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11. 发明申请

US20130081942A1 Thin Film Formation Method and Thin Film Formation Apparatus 有权
标题翻译：薄膜形成方法和薄膜形成装置
公开(公告)号：US20130081942A1
公开(公告)日：2013-04-04
申请号：US13704568
申请日：2011-06-13
申请人： Yohei Hinata , Kyokuyo Sai , Yoshiyuki Otaki , Ichiro Shiono , Yousong Jiang
发明人： Yohei Hinata , Kyokuyo Sai , Yoshiyuki Otaki , Ichiro Shiono , Yousong Jiang
IPC分类号： C23C14/54
CPC分类号： C23C14/545 , C23C14/3464 , C23C14/3492 , C23C14/505 , C23C14/54 , C23C14/547 , G02B5/28
摘要： A thin film formation method is provided, by which needless film formation due to trial film formation is omitted and film formation efficiency can be improved. This invention is a method for sputtering targets to form a film A having an intended film thickness of T1 as the first thin film on a substrate and monitor substrate held and rotated by a rotation drum and, subsequently, furthermore sputtering the targets used in forming the film A to form a film C having an intended film thickness of T3 as the second thin film, which is another thin film having the same composition as the film A; comprising film thickness monitoring steps S4 and S5, a stopping step S7, an actual time acquisition step S8, an actual rate calculating step S9 and a necessary time calculating step S24.
摘要翻译：提供了一种薄膜形成方法，由此省略了由于试制成膜而形成的不必要的成膜，并且可以提高成膜效率。本发明是一种用于溅射靶材以形成具有预定的膜厚度T1作为第一薄膜的薄膜A的方法，该基材和由旋转滚筒保持和旋转的监测基板，随后进一步溅射形成膜A形成具有期望的膜厚度T3的膜C作为第二薄膜，其是具有与膜A相同组成的另一薄膜; 包括膜厚监测步骤S4和S5，停止步骤S7，实际时间获取步骤S8，实际速率计算步骤S9和必要时间计算步骤S24。

12. 发明申请

US20120105872A1 OPTICAL FILM THICKNESS METER AND THIN FILM FORMING APPARATUS PROVIDED WITH OPTICAL FILM THICKNESS METER 有权
标题翻译：光学薄膜厚度计和薄膜形成装置的光学薄膜厚度计
公开(公告)号：US20120105872A1
公开(公告)日：2012-05-03
申请号：US13381032
申请日：2010-06-29
申请人： Kyokuyo Sai , Yohei Hinata , Yoshiyuki Otaki , Yousong Jiang
发明人： Kyokuyo Sai , Yohei Hinata , Yoshiyuki Otaki , Yousong Jiang
IPC分类号： G01B11/28
CPC分类号： G01B11/06 , C23C14/34 , C23C14/547 , G01B11/0625
摘要： An optical film thickness meter capable of measurement of an optical film thickness and spectroscopic characteristics with high accuracy and a thin film forming apparatus provided with the optical film thickness meter are provided. The optical film thickness meter includes a light projector (11), a reflection mirror (17), a light receiver (19), and a monochromator (20), and the reflection mirror (17) has a reflection surface disposed substantially perpendicularly to the optical axis of measurement light on the side opposite to an actual substrate (S) with respect to an incident direction of the measurement light. Also, the actual substrate (9) is disposed having a predetermined inclination angle (α) with respect to the optical axis of the measurement light. The measurement light (outgoing light and reflection light) passes through the actual substrate (S) twice, whereby a change amount in transmissivity (light amount) can be increased, and control accuracy of film thickness measurement can be improved. Also, occurrence of a measurement error caused by a difference in transmission positions can be prevented, and since the measurement light which has not passed through the measurement substrate twice along a predetermined path is no longer detected on the light receiver (19) side, the optical film thickness and spectroscopic characteristics can be measured with high accuracy.
摘要翻译：提供了能够高精度地测量光学膜厚度和光谱特性以及设置有光学膜厚计的薄膜形成装置的光学膜厚计。光学薄膜厚度计包括光投影仪（11），反射镜（17），光接收器（19）和单色仪（20），反射镜（17）具有基本垂直于相对于测量光的入射方向与实际基板（S）相反的一侧的测量光的光轴。此外，实际的基板（9）相对于测量光的光轴具有预定的倾斜角（α）。测量光（出射光和反射光）通过实际基板（S）两次，从而可以提高透射率（光量）的变化量，并且可以提高膜厚测量的控制精度。此外，可以防止由于发送位置的差异而引起的测量误差的发生，并且由于在光接收器（19）侧不再检测未沿着预定路径通过测量基板的测量光两次，可以高精度地测量光学膜厚度和光谱特性。

