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11. 发明授权

US4486078A Driving device for a revolver in a microscope 失效
标题翻译：用显微镜驱动左轮手枪的装置
公开(公告)号：US4486078A
公开(公告)日：1984-12-04
申请号：US484415
申请日：1983-04-12
申请人： Noriyoshi Hashimoto , Kazuaki Saiki
发明人： Noriyoshi Hashimoto , Kazuaki Saiki
IPC分类号： G02B7/16 , G02B21/02 , H02P3/08
CPC分类号： G02B7/16
摘要： A microscope provided with a revolver having objective lenses mounted thereon and rotatable to move the objective lenses into an observation optical path comprises means for varying the load torque for rotation of the revolver at the rotated position of the revolver when the objective lenses face a predetermined position in the observation optical path, an electric motor, circuit means for driving the electric motor, means for transmitting the rotation of the electric motor to the revolver, and means for detecting the fluctuation of the load of the electric motor caused by a variation in the rotational torque of the revolver, and means for acting on the circuit means to stop the rotation of the electric motor in response to the detecting means.
摘要翻译：一种具有旋转镜的显微镜，其具有安装在其上的物镜并且可旋转以将物镜移动到观察光路中，包括用于当物镜朝向预定位置时改变用于旋转的旋转位置的旋转器的旋转的负载转矩的装置在观察光路中，电动机，用于驱动电动机的电路装置，用于将电动机的旋转传递到转轮的装置，以及用于检测由电动机的变化引起的电动机的负载的波动的装置以及用于作用在电路装置上以响应于检测装置停止电动机的旋转的装置。

12. 发明授权

US08805556B2 Damping apparatus and exposure apparatus 有权
标题翻译：阻尼装置和曝光装置
公开(公告)号：US08805556B2
公开(公告)日：2014-08-12
申请号：US12495915
申请日：2009-07-01
申请人： Kazuaki Saiki , Ping-Wei Chang
发明人： Kazuaki Saiki , Ping-Wei Chang
IPC分类号： G05B19/18
CPC分类号： H01L21/67092 , G03F7/70775 , G03F7/7085 , G03F7/709 , H01L21/68785
摘要： A damping apparatus that supports and dampens a stage apparatus that positions and drives a stage to a target position is provided herein. The damping apparatus including a support plate part, a support force generating means, and a first controlling means. The support plate part supports the stage apparatus. The support force generating means exerts a damping action by applying a support force to the support plate part in the vertical directions. The first controlling means uses the acceleration of the stage, which is derived from a target track, to the target position, to control the support force generated by the support force generating means so as to compensate for forces that both occur as a result of the acceleration of the stage and cause the support plate part to tilt. The present invention controls vibration and the tilt of a base plate with high precision.
摘要翻译：本文提供了一种阻尼装置，其支撑和阻尼将台架定位和驱动到目标位置的平台装置。该阻尼装置包括支撑板部分，支撑力产生装置和第一控制装置。支撑板部件支撑平台装置。支撑力产生装置通过在垂直方向上向支撑板部分施加支撑力来施加阻尼作用。第一控制装置使用从目标轨道导出的平台的加速度到目标位置，以控制由支撑力产生装置产生的支撑力，以便补偿由于加速阶段并使支撑板部分倾斜。本发明以高精度控制基板的振动和倾斜。

