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11. 发明申请

US20070256711A1 SUBSTRATE CLEANING APPARATUS AND METHOD 审中-公开
标题翻译：基板清洗装置和方法
公开(公告)号：US20070256711A1
公开(公告)日：2007-11-08
申请号：US11683582
申请日：2007-03-08
申请人： Toshihide HAYASHI , Tsutomu Makino , Takahiko Wakatsuki , Naoya Hayamizu , Hiroshi Fujita , Akiko Saito
发明人： Toshihide HAYASHI , Tsutomu Makino , Takahiko Wakatsuki , Naoya Hayamizu , Hiroshi Fujita , Akiko Saito
IPC分类号： B08B3/00
CPC分类号： B08B1/02 , B08B3/022 , G03F7/422 , G03F7/427 , H01L21/67046 , H01L21/67051
摘要： A cleaning apparatus to remove organic substances deposited onto a substrate, the apparatus includes a transport unit configured to transport the substrate, a water steam ejection unit configured to eject a heated water steam to a face of the substrate to be transported deposited with the organic substances, and a physical force applying unit configured to apply a physical force to the organic substances deposited onto the substrate to be transported.
摘要翻译：一种用于去除沉积在基底上的有机物质的清洁装置，该装置包括构造成输送基底的输送单元，水蒸汽喷射单元，其构造成将被加热的水蒸汽喷射到待运输的基底的面上，沉积有机物质以及物理力施加单元，其构造成对被运送的基板上沉积的有机物质施加物理力。

12. 发明申请

US20070277853A1 APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING 有权
标题翻译：用于光刻胶去除处理的装置和方法
公开(公告)号：US20070277853A1
公开(公告)日：2007-12-06
申请号：US11625081
申请日：2007-01-19
申请人： Takahiko Wakatsuki , Naoya Hayamizu , Hiroshi Fujita , Akiko Saito , Toshihide Hayashi , Yukinobu Nishibe , Tsutomu Makino
发明人： Takahiko Wakatsuki , Naoya Hayamizu , Hiroshi Fujita , Akiko Saito , Toshihide Hayashi , Yukinobu Nishibe , Tsutomu Makino
IPC分类号： B08B3/14 , B08B3/10 , B08B7/04
CPC分类号： B08B3/00 , B08B7/00 , B08B2230/01 , G03F7/427
摘要： A processing apparatus includes: a tank configured to store water; vapor generating unit configured to turn the water supplied from the tank into vapor; a processing chamber in which vapor supplied from the vapor generating unit is used to remove residues from a workpiece; cooling unit; and filtering unit. The cooling unit cools waste liquid ejected from the processing chamber. The filtering unit is provided between the cooling unit and the tank, and the filtering unit filters the waste liquid cooled in the cooling unit. A processing method includes: supplying vapor into a processing chamber; removing residues from a workpiece using the vapor; cooling waste liquid containing the removed residues to precipitate the residues as solids; and filtering the waste liquid containing the precipitates.
摘要翻译：一种处理装置，包括：储存器，用于储存水; 蒸汽发生单元，其构造成将从所述罐供给的水转化为蒸气; 处理室，其中从蒸汽发生单元供应的蒸汽用于从工件中除去残余物; 冷却单元和过滤单元。冷却单元冷却从处理室喷出的废液。过滤单元设置在冷却单元和水箱之间，过滤单元对冷却单元中冷却的废液进行过滤。一种处理方法包括：将蒸气供应到处理室中; 使用蒸气从工件去除残留物; 冷却含有去除的残余物的废液以将残留物沉淀为固体; 并过滤含有沉淀物的废液。

13. 发明申请

US20080029132A1 ULTRASONIC CLEANING APPARATUS 审中-公开
标题翻译：超声波清洗装置
公开(公告)号：US20080029132A1
公开(公告)日：2008-02-07
申请号：US11870272
申请日：2007-10-10
申请人： Naoaki Sakurai , Hiroshi Fujita
发明人： Naoaki Sakurai , Hiroshi Fujita
IPC分类号： B08B3/12 , H01L41/09
CPC分类号： H01L21/67051 , B08B3/12 , Y10S134/902
摘要： An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.
摘要翻译：一种超声波清洗装置，其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料，并且清洁表面，其中超声波施加头具有设置有超声波传递部件在与表面相邻的第一平面上具有弯曲部分，设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器，并且产生并施加超声波到通过超声波传递部件在表面上清洗液体，以及设置在超声波传递部件中的防止部，防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器传输部件。

14. 发明申请

US20090044844A1 ULTRASONIC CLEANING APPARATUS 有权
标题翻译：超声波清洗装置
公开(公告)号：US20090044844A1
公开(公告)日：2009-02-19
申请号：US12248514
申请日：2008-10-09
申请人： Naoaki SAKURAI , Hiroshi Fujita
发明人： Naoaki SAKURAI , Hiroshi Fujita
IPC分类号： B08B13/00
CPC分类号： H01L21/67051 , B08B3/12 , Y10S134/902
摘要： An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.
摘要翻译：一种超声波清洗装置，其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料，并且清洁表面，其中超声波施加头具有设置有超声波传递部件在与表面相邻的第一平面上具有弯曲部分，设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器，并且产生并施加超声波到通过超声波传递部件在表面上清洗液体，以及设置在超声波传递部件中的防止部，防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器传输部件。

