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11. 发明授权

US08025923B2 Method for manufacturing a structure 失效
标题翻译：制造结构的方法
公开(公告)号：US08025923B2
公开(公告)日：2011-09-27
申请号：US12202972
申请日：2008-09-02
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takaemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takaemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
IPC分类号： B05D1/32
CPC分类号： B81C1/00111 , Y10S977/70 , Y10S977/84 , Y10S977/89 , Y10S977/892 , Y10T428/24802
摘要： A method of manufacturing a structure, including forming a composite film composed of a coating film and an organic or inorganic film on top of a substrate by forming the coating film on the surface of a template provided on top of the substrate; forming the organic or inorganic film on the surface of the coating film, and removing a portion of the organic or inorganic film and a portion of the coating film; forming a second coating film on the surface of the composite film; forming an organic coating film on the substrate that covers the second coating film; removing a portion of the second coating film; and forming a structure composed of a metal or metal oxide later on the substrate by removing all residues left on the substrate except for the coating film and the second coating film.
摘要翻译：一种结构的制造方法，其特征在于，在基板顶部的模板表面上形成涂膜，在基板顶部形成由涂膜和有机或无机膜构成的复合膜; 在涂膜表面上形成有机或无机膜，除去一部分有机或无机膜和一部分涂膜; 在复合膜的表面上形成第二涂膜; 在覆盖第二涂膜的基板上形成有机涂膜; 去除所述第二涂膜的一部分; 并且通过除去除了涂膜和第二涂膜之外残留在基板上的所有残留物，在基板上形成由金属或金属氧化物组成的结构。

12. 发明申请

US20080187724A1 Preparation method for nanomaterial, metal oxide nanomaterial formation composition used for the method,mold and metal oxide nanostructure 有权
标题翻译：用于该方法的纳米材料，金属氧化物纳米材料形成组合物的制备方法，模具和金属氧化物纳米结构
公开(公告)号：US20080187724A1
公开(公告)日：2008-08-07
申请号：US10840192
申请日：2004-05-06
申请人： Shigenori Fujikawa , Toyoki Kunitake
发明人： Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： B05D1/32 , B32B5/00
CPC分类号： B29C59/02 , B82Y30/00 , C01G23/047 , C01P2004/13 , C01P2004/64 , C03C17/23 , C03C23/006 , C23C18/1216 , C23C18/1225 , C23C18/125 , C23C18/14 , Y10T428/24802
摘要： A production method for a nanomaterial comprising the steps of: forming a template on a solid substrate using a metal oxide nanomaterial forming composition including an organic compound with a phenolic hydroxyl group and a molecular weight of at least 500, forming a metal oxide layer on the template, and removing the template to generate a metal oxide nanostructure.
摘要翻译：一种纳米材料的制造方法，其特征在于，包括以下工序：使用含有酚羟基和分子量为500以上的有机化合物的金属氧化物纳米材料形成用组合物在固体基材上形成模板，在所述固体基材上形成金属氧化物层模板，并去除模板以产生金属氧化物纳米结构。

13. 发明授权

US08999631B2 Primer and pattern forming method for layer including block copolymer 有权
标题翻译：含嵌段共聚物层的底漆和图案形成方法
公开(公告)号：US08999631B2
公开(公告)日：2015-04-07
申请号：US13820017
申请日：2011-09-12
申请人： Takahiro Senzaki , Takahiro Dazai , Ken Miyagi , Shigenori Fujikawa , Harumi Hayakawa , Mari Koizumi
发明人： Takahiro Senzaki , Takahiro Dazai , Ken Miyagi , Shigenori Fujikawa , Harumi Hayakawa , Mari Koizumi
IPC分类号： G03F7/11 , G03F7/20 , G03F7/26 , C08L53/00 , C09D161/06 , G03F7/00 , C09D125/14 , G03F7/075 , C08K5/42 , C08K5/45
CPC分类号： G03F7/11 , C08K5/42 , C08K5/45 , C08L53/00 , C09D125/14 , C09D161/06 , G03F7/00 , G03F7/0002 , G03F7/0233 , G03F7/0752 , G03F7/20 , G03F7/265 , Y10S438/947 , C08L25/02 , C08L2205/025 , C08L33/12 , C08L23/20 , C08F212/08 , C08F212/14 , C08F220/14 , C08F212/32 , C08F2220/325 , C08F2220/1858 , C08F220/18
摘要： An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
摘要翻译：一种底涂剂，其可用于相分离形成在基材上的层，所述层包含具有多个聚合物的嵌段共聚物，所述底涂剂包括树脂组分，和20摩尔％至80摩尔％的所有结构单元所述树脂组分是衍生自含芳环的单体的结构单元; 以及形成包含嵌段共聚物的层的图案的方法，所述方法包括：（1）在基材（1）上涂覆底涂层，从而形成由底涂层构成的层（2），步骤（2））形成包含在由所述底涂层构成的层（2）的表面上结合的多种聚合物的嵌段共聚物的层（3），并使含有嵌段共聚物的层（3）进行相分离，以及步骤 3）从含有嵌段共聚物的层（3）选择性地除去构成嵌段共聚物的多种共聚物中的至少一种聚合物的相（3a）。

