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11. 发明授权

US08307314B2 Write error verification method of writing apparatus and creation apparatus of write error verification data for writing apparatus 有权
标题翻译：写入装置的写入错误验证方法和写入装置的写入错误验证数据的创建装置
公开(公告)号：US08307314B2
公开(公告)日：2012-11-06
申请号：US12787907
申请日：2010-05-26
申请人： Akihito Anpo
发明人： Akihito Anpo
IPC分类号： G06F17/50 , G06F9/455
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/222 , H01J37/304 , H01J2237/24592 , H01J2237/2817 , H01J2237/31776 , H01J2237/31798
摘要： A write error verification method of a writing apparatus verifying a write error after a write operation being started in the writing apparatus to which layout data containing a figure pattern to be formed is input and which forms the figure pattern on a target object based on the layout data input, the write error verification method includes: if a write error occurs in a process between input of the layout data into the writing apparatus and inspection of the target object on which the figure pattern is formed, selecting a part of the layout data necessary for operation of a function that has caused the write error; extracting parts of the layout data corresponding to a selected part of the layout data for all of a plurality of portions of the target object if a pattern indicated by the selected part of the layout data is arranged at the plurality of portions of the target object; creating verification data by deleting at least one parts extracted for at least one portions other than a portion that has caused the write error from extracted parts of the layout data and by using remaining data; and reproducing the operation of the function that has caused the write error using the verification data to output a result of the reproducing.
摘要翻译：写入装置的写入错误验证方法，在写入装置中开始写入操作之后，写入错误验证方法，该写入装置输入包含要形成的图形图案的布局数据，并且基于布局在目标对象上形成图案数据输入时，写入错误验证方法包括：如果在写入设备的布局数据的输入和形成图形的目标对象的检查之间的过程中发生写入错误，则选择布局数据的一部分用于操作引起写入错误的功能; 如果由所述布局数据的所选部分指示的图案被布置在所述目标对象的所述多个部分，则提取对应于所述目标对象的多个部分的布局数据的选定部分的部分布局数据; 通过删除除了从所述布局数据的提取部分引起的写入错误的部分之外的至少一个部分提取的至少一个部分以及通过使用剩余数据来创建验证数据; 并且使用验证数据再现引起写入错误的功能的操作，以输出再现的结果。

12. 发明申请

US20110012031A1 CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS 有权
标题翻译：充电颗粒光束绘图方法和装置
公开(公告)号：US20110012031A1
公开(公告)日：2011-01-20
申请号：US12816773
申请日：2010-06-16
申请人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
发明人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
IPC分类号： G21K5/04
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A charged particle beam drawing apparatus for drawing patterns corresponding to figures in a drawing data, has a portion for dividing a drawing area on the workpiece into block frames, a portion for combining at least a first block frame and a second block frame into a virtual block frame, and a portion for transferring a data of the virtual block frame from an input data dividing module to a common memory of a first converter and a second converter. The first converter converts a data of a first figure included in the first block frame into a first drawing apparatus internal format data. The second converter converts a data of a second figure included in the second block frame into a second drawing apparatus internal format data. The first figure and the second figure are included in a cell extending over the first block frame and the second block frame.
摘要翻译：用于绘制与绘图数据中的图形对应的图案的带电粒子束描绘装置具有用于将工件上的绘图区域划分成块框架的部分，用于将至少第一块框架和第二块框架组合成虚拟的部分以及用于将虚拟块帧的数据从输入数据划分模块传送到第一转换器和第二转换器的公共存储器的部分。第一转换器将包括在第一块帧中的第一图形的数据转换成第一绘图装置内部格式数据。第二转换器将包括在第二块帧中的第二图形的数据转换为第二绘图装置内部格式数据。第一图和第二图被包括在延伸超过第一块帧和第二块帧的单元中。

