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11. 发明授权

US07526749B2 Methods and apparatus for designing and using micro-targets in overlay metrology 有权
标题翻译：在重叠计量中设计和使用微观目标的方法和设备
公开(公告)号：US07526749B2
公开(公告)日：2009-04-28
申请号：US11329716
申请日：2006-01-10
申请人： Vladimir Levinski , Michael E. Adel , Aviv Frommer , Daniel Kandel
发明人： Vladimir Levinski , Michael E. Adel , Aviv Frommer , Daniel Kandel
IPC分类号： G06F17/50
CPC分类号： H01L23/544 , G03F7/70633 , H01L22/12 , H01L2223/54453 , H01L2223/5448 , H01L2924/0002 , H01L2924/00
摘要： Methods and apparatus for fabricating a semiconductor die including several target structures. A first layer is formed that includes one or more line or trench structures that extend in a first direction. A second layer is formed that includes one or more line or trench structures that extend in a second direction that is perpendicular to the first structure, such that a projection of the target structure along the first direction is independent of the second direction and a projection of the target structure along the second direction is independent of the first direction. A target structure and a method for generating a calibration curve are also described.
摘要翻译：用于制造包括几个目标结构的半导体管芯的方法和装置。形成第一层，其包括在第一方向上延伸的一个或多个线或沟槽结构。形成第二层，其包括在垂直于第一结构的第二方向上延伸的一个或多个线或沟槽结构，使得目标结构沿着第一方向的突起独立于第二方向和投影沿着第二方向的目标结构与第一方向无关。还描述了用于产生校准曲线的目标结构和方法。

12. 发明授权

US07564557B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07564557B2
公开(公告)日：2009-07-21
申请号：US11926603
申请日：2007-10-29
申请人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant
发明人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant
IPC分类号： G01B11/00 , G01B11/14 , G01B11/04 , G01B11/08 , G01N21/00 , G01N23/00 , G01N21/86 , G21K7/00 , G01V8/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.
摘要翻译：公开了一种组合的散射测量标记，其包括能够被测量以确定CD或轮廓信息的散射关键维度（CD）或轮廓目标，以及布置在散射测量CD或轮廓目标上的散射测绘覆盖目标，散射测绘覆盖目标与散射光谱CD 或轮廓目标以形成能够被测量以确定覆盖的散射测量标记。

13. 发明授权

US6142629A Spectral imaging using illumination of preselected spectral content 失效
标题翻译：使用预选光谱含量照明的光谱成像
公开(公告)号：US6142629A
公开(公告)日：2000-11-07
申请号：US143964
申请日：1998-08-30
申请人： Michael E. Adel , Dario Cabib , David Wine
发明人： Michael E. Adel , Dario Cabib , David Wine
IPC分类号： G02B6/00 , A61B1/06 , A61B3/12 , A61B3/14 , G01J3/10 , G01J3/12 , G01J3/28 , G02B6/04
CPC分类号： A61B3/10 , G01J3/10 , G01J3/2823 , G01J2003/1282
摘要： A device and method for spectral imaging of an object. A plurality of sets of narrow-band light sources such as LEDs are provided. Each set emits illumination radiation in a different narrow spectral band. Each set is activated sequentially to illuminate the object. Light reflected from the object or transmitted by the object is focused on a detector array to image the object. Narrower illumination bands are provided by dispersing the emitted light using a dispersive optical element such as a diffraction grating. Alternatively; selected sets or subsets are activated simultaneously with duty cycles that emulate a preselected spectral distribution. For imaging ocular fundus tissue, the illumination light is shaped into an annular beam by an appropriately shaped waveguide.
摘要翻译：用于对象的光谱成像的装置和方法。提供多组窄带光源如LED。每组发射不同窄光谱带的照射辐射。每个组被依次激活以照亮对象。从物体反射或由物体传输的光聚焦在检测器阵列上以对物体进行成像。通过使用诸如衍射光栅的分散光学元件分散发射的光来提供较窄的照明带。或者; 所选择的集合或子集与模拟预选频谱分布的占空比同时激活。为了对眼底组织进行成像，照明光通过适当形状的波导成形为环形光束。

