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11. 发明授权

US06544715B2 Positive photoresist composition for far ultraviolet ray exposure 有权
公开(公告)号：US06544715B2
公开(公告)日：2003-04-08
申请号：US09492848
申请日：2000-01-27
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03C173
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive photoresist composition for far ultraviolet ray exposure improved in standard developing solution suitability, good in defocus latitude depended on line pitch of a resist pattern formed and excellent in sensitivity to a light source of shorter wavelength, which comprises (i) a compound capable of generating an acid by irradiation of actinic light or radiation; and (ii) a resin containing (a) repeating units each having an alkali-soluble group protected with at least one specific group containing an alicyclic hydrocarbon structure, (b) repeating units having, for example, lactone rings, and (c) repeating units derived from (meth)acrylic acid, the content of the repeating units of (c) being from 5 mol % to 18 mol % based on the total repeating units of the resin, and the resin being decomposable by action of an acid to increase its solubility in an alkali solution.

12. 发明授权

US06410204B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06410204B1
公开(公告)日：2002-06-25
申请号：US09669907
申请日：2000-09-27
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0397 , Y10S430/122
摘要： A positive photoresist composition comprising (A) a compound which generates a sulfonic acid having naphthalene structure by the irradiation with actinic rays of a wavelength of 220 nm or less or radiation, and (B) a resin whose solubility in an alkali developing solution increases by the action of an acid is disclosed.
摘要翻译：一种正型光致抗蚀剂组合物，其包含（A）通过用波长为220nm以下的光化射线照射或辐射而产生具有萘结构的磺酸的化合物，和（B）在碱性显影溶液中的溶解度增加的树脂公开了酸的作用。

13. 发明授权

US6150068A Photosensitive resin composition for far-ultraviolet exposure 失效
标题翻译：用于远紫外线曝光的感光树脂组合物
公开(公告)号：US6150068A
公开(公告)日：2000-11-21
申请号：US911165
申请日：1997-08-14
申请人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039 , G03F7/30 , H01L21/027 , B03F7/004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/121
摘要： A photosensitive resin composition for far-ultraviolet exposure of from 170 to 220 nm, which comprises an N-hydroxymaleinimide-type sulfonate photo acid generator having a specific structure and a resin having a substituent capable of increasing the solubility to an alkali developer by an acid, and a pattern forming method using the photosensitive resin composition. The photosensitive resin composition has a high transparency to light having a wavelength of from 170 to 220 nm and is excellent in the photocomposition property and the acid generating efficiency.
摘要翻译：一种用于远紫外线暴露于170至220nm的感光树脂组合物，其包含具有特定结构的N-羟基马来酰亚胺型磺酸盐光致酸产生剂和具有能够通过酸增加对碱性显影剂的溶解度的取代基的树脂，以及使用感光性树脂组合物的图案形成方法。感光性树脂组合物对波长为170〜220nm的光具有高透明性，并且光致变色性和酸产生效率优异。

14. 发明授权

US06818377B2 Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06818377B2
公开(公告)日：2004-11-16
申请号：US10176067
申请日：2002-06-21
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A positive photosensitive composition comprising (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B-1) a resin having a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and containing at least one structure represented by formulae (I), (II) and (III) as described in the specification or (B-2) a resin having at least one monovalent polyalicyclic group represented by formula (Ib) as described in the specification and a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution. The positive photosensitive composition containing the resin according to the present invention has high transmittance to far ultraviolet light particularly having a wavelength of 220 nm or less and exhibits good dry etching resistance. Further, the positive photosensitive composition exhibits high sensitivity, good resolution and good pattern profile when far ultraviolet light having a wavelength of 250 nm or less, particularly 220 nm or less (especially an ArF excimer laser beam) is employed as an exposure light source, and thus it can be effectively employed for the formation of fine pattern necessary for the production of semiconductor elements.
摘要翻译：一种正型光敏组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，和（B-1）具有通过酸作用分解的基团的树脂，以增加在碱性显影中的溶解度溶液，并且如说明书中所述含有至少一种由式（I），（II）和（III）表示的结构，或（B-2）具有至少一个由式（Ib）表示的一价多元脂环基团的树脂，如说明书和通过酸的作用而分解以增加在碱性显影液中的溶解度的基团。含有本发明树脂的正型感光性组合物对于远紫外线具有高透射率，特别是波长为220nm以下，表现出良好的耐干蚀刻性。此外，当使用波长为250nm以下，特别是220nm以下的远紫外光（特别是ArF准分子激光）时，正型感光性组合物显示出高灵敏度，良好的分辨率和良好的图案分布，作为曝光光源，因此可以有效地用于形成半导体元件的制造所需的精细图案。