13. 发明授权

US07592611B2 Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam 有权
标题翻译：带电粒子束写入数据的创建方法和转换方法，带电粒子束的写入方法
公开(公告)号：US07592611B2
公开(公告)日：2009-09-22
申请号：US11470113
申请日：2006-09-05
申请人： Jun Kasahara , Shigehiro Hara , Hitoshi Higurashi , Akihito Anpo
发明人： Jun Kasahara , Shigehiro Hara , Hitoshi Higurashi , Akihito Anpo
IPC分类号： G11B11/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31762 , H01J2237/31776
摘要： A creation method of charged particle beam writing data for writing a pattern using a charged particle beam based on design data of circuits includes creating, based on the design data, a location data file including location data, as part of the writing data, the location data being defined for locating one of a plurality of pattern data composed of one or more elementary patterns in each block area of a plurality of block areas, the plurality of block areas being made by virtually dividing a writing area, creating, based on the design data, a pattern data file including pattern data composed of one or more elementary patterns, as part of the writing data, and creating, based on the design data, a link file including link data for linking each of the location data and each of the pattern data, as part of the writing data.
摘要翻译：基于电路的设计数据，使用带电粒子束写入图案的带电粒子束写入数据的创建方法包括基于设计数据创建包括位置数据的位置数据文件作为写入数据的一部分，位置数据被定义用于定位由多个块区域的每个块区域中的一个或多个基本图案组成的多个图案数据之一，所述多个块区域通过虚拟地划分写入区域而形成，基于所述设计数据，包括由一个或多个基本图案组成的图案数据的图案数据文件，作为写入数据的一部分，以及基于设计数据创建包括用于链接每个位置数据和每个位置数据的链接数据的链接文件模式数据，作为写入数据的一部分。

14. 发明申请

US20070053242A1 CREATION METHOD AND CONVERSION METHOD OF CHARGED PARTICLE BEAM WRITING DATA, AND WRITING METHOD OF CHARGED PARTICLE BEAM 有权
标题翻译：充电颗粒光束数据的创建方法和转换方法以及充电粒子束的写入方法
公开(公告)号：US20070053242A1
公开(公告)日：2007-03-08
申请号：US11470113
申请日：2006-09-05
申请人： Jun Kasahara , Shigehiro Hara , Hitoshi Higurashi , Akihito Anpo
发明人： Jun Kasahara , Shigehiro Hara , Hitoshi Higurashi , Akihito Anpo
IPC分类号： G11B11/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31762 , H01J2237/31776
摘要： A creation method of charged particle beam writing data for writing a pattern using a charged particle beam based on design data of circuits includes creating, based on the design data, a location data file including location data, as part of the writing data, the location data being defined for locating one of a plurality of pattern data composed of one or more elementary patterns in each block area of a plurality of block areas, the plurality of block areas being made by virtually dividing a writing area, creating, based on the design data, a pattern data file including pattern data composed of one or more elementary patterns, as part of the writing data, and creating, based on the design data, a link file including link data for linking each of the location data and each of the pattern data, as part of the writing data.
摘要翻译：基于电路的设计数据，使用带电粒子束写入图案的带电粒子束写入数据的创建方法包括基于设计数据创建包括位置数据的位置数据文件作为写入数据的一部分，位置数据被定义用于定位由多个块区域的每个块区域中的一个或多个基本图案组成的多个图案数据之一，所述多个块区域通过虚拟地划分写入区域而形成，基于所述设计数据，包括由一个或多个基本图案组成的图案数据的图案数据文件，作为写入数据的一部分，以及基于设计数据创建包括用于链接每个位置数据和每个位置数据的链接数据的链接文件模式数据，作为写入数据的一部分。

15. 发明授权

US08563952B2 Charged particle beam writing apparatus 有权
标题翻译：带电粒子束写入装置
公开(公告)号：US08563952B2
公开(公告)日：2013-10-22
申请号：US13469580
申请日：2012-05-11
申请人： Jun Yashima , Akihito Anpo
发明人： Jun Yashima , Akihito Anpo
IPC分类号： H01J37/317 , G03B27/32 , G03B27/42 , H01J37/20 , H01J37/02 , H01J37/153
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/02 , H01J37/153 , H01J37/3174 , H01J2237/31754 , H01J2237/31764 , H01J2237/31776 , Y10S430/143
摘要： A charged particle beam writing apparatus, includes a unit to input information about a stripe region height, and to judge, when a write region is divided into stripe regions in a thin rectangular shape by the stripe region height, whether a height of a last stripe region is narrower than the stripe region height; and a unit to divide the write region into stripe regions in the thin rectangular shape in such a way that the last stripe region and a stripe region prior to the last stripe region are combined to create one stripe region and stripe regions at least two stripe regions prior to the last stripe region are each created as stripe regions of the stripe region height if the height of the last stripe region is narrower than the stripe region height.
摘要翻译：一种带电粒子束写入装置，包括输入关于条带区域高度的信息的单元，并且当写入区域被划分成条形区域高度的薄矩形形状的条带区域时，判断最后条带的高度区域比条纹区域高; 以及将所述写入区域划分成所述薄矩形形状的条带区域的单元，使得所述最后条带区域和所述最后条带区域之前的条带区域被组合以产生一个条带区域和条带区域，至少两个条带区域如果最后一个条带区域的高度比条带区域高度窄，则在最后一个条带区域之前分别被创建为条带区域高度的条带区域。