14. 发明申请

US20140113236A1 SOLVENT DEVELOPABLE NEGATIVE RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN OF LAYER INCLUDING BLOCK COPOLYMER 有权
标题翻译：耐溶剂发展负极材料组合物，电阻图案形成方法和形成包括嵌段共聚物层的图案的方法
公开(公告)号：US20140113236A1
公开(公告)日：2014-04-24
申请号：US14125020
申请日：2012-06-08
申请人： Takahiro Senzaki , Ken Miyagi , Shigenori Fujikawa , Mari Koizumi , Harumi Hayakawa
发明人： Takahiro Senzaki , Ken Miyagi , Shigenori Fujikawa , Mari Koizumi , Harumi Hayakawa
IPC分类号： G03F7/32
CPC分类号： G03F7/32 , B82Y10/00 , B82Y40/00 , C08F220/10 , G03F7/0002 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0397 , G03F7/325
摘要： A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure.
摘要翻译：一种溶剂显影负色调抗蚀剂组合物，其含有在酸和在曝光时产生酸的酸产生剂组分（B）的作用下在有机溶剂中显示出增加的极性和降低的溶解性的基础组分（A），组分（A ）包括含有：由含有4〜12元含内酯的环状基团的丙烯酸酯衍生的结构单元（a2），含有3〜7元含醚的环状基团或5〜至7元含碳酸酯的环状基团; 和由含有酸分解性基团的丙烯酸酯衍生的结构单元（a1），该酸性发生剂组分（B）含有产生磺酸的化合物的酸产生剂（B1）曝光后

15. 发明申请

US20120048738A1 SUBSTRATE PROVIDED WITH METAL NANOSTRUCTURE ON SURFACE THEREOF AND METHOD OF PRODUCING THE SAME 有权
标题翻译：在其表面上具有金属纳米结构的基材及其生产方法
公开(公告)号：US20120048738A1
公开(公告)日：2012-03-01
申请号：US13218168
申请日：2011-08-25
申请人： Shigenori Fujikawa , Mari Koizumi , Takahiro Senzaki , Takahiro Dazai , Ken Miyagi
发明人： Shigenori Fujikawa , Mari Koizumi , Takahiro Senzaki , Takahiro Dazai , Ken Miyagi
IPC分类号： B32B15/08 , C25D5/54 , C25D5/34
CPC分类号： C23C18/54
摘要： A method of producing a substrate provided with a metal nanostructure on the surface thereof, including: forming a layer containing a block copolymer having a plurality of polymers bonded on a surface of a substrate, and subjecting the layer to phase separation, selectively removing a phase of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer to expose part of the surface of the substrate, and allowing a metal ion to come into contact with the exposed surface of the substrate to effect an electrochemical reaction between the surface of the substrate and the metal ion, thereby depositing a metal on the surface of the substrate; and a substrate provided with a metal nanostructure on the surface thereof produced by the same method.
摘要翻译：一种在其表面上具有金属纳米结构的基板的制造方法，其特征在于，包括：在基材表面上形成含有多个聚合物的嵌段共聚物的层，并对所述层进行相分离，选择性地除去相的至少一种由该层构成嵌段共聚物的多种共聚物的聚合物暴露于基材表面的一部分，并允许金属离子与基材的暴露表面接触，以实现在基板的表面和金属离子，从而在基板的表面上沉积金属; 以及通过相同的方法在其表面上设置有金属纳米结构的基板。

16. 发明授权

US07993706B2 Method of forming a nano-structure and the nano-structure 失效
标题翻译：形成纳米结构和纳米结构的方法
公开(公告)号：US07993706B2
公开(公告)日：2011-08-09
申请号：US11628793
申请日：2005-06-08
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
IPC分类号： B82B3/00 , C01B33/12 , H01L21/027
CPC分类号： G03F7/405 , H01L21/0272 , Y10T428/24802
摘要： A method of forming a nano-structure can form a fine pattern easily, and the nano-structure obtained by the method is provided. A method of forming a nano-structure comprising forming a thin film by a liquid phase adsorption on surface of a template formed on a substrate, and removing a portion of the thin film, and removing the template is used.
摘要翻译：形成纳米结构的方法可以容易地形成精细图案，并且提供通过该方法获得的纳米结构。使用形成纳米结构的方法，包括通过在形成在基板上的模板的表面上的液相吸附形成薄膜，以及去除薄膜的一部分，以及去除模板。

17. 发明授权

US07932013B2 Pattern coating material and pattern forming method 有权
标题翻译：图案涂层材料和图案形成方法
公开(公告)号：US07932013B2
公开(公告)日：2011-04-26
申请号：US11993444
申请日：2006-06-16
申请人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
发明人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： H01L21/0273 , G03F7/405
摘要： There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
摘要翻译：提供一种涂覆材料，其使用在基板上形成的图案作为掩模，在蚀刻工艺中提高图案的耐蚀刻性。该材料是使用在基板上形成的图案作为掩模的蚀刻工艺的图案涂覆材料，其包括在水解时可产生羟基的金属化合物（W）。

