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11. 发明授权

US06280895B1 Light-receiving member with outer layer made by alternatively forming and etching 有权
标题翻译：具有通过交替形成和蚀刻制成的外层的光接收构件
公开(公告)号：US06280895B1
公开(公告)日：2001-08-28
申请号：US09361804
申请日：1999-07-27
申请人： Shigenori Ueda , Junichiro Hashizume , Makoto Aoki , Shinji Tsuchida
发明人： Shigenori Ueda , Junichiro Hashizume , Makoto Aoki , Shinji Tsuchida
IPC分类号： G03G1504
CPC分类号： C23C16/44 , G03G5/08235 , G03G5/08264 , G03G5/08278
摘要： In a reactor capable of reducing an internal pressure thereof, a non-single-crystalline material layer containing at least one kind of carbon atoms, hydrogen atoms or nitrogen atoms is formed and etched on a non-single-crystalline photoconductive layer mainly composed of silicon atoms, formed on a substrate, under application of a high-frequency power of 50 MHz to 450 MHz, and the formation and the etching are alternately repeated plural times to form a surface layer. A light-receiving member having such a surface layer does not damage cleaning performance over a long period of time, hardly allows adhesion of corona discharge products, and can be free from faint images, smeared images and uneven image density even if no heating means for the drum is provided.
摘要翻译：在能够降低其内部压力的反应器中，形成含有至少一种碳原子，氢原子或氮原子的非单晶材料层，并在主要由硅构成的非单晶光电导层上进行蚀刻原子，形成在基板上，在施加50MHz至450MHz的高频功率下，并且形成和蚀刻交替重复多次以形成表面层。具有这种表面层的光接收元件不会长时间损坏清洁性能，即使没有提供用于鼓的加热装置，几乎不允许电晕放电产物的粘附，并且可以没有微弱的图像，模糊图像和不均匀的图像密度。

12. 发明授权

US6001521A Electrophotographic photosensitive member 失效
标题翻译：电子照相感光构件
公开(公告)号：US6001521A
公开(公告)日：1999-12-14
申请号：US178884
申请日：1998-10-27
申请人： Junichiro Hashizume , Shigenori Ueda , Makoto Aoki
发明人： Junichiro Hashizume , Shigenori Ueda , Makoto Aoki
IPC分类号： G03G5/082 , G03G5/147 , G03G5/047
CPC分类号： G03G5/08221 , G03G5/08285 , G03G5/14704
摘要： For providing an electrophotographic photosensitive member that can always maintain good images without occurrence of fusion of toner, independent of the circumstances and the combination of urging pressure of a cleaner, process speed, components contained in toner, etc. and that can always maintain good images of high resolution and even density without occurrence of uneven shaving against a cleaning system or toner, the outermost surface thereof is comprised of a non-monocrystalline carbon film comprising hydrogen and having a dynamic hardness not less than 300 kgf/mm.sup.2 nor more than 1300 kgf/mm.sup.2 measured using a diamond stylus of a triangular pyramid having a tip of a radius not more than 0.1 .mu.m and an edge-to-edge angle of 115.degree., or the outermost surface thereof is comprised of a non-monocrystalline carbon film comprising hydrogen and having a critical load at rupture of the film not less than 50 mN and not more than 700 mN measured when exerting a load on a diamond stylus having a tip of a radius not more than 15 .mu.m while moving the stylus at an amplitude of 20 to 100 .mu.m, an oscillation frequency of 30 Hz, and a feed rate of 2 to 20 .mu.m/sec.
摘要翻译：为了提供电子照相感光构件，其可以始终保持良好的图像，而不会发生调色剂的融合，而与情况无关，并且清洁剂的施加压力，处理速度，包含在调色剂中的组分等的组合并且可以始终保持良好的图像高分辨率和均匀的密度，而不会对清洁系统或调色剂产生不均匀的剃刮，其最外表面由包含氢的非单晶碳膜组成，动态硬度不小于300kgf / mm2，不大于1300kgf / mm2由具有半径不大于0.1μm的尖端和115°的边缘到边缘角度的三角锥形金刚石触针测量，或其最外表面由非单晶碳膜组成，所述非单晶碳膜包括氢气，并且当在金刚石触针板上施加负载时测量的薄膜破裂时的临界负载不小于50mN且不大于700mN 在20至100微米的振幅移动触针，振荡频率为30Hz，进给速度为2至20微米/秒的同时，将半径不超过15微米的尖端。

