专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US07455747B2 Substrate processing apparatus, control method for the apparatus, and program for implementing the method 有权
标题翻译：基板处理装置，装置的控制方法和实现该方法的程序
公开(公告)号：US07455747B2
公开(公告)日：2008-11-25
申请号：US10984982
申请日：2004-11-10
申请人： Noriaki Shimizu , Masahiro Numakura
发明人： Noriaki Shimizu , Masahiro Numakura
IPC分类号： H01L21/306 , H01L21/67 , B05C11/00 , C23C16/00 , G06F19/00
CPC分类号： H01L21/67294 , H01L21/67276 , Y10S414/135
摘要： A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A transfer chamber transfers the semiconductor wafers. A FOUP (front opening unified pod) houses a plurality of dummy wafers for inspection of the processing chamber or the transfer chamber. A CPU causes an HDD (hard disk drive) to store a housing state relating to the arrangement of the dummy wafers in the FOUP before replacement of dummy wafers in the FOUP and that after the replacement as dummy wafer setup information.
摘要翻译：一种基板处理装置，根据该基板处理装置，可以在提高可靠性的同时进行基板处理装置中的各种装置的检查，同时减轻用户的负担。处理室在其中处理半导体晶片。传送室传送半导体晶片。 FOUP（前开口统一吊舱）容纳多个用于检查处理室或传送室的虚拟晶片。在更换FOUP中的虚拟晶片之前，CPU将硬盘（硬盘驱动器）存储与FOUP中的虚设晶片的布置相关的壳体状态，以及在替换之后的虚拟晶片设置信息。

12. 发明授权

US07367769B2 Semiconductor production system, cluster tool, control method of semiconductor production system and maintenance method of cluster tool 有权
标题翻译：半导体生产系统，集群工具，半导体生产系统的控制方法和集群工具的维护方法
公开(公告)号：US07367769B2
公开(公告)日：2008-05-06
申请号：US10471289
申请日：2002-03-18
申请人： Tomoyuki Ishii , Masahiro Numakura
发明人： Tomoyuki Ishii , Masahiro Numakura
IPC分类号： H01L21/677 , G06F7/00
CPC分类号： H01L21/67276 , G05B2219/45032 , Y10S414/139
摘要： PS control sections MC1, MC2 configured to independently control the operations in process ships PS1, PS2 are provided respectively, and an LM control section MC3 configured to control the operation in a loader module LM is provided independently.With this structure, the operations of the process ships PS1, PS2 and the loader module LM can be checked while the process ships PS1, PS2 are not coupled to the loader module LM.
摘要翻译：分别提供被配置为独立地控制处理船舶PS 1，PS 2中的操作的PS控制部分MC 1，MC 2，并且独立地提供被配置为控制加载器模块LM中的操作的LM控制部分MC 3。利用这种结构，可以在处理装置PS 1，PS 2未联接到装载机模块LM的同时检查处理船PS 1，PS 2和装载机模块LM的操作。

13. 发明授权

US09305814B2 Method of inspecting substrate processing apparatus and storage medium storing inspection program for executing the method 有权
标题翻译：检查基板处理装置的方法和存储用于执行该方法的检查程序的存储介质
公开(公告)号：US09305814B2
公开(公告)日：2016-04-05
申请号：US11311549
申请日：2005-12-20
申请人： Masahiro Numakura
发明人： Masahiro Numakura
IPC分类号： H01L21/67 , H01L21/677
CPC分类号： H01L21/67276 , H01L21/67167 , H01L21/67253 , H01L21/67745 , H01L21/67778
摘要： A method of inspecting a substrate processing apparatus, which is capable of preventing product substrates from being supplied to a substrate processing chamber to be inspected, and inspecting the substrate processing chamber in desired timing. Product wafers W (product substrates) are inhibited from being conveyed into a processing unit to be inspected (substrate processing chamber) according to a selection of a menu option “QC MODE” by an operator, or in response to instruction from a host computer. A QC wafer is permitted to be conveyed from a carrier connected to an associated load port 24 into the processing unit to be inspected, in response to a notification the fact that a wafer stored in the carrier connected to the associated load port 24 is the QC wafer.
摘要翻译：检查基板处理装置的方法，该基板处理装置能够防止将产品基板供给到要检查的基板处理室，并且以期望的时刻检查基板处理室。根据操作者的菜单选项“QC MODE”的选择，或响应于来自主计算机的指示，抑制产品晶片W（产品基板）被输送到要检查的处理单元（基板处理室）中。响应于通知存储在与相关联的负载端口24连接的载体中的晶片为QC的事实，允许QC晶片从连接到相关联的负载端口24的载体传送到待检查的处理单元晶圆。