15. 发明申请

US20080110473A1 Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal display 审中-公开
标题翻译：超声波洗涤装置，超声波洗涤装置，超声波洗涤法，半导体装置的制造方法以及液晶显示装置的制造方法
公开(公告)号：US20080110473A1
公开(公告)日：2008-05-15
申请号：US11976267
申请日：2007-10-23
申请人： Naoaki Sakurai , Hiroshi Fujita
发明人： Naoaki Sakurai , Hiroshi Fujita
IPC分类号： B08B3/12
CPC分类号： H01L21/67259 , B08B3/12 , H01L21/67051 , H01L21/67253 , H01L21/68
摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.
摘要翻译：一种超声波洗涤装置，其特征在于，包括通过粘合剂固定超声波振动体的超声波振动板，与所述振动板相对的超声波传递板，液体供给装置，其向限定的空间在所述振动板和所述透射板之间，以及用于从所述空间排出液体的液体排出装置。

16. 发明申请

US20050145264A1 Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal display 审中-公开
标题翻译：超声波洗涤装置，超声波洗涤装置，超声波洗涤法，半导体装置的制造方法以及液晶显示装置的制造方法
公开(公告)号：US20050145264A1
公开(公告)日：2005-07-07
申请号：US11072326
申请日：2005-03-07
申请人： Naoaki Sakurai , Hiroshi Fujita
发明人： Naoaki Sakurai , Hiroshi Fujita
IPC分类号： B05B17/06 , B05D3/12 , B08B3/12 , H01L21/00 , H01L21/304 , H01L21/68 , B08B3/10
CPC分类号： H01L21/67259 , B08B3/12 , H01L21/67051 , H01L21/67253 , H01L21/68
摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.
摘要翻译：一种超声波洗涤装置，其特征在于，包括通过粘合剂固定超声波振动体的超声波振动板，与所述振动板相对的超声波传递板，液体供给装置，其向限定的空间在所述振动板和所述透射板之间，以及用于从所述空间排出液体的液体排出装置。

17. 发明授权

US07814919B2 Ultrasonic cleaning apparatus 有权
标题翻译：超声波清洗设备
公开(公告)号：US07814919B2
公开(公告)日：2010-10-19
申请号：US12248514
申请日：2008-10-09
申请人： Naoaki Sakurai , Hiroshi Fujita
发明人： Naoaki Sakurai , Hiroshi Fujita
IPC分类号： B08B3/12 , B08B6/00
CPC分类号： H01L21/67051 , B08B3/12 , Y10S134/902
摘要： An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.
摘要翻译：一种超声波清洗装置，其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料，并且清洁表面，其中超声波施加头具有设置有超声波传递部件在与表面相邻的第一平面上具有弯曲部分，设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器，并且产生并施加超声波到通过超声波传递部件在表面上清洗液体，以及设置在超声波传递部件中的防止部，防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器传输部件。

18. 发明申请

US20090044829A1 ULTRASONIC-WAVE WASHING UNIT, ULTRASONIC-WAVE WASHING APPARATUS, ULTRASONIC-WAVE WASHING METHOD, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING A LIQUID CRYSTAL DISPLAY 审中-公开
标题翻译：超声波洗涤装置，超声波洗涤装置，超声波洗涤方法，制造半导体装置的方法以及制造液晶显示方法
公开(公告)号：US20090044829A1
公开(公告)日：2009-02-19
申请号：US12251024
申请日：2008-10-14
申请人： Naoaki SAKURAI , Hiroshi Fujita
发明人： Naoaki SAKURAI , Hiroshi Fujita
IPC分类号： B08B1/00
CPC分类号： H01L21/67259 , B08B3/12 , H01L21/67051 , H01L21/67253 , H01L21/68
摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.
摘要翻译：一种超声波洗涤装置，其特征在于，包括通过粘合剂固定超声波振动体的超声波振动板，与所述振动板相对的超声波传递板，液体供给装置，其向限定的空间在所述振动板和所述透射板之间，以及用于从所述空间排出液体的液体排出装置。

19. 发明申请

US20050284509A1 Ultrasonic cleaning apparatus 审中-公开
标题翻译：超声波清洗设备
公开(公告)号：US20050284509A1
公开(公告)日：2005-12-29
申请号：US11159199
申请日：2005-06-23
申请人： Naoaki Sakurai , Hiroshi Fujita
发明人： Naoaki Sakurai , Hiroshi Fujita
IPC分类号： B08B3/12 , H01L21/00
CPC分类号： H01L21/67051 , B08B3/12 , Y10S134/902
摘要： An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.
摘要翻译：一种超声波清洗装置，其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料，并且清洁表面，其中超声波施加头具有设置有超声波传递部件在与表面相邻的第一平面上具有弯曲部分，设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器，并且产生并施加超声波到通过超声波传递部件在表面上清洗液体，以及设置在超声波传递部件中的防止部，防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器传输部件。

20. 发明授权

US06875696B2 Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal display 有权
公开(公告)号：US06875696B2
公开(公告)日：2005-04-05
申请号：US10443012
申请日：2003-05-22
申请人： Naoaki Sakurai , Hiroshi Fujita
发明人： Naoaki Sakurai , Hiroshi Fujita
IPC分类号： B05B17/06 , B05D3/12 , B08B3/12 , H01L21/00 , H01L21/304 , H01L21/68 , H01L21/302 , H01L21/26 , H01L21/324 , H01L21/461 , H01L21/477
CPC分类号： H01L21/67259 , B08B3/12 , H01L21/67051 , H01L21/67253 , H01L21/68
摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.

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