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    • 13. 发明授权
    • Image reading apparatus
    • 图像读取装置
    • US08711442B2
    • 2014-04-29
    • US13361518
    • 2012-01-30
    • Hiroyuki KawanoTaku MatsuzawaTatsuki OkamotoTadashi MinobeTatsuya Kunieda
    • Hiroyuki KawanoTaku MatsuzawaTatsuki OkamotoTadashi MinobeTatsuya Kunieda
    • H04N1/387H04N1/04
    • G03G15/60H04N2201/0434
    • The object of the present invention is to provide an image reading apparatus having a large depth of field and being compact in size.The image reading apparatus includes a light source, an imaging optics system, an image pickup device unit, a memory, and a processor. The imaging optics system has a plurality of cells each being an independent optics system arranged in a main scanning direction, and arranged in two rows in a sub-scanning direction. In each of the cells, a first reflective light-gathering optical element, a first plane mirror, an aperture, and a second reflective light-gathering optical element are arranged in this order from a document, and the aperture is arranged at the back focal point position of the first reflective light-gathering optical element to form a telecentric optics system at the side of the document.
    • 本发明的目的是提供一种具有大景深并且尺寸紧凑的图像读取装置。 图像读取装置包括光源,成像光学系统,图像拾取装置单元,存储器和处理器。 成像光学系统具有多个单元,每个单元是沿主扫描方向布置的独立光学系统,并且在副扫描方向上布置成两行。 在每个单元中,从文件依次布置第一反射聚光光学元件,第一平面镜,孔和第二反射聚光光学元件,并且孔布置在后焦点 第一反射聚光光学元件的点位置,以在文档的侧面形成远心光学系统。
    • 14. 发明申请
    • IMAGE SENSING APPARATUS
    • 图像感应装置
    • US20090147321A1
    • 2009-06-11
    • US12261520
    • 2008-10-30
    • Tadashi MINOBEHiroyuki KawanoIzumi MikamiTakafumi Endo
    • Tadashi MINOBEHiroyuki KawanoIzumi MikamiTakafumi Endo
    • H04N1/04
    • H04N1/0318H04N1/02815H04N1/02835H04N1/1017H04N1/193H04N2201/03112H04N2201/03129H04N2201/03137H04N2201/03145
    • An image sensing apparatus having a large depth of focus (DOF) and being compact in size is provided. The image sensing apparatus includes a plurality of light sources that shines light beams on an illumination portion of a document; a first mirror that receives incident light scattered by reflection from the document, to reflect the scattered light in the secondary scan direction; a plurality of first concaved aspheric mirrors that collimates light beams from the first mirror, to reflect therefrom the collimated light beams as substantially collimated light fluxes; an aperture mirror that reflects therefrom the light beams from the respective first aspheric mirrors, through apertures each having a light-shielded portion formed therearound and selectively passing the light beams therethrough; a plurality of second concaved aspheric mirrors that receives the light beams incident from the respective aperture mirror, to reflect the incident light beams as converging light beams; a second mirror that reflects the light beams in a direction perpendicular to the surface of the document, disposed on a path of the light beams to be converged by means of the second aspheric mirrors; a plurality of light receivers each having a light-receiving area that receives the light beams from the second mirrors, to form images according to the light beams from the respective apertures; and a casing where the first and second aspheric mirrors are disposed on a first side of the casing in the secondary scan direction, and the aperture mirror is disposed on a second side thereof in the secondary scan direction.
    • 提供了具有较大焦距(DOF)并且尺寸紧凑的图像感测装置。 图像感测装置包括将光束照射在文件的照明部分上的多个光源; 第一反射镜,其接收从原稿反射散射​​的入射光,以反射二次扫描方向上的散射光; 多个第一凹入非球面镜,其准直来自第一反射镜的光束,从而将准直光束反射为基本上准直的光束; 一个孔径反射镜,从其反射来自各个第一非球面反射镜的光束,通过各孔具有形成在其周围的光屏蔽部分,并选择性地使光束通过其中; 多个第二凹面非球面镜,其接收从相应孔径镜入射的光束,以将入射光束反射为会聚光束; 第二反射镜,其在垂直于文件表面的方向上反射光束,设置在通过第二非球面镜聚焦的光束的路径上; 多个光接收器,每个光接收器具有接收来自第二反射镜的光束的光接收区域,以根据来自各孔的光束形成图像; 以及壳体,其中所述第一和第二非球面镜在所述副扫描方向上设置在所述壳体的第一侧上,并且所述孔径反射镜被设置在所述副扫描方向的第二侧上。
    • 15. 发明授权
    • Image processing apparatus
    • 图像处理装置
    • US07006247B1
    • 2006-02-28
    • US09716958
    • 2000-11-22
    • Hiroshi SekineHiroyuki KawanoTakanobu Otsubo
    • Hiroshi SekineHiroyuki KawanoTakanobu Otsubo
    • G06K15/00
    • H04N1/3871H04N1/46
    • There is provided an image processing apparatus where in an additional image storage unit 3, a color additional image is stored into a color image storage unit 4, and a black/white additional image is stored into a black/white image storage unit 5. A color judging unit 2 judges as to whether an input image corresponds to a color image, or a black/white image every page thereof. Based upon the judgment result of the color judging unit 2, an image synthesizing unit 6 adds the color additional image stored in the color image storage unit 4 to the input image when the input image is the color image, and adds the black/white additional image stored in the black/white image storage unit 5 in the input image when the input image is the black/white image. Then, the image synthesizing unit 6 outputs the resulting image synthesized with the additional image. When the input image is the black/white image, the black/white additional image is added to this input image charge amount for the black/white image can be determined.
