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    • 15. 发明申请
    • Extreme ultra violet light source apparatus
    • 极紫外光源装置
    • US20080073598A1
    • 2008-03-27
    • US11902596
    • 2007-09-24
    • Masato MoriyaTamotsu AbeTakashi SuganumaHiroshi SomeyaTakayuki YabuAkira Sumitani
    • Masato MoriyaTamotsu AbeTakashi SuganumaHiroshi SomeyaTakayuki YabuAkira Sumitani
    • H05G2/00
    • H05G2/001
    • An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.
    • EUV光源装置能够防止由于EUV光产生室的窗口的劣化导致的EUV光的产生效率降低。 EUV光源装置包括:具有窗口的EUV光产生室,产生激光束的驱动激光器,放大激光束的凹透镜;使激光束准直的凸透镜;抛物面凹面镜; 布置在EUV光产生室中,并且反射准直激光束以将激光束收集到目标材料上,调整抛物面凹面镜的位置和角度的抛物面凹面镜调节机构,收集EUV光的EUV聚光镜, 以及净化气体供给单元,其供给用于保护窗口和抛物面凹面镜的吹扫气体。
    • 20. 发明申请
    • Extreme ultra violet light source apparatus
    • 极紫外光源装置
    • US20080210889A1
    • 2008-09-04
    • US12073001
    • 2008-02-28
    • Takashi SuganumaTamotsu AbeHiroshi SomeyaAkira Sumitani
    • Takashi SuganumaTamotsu AbeHiroshi SomeyaAkira Sumitani
    • H05G2/00
    • G03F7/70916G03F7/70033
    • An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which EUV light is generated; a target material supply unit for supplying a target material into the EUV light generation chamber; a laser source for applying a laser beam to the target material supplied into the EUV light generation chamber to generate plasma; collection optics for collecting EUV light radiated from the plasma; a filter for filtering the EUV light collected by the collection optics; and a filter protecting member provided between the plasma and the filter, for protecting the filter by blocking flying matter flying from the plasma toward the filter.
    • EUV光源装置,能够防止过滤EUV光的过滤器的劣化和/或破损。 EUV光源装置包括产生EUV光的EUV产生室; 目标材料供应单元,用于将目标材料供应到EUV光产生室中; 激光源,用于将激光束施加到提供到EUV光产生室中的目标材料以产生等离子体; 用于收集从等离子体辐射的EUV光的收集光学器件; 用于过滤由收集光学器件收集的EUV光的滤光器; 以及设置在等离子体和过滤器之间的过滤器保护构件,用于通过阻挡从等离子体飞向过滤器的飞散物质来保护过滤器。