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11. 发明申请

US20070046921A1 EXPOSURE APPARATUS AND METHOD 有权
标题翻译：曝光装置及方法
公开(公告)号：US20070046921A1
公开(公告)日：2007-03-01
申请号：US11459117
申请日：2006-07-21
申请人： Kazuhiro Takahashi , Koji Mikami , Michio Kono
发明人： Kazuhiro Takahashi , Koji Mikami , Michio Kono
IPC分类号： G03B27/72
CPC分类号： G03F7/70091 , G03F7/70566
摘要： An exposure apparatus for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes a measuring part for obtaining polarization information of the light that has passed the optical system, the polarization information including at least one of polarized light intensities, a ratio between the polarized light intensities, a degree of polarization, and a retardation of two orthogonal directions that are both parallel to the optical axis, and a controller for controlling, based on a measurement result by the measuring part, at least one exposure parameter of the light source and the optical system.
摘要翻译：使用来自光源和光学系统的光将掩模版图案曝光在曝光装置上的曝光装置包括用于获得已经通过光学系统的光的偏振信息的测量部分，所述偏光信息包括以下各项中的至少一个：偏振光强度，偏振度之间的比例，极化度和两个平行于光轴的两个正交方向的延迟;以及控制器，用于基于测量部分的测量结果，在光源和光学系统的至少一个曝光参数。

12. 发明授权

US06552737B1 Control of window size in response to user operation 失效
标题翻译：响应用户操作控制窗口大小
公开(公告)号：US06552737B1
公开(公告)日：2003-04-22
申请号：US09387832
申请日：1999-09-01
申请人： Harutaka Tanaka , Shuji Iwasaki , Takao Shikama , Yoshito Taniyama , Yoshimasa Sekiya , Hirofumi Kobayashi , Koji Mikami , Masayoshi Kamada , Shinichi Tabe
发明人： Harutaka Tanaka , Shuji Iwasaki , Takao Shikama , Yoshito Taniyama , Yoshimasa Sekiya , Hirofumi Kobayashi , Koji Mikami , Masayoshi Kamada , Shinichi Tabe
IPC分类号： G06F314
CPC分类号： G06F3/0481 , G09G5/14
摘要： A device for controlling multi-window display on a screen includes a screen-operation detecting unit which detects user screen operations including a user operation of a pointer on the screen. The device further includes a control unit which controls a window to increase an amount of information displayed therein when said screen-operation detecting unit detects a move of the pointer into an area of the window.
摘要翻译：用于在屏幕上控制多窗口显示的设备包括屏幕操作检测单元，其检测包括屏幕上的指针的用户操作的用户屏幕操作。该装置还包括控制单元，当所述屏幕操作检测单元检测到指针移动到窗口的区域中时，控制窗口以增加其中显示的信息量。

13. 发明授权

US4238233A Aluminum alloy for cladding excellent in sacrificial anode property and erosion-corrosion resistance 失效
标题翻译：用于包覆的铝合金，牺牲阳极性能和耐腐蚀腐蚀性优异
公开(公告)号：US4238233A
公开(公告)日：1980-12-09
申请号：US31958
申请日：1979-04-19
申请人： Kazuo Yamada , Koji Mikami , Shigetake Imaizumi
发明人： Kazuo Yamada , Koji Mikami , Shigetake Imaizumi
IPC分类号： C22C21/00 , C22C21/06 , C22C21/10 , C23F13/14
CPC分类号： C22C21/00 , C22C21/06 , C22C21/10 , C23F13/14 , F24J2/4612 , F28F19/06 , F28F21/084 , Y02E10/40
摘要： An aluminum alloy for cladding excellent in sacrificial anode property and erosion-corrosion resistance, which consists essentially of, in weight percentage:Zinc: from 0.3 to 3.0%,Magnesium: from 0.2 to 4.0%,Manganese: from 0.3 to 2.0%,and,the balance aluminum and incidental impurities;said alloy including an aluminum alloy also containing at least one element selected from the group consisting of, in weight percentage:Indium: from 0.005 to 0.2%,Tin: from 0.01 to 0.3%,and,Bismuth: from 0.01 to 0.3%;provided that the total content of indium, tin and bismuth being up to 0.3%.
摘要翻译：一种用于牺牲阳极性能和耐腐蚀腐蚀性优良的包覆铝合金，其重量百分比基本上由锌组成：0.3-3.0％，镁：0.2-4.0％，锰：0.3-2.0％，和，余量为铝和杂质; 所述合金包括还含有至少一种选自以下重量百分比的元素的铝合金：铟：0.005-0.2％，锡：0.01-0.3％，铋：0.01至0.3％; 铟，锡和铋的总含量高达0.3％。