13. 发明授权

US5976745A Photosensitive member for electrophotography and fabrication process thereof 失效
标题翻译：电子照相用感光体及其制造方法
公开(公告)号：US5976745A
公开(公告)日：1999-11-02
申请号：US924309
申请日：1997-09-05
申请人： Makoto Aoki , Shigenori Ueda , Junichiro Hashizume
发明人： Makoto Aoki , Shigenori Ueda , Junichiro Hashizume
IPC分类号： G03G5/08 , G03G5/082 , G03G5/147
CPC分类号： G03G5/08221 , G03G5/08285 , G03G5/14704
摘要： With a plasma being generated between a cathode electrode to which a high-frequency power is applied and an electrically conductive substrate opposed to the electrode in a reaction vessel the pressure of which can be reduced, a photoconductive layer having the matrix of silicon atoms is deposited on a substrate to be processed, a surface layer comprised of non-monocrystal carbon containing hydrogen is provided on the photoconductive layer, a surface of the surface layer is etched to fluorinate the surface, the surface roughness Rz by etching is controlled below 1000 .ANG., the fluorine contained in the surface layer is made present within 50 .ANG. from the surface, and the concentration of fluorine to carbon in that region is 20% or more, thereby providing a photosensitive member for electrophotography that can obtain high-quality images free of image faintness and image smearing without using a heating means for the photosensitive member, that has high durability, that shows less change in potential characteristics, that can obtain high-quality images on a stable basis, and that is free of the ghost phenomenon and providing a fabrication process of the photosensitive member.
摘要翻译：通过在施加高频功率的阴极电极和反应容器内与电极相对的导电基板之间产生等离子体，其压力可以降低，沉积具有硅原子基体的光电导层在待加工的基板上，在光电导层上设置由非单晶碳构成的表面层，表面层的表面被蚀刻以氟化表面，通过蚀刻将表面粗糙度Rz控制在1000以下，表面层中所含的氟使表面存在于50以内，并且该区域中氟与碳的浓度为20％以上，从而提供可获得无图像的高质量图像的电子照相用感光体没有使用用于感光构件的加热装置，具有高耐久性的微弱和图像涂抹，其显示出来电位特性的变化，可以在稳定的基础上获得高质量的图像，并且没有重影现象并提供感光构件的制造工艺。

14. 发明授权

US06410102B1 Plasma process method 失效
标题翻译：等离子体工艺方法
公开(公告)号：US06410102B1
公开(公告)日：2002-06-25
申请号：US08874584
申请日：1997-06-13
申请人： Junichiro Hashizume , Shigenori Ueda , Makoto Aoki
发明人： Junichiro Hashizume , Shigenori Ueda , Makoto Aoki
IPC分类号： C23C1456
CPC分类号： H01J37/32082 , C23C16/4405 , C23C16/5093
摘要： A plasma process, which can fabricate a deposition film in short time and at low cost, which can fabricate a deposition film with excellent reproducibility, which can greatly decrease the cleaning time upon cleaning, and which is optimum for fabricating a deposit film, especially a photosensitive member for electrophotography, capable of achieving a high charge potential upon electrification and capable of obtaining clear images with less image defects, is arranged such that a raw-material gas comprising silicon is introduced into a deposition chamber while evacuating the deposition chamber capable of being kept airtight in a vacuum, the raw-material gas is decomposed by high-frequency power in the VHF band, film formation is carried out to form a deposit film on a substrate installed in the deposition chamber, and thereafter cleaning inside the deposition chamber is carried out by etching and removing a deposit film depositing inside the deposition chamber, using a gas containing at least fluorine and using high-frequency power of a frequency lower than the VHF band.
摘要翻译：一种等离子体工艺，其可以在短时间和低成本下制造沉积膜，其可以制造具有优异再现性的沉积膜，这可以大大降低清洁时的清洗时间，并且其最适于制造沉积膜，特别是能够在充电时实现高电荷电位并且能够获得具有较少图像缺陷的清晰图像的电子照相用感光构件被布置成使得包含硅的原料气体被引入沉积室，同时抽真空沉积室在真空中保持气密，原料气体在VHF带中被高频功率分解，进行成膜以在安装在沉积室中的基板上形成沉积膜，然后在沉积室内进行清洗通过蚀刻和去除沉积在沉积室内的沉积膜，使用含有l的气体进行东氟，使用频率低于VHF频段的高频功率。

