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11. 发明授权

US1065225A Deep-well pump. 失效
标题翻译：深层泵
公开(公告)号：US1065225A
公开(公告)日：1913-06-17
申请号：US1912736786
申请日：1912-12-14
申请人： CUNNINGHAM WILLIAM STANTON
发明人： CUNNINGHAM WILLIAM STANTON
CPC分类号： F04B47/00

12. 发明授权

US07815372B2 Pop-up disposable bag 失效
标题翻译：弹出一次性袋
公开(公告)号：US07815372B2
公开(公告)日：2010-10-19
申请号：US11505238
申请日：2006-08-15
申请人： John William Stanton , Ronald Ghee Jin Ong
发明人： John William Stanton , Ronald Ghee Jin Ong
IPC分类号： B65D30/16 , B65D33/06 , B65D30/10 , A63B55/04
CPC分类号： B65F1/1415 , B65F1/0006 , B65F2220/106
摘要： Pop-up disposable bag is formed of light-weight disposable bag assembly capable of self erecting and self-standing. It does not require any stakes, poles, ropes or additional supports or frame to support it. The entire bag assembly is flexible and can be folded to a compact form for packaging and sale and can easily be opened into a self-standing position by removing the retainer.
摘要翻译：弹性一次性袋由重量轻的一次性袋组件形成，能够自立和自立。它不需要任何桩，杆，绳索或额外的支撑或框架来支撑它。整个袋组件是柔性的，并且可以折叠成紧凑形式用于包装和销售，并且可以通过移除保持器而容易地打开成自立式位置。

13. 发明申请

US20080044630A1 STRUCTURAL SHEAR PLATE FOR A VEHICLE 有权
标题翻译：用于车辆的结构剪板
公开(公告)号：US20080044630A1
公开(公告)日：2008-02-21
申请号：US11847411
申请日：2007-08-30
申请人： Kevin Lusk , William Stanton
发明人： Kevin Lusk , William Stanton
IPC分类号： B32B3/02 , B29C65/00
CPC分类号： B62D29/041 , B29C70/443 , B29C70/865 , B29L2031/608 , B62D25/087 , B62D25/20 , Y10T428/24612 , Y10T428/24653
摘要： A structural shear panel for forming a floor panel for support by a vehicle frame is formed by a composite of top and bottom sheets and a core with a vacuum infused resin. The panel is mainly planar and terminates at its side edges at a portion which lies in a common plane and portions are provided which are deformed out of the generally planar shape to form depending or elevated sections. The structure is formed on a generally flat plate defining the planar panel portion with removable sections to define the depending and elevated sections. Edge pieces are attached to the plate to define the edges of the panel. Accessories are attached to the panel without compressing the core by a base plate of the accessory which is bolted to a bracket which has a backer plate and collar through a hole in the panel.
摘要翻译：用于形成用于车架支撑的地板镶板的结构剪切板通过顶片和底片与具有真空注入树脂的芯的复合形成。面板主要是平面的，并且在其侧边缘处终止于位于公共平面中的部分，并且设置部分被变形为大致平面形状，以形成垂直或升高的部分。该结构形成在限定平面板部分的大致平坦的板上，具有可移除部分以限定垂直和升高的部分。边缘片连接到板上以限定面板的边缘。附件被附接到面板上，而不是通过附件的底板压缩芯，该基板螺栓连接到支架上，该支架具有通过面板中的孔的支撑板和套环。

14. 发明申请

US20060093927A1 Pattern mask with features to minimize the effect of aberrations 审中-公开
公开(公告)号：US20060093927A1
公开(公告)日：2006-05-04
申请号：US11305197
申请日：2005-12-19
申请人： Pary Baluswamy , William Stanton , William Baggenstoss
发明人： Pary Baluswamy , William Stanton , William Baggenstoss
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/36 , G03F1/26 , G03F7/70433
摘要： A semiconductor pattern mask that might otherwise exhibit three-fold symmetry, which could give rise to distorted semiconductor features in the presence of three-leaf aberration in the optical system used to expose a semiconductor wafer through the mask, is altered to break up the three-fold symmetry without altering the semiconductor features that are formed. This accomplished by adding features to the mask that break up the symmetry. One way of achieving that result is to make the added features of “sub-resolution” size that do not produce features on the exposed wafer. Another way of achieving that result is to change existing features that do form structures in such a way (e.g., with optical elements) that changes the relative phase, amplitude or other characteristic of light transmitted through those features.

