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11. 发明申请

US20080225260A1 Illuminator for a lithographic apparatus and method 有权
标题翻译：光刻设备和方法的照明器
公开(公告)号：US20080225260A1
公开(公告)日：2008-09-18
申请号：US11724331
申请日：2007-03-15
申请人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Bernd Geh , Emil Peter Schmitt-Weaver
发明人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Bernd Geh , Emil Peter Schmitt-Weaver
IPC分类号： G03B27/32 , G03B27/72
CPC分类号： G03F7/701 , G03F7/70566
摘要： An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angular and spatial distribution as governed by an illumination mode defining element.
摘要翻译：一种用于光刻设备的照明器，所述照明器包括照明模式限定元件和多个偏振调节器，所述偏振调节器可移动到与具有角度和空间分布的辐射束的部分交叉中，所述辐射束具有由限定元件。

12. 发明申请

US20060291031A1 Arrangement of aperture diaphragms and/or filters, with changeable characteristics for optical devices 审中-公开
标题翻译：孔径光阑和/或滤光片的布置，具有光学元件的特性
公开(公告)号：US20060291031A1
公开(公告)日：2006-12-28
申请号：US11429428
申请日：2006-05-08
申请人： Klaus Boehm , Peter Schaeffer , Wolfgang Harnisch , Thomas Engel , Axel Zibold , Bernd Geh
发明人： Klaus Boehm , Peter Schaeffer , Wolfgang Harnisch , Thomas Engel , Axel Zibold , Bernd Geh
IPC分类号： G02F1/01
CPC分类号： G03F7/701 , G02B5/005 , G02B21/24 , G02B26/007
摘要： An arrangement making use of two-dimensional arrays consisting of individually controllable elements, for forming aperture diaphragms in the beam paths of optical devices. In an arrangement of diaphragm apertures and/or filters, in which the form, position and/or optical characteristics can be changed, for use in optical devices, at least one two-dimensional array, consisting of individually controllable elements, is arranged for forming the diaphragm apertures and/or filters in the optical imaging and/or illumination beam paths and is connected with a control unit for controlling the individual elements In this way, the geometry, the optical characteristics and/or the position of the aperture diaphragms and/or the filters can be controlled very quickly. These changes can also be made “online” during the process of measurement or adjustment in the sense of optical fine tuning. Furthermore, using these systems, the elaborate and time consuming preparation of the diaphragm apertures with geometric forms can be omitted.
摘要翻译：使用由独立可控元件组成的二维阵列的装置，用于在光学装置的光束路径中形成孔径光阑。在其中可以改变形式，位置和/或光学特性的隔膜孔和/或滤光器的布置中，用于光学装置中，布置有由独立可控元件组成的至少一个二维阵列，用于形成光学成像和/或照明光束路径中的隔膜孔和/或滤光器，并与用于控制各个元件的控制单元连接。以这种方式，孔径光阑的几何形状，光学特性和/或位置和/ 或者可以非常快速地控制过滤器。这些变化也可以在光学微调的测量或调整过程中“联机”。此外，使用这些系统，可以省略精细和耗时的几何形式的隔膜孔的准备。

13. 发明申请

US20060256311A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060256311A1
公开(公告)日：2006-11-16
申请号：US11129556
申请日：2005-05-16
申请人： Steven Hansen , Bernd Geh , Donis Flagello
发明人： Steven Hansen , Bernd Geh , Donis Flagello
IPC分类号： G03B27/54
CPC分类号： G03F7/70091 , G03F7/70125 , G03F7/70325
摘要： A method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The lithographic apparatus includes an illumination system configured to provide an illumination configuration and a projection system. In an embodiment of the invention, the method includes illuminating a mask pattern with an illumination configuration that includes a dark field component; and projecting an image of the illuminated pattern onto a photoresist layer coated on the substrate.
摘要翻译：提出了一种使用光刻设备将掩模图案的图像转印到基板上的方法。光刻设备包括被配置为提供照明配置和投影系统的照明系统。在本发明的实施例中，该方法包括用包括暗场分量的照明配置照亮掩模图案; 以及将照射图案的图像投射到涂覆在基底上的光致抗蚀剂层上。