13. 发明申请

US20110262656A1 OPTICAL THIN-FILM VAPOR DEPOSITION APPARATUS AND OPTICAL THIN-FILM PRODUCTION METHOD 审中-公开
标题翻译：光学薄膜蒸发沉积装置和光薄膜生产方法
公开(公告)号：US20110262656A1
公开(公告)日：2011-10-27
申请号：US13179004
申请日：2011-07-08
申请人： Ekishu Nagae , Yousong Jiang , Ichiro Shiono , Tadayuki Shimizu , Tatsuya Hayashi , Makoto Furukawa , Takanori Murata
发明人： Ekishu Nagae , Yousong Jiang , Ichiro Shiono , Tadayuki Shimizu , Tatsuya Hayashi , Makoto Furukawa , Takanori Murata
IPC分类号： B05D3/06
CPC分类号： C23C14/22 , C23C14/083 , C23C14/10 , C23C14/221 , C23C14/225 , H01J2237/0041 , H01J2237/3132
摘要： A method of vapor depositing a vapor deposition substance onto substrates within a vacuum vessel includes holding the substrates with a dome shaped holder disposed within the vacuum vessel, rotating the dome shaped holder, vapor depositing a substance from a vapor deposition source disposed oppositely to the substrates, supplying ions from an ion source to the substrates, and supplying neutralizing electrons from a neutralizer to the substrates.
摘要翻译：将真空容器内的气相沉积物质气相沉积到基板上的方法包括：将基板保持在设置在真空容器内的圆顶形保持器，旋转圆顶形夹持器，从与基板相对设置的气相沉积源汽相沉积物质将离子源从离子源供给到衬底，并将中和电子从中和剂供给到衬底。

14. 发明申请

US20110151135A1 OPTICAL THIN-FILM DEPOSITION DEVICE AND OPTICAL THIN-FILM FABRICATION METHOD 有权
标题翻译：光学薄膜沉积装置和光学薄膜制造方法
公开(公告)号：US20110151135A1
公开(公告)日：2011-06-23
申请号：US13058557
申请日：2009-08-17
申请人： Ekishu Nagae , Yousong Jiang , Ichiro Shiono , Tadayuki Shimizu , Tatsuya Hayashi , Makoto Furukawa , Takanori Murata
发明人： Ekishu Nagae , Yousong Jiang , Ichiro Shiono , Tadayuki Shimizu , Tatsuya Hayashi , Makoto Furukawa , Takanori Murata
IPC分类号： C23C14/48
CPC分类号： C23C14/22 , C23C14/083 , C23C14/10 , C23C14/221 , C23C14/225 , H01J2237/0041 , H01J2237/3132
摘要： An optical thin-film vapor deposition apparatus and method are capable of producing an optical thin-film by vapor depositing a vapor deposition substance onto substrates (14) within a vacuum vessel (10). A dome shaped holder (12) is disposed within the vacuum vessel (10) and holds the substrates (14). A drive rotates the dome shaped holder (12). A vapor depositing source (34) is disposed oppositely to the substrates (14). An ion source (38) irradiates ions to the substrates (14). A neutralizer (40) irradiates electrons to the substrates (14). The ion source (38) is disposed at an angle between an axis, along which ions are irradiated from the ion source (38), and a line perpendicular to a surface of each of the substrates (14). The angle is between 8° inclusive and 40° inclusive. A ratio of a distance in a vertical direction between (i) a center of rotational axis of the dome shaped holder (12), and (ii) a center of the ion source (38), relative to a diameter of the dome shaped holder (12), is between 0.5 inclusive and 1.2 inclusive.
摘要翻译：光学薄膜蒸镀装置和方法能够通过将气相沉积物质蒸镀在真空容器（10）内的基板（14）上来制造光学薄膜。圆顶形保持器（12）设置在真空容器（10）内并保持基板（14）。驱动器旋转圆顶形保持器（12）。气相沉积源（34）与衬底（14）相对设置。离子源（38）将离子照射到衬底（14）上。中和器（40）将电子照射到衬底（14）上。离子源（38）以垂直于每个基板（14）的表面的线与离子源（38）照射的轴线之间成角度地设置。角度介于8°至40°之间。（i）圆顶状保持器（12）的旋转轴的中心与（ii）离子源（38）的中心之间的垂直方向上的距离相对于圆顶状保持器的直径的比例（12），介于0.5和0.5之间。