18. 发明授权

US07572400B2 Production method for a nanomaterial 有权
标题翻译：纳米材料的生产方法
公开(公告)号：US07572400B2
公开(公告)日：2009-08-11
申请号：US10840192
申请日：2004-05-06
申请人： Shigenori Fujikawa , Toyoki Kunitake
发明人： Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： B29C59/02
CPC分类号： B29C59/02 , B82Y30/00 , C01G23/047 , C01P2004/13 , C01P2004/64 , C03C17/23 , C03C23/006 , C23C18/1216 , C23C18/1225 , C23C18/125 , C23C18/14 , Y10T428/24802
摘要： A production method for a nanomaterial comprising the steps of: forming a template on a solid substrate using a metal oxide nanomaterial forming composition including an organic compound with a phenolic hydroxyl group and a molecular weight of at least 500, forming a metal oxide layer on the template, and removing the template to generate a metal oxide nanostructure.
摘要翻译：一种纳米材料的制造方法，其特征在于，包括以下工序：使用含有酚羟基和分子量为500以上的有机化合物的金属氧化物纳米材料形成用组合物在固体基材上形成模板，在所述固体基材上形成金属氧化物层模板，并去除模板以产生金属氧化物纳米结构。

19. 发明申请

US20090087625A1 METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE 失效
标题翻译：制造结构和结构的方法
公开(公告)号：US20090087625A1
公开(公告)日：2009-04-02
申请号：US12202972
申请日：2008-09-02
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
IPC分类号： B32B3/10 , B05D1/36
CPC分类号： B81C1/00111 , Y10S977/70 , Y10S977/84 , Y10S977/89 , Y10S977/892 , Y10T428/24802
摘要： A method of producing a structure, including: a composite film formation step that forms a composite film composed of a coating film and an organic film or inorganic film on top of a substrate by conducting Steps (1) to (3) below: (1) forming the coating film composed of a metal layer or a metal oxide layer on the surface of a template provided on top of the substrate, (2) forming the organic film or inorganic film on the surface of the coating film, and (3) removing a portion of the organic film or inorganic film and the coating film; a second coating film formation step that forms a second coating film composed of a metal layer or a metal oxide layer on the surface of the composite film; a coating step that, following formation of the second coating film, forms an organic coating film on the substrate that covers the surface of the substrate; a removal step that removes a portion of the second coating film, the side surfaces of which are at least partially supported by the organic coating film; and a structure formation step that forms a structure composed of a metal layer or metal oxide layer on the substrate by removing all residues left on the substrate except for the coating film and the second coating film.
摘要翻译：一种制造结构的方法，包括：通过进行下述步骤（1）至（3），在基板的顶部上形成由涂膜和有机膜或无机膜构成的复合膜的复合膜形成步骤：（1 ），在设置在基板顶部的模板表面上形成由金属层或金属氧化物层构成的涂膜，（2）在涂膜的表面形成有机膜或无机膜，（3）去除一部分有机膜或无机膜和涂膜; 第二涂膜形成步骤，在复合膜的表面上形成由金属层或金属氧化物层构成的第二涂膜; 涂覆步骤，在形成第二涂膜之后，在覆盖基材表面的基材上形成有机涂膜; 去除步骤，其去除第二涂膜的一部分，其侧表面至少部分地由有机涂膜支撑; 以及结构形成步骤，通过去除除了涂膜和第二涂膜之外的残留在基板上的残留物，在基板上形成由金属层或金属氧化物层构成的结构。

20. 发明申请

US20080020509A1 THIN FILM MATERIALS OF AMORPHOUS METAL OXIDES 失效
标题翻译：非晶金属氧化物薄膜材料
公开(公告)号：US20080020509A1
公开(公告)日：2008-01-24
申请号：US11780214
申请日：2007-07-19
申请人： Toyoki Kunitake , Izumi Ichinose , Shigenori Fujikawa , Jianguo Huang
发明人： Toyoki Kunitake , Izumi Ichinose , Shigenori Fujikawa , Jianguo Huang
IPC分类号： H01L21/00
CPC分类号： C23C18/1216 , C23C8/10 , C23C8/36 , C23C18/1287 , C23C26/00
摘要： Amorphous metal oxide thin film is produced by removing through oxygen plasma treatment the organic component from an organics/metal oxide composite thin film having thoroughly dispersed therein such organic component at molecular scale. This ensures production of amorphous metal oxide thin film with low density and excellent thickness precision.
摘要翻译：无机金属氧化物薄膜是通过氧分子处理从有机/金属氧化物复合薄膜中分离出有机成分而得到的。这确保了生产具有低密度和优异的厚度精度的无定形金属氧化物薄膜。

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