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11. 发明申请

US20140300878A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20140300878A1
公开(公告)日：2014-10-09
申请号：US14311918
申请日：2014-06-23
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341
摘要： In an immersion exposure apparatus, a projection system includes an optical element having a light emitting surface that contacts immersion liquid and an outer surface above the light emitting surface. A holding member holds the optical element, and a liquid confinement member surrounds the optical element to form a gap between the optical element and the liquid confinement member. The outer surface of the optical element includes a first part extending upwardly with respect to the light emitting surface, and a second part above the gap and extending radially outwardly with respect to the first part. The gap is between the first part and an inner surface of the liquid confinement member, which has an upper surface extending radially outwardly with respect to the inner surface. The holding member holds the optical element over a portion of the upper surface of the liquid confinement member.
摘要翻译：在浸渍曝光装置中，投影系统包括具有与浸没液接触的发光面和发光面上方的外表面的光学元件。保持构件保持光学元件，并且液体限制构件围绕光学元件以在光学元件和液体限制构件之间形成间隙。光学元件的外表面包括相对于发光表面向上延伸的第一部分和在间隙上方的第二部分，并相对于第一部分径向向外延伸。间隙位于液体限制构件的第一部分和内表面之间，其具有相对于内表面径向向外延伸的上表面。保持构件将光学元件保持在液体限制构件的上表面的一部分上。

12. 发明申请

US20180149984A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD 审中-公开
公开(公告)号：US20180149984A1
公开(公告)日：2018-05-31
申请号：US15884634
申请日：2018-01-31
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/2041 , G03F7/70341 , G03F7/70725
摘要： A liquid immersion exposure apparatus includes a projection system having a final optical element; a liquid-immersion-area-forming-member having an opening through which an exposure light is projected, the-liquid-immersion-area-forming-member having a removal outlet facing downward and a liquid supply inlet; a substrate stage having a substrate holding portion, which is movable below and relative to the projection system; and a controller. The controller controls movement of the substrate stage, so that when the substrate is moved from a first position to a second position in a plane perpendicular to an optical axis of the final optical element, the controller limits the movement of the substrate stage based on a positional relation between the first position and the second position.

13. 发明申请

US20130194560A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开
公开(公告)号：US20130194560A1
公开(公告)日：2013-08-01
申请号：US13734683
申请日：2013-01-04
申请人： NIKON CORPORATION
发明人： Yasuhiro OMURA , Takaya OKADA , Hiroyuki NAGASAKA
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

14. 发明申请

US20210023779A1 PROCESSING APPARATUS, PROCESSING METHOD, COMPUTER PROGRAM, RECORDING MEDIUM, AND CONTROL APPARATUS 有权
公开(公告)号：US20210023779A1
公开(公告)日：2021-01-28
申请号：US16964689
申请日：2019-01-29
申请人： NIKON CORPORATION
发明人： Takeshi MATSUDA , Hiroyuki NAGASAKA , Masayuki SHIRAISHI , Shigeki EGAMI , Takehiro YAMAMOTO
IPC分类号： B29C64/153 , B23K26/342 , B23K15/00 , B23K26/08 , B33Y30/00 , B29C64/268 , B33Y10/00
摘要： A processing apparatus with: an irradiation apparatus that emits an energy beam; and a supply apparatus that supplies materials to an irradiation position of the energy beam, the processing apparatus forms a build object by moving the irradiation position from a first position on a first object to a second position that is away from the first object.

15. 发明申请

US20180173107A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20180173107A1
公开(公告)日：2018-06-21
申请号：US15897271
申请日：2018-02-15
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20 , G03B27/42
摘要： A liquid immersion exposure apparatus and method expose a substrate with illumination light via liquid. A projection optical system has plural optical elements that include a lens contacting the liquid and a barrel supporting the optical elements, the lens provided on a front end part of the projection optical system and exposed from the barrel. A liquid immersion member around the lens forms a liquid immersion area between the lens and part of the substrate. A drive device having a magnetic floating type of motor moves a substrate stage below the projection optical system. The liquid immersion member has a supply port to supply the liquid below the projection optical system and a recovery port to recover the liquid. The supply port is outside the projection area, the recovery port surrounds the projection area and the supply port, and each of the supply and recovery ports faces the substrate stage.