14. 发明授权

US06678240B2 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements 失效
标题翻译：用于优化至少两个光学元件的图像特性的方法以及用于优化至少三个光学元件的图像特性的方法
公开(公告)号：US06678240B2
公开(公告)日：2004-01-13
申请号：US10247270
申请日：2002-09-19
申请人： Bernd Geh , Paul Gräupner , Klaus Wurmbrand , Thomas Stammler , Dirk Stenkamp , Jochen Stühler
发明人： Bernd Geh , Paul Gräupner , Klaus Wurmbrand , Thomas Stammler , Dirk Stenkamp , Jochen Stühler
IPC分类号： G03B2732
CPC分类号： G03F7/706 , G01M11/0207 , G01M11/0242 , G01M11/0257 , G02B27/0012 , G03F7/70225 , G03F7/70258 , G03F7/70666
摘要： In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.
摘要翻译：为了优化其中至少一个相对于至少一个固定光学元件移动的多个光学元件的图像特性，首先测量由所有光学元件的相互作用产生的整体图像缺陷。这被表示为正交函数集的基函数的线性组合。然后将可移动元件移动到新的测量位置，并再次测量整个图像缺陷。在新的整体图像缺陷的线性组合表示之后，根据获得的数据计算可移动元件和静止元件的图像缺陷。只有一个可移动光学元件可以直接计算和调整整个图像缺陷最小化的目标位置。如果有多个可移动的光学元件可用，则给出用于有效确定各个目标位置的方法。

15. 发明申请

US20080252987A1 Projection Objective For Microlithography 有权
标题翻译：微光刻的投影目的
公开(公告)号：US20080252987A1
公开(公告)日：2008-10-16
申请号：US11658574
申请日：2005-08-03
申请人： Bernd Geh
发明人： Bernd Geh
IPC分类号： G02B3/00
CPC分类号： G03F7/702 , G03F7/703 , G03F7/70783
摘要： A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which arc arranged along an optical axis of the projection objective and are configured in such a way that a defined image field curvature of the projection objective is set in such a way that an object surface that is curved convexly with respect to the projection objective can be imaged into a planar image surface. What can be achieved given a suitable setting of the object surface curvature is that a gravitation-dictated bending of a mask does not have a disturbing effect on the imaging quality.
摘要翻译：用于将布置在投影物镜的物体表面中的图案成像到具有缩小成像刻度的投影物镜的图像表面中的投影物镜具有沿着投影物镜的光轴排列的多个光学元件，使得投影物镜的定义的图像场曲率被设置为使得相对于投影物体凸出地弯曲的物体表面可以被成像为平面图像表面的方式。给定对象表面曲率的适当设置可以实现什么是掩模的重力指定弯曲对成像质量没有干扰的影响。

16. 发明申请

US20080212060A1 Method for Determining Intensity Distribution in the Image Plane of a Projection Exposure Arrangement 有权
标题翻译：确定投影曝光安排图像平面中强度分布的方法
公开(公告)号：US20080212060A1
公开(公告)日：2008-09-04
申请号：US12065451
申请日：2006-09-02
申请人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
发明人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
IPC分类号： G03B27/54
CPC分类号： G03F7/70666 , G03F7/70308
摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method consists in includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.
摘要翻译：一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。还描述了用于执行该方法和仿真装置的装置。由于考虑到系统变迹，本发明使得可以提高再现质量。本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的幅度分布来计算校正的变迹图像。

