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    • 13. 发明授权
    • Light emitting device and illumination apparatus
    • 发光装置和照明装置
    • US08106584B2
    • 2012-01-31
    • US11721807
    • 2005-07-27
    • Tomoya TabuchiAkira MiyakeDaisuke Sakumoto
    • Tomoya TabuchiAkira MiyakeDaisuke Sakumoto
    • H01J1/62H01L21/00
    • H01L33/56H01L33/507H01L2224/13
    • A light emitting device includes a base on which a wiring conductor is formed from the top surface to the bottom surface or the side face; a light emitting chip mounted on the top surface of the base and electrically connected with the wiring conductor; a first light transmitting member which covers the light emitting chip; a second light transmitting member provided above the first light transmitting member to cover the first light transmitting member, the second light transmitting member being formed of a light transmitting material containing fluorescent materials for converting in wavelength the light emitted from the light emitting chip; and a third light transmitting member provided between the first and second light transmitting members, wherein the refractive index n1 of the first light transmitting member, the refractive index n2 of the second light transmitting member and the refractive index n3 of the third light transmitting member satisfy the relation: n3
    • 发光器件包括从顶表面到底表面或侧面形成布线导体的基底; 发光芯片安装在基座的顶表面上并与布线导体电连接; 覆盖发光芯片的第一透光构件; 第二透光构件,设置在第一透光构件上方以覆盖第一透光构件,第二透光构件由包含荧光材料的透光材料形成,用于使波长从发光芯片发射的光转换; 以及第三透光构件,设置在第一透光构件和第二透光构件之间,其中第一透光构件的折射率n1,第二透光构件的折射率n2和第三透光构件的折射率n3满足 关系:n3
    • 18. 发明申请
    • Apparatus for evalulating EUV light source, and evaluation method using the same
    • 用于评价EUV光源的装置及使用其的评价方法
    • US20070002474A1
    • 2007-01-04
    • US11082404
    • 2005-03-17
    • Mitsuaki AmemiyaAkira Miyake
    • Mitsuaki AmemiyaAkira Miyake
    • G02B5/08
    • G02B17/0631B82Y10/00G02B5/22G02B17/0642G02B17/0663G21K2201/061
    • Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.
    • 公开了一种用于测量EUV光源的聚光点的位置,大小和/或形状的测量装置。 在一个优选形式中,该装置包括用于接收从光会聚点发散的EUV光的光接收装置,用于将EUV光引向光接收装置的光学系统,设置在光路的一部分中的遮光构件,用于 EUV光并且具有多个开口,以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。 在另一个优选的实施例中,该装置包括用于接收从光会聚点发散的EUV光的光接收装置,设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统, 基于由光接收装置接收到的EUV光,在光会聚点检测EUV光的空间分布。
    • 19. 发明申请
    • X-ray generator and exposure apparatus having the same
    • X射线发生器和具有其的曝光装置
    • US20060138364A1
    • 2006-06-29
    • US11293284
    • 2005-12-01
    • Akira Miyake
    • Akira Miyake
    • G01J3/10
    • G03F7/7005B82Y10/00G03F7/70033
    • An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light sources and for reflecting the X-ray from one of the plural light sources to the illumination optical system, wherein an angle between a plane determined by an optical axis of the X-ray emitted from the reflector and a line that connects the plural light sources to the reflector, and a polarization plane on which an electric field vector oscillates is between 45° and 135°, the polarization plane maximizing a reflectance to the X-ray of the illumination optical system.
    • 将X射线引入照明光学系统的X射线发生器包括多个等离子体光源和可移动地布置在多个光源中的反射器,用于切换光源并从多个光中的一个反射X射线 来源于照明光学系统,其中由从反射器发射的X射线的光轴确定的平面与将多个光源连接到反射体的线之间的角度以及电场矢量 振荡在45°和135°之间,偏振平面使对照明光学系统的X射线的反射率最大化。