16. 发明申请

US20170371253A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20170371253A1
公开(公告)日：2017-12-28
申请号：US15697750
申请日：2017-09-07
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus includes a projection optical system having a last optical element via which an exposure beam is projected to a projection area, and a liquid supply system having a first supply port and a second supply port via which an immersion liquid is supplied to form a liquid immersion area. The first supply port is arranged on one side of the projection area in a scanning direction, and the second supply port is arranged on the other side of the projection area in the scanning direction, the first and second supply ports facing downwardly. A plurality of shot areas of a substrate are successively exposed with the exposure beam through the liquid immersion area covering only a portion of an upper surface of the substrate.

17. 发明申请

US20170176874A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD 审中-公开
公开(公告)号：US20170176874A1
公开(公告)日：2017-06-22
申请号：US15450611
申请日：2017-03-06
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/2041 , G03F7/70341 , G03F7/70725
摘要： A liquid immersion exposure apparatus includes a liquid-immersion-area-forming-member having an opening through which an exposure light is projected, the-liquid-immersion-area-forming-member having a first liquid supply inlet facing downward, a second liquid supply inlet provided opposite to an outer surface of the final optical element, and a first removal outlet facing downward. A liquid immersion area is formed on a portion of an upper surface of a substrate while performing a liquid supply via the first liquid supply inlet to a gap between the liquid-immersion-area-forming-member and the upper surface of the substrate, a liquid supply via the second liquid supply inlet to a gap between the liquid-immersion-area-forming-member and a final optical element of a projection system and a liquid removal via the first removal outlet from the gap between the liquid-immersion-area-forming-member and the upper surface of the substrate.

18. 发明申请

US20130250258A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US20130250258A1
公开(公告)日：2013-09-26
申请号：US13897989
申请日：2013-05-20
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/2041 , G03F7/70325 , G03F7/70725 , G03F7/70775
摘要： A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.
摘要翻译：用曝光光束曝光基板的液浸式曝光装置包括投影光学系统，通过该投影光学系统将基板暴露于曝光光束，设置在第一位置的第一入口，其能够将第一液体供应到与所述投影光学系统的底面相邻的空间，以及设置在与所述第一位置不同的第二位置的第二入口，所述第二入口能够将不同于所述第一液体的第二液体供给到所述空间。

19. 发明申请

US20130141701A1 EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20130141701A1
公开(公告)日：2013-06-06
申请号：US13753969
申请日：2013-01-30
申请人： Nikon Corporation
发明人： Soichi OWA , Nobutaka MAGOME , Shigeru HIRUKAWA , Yoshihiko KUDO , Jiro INOUE , Hirotaka KOHNO , Masahiro NEI , Motokatsu IMAI , Hiroyuki NAGASAKA , Kenichi SHIRAISHI , Yasufumi NISHII , Hiroaki TAKAIWA
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

20. 发明公开

US20230341679A1 OPTICAL APPARATUS AND PROCESSING APPARATUS 审中-公开
公开(公告)号：US20230341679A1
公开(公告)日：2023-10-26
申请号：US18021576
申请日：2020-08-18
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA , Yoshio KAWABE
IPC分类号： G02B27/00 , G02B26/08 , G02B15/02 , G02B19/00
CPC分类号： G02B27/0012 , G02B26/0833 , G02B26/0825 , G02B15/02 , G02B19/0004
摘要： An optical apparatus includes: a first optical system configured to guide light from a first area on a first plane to a second plane, the second plane being a pupil plane of the first optical system relative to the first plane; a second optical system disposed between the second plane and a third plane, the second plane being a pupil plane of the second optical system relative to the third plane; a first reflective member that is disposed on a first optical path at an entrance side of the first optical system and that has a first reflective surface that is swingable; and a second reflective member that is disposed on a second optical path between the first optical system and the second optical system and that has a second reflective surface that is swingable.

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