13. 发明申请

US20140028992A1 DRIVING SYSTEM AND DRIVING METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DRIVING SYSTEM DESIGN METHOD 有权
标题翻译：驱动系统和驱动方法，曝光装置和曝光方法以及驱动系统设计方法
公开(公告)号：US20140028992A1
公开(公告)日：2014-01-30
申请号：US13981733
申请日：2012-01-27
申请人： Hiroshi Fujimoto , Kazuaki Saiki , Koichi Sakata
发明人： Hiroshi Fujimoto , Kazuaki Saiki , Koichi Sakata
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G03F7/70725 , G03F7/70758
摘要： At a carriage that shows a resonance mode in opposite phase to a resonance mode shown by a plate table where an interferometer which measures a position (a first controlled variable) of a plate stage driven according to a control input is installed, another interferometer is installed which measures a position (the second controlled variable) of the plate stage. By using the interferometer and the another interferometer, it becomes possible to design a driving system robust in a high bandwidth that drives the plate stage.
摘要翻译：在显示与由平板表所示的谐振模式相反的谐振模式的托架上，其中安装了根据控制输入驱动的板级位置（第一受控变量）的干涉仪，另一干涉仪被安装其测量平台的位置（第二受控变量）。通过使用干涉仪和另一干涉仪，可以设计在驱动平板台的高带宽中坚固的驱动系统。

14. 发明申请

US20100001168A1 DAMPING APPARATUS AND EXPOSURE APPARATUS 有权
标题翻译：阻尼装置和曝光装置
公开(公告)号：US20100001168A1
公开(公告)日：2010-01-07
申请号：US12495915
申请日：2009-07-01
申请人： Kazuaki Saiki , Ping-Wei Chang
发明人： Kazuaki Saiki , Ping-Wei Chang
IPC分类号： H01L21/67 , H01L21/027
CPC分类号： H01L21/67092 , G03F7/70775 , G03F7/7085 , G03F7/709 , H01L21/68785
摘要： A damping apparatus that supports and dampens a stage apparatus that positions and drives a stage to a target position is provided herein. The damping apparatus including a support plate part, a support force generating means, and a first controlling means. The support plate part supports the stage apparatus. The support force generating means exerts a damping action by applying a support force to the support plate part in the vertical directions. The first controlling means uses the acceleration of the stage, which is derived from a target track, to the target position, to control the support force generated by the support force generating means so as to compensate for forces that both occur as a result of the acceleration of the stage and cause the support plate part to tilt. The present invention controls vibration and the tilt of a base plate with high precision.
摘要翻译：本文提供了一种阻尼装置，其支撑和阻尼将台架定位和驱动到目标位置的平台装置。该阻尼装置包括支撑板部分，支撑力产生装置和第一控制装置。支撑板部件支撑平台装置。支撑力产生装置通过在垂直方向上向支撑板部分施加支撑力来施加阻尼作用。第一控制装置使用从目标轨道导出的平台的加速度到目标位置，以控制由支撑力产生装置产生的支撑力，以便补偿由于加速阶段并使支撑板部分倾斜。本发明以高精度控制基板的振动和倾斜。

15. 发明授权

US5640227A Exposure apparatus and exposure method for minimizing defocusing of the transferred pattern 失效
标题翻译：用于最小化转印图案的散焦的曝光装置和曝光方法
公开(公告)号：US5640227A
公开(公告)日：1997-06-17
申请号：US349869
申请日：1994-12-06
申请人： Kinya Kato , Kazuaki Saiki , Masami Seki , Masaki Kato
发明人： Kinya Kato , Kazuaki Saiki , Masami Seki , Masaki Kato
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7026 , G03F7/70358
摘要： An exposure apparatus and an exposure method which minimize defocusing of the transferred pattern even with a large-sized mask. When the exposure apparatus is used which transfers the pattern formed on a first substrate through a substantially real-size projection optical system onto a second substrate, the positions of the mask and the substrate are detected, and based on the information on the positions the distance between the mask and the substrate is controlled to be substantially constant. According to the present invention, defocusing of the transferred pattern may be substantially avoided by detecting positions of the mask and the plate by making use of, e.g., an obliquely incident light focus detection optical system, and controlling the distance therebetween to be held constant or at a predetermined distance.
摘要翻译：曝光装置和曝光方法，即使用大尺寸的掩模，也能最小化转印图案的散焦。当使用通过基本上实际尺寸的投影光学系统将形成在第一基板上的图案转印到第二基板上的曝光装置时，检测掩模和基板的位置，并且基于关于位置的信息，距离掩模和基板之间的距离被控制为基本恒定。根据本发明，通过利用例如倾斜入射的光聚焦检测光学系统来检测掩模和板的位置，并且控制其之间的距离保持不变，可以基本上避免转印图案的散焦在预定距离处。