15. 发明授权

US09157146B2 Method for depositing silicon carbide film 有权
标题翻译：沉积碳化硅膜的方法
公开(公告)号：US09157146B2
公开(公告)日：2015-10-13
申请号：US13700695
申请日：2011-08-02
申请人： Takuya Sugawara , Hikaru Aoshima , Yousong Jiang , Ichiro Shiono , Ekishu Nagae
发明人： Takuya Sugawara , Hikaru Aoshima , Yousong Jiang , Ichiro Shiono , Ekishu Nagae
IPC分类号： C23C14/34 , C23C14/35 , C23C14/00 , C23C14/06 , C23C14/58 , G02B1/10
CPC分类号： C23C14/35 , C23C14/0078 , C23C14/0635 , C23C14/3464 , C23C14/5826 , G02B1/10
摘要： A film deposition method of a silicon carbide thin film having a high transmissivity and high film strength applicable for optical use purposes is provided. The film can be formed safely and efficiently in a short time and on a low heat resistance substrate. The method can include depositing a silicon carbide thin film on a moving substrate by using a film formation apparatus configured such that a reaction process region and film formation process regions are arranged spatially separated from one another in a vacuum container. Silicon targets can be sputtered in one region and carbon targets can be sputtered in another region. Thereby, an interlayer thin film containing silicon and carbon is formed on the substrate. Next, in another region, the interlayer thin film can be exposed to plasma generated in an atmosphere of a mixed gas including inert gas and hydrogen.
摘要翻译：提供了适用于光学用途的具有高透射率和高膜强度的碳化硅薄膜的成膜方法。该膜可以在短时间内和低耐热性基材上安全有效地形成。该方法可以包括通过使用成膜装置在移动的基板上沉积碳化硅薄膜，所述成膜装置被配置成使得反应处理区域和成膜处理区域在真空容器中彼此空间上分开布置。硅靶可以在一个区域溅射，并且碳靶可以在另一个区域溅射。由此，在基板上形成含有硅和碳的层间薄膜。接下来，在另一区域中，层间薄膜可以暴露于在包含惰性气体和氢气的混合气体的气氛中产生的等离子体。

16. 发明授权

US08826856B2 Optical thin-film vapor deposition apparatus and optical thin-film production method 有权
标题翻译：光学薄膜蒸镀装置及光学薄膜制造方法
公开(公告)号：US08826856B2
公开(公告)日：2014-09-09
申请号：US13058557
申请日：2009-08-17
申请人： Ekishu Nagae , Yousong Jiang , Ichiro Shiono , Tadayuki Shimizu , Tatsuya Hayashi , Makoto Furukawa , Takanori Murata
发明人： Ekishu Nagae , Yousong Jiang , Ichiro Shiono , Tadayuki Shimizu , Tatsuya Hayashi , Makoto Furukawa , Takanori Murata
IPC分类号： C23C16/00 , C23C16/50 , C23C14/22 , C23C14/10 , C23C14/08
CPC分类号： C23C14/22 , C23C14/083 , C23C14/10 , C23C14/221 , C23C14/225 , H01J2237/0041 , H01J2237/3132
摘要： An optical thin-film vapor deposition apparatus and method are capable of producing an optical thin-film by vapor depositing a vapor deposition substance onto substrates (14) within a vacuum vessel (10). A dome shaped holder (12) is disposed within the vacuum vessel (10) and holds the substrates (14). A drive rotates the dome shaped holder (12). A vapor depositing source (34) is disposed oppositely to the substrates (14). An ion source (38) irradiates ions to the substrates (14). A neutralizer (40) irradiates electrons to the substrates (14). The ion source (38) is disposed at an angle between an axis, along which ions are irradiated from the ion source (38), and a line perpendicular to a surface of each of the substrates (14). The angle is between 8° inclusive and 40° inclusive. A ratio of a distance in a vertical direction between (i) a center of rotational axis of the dome shaped holder (12), and (ii) a center of the ion source (38), relative to a diameter of the dome shaped holder (12), is between 0.5 inclusive and 1.2 inclusive.
摘要翻译：光学薄膜蒸镀装置和方法能够通过将气相沉积物质蒸镀在真空容器（10）内的基板（14）上来制造光学薄膜。圆顶形保持器（12）设置在真空容器（10）内并保持基板（14）。驱动器旋转圆顶形保持器（12）。气相沉积源（34）与衬底（14）相对设置。离子源（38）将离子照射到衬底（14）上。中和器（40）将电子照射到衬底（14）上。离子源（38）以垂直于每个基板（14）的表面的线与离子源（38）照射的轴线之间成角度地设置。角度介于8°至40°之间。（i）圆顶状保持器（12）的旋转轴的中心与（ii）离子源（38）的中心之间的垂直方向上的距离相对于圆顶状保持器的直径的比例（12），介于0.5和0.5之间。