15. 发明授权

US5958644A Process to form light-receiving member with outer layer made by alternately forming and etching 失效
标题翻译：通过交替成形和蚀刻形成外层的光接收元件的工艺
公开(公告)号：US5958644A
公开(公告)日：1999-09-28
申请号：US637188
申请日：1996-04-24
申请人： Shigenori Ueda , Junichiro Hashizume , Makoto Aoki , Shinji Tsuchida
发明人： Shigenori Ueda , Junichiro Hashizume , Makoto Aoki , Shinji Tsuchida
IPC分类号： G03G5/08 , C23C16/44 , C23F4/00 , G03G5/082 , H01L21/302 , H01L21/3065 , H01L31/08 , G03G5/00
CPC分类号： C23C16/44 , G03G5/08235 , G03G5/08264 , G03G5/08278
摘要： In a reactor capable of reducing an internal pressure thereof, a non-single-crystalline material layer containing at least one kind of carbon atoms, hydrogen atoms or nitrogen atoms is formed and etched on a non-single-crystalline photoconductive layer mainly composed of silicon atoms, formed on a substrate, under application of a high-frequency power of 50 MHz to 450 MHz, and the formation and the etching are alternately repeated plural times to form a surface layer.A light-receiving member having such a surface layer does not damage cleaning performance over a long period of time, hardly allows adhesion of corona discharge products, and can be free from faint images, smeared images and uneven image density even if no heating means for the drum is provided.
摘要翻译：在能够降低其内部压力的反应器中，形成含有至少一种碳原子，氢原子或氮原子的非单晶材料层，并在主要由硅构成的非单晶光电导层上进行蚀刻原子，在50MHz〜450MHz的高频功率下，在基板上形成，并且形成和蚀刻交替重复多次以形成表面层。具有这种表面层的光接收部件长时间不损坏清洗性能，几乎不能使电晕放电产物附着，并且即使没有加热装置，也不会产生微弱的图像，模糊图像和不均匀的图像浓度提供鼓。

16. 发明授权

US5849446A Light receiving member having a surface protective layer with a specific outermost surface and process for the production thereof 失效
标题翻译：具有具有特定最外表面的表面保护层的光接收元件及其制造方法
公开(公告)号：US5849446A
公开(公告)日：1998-12-15
申请号：US785862
申请日：1997-01-21
申请人： Junichiro Hashizume , Shigenori Ueda , Makoto Aoki
发明人： Junichiro Hashizume , Shigenori Ueda , Makoto Aoki
IPC分类号： G03G5/08 , C23C16/26 , C23C16/56 , G03G5/043 , G03G5/082 , G03G5/147
CPC分类号： C23C16/56 , C23C16/26 , G03G5/0433 , G03G5/08221 , G03G5/08285 , G03G5/14704
摘要： A light receiving member comprising a electrically conductive substrate, a photoconductive layer composed of a non-single crystalline material containing at least silicon atoms as a matrix formed on said substrate by decomposing a silicon-containing raw material gas, and a surface protective layer composed of a non-single crystalline carbon material containing hydrogen formed on said photoconductive layer by decomposing a raw material gas comprising at least a hydrocarbon using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz, wherein a 20 .ANG. or more thick surface side layer region of said surface protective layer composed of said non-single crystalline carbon material is etched at an etching speed of 0.1 to 50 .ANG./sec. by means of a fluorine-containing plasma produced by decomposing a fluorine-containing gas using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz such that said surface protective layer has a thickness of 100 to 10000 .ANG. and has an etched surface deposited with fluorine atoms so as to cover said etched surface. And a process for producing said light receiving member.
摘要翻译：一种光接收元件，包括导电衬底，由至少含有硅原子作为基质的非单晶材料构成的光电导层，其通过分解含硅原料气体而形成在所述衬底上，以及表面保护层由通过使用振荡频率为50MHz至450MHz的高频功率分解至少包含烃的原料气体，在所述光电导层上形成含有氢的非单晶碳材料，其中20或更厚的表面侧以0.1至50安培/秒的蚀刻速度蚀刻由所述非单晶碳材料构成的所述表面保护层的层区域。通过使用振荡频率为50MHz〜450MHz的高频功率分解含氟气体而制成的含氟等离子体，使得所述表面保护层的厚度为100〜10000，具有蚀刻面沉积有氟原子以覆盖所述蚀刻表面。以及用于制造所述光接收元件的工艺。