15. 发明授权

US06794108B1 Positive photoresist composition for far ultraviolet exposure 失效
标题翻译：用于远紫外线曝光的正光致抗蚀剂组合物
公开(公告)号：US06794108B1
公开(公告)日：2004-09-21
申请号：US09541597
申请日：2000-04-03
申请人： Kenichiro Sato , Yutaka Adegawa , Toshiaki Aoai , Kunihiko Kodama
发明人： Kenichiro Sato , Yutaka Adegawa , Toshiaki Aoai , Kunihiko Kodama
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0395 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a positive photoresist composition for far ultraviolet exposure, which comprises a polymer having at least one of a repeating unit represented by formula (Ia) and a repeating unit represented by formula (Ib), and a repeating unit represented by formula (II), and having a group capable of decomposing by the action of an acid: wherein R1 and R2 each represents hydrogen atom, a cyano group, a hydroxyl group, —COOH, —COOR5, —CO—NH—R6, —CO—NH—SO2—R6, an alkyl group, an alkoxy group, a cyclic hydrocarbon group or a —Y group, X represents —O—, —S—, —NH—, —NHSO2— or —NHSO2NH—, A represents a single bond or a divalent linking group, Z2 represents —O— or —N(R3)—, R11 and R12 each represents a hydrogen atom, a cyano group, a halogen atom or an alkyl group, Z1 represents an atomic group necessary for forming an alicyclic structure which contains two bonded carbon atoms (C—C), and Y, R3, R5 and R6 are as defined in the specification.
摘要翻译：本发明提供一种用于远紫外线曝光的正性光致抗蚀剂组合物，其包含具有式（Ia）表示的重复单元和式（Ib）表示的重复单元中的至少一种的聚合物和由式（Ib）表示的重复单元， II），并且具有能够通过酸的作用分解的基团：其中R 1和R 2各自表示氢原子，氰基，羟基，-COOH，-COOR 5，-CO-NH-R 6，-CO- NH-SO 2 -R 6，烷基，烷氧基，环状烃基或-Y基，X表示-O - ， - S - ， - NH-，-NHSO 2 - 或-NHSO 2 NH-，A表示单键或二价连接基团，Z 2表示-O-或-N（R 3） - ，R 11和R 12各自表示氢原子，氰基，卤素原子或烷基，Z 1表示形成含有两个键合碳原子（CC）的脂环结构，Y，R3，R5和R6如说明书中所定义。

16. 发明授权

US06787283B1 Positive photoresist composition for far ultraviolet exposure 有权
标题翻译：用于远紫外线曝光的正光致抗蚀剂组合物
公开(公告)号：US06787283B1
公开(公告)日：2004-09-07
申请号：US09620708
申请日：2000-07-20
申请人： Toshiaki Aoai , Kenichiro Sato , Kunihiko Kodama
发明人： Toshiaki Aoai , Kenichiro Sato , Kunihiko Kodama
IPC分类号： G03F7039
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Disclosed is a positive photoresist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in alkali, containing a repeating unit having a group represented by the following formula (I): wherein R1 represents hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, which may have a substituent, R1 to R7, which may be the same or different, each represents hydrogen atom, an alkyl group which may have a substituent, a cycloalkyl group which may have a substituent or an alkenyl group which may have a substituent, provided that at least one of R6 and R7 is a group exclusive of hydrogen atom and R6 and R7 may combine to form a ring, and m and n each independently represents 0 or 1, provided that m and n are not 0 at the same time. The positive photoresist composition can further comprise a fluorine-containing and/or silicon-containing surfactant and at least one first solvent selected from propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate and 3-ethoxypropionate.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时能够产生酸的化合物和（B）能够在酸的作用下分解以增加在碱中的溶解度的树脂，其含有重复单元具有由下式（I）表示的基团：其中R 1表示氢原子或可具有取代基的具有1至4个碳原子的烷基，R 1至R 7可以相同或不同，各自表示氢原子，可以具有取代基的烷基，可以具有取代基的环烷基或可以具有取代基的烯基，条件是R 6和R 7中的至少一个是不是氢原子的基团，并且R 6和R 7可以组合形成环，m和n各自独立地表示0或1，条件是m和n不同时为0。正性光致抗蚀剂组合物可以进一步包括含氟和/或含硅表面活性剂和至少一种选自丙二醇单甲醚乙酸酯，丙二醇单甲醚丙酸酯，3-甲氧基丙酸甲酯，3-甲氧基丙酸乙酯，甲基3 乙氧基丙酸酯和3-乙氧基丙酸酯。

