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11. 发明授权

US09594306B2 Lithographic apparatus, spectral purity filter and device manufacturing method 有权
标题翻译：平版印刷设备，光谱纯度滤光片和器件制造方法
公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20 , B82Y10/00 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

12. 发明申请

US20110223543A1 RADIATION SYSTEM, RADIATION COLLECTOR, RADIATION BEAM CONDITIONING SYSTEM, SPECTRAL PURITY FILTER FOR RADIATION SYSTEM AND METHOD FOR FORMING A SPECTRAL PURITY FILTER 有权
标题翻译：辐射系统，辐射收集器，辐射束调节系统，辐射系统的光谱滤光器和形成光谱滤光片的方法
公开(公告)号：US20110223543A1
公开(公告)日：2011-09-15
申请号：US12994930
申请日：2009-05-05
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70575
摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.
摘要翻译：辐射系统被配置为产生辐射束。所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

13. 发明申请

US20110170078A1 Projection System and Lithographic Apparatus 有权
标题翻译：投影系统和平版印刷设备
公开(公告)号：US20110170078A1
公开(公告)日：2011-07-14
申请号：US13061792
申请日：2009-07-17
申请人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
发明人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70825
摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译：提供了一种投影系统（PS），在一个实施例中包括两个帧。投影系统的光学元件安装在第一框架（200）上。使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。第二测量系统（920）用于测量与第二帧的变形相关联的参数。由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。通常，框架的变形是由于共振振荡和热膨胀。具有两个框架使得投影系统的光学元件能够以高精确度定位。可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

14. 发明授权

US07375799B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07375799B2
公开(公告)日：2008-05-20
申请号：US11065349
申请日：2005-02-25
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a detector for measuring the intensity of the radiation after it has passed through the projection system. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable; and a polarization analyzer, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements, using the detector, for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及用于在辐射通过投影系统之后测量辐射强度的检测器。该装置还包括可调节的诸如四分之一波片的偏振变化元件; 以及诸如线性偏振器的偏振分析器，其中偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。通过采用强度测量，使用检测器，对于偏振变化元件的不同的旋转取向，可以获得关于在图案形成装置的电平处的辐射的偏振状态的信息。由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。

15. 发明授权

US07245355B2 Lithographic apparatus, device manufacturing method 有权
公开(公告)号：US07245355B2
公开(公告)日：2007-07-17
申请号：US11246549
申请日：2005-10-11
申请人： Johannes Catharinus Hubertus Mulkens , Wilhelmus Petrus De Boeij , Carsten Andreas Kohler
发明人： Johannes Catharinus Hubertus Mulkens , Wilhelmus Petrus De Boeij , Carsten Andreas Kohler
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0043 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.

16. 发明授权

US06650399B2 Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations 有权
标题翻译：平版印刷设备，光栅模块，传感器模块，测量波前像差的方法
公开(公告)号：US06650399B2
公开(公告)日：2003-11-18
申请号：US10073119
申请日：2002-02-12
申请人： Johannes Jacobus Matheus Baselmans , Marco Hugo Petrus Moers , Hans Van Der Laan , Robert Wilhelm Willekers , Wilhelmus Petrus De Boeij , Marcus Adrianus Van De Kerkhof
发明人： Johannes Jacobus Matheus Baselmans , Marco Hugo Petrus Moers , Hans Van Der Laan , Robert Wilhelm Willekers , Wilhelmus Petrus De Boeij , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B2742
CPC分类号： G01M11/0264 , G01M11/0285 , G03F7/706
摘要： A lithographic projection apparatus including an illumination system; a support structure for holding a mask; a substrate table for holding a substrate; a projection system for projecting a pattern onto a target portion of the substrate; and an interferometric measurement system for measuring wave front aberrations of the projection system, characterized in that the interferometric measurement system including: a grating, featuring a grating pattern in a grating plane, said grating being movable into and out of the projection beam, such that the grating plane is substantially coincident with said object plane; a pinhole, featuring a pinhole pattern in a pinhole plane and arranged in a pinhole plate, said pinhole being movable into and out of the projection beam, such that the pinhole plane is substantially coincident with a plane downstream of the projection system and optically conjugate to said object plane, and a detector with a detector surface substantially coincident with a detection plane, said detection plane located downstream of the pinhole at a location where a spatial distribution of the electric field amplitude of the projection beam is substantially a Fourier transformation of a spatial distribution of the electric field amplitude of the projection beam in the pinhole plane.
摘要翻译：一种光刻投影装置，包括照明系统; 用于保持面罩的支撑结构; 用于保持衬底的衬底台; 投影系统，用于将图案投影到所述基板的目标部分上; 以及用于测量所述投影系统的波前像差的干涉测量系统，其特征在于，所述干涉测量系统包括：光栅，其特征在于光栅平面中的光栅图案，所述光栅可移入和移出所述投影光束，使得光栅平面基本上与所述物平面重合; 针孔，其具有针孔平面中的针孔图案并且布置在针孔板中，所述针孔可移动进入和离开投影梁，使得针孔平面基本上与投影系统的下游平面重合，并且与光学共轭所述物体平面和检测器表面基本上与检测平面重合的检测器，所述检测平面位于所述针孔的下游，所述位置处投影光束的电场振幅的空间分布基本上是空间的傅立叶变换投影光束在针孔平面中的电场振幅分布。

17. 发明授权

US09164401B2 Projection system and lithographic apparatus 有权
标题翻译：投影系统和光刻设备
公开(公告)号：US09164401B2
公开(公告)日：2015-10-20
申请号：US13061792
申请日：2009-07-17
申请人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus De Jongh , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
发明人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus De Jongh , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70825
摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译：提供了一种投影系统（PS），在一个实施例中包括两个帧。投影系统的光学元件安装在第一框架（200）上。使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。第二测量系统（920）用于测量与第二帧的变形相关联的参数。由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。通常，框架的变形是由于共振振荡和热膨胀。具有两个框架使得投影系统的光学元件能够以高精确度定位。可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

18. 发明授权

US09097982B2 Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter 有权
标题翻译：辐射系统，辐射收集器，辐射束调节系统，辐射系统光谱纯度滤波器和形成光谱纯度滤光片的方法
公开(公告)号：US09097982B2
公开(公告)日：2015-08-04
申请号：US12994930
申请日：2009-05-05
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70575
摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.
摘要翻译：辐射系统被配置为产生辐射束。所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

19. 发明申请

US20140085619A1 Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method 有权
标题翻译：光刻设备，光谱纯化过滤器和器件制造方法
公开(公告)号：US20140085619A1
公开(公告)日：2014-03-27
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

20. 发明申请

US20120262690A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD 审中-公开
标题翻译：照明系统，光刻设备和照明方法
公开(公告)号：US20120262690A1
公开(公告)日：2012-10-18
申请号：US13518301
申请日：2010-11-29
申请人： Wilhelmus Petrus De Boeij , Erik Roelof Loopstra , Uwe Mickan , Jan Bernard Plechelmus Van Schoot , Gosse Charles De Vries
发明人： Wilhelmus Petrus De Boeij , Erik Roelof Loopstra , Uwe Mickan , Jan Bernard Plechelmus Van Schoot , Gosse Charles De Vries
IPC分类号： G03B27/54
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.
摘要翻译：照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从瞳孔面反射镜。

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