14. 发明授权

US09551926B2 Determination method, storage medium and information processing apparatus 有权
标题翻译：确定方法，存储介质和信息处理设备
公开(公告)号：US09551926B2
公开(公告)日：2017-01-24
申请号：US13534059
申请日：2012-06-27
申请人： Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G03B27/68 , G03F1/50 , G03F7/20
CPC分类号： G03F1/50 , G03F7/705
摘要： The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for a light intensity distribution formed on a pupil plane of the illumination optical system, and an aberration parameter for an aberration of the projection optical system, and a step of determining a value of the illumination parameter and a value of the aberration parameter so that an image performance of an optical image of the pattern of the mask satisfies an evaluation criterion set for a target pattern to be formed on an image plane of the projection optical system.
摘要翻译：本发明提供了一种确定曝光条件的曝光条件的方法，所述曝光装置包括照明掩模的照明光学系统和投影光学系统，所述投影光学系统将掩模的图案投影到基板上，所述方法包括设置照明用于形成在照明光学系统的光瞳平面上的光强度分布的参数，以及投影光学系统的像差的像差参数，以及确定照明参数的值和像差参数的值的步骤，使得掩模图案的光学图像的图像性能满足为在投影光学系统的图像平面上形成的目标图案设定的评价标准。

15. 发明授权

US09448495B2 Resist pattern calculation method and calculation program storage medium 有权
标题翻译：抗蚀图案计算方法和计算程序存储介质
公开(公告)号：US09448495B2
公开(公告)日：2016-09-20
申请号：US13233209
申请日：2011-09-15
申请人： Ryo Nakayama , Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
发明人： Ryo Nakayama , Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
IPC分类号： G03B27/32 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70558 , G03F7/70608
摘要： A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern. The method includes: a first step of calculating a light intensity distribution of an optical image formed on the resist, based on the reticle pattern and an exposure condition; a second step of convoluting, using a first diffusion length, the calculated light intensity distribution; a third step of calculating a representative light intensity from the calculated light intensity distribution or the convoluted light intensity distribution; a fourth step of correcting the convoluted light intensity distribution by adding, to the convoluted light intensity distribution, a correction function including a first function given by: { ∑ k = 0 n ⁢ ( a k ⁢ J k ) } ⁢ exp ⁡ ( - α ⁢ ⁢ J ) where J is the distribution of the representative light intensity; and a fifth step of calculating the resist pattern based on the corrected light intensity distribution and a slice level set in advance.

16. 发明授权

US09036897B2 Storage medium storing computer program for determining at least one of exposure condition and mask pattern 有权
标题翻译：存储介质，存储用于确定曝光条件和掩模图案中的至少一个的计算机程序
公开(公告)号：US09036897B2
公开(公告)日：2015-05-19
申请号：US13032960
申请日：2011-02-23
申请人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G06K9/00 , G03F7/20
CPC分类号： G03F7/709 , G03F7/70091 , G03F7/70358 , G03F7/705 , G03F7/70525
摘要： A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.
摘要翻译：提供了一种计算机可读存储介质，其存储用于使计算机确定具有照明光学系统的曝光装置的掩模图案和曝光条件中的至少一个的计算机可执行程序，所述照明光学系统用于从光源和用于将掩模图案投影到基板上的投影光学系统。该程序使计算机使用关于由曝光装置引起的图像的横向偏移的信息来执行投影光学系统的物体平面上的图案的图像的计算，以及确定曝光条件和掩模中的至少一个基于计算结果的模式。

17. 发明授权

US08811714B2 Method, apparatus and medium for determining the intensity distribution formed on a pupil plane of an illumination optical system 有权
标题翻译：用于确定在照明光学系统的光瞳平面上形成的强度分布的方法，装置和介质
公开(公告)号：US08811714B2
公开(公告)日：2014-08-19
申请号：US13217558
申请日：2011-08-25
申请人： Yuichi Gyoda , Hiroyuki Ishii , Koji Mikami , Youzou Fukagawa
发明人： Yuichi Gyoda , Hiroyuki Ishii , Koji Mikami , Youzou Fukagawa
IPC分类号： G06K9/20 , G06K9/60 , G06K9/64 , G03F7/20
CPC分类号： G03F7/70091 , G03F7/705
摘要： The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cutline used to evaluate an image of a pattern of a mask, which is formed on an image plane of a projection optical system, and a target position of the image, and a step of determining an intensity of an element light source such that the position of a midpoint between edges of the image of the pattern of the mask on the cutline from a calculated image comes close to the target position, thereby determining the light intensity distribution.
摘要翻译：本发明提供一种确定在曝光装置中确定在照明光学系统的光瞳平面上形成的光强度分布的方法，该方法包括设置用于评估掩模图案的图像的切割线的步骤，其形成在投影光学系统的图像平面上，以及图像的目标位置，以及确定元件光源的强度的步骤，使得图案的图像的边缘之间的中点的位置来自计算图像的切割线上的掩模接近目标位置，由此确定光强度分布。