14. 发明授权

US6082892A Temperature measuring method and apparatus 失效
标题翻译：温度测量方法和仪器
公开(公告)号：US6082892A
公开(公告)日：2000-07-04
申请号：US947502
申请日：1997-10-10
申请人： Michael E. Adel , Dario Cabib , Yaron Ish-Shalom , Shmuel Mangan
发明人： Michael E. Adel , Dario Cabib , Yaron Ish-Shalom , Shmuel Mangan
IPC分类号： G01J5/10 , G01J5/60 , G01J5/62 , G01K11/12 , G01K11/00 , G01K5/58 , G01K5/62
CPC分类号： G01K11/12 , G01J5/10 , G01J5/601 , G01J5/62
摘要： A method of remotely measuring the temperature of a body, such as a semiconductor wafer, whose transparency varies with both wavelength and temperature and is characterized by an optical absorption edge. The body is illuminated at wavelengths on either side of the optical absorption edge. Based on the measured reflectivity at wavelengths shorter than the optical absorption edge, the direct reflectivity at wavelengths longer than the optical absorption edge is predicted and used to estimate the component of total reflectivity, at wavelengths longer than the optical absorption edge, which corresponds to propagation through the body and reflection back through the body. Light reflected from the body, measured in an "active" channel, is distinguished from light emitted passively by the body and measured in a "passive" channel. In the case of an opaque body, this allows the estimation of the emissivity of the body, and a temperature estimate based on Planck's law.
摘要翻译：远程测量其透明度随波长和温度两者而变化的半导体晶片等体的温度的方法，其特征在于光吸收边缘。身体在光吸收边缘两侧的波长处照亮。基于在比光吸收边缘短的波长处的测量的反射率，预测在比光吸收边缘长的波长处的直接反射率，并且用于估计在比对应于传播的光吸收边长的波长处的总反射率的分量通过身体反射穿过身体。在“活动”通道中测量的从身体反射的光与身体被动发射的光不同，并在“被动”通道中测量。在不透明的身体的情况下，这允许估计身体的发射率，以及基于普朗克定律的温度估计。

15. 发明授权

US08390808B1 Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods 有权
标题翻译：增强的OVL虚拟场使能即时OVL测量方法
公开(公告)号：US08390808B1
公开(公告)日：2013-03-05
申请号：US13548656
申请日：2012-07-13
申请人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
发明人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
IPC分类号： G01B11/00
CPC分类号： H01L21/67294 , H01L21/68
摘要： A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
摘要翻译：半导体晶片可以包括被配置为实现覆盖测量的虚拟场。增强的伪字段可以包括能够在增强的伪字段中进行OVL测量的多个编码块。

16. 发明授权

US07301634B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07301634B2
公开(公告)日：2007-11-27
申请号：US10785821
申请日：2004-02-23
申请人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Christopher F. Bevis , John Fielden , Noah Bareket , Anatoly Fabrikant , Mark Ghinovker , Piotr Zalicki , Dan Wack
发明人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Christopher F. Bevis , John Fielden , Noah Bareket , Anatoly Fabrikant , Mark Ghinovker , Piotr Zalicki , Dan Wack
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.
摘要翻译：公开了一种确定多层样本的两层之间的覆盖误差的方法。对于每个具有由第一层形成的第一结构和由样本的第二层形成的第二结构的多个周期性目标，使用干涉仪来调制宽带源的基本上多个波长，然后获取一个或更多图像的周期性目标。在第一和第二结构之间有预定义的偏移。然后通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性目标的一个或多个获取的图像来确定第一和第二结构之间的重叠误差。