    • 提供了一种图像处理装置,其中在附加图像存储单元3中,彩色附加图像被存储到彩色图像存储单元4中,并且黑/白附加图像被存储到黑/白图像存储单元5中。 颜色判断单元2判断输入图像是否对应于每页的彩色图像或黑/白图像。 基于颜色判断单元2的判断结果,当输入图像为彩色图像时,图像合成单元6将存储在彩色图像存储单元4中的颜色附加图像添加到输入图像,并将黑色/白色附加 当输入图像是黑/白图像时,输入图像中存储在黑/白图像存储单元5中的图像。 然后,图像合成单元6输出由附加图像合成的结果图像。 当输入图像是黑/白图像时,黑/白附加图像被添加到该输入图像中,可以确定黑/白图像的电荷量。
    • 19. 发明授权
    • Method for fabricating a semiconductor device
    • 半导体器件的制造方法
    • US06660617B2
    • 2003-12-09
    • US09899175
    • 2001-07-06
    • Hiroyuki Kawano
    • Hiroyuki Kawano
    • H01L2176
    • H01L23/544H01L21/76229H01L2223/54406H01L2223/54493H01L2924/0002H01L2924/00
    • A semiconductor device having an STI structure is provided by eliminating a problem of insufficient polishing of an insulating film on chips adjacent to a marking region by making a polishing pressure equal for all of the chips. A method for fabricating a semiconductor device having an isolation structure of the present invention includes: processing a marking region of a wafer having a device region, a grid line region and the marking region in order to enable a substantially equal polishing pressure to be applied to chips adjacent to the marking region of the wafer and to other chips, for example, by tapering or recessing; marking in the marking region; forming a nitride film and an oxide film on a surface of the wafer; removing the oxide film by polishing; and removing the nitride film.
    • 提供了一种具有STI结构的半导体器件,通过消除与标记区域相邻的芯片上的绝缘膜的研磨不充分的问题,通过使所有芯片的抛光压力相等。 制造具有本发明的隔离结构的半导体器件的方法包括:处理具有器件区域,栅格线区域和标记区域的晶片的标记区域,以便能够将基本上相等的抛光压力施加到 例如,通过锥形或凹陷,与晶片的标记区域相邻的芯片和其它芯片; 标记区域; 在所述晶片的表面上形成氮化物膜和氧化物膜; 通过抛光去除氧化膜; 并除去氮化物膜。
    • 20. 发明授权
    • Method for detecting scratch of an insulating film
    • 检测绝缘膜划痕的方法
    • US06387811B1
    • 2002-05-14
    • US09612461
    • 2000-07-07
    • Hiroyuki Kawano
    • Hiroyuki Kawano
    • H01L21302
    • G01N21/95
    • In a device having a structure in which a silicon oxide film, a silicon nitride film, and a silicon oxide film are layered on a silicon substrate in that order from a bottom position, CMP polishing is performed in order for a top layer of a silicon oxide film to residually exist. An etchant for selectively etching a silicon nitride film only is then used. Only a nitride film in a scratched portion, the depth of which is deeper than the depth of the silicon oxide film, is selectively etched, and only the scratch, the depth of which is deeper than the depth of the residual film of the silicon oxide film, is exposed.
    • 在从底部开始依次层叠氧化硅膜,氮化硅膜和氧化硅膜的结构的装置中,为了使硅的顶层进行CMP研磨 氧化膜残留存在。 然后使用用于选择性地蚀刻氮化硅膜的蚀刻剂。 只有深度比氧化硅深度深的刮痕部分中的氮化物膜被选择性地蚀刻,并且只有其深度比氧化硅的残留膜的深度更深的划痕 电影,暴露。