17. 发明授权

US07033717B2 Process for producing electrophotographic photosensitive member, and electrophotographic photosensitive member and electrophotographic apparatus making use of the same 失效
标题翻译：用于制造电子照相感光构件的方法和使用其的电子照相感光构件和电子照相设备
公开(公告)号：US07033717B2
公开(公告)日：2006-04-25
申请号：US10630772
申请日：2003-07-31
申请人： Satoshi Kojima , Toshiyuki Ehara , Hideaki Matsuoka , Junichiro Hashizume , Ryuji Okamura , Koji Hitsuishi , Hironori Ohwaki , Kazuto Hosoi
发明人： Satoshi Kojima , Toshiyuki Ehara , Hideaki Matsuoka , Junichiro Hashizume , Ryuji Okamura , Koji Hitsuishi , Hironori Ohwaki , Kazuto Hosoi
IPC分类号： G03G15/04
CPC分类号： G03G5/08221 , G03G5/08278
摘要： An electrophotographic photosensitive member production process is provided having the steps of placing a cylindrical substrate having a conductive surface in a first film-forming chamber, and decomposing a source gas with high-frequency power to deposit on the cylindrical substrate a first layer formed of a non-single-crystal material, taking out of the first film-forming chamber the cylindrical substrate with the first layer deposited thereon, and placing the cylindrical substrate with the first layer deposited thereon in a second film-forming chamber, and decomposing a source gas with a high-frequency power to deposit on the first layer a second layer having an upper-part blocking layer formed of a non-single-crystal material. Even where abnormal growth portions called spherical protuberances are present on the photosensitive member surface, they can be made not to appear on images, and image defects can vastly be remedied.
摘要翻译：提供一种电子照相感光构件制造方法，其具有以下步骤：将具有导电表面的圆柱形基材放置在第一成膜室中，并且以高频电力分解源气体以沉积在圆柱形基板上，形成第一层非单晶材料，从第一成膜室取出其上沉积有第一层的圆柱形基板，并将其上沉积有第一层的圆柱形基板放置在第二成膜室中，并将源气体具有高频功率以在第一层上沉积具有由非单晶材料形成的上部阻挡层的第二层。即使在感光构件表面上存在称为球形隆起物的异常生长部分，也可以使其不会出现在图像上，并且可以大大地补救图像缺陷。

18. 发明授权

US06846600B2 Electrophotographic photosensitive member, process for its production, and electrophotographic apparatus 有权
标题翻译：电子照相感光构件，其制造方法和电子照相设备
公开(公告)号：US06846600B2
公开(公告)日：2005-01-25
申请号：US10059139
申请日：2002-01-31
申请人： Toshiyuki Ehara , Junichiro Hashizume , Masaya Kawada , Tetsuya Karaki , Hironori Ohwaki , Kunimasa Kawamura , Ryuji Okamura , Kazuto Hosoi
发明人： Toshiyuki Ehara , Junichiro Hashizume , Masaya Kawada , Tetsuya Karaki , Hironori Ohwaki , Kunimasa Kawamura , Ryuji Okamura , Kazuto Hosoi
IPC分类号： G03G5/08 , G03G5/082 , G03G5/147 , H01L21/311
CPC分类号： G03G5/08221 , G03G5/08 , G03G5/08214 , G03G5/08235 , G03G5/08285 , G03G5/14704
摘要： A process for producing an electrophotographic photosensitive member comprising the steps of depositing a non-single crystal material composed basically of silicon atoms, on a cylindrical substrate in a deposition chamber, thereafter once taking the substrate with film out of the deposition chamber, then returning it to the deposition chamber, and thereafter again depositing thereon a non-single-crystal material composed basically of carbon atoms. In another embodiment, the process comprises the steps of depositing on a cylindrical substrate a photoconductive layer formed of a non-single crystal material, subjecting to surface processing the deposited film having protrusions present at its surface, and depositing on the processed surface a surface protective layer formed of a non-single-crystal material. Also disclosed is the electrophotographic photosensitive member thus obtained, and an electrophotographic apparatus having that member.
摘要翻译：一种用于制造电子照相感光构件的方法，包括以下步骤：将沉积室中的基本上由硅原子组成的非单晶材料沉积在圆柱形衬底上，然后一次将基片用薄膜从沉积室中取出，然后返回然后再沉积到基本上由碳原子组成的非单晶材料上。在另一个实施方案中，该方法包括以下步骤：在圆柱形基材上沉积由非单晶材料形成的光电导层，对其表面具有突起的沉积膜进行表面处理，并在处理表面上沉积表面由非单晶材料形成的保护层。还公开了如此获得的电子照相感光构件和具有该构件的电子照相设备。

