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    • 13. 发明授权
    • Method and system for removing contaminants
    • 清除污染物的方法和系统
    • US5244000A
    • 1993-09-14
    • US918082
    • 1992-07-24
    • Thomas B. StanfordRichard C. George, Jr.Jennifer I. ShinnoDhiren C. MehtaGifford W. Rodine
    • Thomas B. StanfordRichard C. George, Jr.Jennifer I. ShinnoDhiren C. MehtaGifford W. Rodine
    • B23K1/20C23G1/14H05K3/26
    • H05K3/26B23K1/206C23G1/14H05K2203/0793H05K2203/0796
    • A method for removing contaminants from a solid substrate comprising, in a preferred embodiment:(a) providing an initial reaction bath comprising:(1) an alkaline compound in sufficient amount to provide a pH of 10.5 to 14.0 in the final reaction bath;(2) a chosen wetting agent which is stable in the presence of the alkaline compound and hydrogen peroxide; and(3) deionized water;(b) metering hydrogen peroxide into the initial and final reaction baths at a rate of about 0.004 milligrams of hydrogen peroxide per minute per gallon of reaction bath fluid or higher;(c) sparging the initial and final reaction baths with air or oxygen at a rate of about 0.001 to 1 standard cubic feet per minute; and(d) exposing the substrate having contaminants to the final reaction bath containing metered hydrogen peroxide and sparging air or oxygen. The hydrogen peroxide in the final reaction bath is maintained at an effective level for an extended period of time to remove said contaminants from the substrate in a uniform and controlled manner. Alternatively, other oxidants besides hydrogen peroxide may be used. A system for accomplishing this method is also disclosed.
    • 一种用于从固体基质中除去污染物的方法,其包括在优选实施方案中:(a)提供初始反应浴,其包含:(1)足量的碱性化合物,以在最终反应浴中提供10.5至14.0的pH; (2)选择的润湿剂,其在碱性化合物和过氧化氢存在下是稳定的; 和(3)去离子水; (b)以每加仑反应浴液或更高的每分钟约0.004毫克过氧化氢的速率将过氧化氢计量到初始和最终反应浴中; (c)用空气或氧气以约0.001至1标准立方英尺/分钟的速率喷射初始和最终反应浴; 和(d)将具有污染物的底物暴露于含有计量过氧化氢和喷射空气或氧气的最终反应浴中。 将最终反应浴中的过氧化氢保持在有效水平持续一段时间以以均匀和受控的方式从基质中除去所述污染物。 或者,可以使用除了过氧化氢之外的其它氧化剂。 还公开了一种用于实现该方法的系统。
    • 15. 发明授权
    • Volatile organic compound sensors
    • 挥发性有机化合物传感器
    • US5756879A
    • 1998-05-26
    • US685997
    • 1996-07-25
    • Frederick G. YamagishiThomas B. StanfordCamille I. van AstLeroy J. Miller
    • Frederick G. YamagishiThomas B. StanfordCamille I. van AstLeroy J. Miller
    • G01N27/12G01N27/00B05D5/12C08F283/00G01N7/00
    • G01N27/126Y10T428/3154
    • A novel, inexpensive sensor and method for detecting volatile compounds in the gas phase at concentrations of less than about 500 ppm in ambient air are provided. The sensor comprises (a) a dielectric substrate having a major surface; (b) a pair of electrically conductive electrodes disposed on the major surface of the substrate; and (c) a conductive polymer covering the pair of electrically conductive electrodes, with the conductive polymer doped with appropriate dopants in measurable excess of that stoichiometrically required to change the conductive polymer from a neutral state to a charged state to provide requisite conductivity. A method for making the sensor is provided, as is a method of use of the sensor which relates to its use in a monitoring system comprising a means for measuring the conductivity of the sensor connected to a warning means for providing an indication when the conductivity reaches a predetermined level. Contemplated specific methods of use include the detection of fugitive emissions in chemical plant environments; the detection of certain pollutants in vehicle exhaust; and the detection of certain pollutants near chemical handling operations, such as painting operations.
    • 提供了一种用于在环境空气中以小于约500ppm的浓度检测气相中的挥发性化合物的新型廉价的传感器和方法。 传感器包括(a)具有主表面的电介质基片; (b)设置在基板的主表面上的一对导电电极; 并且(c)覆盖一对导电电极的导电聚合物,其中导电聚合物掺杂合适的掺杂剂,其可测量的过量是将导电聚合物从中性状态改变为带电状态所需的化学计量要求,以提供必需的导电性。 提供了一种用于制造传感器的方法,传感器的使用方法与其在监视系统中的使用相关,该监视系统包括用于测量连接到警告装置的传感器的电导率的装置,用于当电导率达到时提供指示 一个预定的水平。 考虑的具体使用方法包括检测化学工厂环境中的逃逸排放; 检测车辆废气中某些污染物; 并检测化学处理操作附近的某些污染物,如油漆作业。
    • 17. 发明授权
    • Cleaning by cavitation in liquefied gas
    • 液化气体气蚀清洗
    • US5316591A
    • 1994-05-31
    • US927443
    • 1992-08-10
    • Sidney C. ChaoEdna M. PurerThomas B. StanfordCarl W. Townsend
    • Sidney C. ChaoEdna M. PurerThomas B. StanfordCarl W. Townsend
    • B01D11/00B08B3/12B08B7/00D06F19/00D06F43/00D06F43/08H05K3/26C02F1/46
    • D06F19/00B08B3/12B08B7/0021D06F43/007D06F43/08H05K3/26
    • Undesired material is removed from a chosen substrate by a process comprising the steps of (a) placing the substrate containing the undesired material in a cleaning chamber provided with cavitation-producing means; (b) introducing a liquefied gas, such as liquid carbon dioxide, into the cleaning chamber and contacting the substrate containing the undesired material with the liquid carbon dioxide at a temperature below its critical temperature; and (c) exposing the liquid carbon dioxide to the cavitation-producing means for a period of time sufficient to remove the undesired material from the substrate. The substrate containing the undesired material may optionally be contacted with carbon dioxide in the dense phase prior to and/or after the cavitation treatment to aid in removal of the undesired material. Further, spent liquid carbon dioxide may be treated to regenerate fresh liquid carbon dioxide which is recycled to the cleaning chamber. Other gases besides carbon dioxide which may be used include nitrous oxide, sulfur hexafluoride, and xenon.
    • 不期望的材料通过包括以下步骤的方法从所选择的衬底中移除:(a)将含有不需要的材料的衬底放置在设置有空化产生装置的清洁室中; (b)将液化二氧化碳等液化气体引入清洗室,并将含有不需要的材料的基材与液体二氧化碳在低于其临界温度的温度下接触; 和(c)将液体二氧化碳暴露于产生气蚀的装置一段足以从衬底去除不想要的材料的时间。 在空化处理之前和/或之后,含有不想要的材料的基材可以任选地与致密相中的二氧化碳接触以帮助去除不需要的材料。 此外,废液二氧化碳可以被处理以再生再循环到清洁室的新鲜液体二氧化碳。 除二氧化碳之外的其他气体可以使用包括一氧化二氮,六氟化硫和氙。