17. 发明授权

US06420082B1 Positive resist fluid and positive resist composition 有权
标题翻译：正抗蚀液和正光刻胶组成
公开(公告)号：US06420082B1
公开(公告)日：2002-07-16
申请号：US09438789
申请日：1999-11-12
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03F7039
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/107 , Y10S430/111
摘要： The present invention provides a positive resist fluid excellent in the storage stability of the fluid and in defocus latitude depended on line pitch, and a positive photoresist composition for far ultraviolet exposure which forms a resist pattern having excellent defocus latitude depended on line pitch and has excellent sensitivity to short-wavelength exposure lights. The positive resist fluid comprises a resin which contains repeating units represented by formula (I) as defined in the specification, a photo-acid generator, and a solvent and the positive photoresist composition for far ultraviolet exposure comprises a resin which contains both alkali-soluble groups protected by groups containing an alicyclic hydrocarbon structure and represented by at least one of formulae (pI) to (pVI) and groups represented by formula (qI): —A—X—R5 as defined in the specification.
摘要翻译：本发明提供一种在流体的保存稳定性和取决于线间距的散焦纬度方面优异的正性抗蚀剂流体和用于远紫外线曝光的正性光致抗蚀剂组合物，其形成具有优异的散焦纬度的抗蚀图案，其依赖于线间距，并且具有优异的对短波长曝光灯的敏感度。正型抗蚀剂流体包括含有本说明书中定义的式（I）表示的重复单元的树脂，光酸产生剂和溶剂，并且用于远紫外线照射的正性光致抗蚀剂组合物包含含有碱溶性的树脂由含有脂环族烃结构的基团保护并且由式（pI）至（pVI）中的至少一个表示的基团和由式（qI）表示的基团保护的基团：如说明书中所定义。

18. 发明授权

US06670095B2 Positive-working resist composition 有权
公开(公告)号：US06670095B2
公开(公告)日：2003-12-30
申请号：US10022363
申请日：2001-12-20
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.

19. 发明申请

US20100255419A1 POSITIVE PHOTOSENSITIVE COMPOSITION 有权
标题翻译：正性感光组合物
公开(公告)号：US20100255419A1
公开(公告)日：2010-10-07
申请号：US12816738
申请日：2010-06-16
申请人： Kunihiko KODAMA , Toshiaki Aoai
发明人： Kunihiko KODAMA , Toshiaki Aoai
IPC分类号： G03F7/004 , C07C309/00 , C07C381/12
CPC分类号： G03F7/0392 , C07C309/06 , C07C381/12 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
摘要翻译：正型光敏组合物包含能够在用光化学射线和辐射之一照射时能够产生特定磺酸的化合物和（B）能够在酸的作用下分解以提高在碱性显影剂中的溶解度的树脂。

20. 发明申请

US20050130060A1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US20050130060A1
公开(公告)日：2005-06-16
申请号：US10866054
申请日：2004-06-14
申请人： Kunihiko Kodama , Toshiaki Aoai
发明人： Kunihiko Kodama , Toshiaki Aoai
IPC分类号： C07C309/06 , C07C381/12 , G03F7/004 , G03F7/039 , G03C1/76
CPC分类号： G03F7/0392 , C07C309/06 , C07C381/12 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
摘要翻译：正型光敏组合物包含能够在用光化学射线和辐射之一照射时能够产生特定磺酸的化合物和（B）能够在酸的作用下分解以提高在碱性显影剂中的溶解度的树脂。

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