18. 发明授权

US08582083B2 Effective light source shape database generation method, optical image calculation method, recording medium, exposure method, and device fabrication method 有权
标题翻译：有效的光源形状数据库生成方法，光学图像计算方法，记录介质，曝光方法和器件制造方法
公开(公告)号：US08582083B2
公开(公告)日：2013-11-12
申请号：US12369472
申请日：2009-02-11
申请人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
发明人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
IPC分类号： G03B27/54
CPC分类号： G03F7/70108 , G03F7/70091 , G03F7/70508
摘要： The present invention provides a method of generating a database of effective light source shapes including a generation step of generating an initial database representing an effective light source shapes corresponding to a plurality of conditions settable for an illumination optical system, a measurement step of setting an arbitrary condition for the illumination optical system, and measuring an effective light source shape, a calculation step of calculating a difference amount between an effective light source shape when each of the plurality of conditions is set for the illumination optical system and the effective light source shape included in the initial database, and a correction step of correcting the effective light source shapes included in the initial database using the difference amounts and compiling the corrected effective light source shapes into an actual database.
摘要翻译：本发明提供了一种生成有效光源形状的数据库的方法，包括生成步骤，生成表示与可设置于照明光学系统的多个条件对应的有效光源形状的初始数据库的生成步骤，设定任意的测量步骤照明光学系统的条件和有效光源形状的测量;计算步骤，当对照明光学系统设定多个条件和有效光源形状时，计算有效光源形状之间的差异量在初始数据库中，以及校正步骤，用差异量校正包含在初始数据库中的有效光源形状，并将校正的有效光源形状编译成实际的数据库。

19. 发明申请

US20130010272A1 DETERMINATION METHOD, STORAGE MEDIUM AND INFORMATION PROCESSING APPARATUS 有权
标题翻译：确定方法，存储介质和信息处理设备
公开(公告)号：US20130010272A1
公开(公告)日：2013-01-10
申请号：US13534059
申请日：2012-06-27
申请人： Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G03B27/72
CPC分类号： G03F1/50 , G03F7/705
摘要： The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for a light intensity distribution formed on a pupil plane of the illumination optical system, and an aberration parameter for an aberration of the projection optical system, and a step of determining a value of the illumination parameter and a value of the aberration parameter so that an image performance of an optical image of the pattern of the mask satisfies an evaluation criterion set for a target pattern to be formed on an image plane of the projection optical system.
摘要翻译：本发明提供了一种确定曝光条件的曝光条件的方法，所述曝光装置包括照明掩模的照明光学系统和投影光学系统，所述投影光学系统将掩模的图案投影到基板上，所述方法包括设置照明用于形成在照明光学系统的光瞳平面上的光强度分布的参数，以及投影光学系统的像差的像差参数，以及确定照明参数的值和像差参数的值的步骤，使得掩模图案的光学图像的图像性能满足为在投影光学系统的图像平面上形成的目标图案设定的评价标准。

20. 发明申请

US20120092639A1 RESIST PATTERN CALCULATION METHOD AND CALCULATION PROGRAM STORAGE MEDIUM 有权
标题翻译：电阻图案计算方法和计算程序存储介质
公开(公告)号：US20120092639A1
公开(公告)日：2012-04-19
申请号：US13233209
申请日：2011-09-15
申请人： Ryo Nakayama , Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
发明人： Ryo Nakayama , Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
IPC分类号： G03B27/58
CPC分类号： G03F7/705 , G03F7/70558 , G03F7/70608
摘要： A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern. The method includes: a first step of calculating a light intensity distribution of an optical image formed on the resist, based on the reticle pattern and an exposure condition; a second step of convoluting, using a first diffusion length, the calculated light intensity distribution; a third step of calculating a representative light intensity from the calculated light intensity distribution or the convoluted light intensity distribution; a fourth step of correcting the convoluted light intensity distribution by adding, to the convoluted light intensity distribution, a correction function including a first function given by: { ∑ k = 0 n  ( a k  J k ) }  exp  ( - α   J ) where J is the distribution of the representative light intensity; and a fifth step of calculating the resist pattern based on the corrected light intensity distribution and a slice level set in advance.
摘要翻译：记录介质存储用于使计算机执行计算抗蚀剂图案的方法的程序。该方法包括：基于掩模图案和曝光条件计算形成在抗蚀剂上的光学图像的光强度分布的第一步骤; 使用第一扩散长度卷积计算的光强度分布的第二步骤; 从计算出的光强度分布或卷积光强度分布计算代表光强度的第三步骤; 第四步骤，通过向所述卷积光强度分布中加入包括由下式给出的第一函数的校正函数来校正所述卷积光强度分布：{Σk = 0 n（ak）J k）} exp（ J）其中J是代表光强度的分布; 以及第五步骤，基于校正的光强度分布和预先设定的限幅电平来计算抗蚀剂图案。

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