17. 发明申请

US20140016139A1 OPTICAL FILM THICKNESS MEASURING DEVICE AND THIN FILM FORMING APPARATUS USING THE OPTICAL FILM THICKNESS MEASURING DEVICE 有权
标题翻译：光学薄膜厚度测量装置和薄膜形成装置使用光学薄膜厚度测量装置
公开(公告)号：US20140016139A1
公开(公告)日：2014-01-16
申请号：US13823527
申请日：2012-02-15
申请人： Kyokuyo Sai , Yousong Jiang , Kenji Ozawa
发明人： Kyokuyo Sai , Yousong Jiang , Kenji Ozawa
IPC分类号： G01B11/06
CPC分类号： G01B11/0691 , C23C14/0078 , C23C14/505 , C23C14/547 , G01B11/0625
摘要： An optical film thickness measuring device, enabling direct measurement of a film thickness of a product in real time accurately without a monitor substrate, includes: a projector, a light receiver, inner beam splitters disposed in a base substrate holder to reflect a measurement beam to a base substrate, an inner optical reflector that totally reflects a measurement beam from the closest inner beam splitter, external beam splitters the measurement beam from the inner beam splitters toward the light receiver, and an outer optical reflector that reflects the measurement beam from the optical reflector toward the light receiver. The measurement beam reflected by the inner beam splitters and the inner optical reflector is passed through the base substrate and then reflected by the external beam splitters and the outer optical reflector to be guided to the light receiver, so that the measurement beam is received by the light receiver.
摘要翻译：一种光学膜厚度测量装置，能够在没有监视器基板的情况下实时精确地直接测量产品的膜厚度，包括：投影仪，光接收器，设置在基板保持器中的内分束器，以将测量光束反射到基底基板，全反射来自最近内分束器的测量光束的内部光学反射器，外部光束将测量光束从内部分束器分离到光接收器，以及外部光学反射器，其将测量光束从光学反射器朝向光接收器。由内分束器和内部光学反射器反射的测量光束通过基底基板，然后被外部分束器和外部光学反射器反射，以被引导到光接收器，使得测量光束被光接收机。

18. 发明申请

US20130180851A1 MAGNETIC FIELD GENERATOR, MAGNETRON CATHODE AND SPATTERING APPARATUS 有权
标题翻译：磁场发生器，MAGNETRON CATHODE和散热装置
公开(公告)号：US20130180851A1
公开(公告)日：2013-07-18
申请号：US13698884
申请日：2011-08-30
申请人： Wei Kong , Zijing Lin , Ming Li , Bin Xie , Haiqian Wang , Yousong Jiang , Ekishu Nagae
发明人： Wei Kong , Zijing Lin , Ming Li , Bin Xie , Haiqian Wang , Yousong Jiang , Ekishu Nagae
IPC分类号： C23C14/35 , H01J25/50 , H01F7/08
CPC分类号： C23C14/351 , C23C14/35 , H01F7/081 , H01J25/50 , H01J37/3405 , H01J37/3452 , H01J37/3461
摘要： A magnetic field generator arranged behind a target and for generating a magnetic field on a front surface of the target based on magnetic force lines can include a ring-shaped outer magnetic body having a pole axis in a parallel direction (X-direction) with respect to the target surface, a center magnetic body arranged on an inner side of the outer magnetic body and having a pole axis in a parallel direction (X-direction) with the direction of the pole axis of the outer magnetic body, a yoke plate for supporting the outer magnetic body and the center magnetic body from behind, and a magnetic permeable plate for changing a magnetic field distribution of the front surface of the target. The magnetic permeable plate is arranged so as to be supported by the yoke plate from behind.
摘要翻译：布置在目标之后并且用于基于磁力线在目标的前表面上产生磁场的磁场发生器可以包括一个环形外磁体，其具有平行方向（X方向）的极轴，相对于设置在外磁体的内侧并具有与外磁性体的磁极轴方向平行（X方向）的极轴的中心磁体的目标表面的磁轭，用于从后面支撑外磁体和中心磁体，以及用于改变靶的前表面的磁场分布的磁导透板。磁导透镜板被布置成从后面被轭板支撑。