19. 发明授权

US5849455A Plasma processing method and plasma processing apparatus 失效
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US5849455A
公开(公告)日：1998-12-15
申请号：US571784
申请日：1995-12-13
申请人： Shigenori Ueda , Junichiro Hashizume , Shinji Tsuchida
发明人： Shigenori Ueda , Junichiro Hashizume , Shinji Tsuchida
IPC分类号： G03G5/08 , C23C16/24 , C23C16/50 , C23C16/509 , H01J37/32 , H01L21/205 , G03G5/00 , A01K15/04 , A61D3/00 , H05H1/02
CPC分类号： H01J37/32082 , C23C16/509 , C23C16/5093 , G03G5/08214 , G03G5/08278 , H01J37/32706
摘要： A plasma processing method and a plasma processing apparatus are provided in which a deposition film is formed, on a substrate serving also as an electrode, by application of high frequency power ranging from 20 MHz to 450 MHz with simultaneous application of DC voltage ranging from 30 to 300 V or -30 to -300 V and/or AC voltage ranging from 30 to 600 V to the substrate in an evacuatable reaction chamber. This method make it practicable to uniformize the plasma and the film thickness distribution independently of the discharge frequency and the applied high frequency power, thereby broadening the allowable range of conditions of the processing such as film formation and the allowable range of the design of the apparatus.
摘要翻译：提供一种等离子体处理方法和等离子体处理装置，其中通过施加20MHz至450MHz的高频功率，在同时作为电极的基板上形成沉积膜，同时施加30V的直流电压在可抽空的反应室中至300V或-30至-300V和/或AC至30V至600V的电压。该方法使得等离子体的均匀化和膜厚分布与喷射频率和施加的高频功率无关，从而扩大了成膜的处理条件的允许范围和设备的允许范围。

20. 发明申请

US20050153223A1 Process for producing electrophotographic photosensitive member, and electrophotographic photosensitive member and electrophotographic apparatus making use of the same 失效
标题翻译：用于制造电子照相感光构件的方法和使用其的电子照相感光构件和电子照相设备
公开(公告)号：US20050153223A1
公开(公告)日：2005-07-14
申请号：US10630772
申请日：2003-07-31
申请人： Satoshi Kojima , Toshiyuki Ehara , Hideaki Matsuoka , Junichiro Hashizume , Ryuji Okamura , Koji Hitsuishi , Hironori Ohwaki , Kazuto Hosoi
发明人： Satoshi Kojima , Toshiyuki Ehara , Hideaki Matsuoka , Junichiro Hashizume , Ryuji Okamura , Koji Hitsuishi , Hironori Ohwaki , Kazuto Hosoi
IPC分类号： G03G5/082 , G03G15/04
CPC分类号： G03G5/08221 , G03G5/08278
摘要： An electrophotographic photosensitive member production process is provided having the steps of placing a cylindrical substrate having a conductive surface in a first film-forming chamber, and decomposing a source gas with high-frequency power to deposit on the cylindrical substrate a first layer formed of a non-single-crystal material, taking out of the first film-forming chamber the cylindrical substrate with the first layer deposited thereon, and placing the cylindrical substrate with the first layer deposited thereon in a second film-forming chamber, and decomposing a source gas with a high-frequency power to deposit on the first layer a second layer having an upper-part blocking layer formed of a non-single-crystal material. Even where abnormal growth portions called spherical protuberances are present on the photosensitive member surface, they can be made not to appear on images, and image defects can vastly be remedied.
摘要翻译：提供一种电子照相感光构件制造方法，其具有以下步骤：将具有导电表面的圆柱形基材放置在第一成膜室中，并且以高频电力分解源气体以沉积在圆柱形基板上，形成第一层非单晶材料，从第一成膜室取出其上沉积有第一层的圆柱形基板，并将其上沉积有第一层的圆柱形基板放置在第二成膜室中，并将源气体具有高频功率以在第一层上沉积具有由非单晶材料形成的上部阻挡层的第二层。即使在感光构件表面上存在称为球形隆起物的异常生长部分，也可以使其不会出现在图像上，并且可以大大地补救图像缺陷。

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