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11. 发明授权

US07812280B2 Method and apparatus for laser micromachining a conical surface 有权
标题翻译：用于激光微加工锥形表面的方法和装置
公开(公告)号：US07812280B2
公开(公告)日：2010-10-12
申请号：US11292691
申请日：2005-12-02
申请人： Sergey V. Broude , Rong Gu , David S. Holbrook , Kenneth T. McDaniel , Pascal Miller , David L. Wall
发明人： Sergey V. Broude , Rong Gu , David S. Holbrook , Kenneth T. McDaniel , Pascal Miller , David L. Wall
IPC分类号： B23K26/38
CPC分类号： B23K26/0823 , B23K26/066 , B23K26/361
摘要： Embodiments of the present invention are directed to methods and systems for micromachining a conical surface. In one embodiment, such a system may include a rotating platform for receiving a long line of laser illumination, a mask having a predetermined pattern comprising a sector of a planar ring, the mask being positioned on the rotating platform, a workpiece stage having a rotational axis for rotating a removably-affixed workpiece comprising a conical surface, wherein the sector comprises the planar image of the conical surface, an excimer laser for producing a laser beam, a homogenizer for homogenizing the laser beam in at least a single direction, at least one condenser lens, a turning mirror and at least one projection lens.
摘要翻译：本发明的实施例涉及用于微加工锥形表面的方法和系统。在一个实施例中，这样的系统可以包括用于接收长行激光照明的旋转平台，具有包括平面环的扇区的预定图案的掩模，所述掩模位于旋转平台上，工件台具有旋转用于旋转包括锥形表面的可拆卸固定的工件，其中所述扇形部包括所述锥形表面的平面图像，用于产生激光束的准分子激光器，用于至少在单个方向上均匀化所述激光束的均质器，至少一个聚光透镜，转向镜和至少一个投影透镜。

12. 发明授权

US07210820B2 Methods and apparatuses for homogenizing light 有权
标题翻译：均匀化光的方法和装置
公开(公告)号：US07210820B2
公开(公告)日：2007-05-01
申请号：US10839026
申请日：2004-05-04
申请人： Sergey V. Broude , David S. Holbrook , Pascal Miller
发明人： Sergey V. Broude , David S. Holbrook , Pascal Miller
IPC分类号： F21S8/00
CPC分类号： G02B27/0927 , G02B27/09 , G02B27/0961 , G02B27/0966 , G02B27/0983 , G03F7/70066 , G03F7/70075
摘要： Embodiments of the present invention are directed to an illuminating optical device for forming a field of illumination. The optical device includes a first one-dimensional homogenizer positioned to homogenize a first dimension/axis of the field of illumination and a second one-dimensional homogenizer positioned to homogenize a second dimension/axis of the field of illumination.
摘要翻译：本发明的实施例涉及一种用于形成照明领域的照明光学装置。光学装置包括第一一维均质器，其被定位成均匀化照明场的第一维度/轴线;以及第二一维均化器，其定位成使照明场的第二维度/轴均匀化。

13. 发明授权

US4855792A Optical alignment system for use in photolithography and having reduced reflectance errors 失效
标题翻译：用于光刻的光学对准系统并具有降低的反射率误差
公开(公告)号：US4855792A
公开(公告)日：1989-08-08
申请号：US193887
申请日：1988-05-13
申请人： David S. Holbrook , Craig R. Simpson
发明人： David S. Holbrook , Craig R. Simpson
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , H05K3/00
CPC分类号： G03F9/7069
摘要： A direct reticle reference alignment system for use in photolithography for use with substrates having optical transmissivity. The system includes a movable stage (14), a transmissive substrate (11) held by the stage and bearing at least one plate mark (15) upon its upper surface, an optical system having a light source (1) for illuminating and projecting a reticle alignment image (4) upon the substrate (11) for alignment with the plate mark (15), a sensor (17) mounted in the stage (14) below the substrate (11) and the plate mark (15) to receive light from the projected alignment image (4), the sensor (17) producing an electrical signal related to the degree of alignment, and a stage control actuated by the signal to position the stage (14) and, so, align the substrate (11) with the reticle (4). The sensor (17) includes a light channel (19), such as a fiber optic rod, positioned to receive images from the lower surface (13) of said substrate ( 11) and carry them to the photocell. The detector may include a quadcell and a corresponding light channel for each cell in the quadcell.