15. 发明申请

US20050049839A1 Methods of forming radiation-patterning tools; carrier waves and computer readable media 失效
标题翻译：形成辐射图案工具的方法; 载波和计算机可读介质
公开(公告)号：US20050049839A1
公开(公告)日：2005-03-03
申请号：US10953982
申请日：2004-09-28
申请人： William Stanton
发明人： William Stanton
IPC分类号： G03F1/00 , G03F1/36 , G03F7/20 , G06F17/50 , G06F7/60 , G06F17/10
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： The invention includes a method for placement of sidelobe inhibitors on a radiation-patterning tool. Elements of the tool are represented by design features in a modeling domain. The modeling domain is utilized to generate vectors spanning between edges of design features within a threshold spatial distance of one another. Locations of vector midpoints are identified. The locations are utilized in identifying areas where sidelobe overlap is likely. The areas are shifted from the modeling domain to a real domain, and in the real domain correspond to regions of the tool where sidelobe overlap is likely to occur. Sidelobe inhibitors are formed across at least some of the identified regions of the tool. The invention includes computer readable code that can enable a computer to determine locations for placement of the sidelobe inhibitors.
摘要翻译：本发明包括一种将旁瓣抑制剂放置在辐射图案化工具上的方法。该工具的元素由建模域中的设计特征表示。建模域被用于在彼此的阈值空间距离内产生跨越设计特征的边缘之间的向量。识别矢量中点的位置。这些位置用于识别旁瓣重叠可能的区域。这些区域从建模域移动到真实域，而实际域对应于可能发生旁瓣重叠的工具区域。旁瓣抑制剂跨过工具的至少一些所识别的区域形成。本发明包括计算机可读代码，其可以使得计算机能够确定放置旁瓣抑制剂的位置。

16. 发明申请

US20050014078A1 Reticles and methods of forming and using the same 失效
标题翻译：织物及其形成和使用方法
公开(公告)号：US20050014078A1
公开(公告)日：2005-01-20
申请号：US10919059
申请日：2004-08-16
申请人： William Baggenstoss , Byron Burgess , Erik Byers , William Stanton
发明人： William Baggenstoss , Byron Burgess , Erik Byers , William Stanton
IPC分类号： G03F1/00 , G03F1/36 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70941 , G03F1/36 , G03F1/70 , G03F7/70433
摘要： Reticles having reticle patterns suitable for reducing edge of array effects are provided. The reticle patterns have unresolvable patterns formed in the periphery areas of the reticle patterns. The unresolvable patterns are non-transparent with respect to patterning radiation. Systems incorporating the reticles are also provided. Additionally, methods of forming and using the reticles are provided.
摘要翻译：提供了具有适于减少阵列效应边缘的掩模版图案的网状物。标线图案具有在分划板图案的周边区域中形成的不可分辨图案。关于图案化辐射，不可分辨的图案是不透明的。还提供了包含标线的系统。此外，提供了形成和使用掩模版的方法。

17. 发明申请

US20050008953A1 Methods of forming patterned reticles 失效
公开(公告)号：US20050008953A1
公开(公告)日：2005-01-13
申请号：US10912510
申请日：2004-08-04
申请人： H. Dulman , William Stanton , John Futrell
发明人： H. Dulman , William Stanton , John Futrell
IPC分类号： G03C5/00 , G03F1/00 , G03F1/36 , G03F9/00 , G06F17/50
CPC分类号： G03F1/36
摘要： The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.

18. 发明申请

US20050008952A1 Methods of forming patterned reticles 有权
公开(公告)号：US20050008952A1
公开(公告)日：2005-01-13
申请号：US10912256
申请日：2004-08-04
申请人： H. Dulman , William Stanton , John Futrell
发明人： H. Dulman , William Stanton , John Futrell
IPC分类号： G03C5/00 , G03F1/00 , G03F1/36 , G03F9/00 , G06F17/50
CPC分类号： G03F1/36
摘要： The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.

19. 发明申请

US20050008949A1 Methods of forming patterned reticles 失效
标题翻译：形成图案化掩模版的方法
公开(公告)号：US20050008949A1
公开(公告)日：2005-01-13
申请号：US10912029
申请日：2004-08-04
申请人： H. Dulman , William Stanton , John Futrell
发明人： H. Dulman , William Stanton , John Futrell
IPC分类号： G03C5/00 , G03F1/00 , G03F1/36 , G03F9/00 , G06F17/50
CPC分类号： G03F1/36
摘要： The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
摘要翻译：本发明包括形成图案化的掩模版的方法。在光学邻近校正之前，可以将设计特征引入到掩模版的布局中，然后在将图案胶带到掩模版之前去除。可以替代地或另外地，在光学邻近校正之后引入设计特征，而不对称地相对于掩模版图案的一个或多个部分。引入的特征随后可以作为形成图案化的掩模版的一部分而被粘贴在掩模版上。

20. 发明授权

US06418008B1 Enhanced capacitor shape 有权
标题翻译：增强电容器形状
公开(公告)号：US06418008B1
公开(公告)日：2002-07-09
申请号：US09798992
申请日：2001-03-06
申请人： Mark Jost , William Stanton , Christophe Pierrat
发明人： Mark Jost , William Stanton , Christophe Pierrat
IPC分类号： H01G4005
CPC分类号： H01L27/10852 , H01L21/3143 , H01L21/3212 , H01L27/10808 , H01L27/10855 , H01L28/84 , H01L28/91
摘要： A capacitor having a pear-shaped cross section is provided. In one embodiment, the pear-shaped capacitor is a stacked container capacitor used in a dynamic random access memory circuit with a bit-line-over-capacitor construction. Each capacitor is at a minimum bit line distance from all adjacent bit line contacts, and also at a minimum capacitor distance from all adjacent capacitors along a substantial portion of its perimeter.
摘要翻译：提供具有梨形截面的电容器。在一个实施例中，梨形电容器是用于具有位线电容器结构的动态随机存取存储器电路中的堆叠容器电容器。每个电容器处于与所有相邻位线触点的最小位线距离，并且在与其周边的实质部分的所有相邻电容器的最小电容器距离处。

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