17. 发明申请

US20080068599A1 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements 审中-公开
标题翻译：用于优化至少两个光学元件的图像特性的方法以及用于优化至少三个光学元件的图像特性的方法
公开(公告)号：US20080068599A1
公开(公告)日：2008-03-20
申请号：US11985674
申请日：2007-11-16
申请人： Bernd Geh , Paul Graupner , Thomas Stammler , Dirk Stenkamp , Jochen Stuhler , Klaus Wurmbrand
发明人： Bernd Geh , Paul Graupner , Thomas Stammler , Dirk Stenkamp , Jochen Stuhler , Klaus Wurmbrand
IPC分类号： G01N21/00
CPC分类号： G03F7/706 , G01M11/0207 , G01M11/0242 , G01M11/0257 , G02B27/0012 , G03F7/70225 , G03F7/70258 , G03F7/70666
摘要： In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.
摘要翻译：为了优化其中至少一个相对于至少一个固定光学元件移动的多个光学元件的图像特性，首先测量由所有光学元件的相互作用产生的整体图像缺陷。这被表示为正交函数集的基函数的线性组合。然后将可移动元件移动到新的测量位置，并再次测量整个图像缺陷。在新的整体图像缺陷的线性组合表示之后，根据获得的数据计算可移动元件和静止元件的图像缺陷。只有一个可移动光学元件可以直接计算和调整整个图像缺陷最小化的目标位置。如果有多个可移动的光学元件可用，则给出用于有效确定各个目标位置的方法。

18. 发明授权

US07301622B2 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements 失效
标题翻译：用于优化至少两个光学元件的图像特性的方法以及用于优化至少三个光学元件的图像特性的方法
公开(公告)号：US07301622B2
公开(公告)日：2007-11-27
申请号：US11187730
申请日：2005-07-22
申请人： Bernd Geh , Paul Gräupner , Thomas Stammler , Dirk Stenkamp , Jochen Stühler , Klaus Wurmbrand
发明人： Bernd Geh , Paul Gräupner , Thomas Stammler , Dirk Stenkamp , Jochen Stühler , Klaus Wurmbrand
IPC分类号： G03B27/32
CPC分类号： G03F7/706 , G01M11/0207 , G01M11/0242 , G01M11/0257 , G02B27/0012 , G03F7/70225 , G03F7/70258 , G03F7/70666
摘要： In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.
摘要翻译：为了优化其中至少一个相对于至少一个固定光学元件移动的多个光学元件的图像特性，首先测量由所有光学元件的相互作用产生的整体图像缺陷。这被表示为正交函数集的基函数的线性组合。然后将可移动元件移动到新的测量位置，并再次测量整个图像缺陷。在新的整体图像缺陷的线性组合表示之后，根据获得的数据计算可移动元件和静止元件的图像缺陷。只有一个可移动光学元件可以直接计算和调整整个图像缺陷最小化的目标位置。如果有多个可移动的光学元件可用，则给出用于有效确定各个目标位置的方法。

19. 发明申请

US20070002300A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070002300A1
公开(公告)日：2007-01-04
申请号：US11436058
申请日：2006-05-18
申请人： Steven Hansen , Donis Flagello , Wolfgang Singer , Bernd Geh , Vladan Blahnik
发明人： Steven Hansen , Donis Flagello , Wolfgang Singer , Bernd Geh , Vladan Blahnik
IPC分类号： G03B27/54
CPC分类号： G03F7/70325 , G03F7/70091 , G03F7/70108 , G03F7/7025
摘要： A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.
摘要翻译：光刻设备包括照明单元，其包括被配置为产生辐射束的辐射源，具有数值孔径NA <0>的照明光学器件和孔径系统; 具有第一数值孔径NA 的投影透镜; 布置在照明单元和投影透镜之间并被配置为支撑图案形成装置的支撑件; 衬底支撑件，被配置为支撑在其上成像图案形成装置上的结构的衬底，其中投影透镜的第一数值孔径NA 小于数值孔径NA < >照明单元。

20. 发明授权

US07961297B2 Method for determining intensity distribution in the image plane of a projection exposure arrangement 有权
标题翻译：用于确定投影曝光装置的图像平面中的强度分布的方法
公开(公告)号：US07961297B2
公开(公告)日：2011-06-14
申请号：US12065451
申请日：2006-09-02
申请人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
发明人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
IPC分类号： G03B27/72 , G03B27/32 , G03B27/68 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70666 , G03F7/70308
摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.
摘要翻译：一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。还描述了用于执行该方法和仿真装置的装置。由于考虑到系统变迹，本发明使得可以提高再现质量。本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的振幅分布计算校正的变迹图像。

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