16. 发明授权

US4577141A System for driving a movable stage 失效
标题翻译：驱动可动台的系统
公开(公告)号：US4577141A
公开(公告)日：1986-03-18
申请号：US675323
申请日：1984-11-27
申请人： Kazuaki Saiki , Aiichi Ishikawa , Noriyoshi Hashimoto , Koichi Kudo , Kuniyuki Yoshikawa
发明人： Kazuaki Saiki , Aiichi Ishikawa , Noriyoshi Hashimoto , Koichi Kudo , Kuniyuki Yoshikawa
IPC分类号： G05B19/25 , G05B11/18
CPC分类号： G05B19/253 , G05B2219/35438 , G05B2219/41156
摘要： In order to appropriately position a specimen within a view finder of a microscope, the stage supporting the specimen must be quickly and smoothly moved in all directions of two dimensions X and Y. According to the present invention, this can be accomplished by dividing a tilt angle of an operation lever of a joy stick into three regions, an insensitive band, a low velocity region and a high velocity region. For each of latter two regions, a relevant signal is produced by the joy stick and transferred to a microcomputer which controls stage driving motors by sawtooth pulse voltages. The velocities of X- and Y-stages are generally setted in the microcomputer so as to be high for the high speed region and low for the low speed regions, and movements in X- and Y-directions alternate by a short time interval, thus quick and smooth movements of stages being enabled.
摘要翻译：为了将样本适当地放置在显微镜的取景器内，支撑样本的台阶必须在二维X和Y的所有方向上快速平稳地移动。根据本发明，这可以通过将倾斜操纵杆的操作杆的角度分为三个区域，不灵敏带，低速区域和高速区域。对于后两个区域中的每一个，由操纵杆产生相关信号并传送到通过锯齿波脉冲电压控制级驱动电机的微型计算机。 X和Y级的速度通常设置在微型计算机中，对于高速区域为高，对于低速区域为低，并且X方向和Y方向的移动以短时间间隔交替，因此启动阶段的快速平稳运动。

17. 发明申请

US20110046795A1 DRIVE CONTROL METHOD, DRIVE CONTROL APPARATUS, STAGE CONTROL METHOD, STAGE CONTROL APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS AND MEASURING APPARATUS 审中-公开
标题翻译：驱动控制方法，驱动控制装置，阶段控制方法，阶段控制装置，曝光方法，曝光装置和测量装置
公开(公告)号：US20110046795A1
公开(公告)日：2011-02-24
申请号：US12719457
申请日：2010-03-08
申请人： Hiroshi Fujimoto , Koichi Sakata , Kazuaki Saiki , Takeshi Ohtomo
发明人： Hiroshi Fujimoto , Koichi Sakata , Kazuaki Saiki , Takeshi Ohtomo
IPC分类号： G01M1/38
CPC分类号： F16F15/002 , G03F7/70525 , G03F7/70725 , G03F7/70758 , G03F7/709
摘要： A drive control method of controlling an object which can move at least in a first direction and a second direction different from the first direction is provided. Here, a force applied to the object is controlled on the basis of a driving signal for driving a first actuator moving the object in the first direction and a disturbance correcting signal generated from a disturbance signal in the second direction at an output terminal of the object.
摘要翻译：提供了一种控制能够至少沿与第一方向不同的第一方向和第二方向移动的物体的驱动控制方法。这里，基于用于驱动在第一方向移动物体的第一致动器的驱动信号和在物体的输出端处从第二方向的干扰信号产生的干扰校正信号来控制施加到物体的力。