19. 发明申请

US20130074767A1 THIN FILM FORMING APPARATUS 有权
标题翻译：薄膜成型装置
公开(公告)号：US20130074767A1
公开(公告)日：2013-03-28
申请号：US13621337
申请日：2012-09-17
申请人： Yousong JIANG , Ichiro SHIONO , Mitsuhiro MIYAUCHI , Takaaki AOYAMA , Tatsuya HAYASHI , Ekishu NAGAE
发明人： Yousong JIANG , Ichiro SHIONO , Mitsuhiro MIYAUCHI , Takaaki AOYAMA , Tatsuya HAYASHI , Ekishu NAGAE
IPC分类号： B05C13/00
CPC分类号： C23C14/042 , C23C14/04 , C23C14/24 , C23C14/50 , C23C14/505 , C23C16/04 , C23C16/042 , C23C16/4584
摘要： Provided is a thin film forming apparatus for reducing operation time and cost by forming a film only on a specific portion on substrates. A substrate holding mechanism provided in the apparatus includes: substrate holding members holding substrates in a manner that a part of a non-film forming portion of a substrate overlaps the other substrate and a film forming portion is exposed, a support member supporting the substrate holding members, and a rotation member which rotates the support member. The substrate holding members include: holding surfaces holding the substrates and disposed between a film forming source and the substrates, step portions formed between the holding surfaces in a manner that ends of the substrates respectively contact with the step portions, and opening portions formed on the holding surfaces of the portion corresponding to the film forming portion when the ends of the substrates contact with the step portions.
摘要翻译：提供了一种通过仅在基板上的特定部分上形成膜来减少操作时间和成本的薄膜形成装置。设置在该设备中的基板保持机构包括：基板保持部件，其以基板的非成膜部分的一部分与另一个基板重叠并且成膜部分露出的方式保持基板;支撑部件，其支撑基板保持构件，以及使支撑构件旋转的旋转构件。基板保持构件包括：保持基板并且配置在成膜源与基板之间的保持面，以与基板的端部分别接触的台阶部分之间形成在保持面之间的台阶部，当基板的端部与台阶部分接触时，保持对应于成膜部分的部分的表面。

20. 发明申请

US20110151138A1 METHOD FOR DEPOSITING FILM 有权
标题翻译：沉积膜的方法
公开(公告)号：US20110151138A1
公开(公告)日：2011-06-23
申请号：US13061624
申请日：2009-08-24
申请人： Ichiro Shiono , Ekishu Nagae , Yousong Jiang , Takuya Sugawara
发明人： Ichiro Shiono , Ekishu Nagae , Yousong Jiang , Takuya Sugawara
IPC分类号： B05D3/06 , C23C14/34
CPC分类号： C23C14/022 , C03C17/42 , C03C19/00 , C03C2217/77 , C23C14/0078 , C23C14/3464 , C23C14/505 , C23C14/568 , H01J37/321 , H01J37/32422 , H01J37/32513 , H01J37/32633 , H01J37/32761 , H01J37/34
摘要： The method for depositing a film of the present invention comprises the first irradiation step of irradiating particles having energy on a surface of a substrate 101, the first film deposition step of depositing a first film 103 on the surface of the substrate 101 subjected to the first irradiation step by using a dry process, and the second film deposition step of depositing a second film 105 having oil repellency on a surface of the first film 103. According to the present invention, a method for depositing a film enabling production of an oil-repellent substrate comprising an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.
摘要翻译：本发明的膜的沉积方法包括：在基板101的表面上照射具有能量的颗粒的第一照射步骤，第一膜沉积步骤，在经受第一次的基板101的表面上沉积第一膜103 通过使用干法进行照射步骤，以及第二膜沉积步骤，在第一膜103的表面上沉积具有拒油性的第二膜105.根据本发明，一种用于沉积膜的方法，可以提供包括具有实际上足够水平的耐磨性的防油膜的防水衬底。

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