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    • 12. 发明授权
    • Fabrication process of optical semiconductor device having a diffraction
grating
    • 具有衍射光栅的光学半导体器件的制造工艺
    • US5981307A
    • 1999-11-09
    • US923255
    • 1997-09-04
    • Manabu Matsuda
    • Manabu Matsuda
    • G02B5/18G02B6/12G03F7/20H01L21/027H01S5/00H01S5/02H01S5/026H01S5/12H01S5/125H01S5/40H01S3/085
    • G03F7/70408H01S5/12H01S5/4031G02B2006/12107G02B2006/12121H01S5/0201H01S5/1215H01S5/125H01S5/4087
    • A method of fabricating an optical semiconductor device includes the steps of irradiating a substrate by a first optical beam and a second optical beam such that the first and second optical beams form interference fringes on the substrate, exposing a resist film provided on the substrate by the interference fringes to form a resist pattern, and forming a diffraction grating pattern on the substrate in accordance with the interference fringes by using the resist pattern as a mask. The first and second optical beams are irradiated such that a wavefront of the first optical beam and a wavefront of the second optical beam intersect at an intersection line parallel to the substrate, and the irradiating step is conducted by refracting the first and second optical beams by an optical element having a smooth surface inclined with respect to a plane parallel to the substrate in the direction of the foregoing intersection line and further inclined in a perpendicular direction.
    • 一种制造光半导体器件的方法包括以下步骤:通过第一光束和第二光束照射衬底,使得第一和第二光束在衬底上形成干涉条纹,将设置在衬底上的抗蚀剂膜暴露于衬底上 干涉条纹以形成抗蚀剂图案,并且通过使用抗蚀剂图案作为掩模,根据干涉条纹在基板上形成衍射光栅图案。 照射第一光束和第二光束,使得第一光束的波前和第二光束的波阵面在与基板平行的交线处相交,并且通过折射第一和第二光束来进行照射步骤 光学元件,其光滑表面相对于与所述基板平行的平面在所述交叉线的方向上倾斜并进一步沿垂直方向倾斜。