18. 发明申请

US20100302526A1 Drive control method for moving body, exposure method, robot control method, drive control apparatus, exposure apparatus and robot apparatus 审中-公开
标题翻译：移动体的驱动控制方法，曝光方法，机器人控制方法，驱动控制装置，曝光装置和机器人装置
公开(公告)号：US20100302526A1
公开(公告)日：2010-12-02
申请号：US12591214
申请日：2009-11-12
申请人： Kazuaki Saiki
发明人： Kazuaki Saiki
IPC分类号： G03B27/58 , G03B27/32 , G06F19/00 , G05B13/02
CPC分类号： G03F7/70725 , G05B19/19 , G05B2219/41368 , G05B2219/41434
摘要： A drive control apparatus includes: a first feed-forward control unit which obtains a first feed-forward signal by applying a first perfect tracking control method to a first transfer function which shows a portion of an inverse system of transfer characteristics of a control subject; a second feed-forward control unit which obtains a second feed-forward signal by applying a second perfect tracking control method to a second transfer function which shows a portion of an inverse system of transfer characteristics of the control subject and which is different from the first transfer function; and an external disturbance observer which obtains a first compensation signal for the first feed-forward signal, wherein the control subject is driven using a second compensation signal which is obtained from the second feed-forward signal and the first compensation signal.
摘要翻译：驱动控制装置包括：第一前馈控制单元，其通过对第一传递函数应用第一完美跟踪控制方法获得第一前馈信号，该第一传递函数示出控制对象的传递特性的逆系统的一部分; 第二前馈控制单元，其通过对第二传递函数应用第二完美跟踪控制方法来获得第二前馈信号，所述第二传递函数示出了控制对象的传递特性的逆系统的一部分，其与第一前馈信号不同传递函数; 以及获得第一前馈信号的第一补偿信号的外部干扰观测器，其中使用从第二前馈信号和第一补偿信号获得的第二补偿信号来驱动控制对象。

19. 发明授权

US5798822A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5798822A
公开(公告)日：1998-08-25
申请号：US950964
申请日：1997-10-15
申请人： Seiji Miyazaki , Hiroshi Shirasu , Kazuaki Saiki , Tsuyoshi Narabe
发明人： Seiji Miyazaki , Hiroshi Shirasu , Kazuaki Saiki , Tsuyoshi Narabe
IPC分类号： G03F7/207 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7026
摘要： A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.
摘要翻译：一对参考板被布置为在一体地保持掩模和感光基板的托架上具有预定的位置关系，使得掩模和感光基板在投影光学系统的两侧彼此相对。通过周期性地检测基准板在光轴方向上的位置关系，检测位置检测装置的检测特性中随时间的变化。通过根据检测到的变化来校正要提供给驱动装置的驱动信号，实现稳定的图像形成特性和高吞吐量。

20. 发明授权

US5657130A Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US5657130A
公开(公告)日：1997-08-12
申请号：US408714
申请日：1995-03-22
申请人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
发明人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70216 , G03F7/70275 , G03F7/70358 , G03F7/70791 , G03F9/70
摘要： In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected. The posture of at least one of the mask and the substrate is adjusted on the basis of the positions detected with the first and second beams.
摘要翻译：在曝光装置和方法中，掩模和基板彼此同步地扫描，使得掩模的图案可以通过投影光学系统被转印到基板上。第一光束照射在与掩模的扫描方向相交的方向间隔开的掩模上的至少两个位置。在投影光学系统的光轴的方向上检测其反射光，并且在光束照射的掩模上的点的位置被检测。此外，第二光束照射到沿扫描方向间隔开的基板上的至少两个位置，并且其反射光被接收。检测到在投影光学系统的光轴的方向上检测到已经照射第二光束的基板上的点的位置。基于由第一和第二光束检测到的位置来调整掩模和基板中的至少一个的姿势。

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