14. 发明授权

US08731698B2 Substrate receiving method and controller 有权
标题翻译：基板接收方式和控制器
公开(公告)号：US08731698B2
公开(公告)日：2014-05-20
申请号：US12762426
申请日：2010-04-19
申请人： Shinobu Onodera , Masahiro Numakura
发明人： Shinobu Onodera , Masahiro Numakura
IPC分类号： G06F17/00
CPC分类号： H01L21/67778 , H01L21/67069 , H01L21/67196 , H01L21/67213
摘要： A substrate receiving method in a substrate processing system includes: a processing process of transferring a plurality of unprocessed substrates accommodated in a first substrate storage container to a substrate processing chamber in sequence and performing a plasma process on the unprocessed substrates in the substrate processing chamber; a retreating process of retreating the plasma-processed substrates temporarily to a second substrate storage container by transferring the plasma-processed substrates to the second substrate storage container in sequence; a determining process of determining whether or not the last unprocessed substrate is unloaded from the first substrate storage container; and a re-accommodating process of transferring and re-accommodating the plurality of the processed substrates accommodated in the second substrate storage container into the first substrate storage container in sequence when a substrate decided as the last unprocessed substrate is unloaded in the determining process.
摘要翻译：衬底处理系统中的衬底接收方法包括：依次将容纳在第一衬底存储容器中的多个未处理衬底转移到衬底处理室的处理过程，并对衬底处理室中的未处理衬底执行等离子体处理; 通过将等离子体处理的基板顺序地转印到第二基板存储容器，将等离子体处理的基板暂时退回到第二基板存储容器的后退处理; 确定最后未处理的基板是否从第一基板存储容器卸载的确定过程; 以及当确定为最后未处理的基板的基板在所述确定过程中被卸载时，将容纳在所述第二基板存储容器中的所述多个处理过的基板顺序地转移和再容纳到所述第一基板存储容器中的再容纳处理。

15. 发明申请

US20100268364A1 SUBSTRATE RECEIVING METHOD AND CONTROLLER 有权
标题翻译：基板接收方法和控制器
公开(公告)号：US20100268364A1
公开(公告)日：2010-10-21
申请号：US12762426
申请日：2010-04-19
申请人： Shinobu Onodera , Masahiro Numakura
发明人： Shinobu Onodera , Masahiro Numakura
IPC分类号： G06F17/00
CPC分类号： H01L21/67778 , H01L21/67069 , H01L21/67196 , H01L21/67213
摘要： A substrate receiving method in a substrate processing system includes: a processing process of transferring a plurality of unprocessed substrates accommodated in a first substrate storage container to a substrate processing chamber in sequence and performing a plasma process on the unprocessed substrates in the substrate processing chamber; a retreating process of retreating the plasma-processed substrates temporarily to a second substrate storage container by transferring the plasma-processed substrates to the second substrate storage container in sequence; a determining process of determining whether or not the last unprocessed substrate is unloaded from the first substrate storage container; and a re-accommodating process of transferring and re-accommodating the plurality of the processed substrates accommodated in the second substrate storage container into the first substrate storage container in sequence when a substrate decided as the last unprocessed substrate is unloaded in the determining process.
摘要翻译：衬底处理系统中的衬底接收方法包括：依次将容纳在第一衬底存储容器中的多个未处理衬底转移到衬底处理室的处理过程，并对衬底处理室中的未处理衬底执行等离子体处理; 通过将等离子体处理的基板顺序地转印到第二基板存储容器，将等离子体处理的基板暂时退回到第二基板存储容器的后退处理; 确定最后未处理的基板是否从第一基板存储容器卸载的确定过程; 以及当确定为最后未处理的基板的基板在所述确定过程中被卸载时，将容纳在所述第二基板存储容器中的所述多个处理过的基板顺序地转移和再容纳到所述第一基板存储容器中的再容纳处理。

