provided, which enables to increase a treatment area and provide good treatment uniformity. This apparatus comprises a pair of electrode plates having a plurality of through holes and an insulating plate having a plurality of through holes. The insulating plate is disposed between the electrode plates such that positions of the through holes of the electrode plates correspond to the positions of the through holes of the insulating plate. A plurality of discharge spaces are formed by the through holes of the electrode plates and the through holes of the insulating plate. By applying a voltage between the electrode plates, while supplying a plasma generation gas into the discharge spaces, plasmas are generated simultaneously in the discharge spaces, and sprayed on an object to efficiently perform a large-area, uniform plasma treatment.
摘要翻译：提供了一种能够增加处理面积并提供良好的处理均匀性的等离子体处理装置。该装置包括具有多个通孔的一对电极板和具有多个通孔的绝缘板。绝缘板设置在电极板之间，使得电极板的通孔的位置对应于绝缘板的通孔的位置。多个放电空间由电极板的通孔和绝缘板的通孔形成。通过在电极板之间施加电压，在将等离子体产生气体供应到放电空间中的同时，在放电空间中同时产生等离子体，并喷射到物体上以有效地进行大面积均匀的等离子体处理。

19. 发明授权

US06818821B2 Electromagnetic wave absorption material and an associated device 有权
标题翻译：电磁波吸收材料及相关装置
公开(公告)号：US06818821B2
公开(公告)日：2004-11-16
申请号：US10235711
申请日：2002-09-06
申请人： Tadashi Fujieda , Kishio Hidaka , Shinzou Ikeda , Mitsuo Hayashibara , Noriyuki Taguchi
发明人： Tadashi Fujieda , Kishio Hidaka , Shinzou Ikeda , Mitsuo Hayashibara , Noriyuki Taguchi
IPC分类号： H05K900
CPC分类号： H05K9/0083 , B82Y10/00 , B82Y30/00 , H01L2224/16225 , H01L2224/48091 , H01L2224/48227 , H01L2924/01012 , H01L2924/01025 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/12041 , H01L2924/1423 , H01L2924/16152 , H01L2924/3011 , H01L2924/3025 , H01Q17/004 , H05K3/284 , H05K9/0024 , Y10S977/932 , H01L2924/00014 , H01L2924/00
摘要： An electromagnetic wave absorption material includes a dispersions of at least one of the materials: a multi-layer hollow globule of carbon, a schungite carbon, and the schungite ore; mixed into a matter having a high electrical resistivity. The invention is further characterized by an electronic device, an optical transmission module, an optical reception module, a high frequency telecommunication equipment, and a stop-free automated tollgate system, wherein at least a part of their board, electronic element, and circuit wiring are covered with said electromagnetic wave absorption material.
摘要翻译：电磁波吸收材料包括至少一种材料的分散体：碳的多层中空球，schiteite碳和schiteite矿石; 混合成具有高电阻率的物质。本发明的特征还在于电子设备，光传输模块，光接收模块，高频电信设备和无停止自动收费系统，其中至少一部分电路板，电子元件和电路布线被所述电磁波吸收材料覆盖。

20. 发明授权

US06743500B2 Hollow carbon fiber and production method 失效
标题翻译：中空碳纤维及其制作方法
公开(公告)号：US06743500B2
公开(公告)日：2004-06-01
申请号：US09984157
申请日：2001-10-29
申请人： Shinji Takeda , Noriyuki Taguchi , Kazumi Kokaji , Osamu Hirai
发明人： Shinji Takeda , Noriyuki Taguchi , Kazumi Kokaji , Osamu Hirai
IPC分类号： B32B326
CPC分类号： B82Y30/00 , D01D5/24 , D01F9/12 , Y10S977/776 , Y10S977/788 , Y10S977/842 , Y10S977/846 , Y10T428/249953 , Y10T428/249971 , Y10T428/2913 , Y10T428/2918 , Y10T428/30
摘要： Production of hollow carbon fibers and hollow carbon particles includes baking and carbonization of polymer particles having a specified volume after deformation. A metal-deposited carbon fiber with metal deposited inside and/or outside the hollow carbon fiber is applicable to electron discharge devices. The thickness and crystallinity of the graphite layer can be freely controlled. Since almost no by-product is generated, separation and refining using a solvent is not required. A hollow carbon particle of desired shape can be produced at a high yield rate. The hollow carbon fiber represented by a carbon nano-tube can be controlled in such a way that a low resistance and uniform shape are provided so that there is an increase in the amount of electrons discharged from the hollow carbon fiber. Use of this hollow carbon fiber as an electron discharge source provides an excellent electron discharge device characterized by stable pixels.
摘要翻译：中空碳纤维和中空碳颗粒的制造包括在变形后具有规定体积的聚合物颗粒的烘烤和碳化。在中空碳纤维内部和/或外部沉积有金属的金属沉积碳纤维可应用于电子放电装置。石墨层的厚度和结晶度可以自由控制。由于几乎不产生副产物，因此不需要使用溶剂的分离和精制。可以以高产率制造所需形状的中空碳颗粒。由碳纳米管表示的中空碳纤维可以以这样的方式进行控制，使得提供低电阻和均匀的形状，使得从中空碳纤维排出的电子量增加。使用该中空碳纤维作为电子放电源提供了以稳定像素为特征的优异的电子放电装置。

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