16. 发明授权

US08471225B2 Charged particle beam writing method and apparatus therefor 有权
标题翻译：带电粒子束写入方法及其装置
公开(公告)号：US08471225B2
公开(公告)日：2013-06-25
申请号：US12874676
申请日：2010-09-02
申请人： Akihito Anpo
发明人： Akihito Anpo
IPC分类号： B82Y10/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A charged particle beam writing method includes inputting layout information of a plurality of chips on which pattern formation is to be achieved, setting, using the layout information, a plurality of writing groups each being composed of at least one of the plurality of chips and each having writing conditions differing from each other, setting a frame which encloses a whole of all chip regions in all the plurality of writing groups, virtually dividing the frame into a plurality of stripe regions in a predetermined direction while keeping chips of writing groups differing from each other intermingled, setting an order of each of the plurality of stripe regions such that a reference position of the each of the plurality of stripe regions is located in order in the predetermined direction, and writing a pattern in the each of the plurality of stripe regions onto a target workpiece according to the order which has been set, by using a charged particle beam.
摘要翻译：带电粒子束写入方法包括输入要在其上实现图案形成的多个芯片的布局信息，使用布局信息设置多个写入组，每个写入组由多个芯片中的至少一个和每个芯片组成具有彼此不同的写入条件，设置在所有多个写入组中包围整个芯片区域的帧，将帧按预定方向实际上划分为多个条带区域，同时保持写入组的芯片不同于每个其他混合，设置多个条带区域中的每一个的顺序，使得多个条带区域中的每一个的参考位置按预定方向依次定位，并且在多个条带区域中的每一个中写入图案通过使用带电粒子束，根据已经设定的顺序，在目标工件上。

17. 发明授权

US08466440B2 Charged particle beam drawing apparatus and control method thereof 有权
标题翻译：带电粒子束描绘装置及其控制方法
公开(公告)号：US08466440B2
公开(公告)日：2013-06-18
申请号：US13163111
申请日：2011-06-17
申请人： Jun Yashima , Yasuo Kato , Akihito Anpo
发明人： Jun Yashima , Yasuo Kato , Akihito Anpo
IPC分类号： G21K5/10 , G03F7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31771 , H01J2237/31776
摘要： A charged particle beam drawing apparatus applies a predetermined dose of a charged particle beam for drawing patterns corresponding to figures included in a drawing data, in a whole of a drawing area of a workpiece, before a result of calculation of a fogging effect correction dose is obtained, wherein a proximity effect correction dose is incorporated in the predetermined dose, and the fogging effect correction dose is not incorporated in the predetermined dose, then, the charged particle beam drawing apparatus applies a predetermined dose of the charged particle beam for drawing the patterns which overlap the patterns drawn before the result of calculation of the fogging effect correction dose is obtained, in the whole of the drawing area of the workpiece, after the calculation of the fogging effect correction dose, wherein the proximity effect correction dose and the fogging effect correction dose are incorporated in the predetermined dose.
摘要翻译：带电粒子束描绘装置在雾化效应校正剂量的计算结果是在工件的整个绘图区域中之前，将预定剂量的带电粒子束用于绘制对应于包括在绘图数据中的图形的图案得到的，其中以预定剂量并入接近效应校正剂量，并且雾化效应校正剂量不包含在预定剂量中，然后，带电粒子束描绘装置施加预定剂量的带电粒子束以绘制图案在计算雾化效果校正剂量之前，在整个绘图区域中获得在雾化效果校正剂量的计算结果之前绘制的图案重叠，其中邻近效应校正剂量和起雾效果校正剂量以预定剂量掺入。