14. 发明授权

US07679546B2 Apparatus and method of determining location of an object 有权
标题翻译：确定物体位置的装置和方法
公开(公告)号：US07679546B2
公开(公告)日：2010-03-16
申请号：US11858413
申请日：2007-09-20
申请人： Scott D. Bublitz , Jeffrey C. Hessenberger , John S. Scott , Matthew J. Mergener , David S. Holbrook
发明人： Scott D. Bublitz , Jeffrey C. Hessenberger , John S. Scott , Matthew J. Mergener , David S. Holbrook
IPC分类号： G01S13/89 , G01S13/88 , G01V3/12 , G01S13/00 , G01V3/00
CPC分类号： H04N7/18
摘要： An apparatus and method of determining location of an object hidden from view. The apparatus includes an imaging tool for detecting hidden objects. The imaging tool includes a housing including a first end and a second end, a display supported by the first end of the housing, and a tracking device supported by the second end of the housing. The imaging tool also includes a transmitter supported by the housing and operable to transmit electromagnetic radiation toward a hidden target, an analysis module supported by the housing and operable to analyze feedback data related to the interaction between the target and the electromagnetic radiation, and an image module operable to receive data from the analysis module to generate an image on the display.
摘要翻译：确定隐藏在视图中的对象的位置的装置和方法。该装置包括用于检测隐藏物体的成像工具。成像工具包括壳体，其包括第一端和第二端，由壳体的第一端支撑的显示器以及由壳体的第二端支撑的跟踪装置。成像工具还包括由壳体支撑并可操作以朝向隐藏目标传送电磁辐射的发射器，由壳体支撑并可操作以分析与目标和电磁辐射之间的相互作用相关的反馈数据的图像和图像模块，其可操作以从所述分析模块接收数据以在所述显示器上生成图像。

15. 发明授权

US07282721B2 Method and apparatus for tuning ion implanters 有权
标题翻译：用于调整离子注入机的方法和装置
公开(公告)号：US07282721B2
公开(公告)日：2007-10-16
申请号：US09943625
申请日：2001-08-30
申请人： Terence Sean Sullivan , David S. Holbrook , Clifford A. Lardin
发明人： Terence Sean Sullivan , David S. Holbrook , Clifford A. Lardin
IPC分类号： H01J37/317
CPC分类号： H01J37/244 , H01J37/304 , H01J37/3171 , H01J2237/24507 , H01J2237/31703
摘要： Methods and apparatus are provided for automatically tuning a charged particle beam system, such as an ion implanter. In one embodiment, a control parameter of a control component located upstream of a target component is modulated, and the beam current downstream of the target component is measured. The beam current measurements provide information that is used to evaluate tuning and, if necessary, to adjust the target component. The target component is typically a slow response component, such as a magnet. In another embodiment, evaluation of tuning is performed by modulating the target parameter and monitoring the effect of such modulation on the beam current. In a further embodiment, the spot size of the charged particle beam is evaluated by scanning the beam across the edge of an aperture and evaluating the sharpness of the beam focus. The tuning algorithms are preferably implemented in localized power supply interfaces for high speed operation.
摘要翻译：提供了用于自动调整带电粒子束系统的方法和装置，例如离子注入机。在一个实施例中，调制位于目标部件上游的控制部件的控制参数，并测量目标部件下游的束电流。光束电流测量提供用于评估调谐的信息，如有必要，调整目标分量。目标部件通常是慢响应部件，例如磁体。在另一实施例中，通过调制目标参数并监视这种调制对波束电流的影响来执行调谐评估。在另一实施例中，通过扫描光束穿过孔的边缘并评估光束焦点的清晰度来评估带电粒子束的光斑尺寸。调谐算法优选地在用于高速操作的局部电源接口中实现。

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