16. 发明申请

US20080228311A1 SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD FOR THE APPARATUS, AND PROGRAM FOR IMPLEMENTING THE METHOD 有权
标题翻译：基板处理装置，装置的控制方法和实现方法的程序
公开(公告)号：US20080228311A1
公开(公告)日：2008-09-18
申请号：US12125959
申请日：2008-05-23
申请人： Noriaki SHIMIZU , Masahiro Numakura
发明人： Noriaki SHIMIZU , Masahiro Numakura
IPC分类号： H01L21/02 , G06F19/00 , H01L21/677
CPC分类号： H01L21/67294 , H01L21/67276 , Y10S414/135
摘要： A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A transfer chamber transfers the semiconductor wafers. A FOUP (front opening unified pod) houses a plurality of dummy wafers for inspection of the processing chamber or the transfer chamber. A CPU causes an HDD (hard disk drive) to store a housing state relating to the arrangement of the dummy wafers in the FOUP before replacement of dummy wafers in the FOUP and that after the replacement as dummy wafer setup information.
摘要翻译：一种基板处理装置，根据该基板处理装置，可以在提高可靠性的同时进行基板处理装置中的各种装置的检查，同时减轻用户的负担。处理室在其中处理半导体晶片。传送室传送半导体晶片。 FOUP（前开口统一吊舱）容纳多个用于检查处理室或传送室的虚拟晶片。在更换FOUP中的虚拟晶片之前，CPU将硬盘（硬盘驱动器）存储与FOUP中的虚设晶片的布置相关的壳体状态，以及在替换之后的虚拟晶片设置信息。

17. 发明申请

US20060181699A1 Method of inspecting substrate processing apparatus and storage medium storing inspection program for executing the method 有权
标题翻译：检查基板处理装置的方法和存储用于执行该方法的检查程序的存储介质
公开(公告)号：US20060181699A1
公开(公告)日：2006-08-17
申请号：US11311549
申请日：2005-12-20
申请人： Masahiro Numakura
发明人： Masahiro Numakura
IPC分类号： G01N21/00
CPC分类号： H01L21/67276 , H01L21/67167 , H01L21/67253 , H01L21/67745 , H01L21/67778
摘要： A method of inspecting a substrate processing apparatus, which is capable of preventing product substrates from being supplied to a substrate processing chamber to be inspected, and inspecting the substrate processing chamber in desired timing. Product wafers W (product substrates) are inhibited from being conveyed into a processing unit to be inspected (substrate processing chamber) according to a selection of a menu option “QC MODE” by an operator, or in response to instruction from a host computer. A QC wafer is permitted to be conveyed from a carrier connected to an associated load port 24 into the processing unit to be inspected, in response to a notification the fact that a wafer stored in the carrier connected to the associated load port 24 is the QC wafer.
摘要翻译：检查基板处理装置的方法，该基板处理装置能够防止将产品基板供给到要检查的基板处理室，并且以期望的时刻检查基板处理室。根据操作者的菜单选项“QC MODE”的选择，或响应于来自主计算机的指示，抑制产品晶片W（产品基板）被输送到要检查的处理单元（基板处理室）中。响应于通知存储在与相关联的负载端口24连接的载体中的晶片为QC的事实，允许QC晶片从连接到相关联的负载端口24的载体传送到待检查的处理单元晶圆。

18. 发明申请

US20050129839A1 Substrate processing apparatus and substrate processing method 审中-公开
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20050129839A1
公开(公告)日：2005-06-16
申请号：US10987035
申请日：2004-11-15
申请人： Masahiro Numakura
发明人： Masahiro Numakura
IPC分类号： H01L21/00 , B05D5/12
CPC分类号： H01L21/67276 , G05B2219/31041 , Y02P90/04
摘要： In a controller MC, information on a process room (PM) (last process PM) which carried out a process last for the previous lot is stored. When starting processing for the current lot, the semiconductor wafers Ware loaded in process rooms, beginning with the process room next to the last process PM (for example, a process room (PM2) when the last process PM is a process room (PM1)). This allows the processing sections to be used evenly and minimizes variations in maintenance cycles and in the wearing of parts in the processing sections.
摘要翻译：在控制器MC中，存储执行了前一批次的处理的处理室（PM）（最后处理PM）的信息。当开始处理当前批次时，半导体晶圆零件装载在处理室中，从最后一个过程PM旁边的过程室开始（例如，最后一个过程PM为处理室的过程室（PM 2）（PM 1））。这允许处理部分被均匀地使用并且最小化维护周期的变化以及处理部件中部件的磨损。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式