18. 发明申请

US20120292536A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：充电颗粒光束写字装置和充电颗粒光束写字方法
公开(公告)号：US20120292536A1
公开(公告)日：2012-11-22
申请号：US13465221
申请日：2012-05-07
申请人： Jun YASHIMA , Akihito Anpo
发明人： Jun YASHIMA , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/304 , H01J2237/31762 , H01J2237/31764 , H01J2237/31776
摘要： A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in the block concerned from cells each including at least one figure pattern, a unit to, for each block, generate a first frame that surrounds the block concerned and the cell extracted, a unit to, for each first frame, divide the inside of the first frame concerned into mesh regions and calculate an area density of a figure pattern in each mesh, a unit to combine area densities of mesh regions which are overlapped with each other and between different first frames, a unit to calculate a dose of beam by using the area density, and a unit to write a pattern on a target workpiece by irradiating the beam of the dose calculated.
摘要翻译：带电粒子束写入装置包括：将芯片区域划分为第一数据处理块的单元，在每个块中单元提取其参考位置位于相关块中的小区，每个小区包括至少一个图形模式，对于每个块，单元产生围绕所涉及的块并且提取的单元的第一帧，对于每个第一帧的单元，将有关的第一帧的内部划分成网格区域，并且计算图形的面积密度每个网格中的图案，用于组合彼此重叠并且在不同第一帧之间的网格区域的区域密度的单位，通过使用面积密度来计算光束的剂量的单元以及在目标上写入图案的单元工件通过照射光束的剂量计算。

19. 发明授权

US08207514B2 Charged particle beam drawing apparatus and proximity effect correction method thereof 有权
标题翻译：带电粒子束绘图装置及其接近效应校正方法
公开(公告)号：US08207514B2
公开(公告)日：2012-06-26
申请号：US12882713
申请日：2010-09-15
申请人： Shigehiro Hara , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
发明人： Shigehiro Hara , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/31769 , H01J2237/31776
摘要： A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.
摘要翻译：带电粒子束描绘装置形成具有网格的图，形成代表性图，每个网格中每个代表图的面积等于每个网格中的图形的总面积，并计算每个网格中的带电粒子束的邻近效应校正剂量在每个网格中每个代表人物的面积的基础上。如果需要改变带电粒子束的接近效应校正剂量以绘制与至少一个图形相对应的至少一个图案，则带电粒子束描绘装置在代表性图形形成之前改变至少一个图形的面积，代表图形形成部分，并且改变用于绘制由邻近效应校正剂量计算部分计算的与至少一个图形相对应的至少一个图案的带电粒子束的邻近效应校正剂量。

20. 发明申请

US20110066271A1 CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS THEREFOR 有权
标题翻译：充电颗粒光束写入方法及其装置
公开(公告)号：US20110066271A1
公开(公告)日：2011-03-17
申请号：US12874676
申请日：2010-09-02
申请人： Akihito Anpo
发明人： Akihito Anpo
IPC分类号： G06F19/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A charged particle beam writing method includes inputting layout information of a plurality of chips on which pattern formation is to be achieved, setting, using the layout information, a plurality of writing groups each being composed of at least one of the plurality of chips and each having writing conditions differing from each other, setting a frame which encloses a whole of all chip regions in all the plurality of writing groups, virtually dividing the frame into a plurality of stripe regions in a predetermined direction while keeping chips of writing groups differing from each other intermingled, setting an order of each of the plurality of stripe regions such that a reference position of the each of the plurality of stripe regions is located in order in the predetermined direction, and writing a pattern in the each of the plurality of stripe regions onto a target workpiece according to the order which has been set, by using a charged particle beam.
摘要翻译：带电粒子束写入方法包括输入要在其上实现图案形成的多个芯片的布局信息，使用布局信息设置多个写入组，每个写入组由多个芯片中的至少一个和每个芯片组成具有彼此不同的写入条件，设置在所有多个写入组中包围整个芯片区域的帧，将帧按预定方向实际上划分为多个条带区域，同时保持写入组的芯片不同于每个其他混合，设置多个条带区域中的每一个的顺序，使得多个条带区域中的每一个的参考位置按预定方向依次定位，并且在多个条带区域中的每一个中写入图案通过使用带电粒子束，根据已经设定的顺序，在目标工件上。

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