17. 发明授权

US5322361A Method and apparatus for measuring temperature 失效
标题翻译：测量温度的方法和装置
公开(公告)号：US5322361A
公开(公告)日：1994-06-21
申请号：US10038
申请日：1993-01-28
申请人： Dario Cabib , Michael E. Adel
发明人： Dario Cabib , Michael E. Adel
IPC分类号： G01K5/52 , G01K5/50 , G01K11/00 , G01K11/18
CPC分类号： G01K5/52
摘要： A method and apparatus for measuring temperature by subjecting, to the temperature to be measured, a light-transmissive body of a material whose dimensions change in response to temperature, directing first rays of light from a light source through a first path including a predetermined distance of travel through the light-transmissive body, simultaneously directing second rays of light from the light source through a second path, parallel to the first path and of a linear length equal to that of the first path, but not including the predetermined distance of travel through the light transmissive body, and measuring the change in phases between the first and second light rays at the ends of the first and second paths, to thereby provide a measurement of the temperature to which the light-transmissive body was subjected.
摘要翻译：一种测量温度的方法和装置，所述方法和装置通过使待测温度的材料的透光体的尺寸随温度变化而变化，将来自光源的第一光线引导通过包括预定距离的第一路径通过透光体行进，同时引导来自光源的第二光线通过平行于第一路径的第二路径并且具有等于第一路径的线性长度的线性长度，但不包括预定行程距离并且测量第一和第二路径的端部处的第一和第二光线之间的相位变化，从而提供对透光体的温度的测量。

18. 发明授权

US07876440B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07876440B2
公开(公告)日：2011-01-25
申请号：US12505311
申请日：2009-07-17
申请人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant
发明人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb.
摘要翻译：公开了用于确定样品的第一层中的多个第一结构与样品的第二层中的多个第二结构之间的叠层的装置和方法。提供了各自包括第一和第二结构的一部分的目标A，B，C和D。目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B被设计成在其第一和第二结构部分之间具有偏移Xb; 目标C被设计成在其第一和第二结构部分之间具有偏移Xc; 并且目标D被设计成在其第一和第二结构部分之间具有偏移Xd。偏移量Xa，Xb，Xc和Xd中的每一个与零不同，并且Xa是相反的符号，并且与Xb不同。

19. 发明申请

US20090303482A1 Enhanced Ovl dummy field enabling "on-the-fly" ovl measurement methods 有权
标题翻译：增强的Ovl虚拟场可实现“即时”ovl测量方法
公开(公告)号：US20090303482A1
公开(公告)日：2009-12-10
申请号：US12455640
申请日：2009-06-04
申请人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
发明人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
IPC分类号： G01B11/00
CPC分类号： H01L21/67294 , H01L21/68
摘要： A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
摘要翻译：半导体晶片可以包括被配置为实现覆盖测量的虚拟场。增强的伪字段可以包括能够在增强的伪字段中进行OVL测量的多个编码块。

20. 发明授权

US07528953B2 Target acquisition and overlay metrology based on two diffracted orders imaging 有权
$Target acquisition and overlay metrology based on two diffracted orders imaging$
标题翻译：基于两个衍射成像的目标获取和覆盖计量
公开(公告)号：US07528953B2
公开(公告)日：2009-05-05
申请号：US11363755
申请日：2006-02-27
申请人： Aviv Frommer , Vladimir Levinski , Mark D. Smith , Jeffrey Byers , Chris A. Mack , Michael E. Adel
发明人： Aviv Frommer , Vladimir Levinski , Mark D. Smith , Jeffrey Byers , Chris A. Mack , Michael E. Adel
IPC分类号： G01B11/00 , G06K9/00
CPC分类号： G03F9/7049 , G03F7/70633 , G03F9/7088
摘要： In one embodiment, a system includes a beam generator for directing at least one incident beam having a wavelength λ towards a periodic target having structures with a specific pitch p. A plurality of output beams are scattered from the periodic target in response to the at least one incident beam. The system further includes an imaging lens system for passing only a first and a second output beam from the target. The imaging system is adapted such that the angular separation between the captured beams, λ, and the pitch are selected to cause the first and second output beams to form a sinusoidal image. The system also includes a sensor for imaging the sinusoidal image or images, and a controller for causing the beam generator to direct the at least one incident beam towards the periodic target or targets, and for analyzing the sinusoidal image or images.
摘要翻译：在一个实施例中，系统包括用于将具有波长λ的至少一个入射光束朝向具有特定间距p的结构的周期性目标的光束发生器。响应于至少一个入射光束，多个输出光束从周期性靶标散射。该系统还包括用于仅从目标通过第一和第二输出光束的成像透镜系统。成像系统被适配成使得捕获的光束λ和间距之间的角度间隔被选择为使得第一和第二输出光束形成正弦图像。该系统还包括用于对正弦图像或图像进行成像的传感器，以及控制器，用于使光束发生器将至少一个入射光束引向周期性目标或目标，并用于分析正弦图像或图像。

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