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11. 发明申请

US20120118332A1 SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE 有权
标题翻译：用于半导体基板的超临界干燥方法
公开(公告)号：US20120118332A1
公开(公告)日：2012-05-17
申请号：US13052232
申请日：2011-03-21
申请人： Yohei SATO , Hisashi Okuchi , Hiroshi Tomita , Hidekazu Hayashi , Yukiko Kitajima
发明人： Yohei SATO , Hisashi Okuchi , Hiroshi Tomita , Hidekazu Hayashi , Yukiko Kitajima
IPC分类号： B08B3/10 , B08B7/00
CPC分类号： H01L21/67034
摘要： In one embodiment, after rinsing a semiconductor substrate having a fine pattern formed thereon with pure water, the pure water staying on the semiconductor substrate is substituted with a water soluble organic solvent, and then, the semiconductor substrate is introduced into a chamber in a state wet with the water soluble organic solvent. Then, the water soluble organic solvent is turned into a supercritical state by increasing a temperature inside of the chamber. Thereafter, the inside of the chamber is reduced in pressure while keeping the inside of the chamber at a temperature enough not to liquefy the pure water (i.e., rinsing pure water mixed into the water soluble organic solvent), and further, the water soluble organic solvent in the supercritical state is changed into a gaseous state, to be discharged from the chamber, so that the semiconductor substrate is dried.
摘要翻译：在一个实施方案中，在用纯水冲洗其上形成有精细图案的半导体衬底之后，将残留在半导体衬底上的纯水用水溶性有机溶剂代替，然后将半导体衬底引入到室中用水溶性有机溶剂润湿。然后，水溶性有机溶剂通过增加室内的温度而变成超临界状态。此后，室内压力降低，同时保持室内不足液化纯水的温度（即冲洗混入水溶性有机溶剂中的纯水），此外，水溶性有机溶剂处于超临界状态的溶剂变成气态，从室排出，使得半导体基板干燥。

12. 发明申请

US20120116567A1 SUBSTRATE TREATMENT APPARATUS, METHOD OF TRANSFERRING SUBSTRATE, AND NON-TRANSITORY COMPUTER STORAGE MEDIUM 有权
标题翻译：基板处理装置，基板转印方法和非电子计算机存储介质
公开(公告)号：US20120116567A1
公开(公告)日：2012-05-10
申请号：US13281535
申请日：2011-10-26
申请人： Makoto HAYAKAWA , Hiroshi Tomita , Tatsuhei Yoshida
发明人： Makoto HAYAKAWA , Hiroshi Tomita , Tatsuhei Yoshida
IPC分类号： G06F19/00
CPC分类号： H01L21/67288 , H01L21/67178 , H01L21/67276 , H01L21/67745
摘要： A coating and developing treatment apparatus includes a substrate transfer mechanism; a defect inspection section; means for controlling transfer of a substrate; means for classifying a defect based on the state of the defect; means for storing a transfer route of the substrate by the substrate transfer mechanism when the substrate has been treated by treatment sections; and means for specifying, based on a kind of the defect classified by the defect classification means and the transfer route of the substrate stored in the storage means, a treatment section which is a cause of occurrence of the classified defect, and judging presence or absence of an abnormality of the specified treatment section, wherein the transfer control means controls the substrate transfer mechanism to transfer a substrate bypassing the treatment section which has been judged to be abnormal by the defective treatment specification means.
摘要翻译：涂布显影处理装置包括基板转印机构; 缺陷检查部; 用于控制基板转印的装置; 基于缺陷状态对缺陷进行分类的手段; 用于在基板被处理部处理时通过基板转印机构存储基板的转印路径的装置; 以及用于基于由缺陷分类装置分类的缺陷的种类和存储在存储装置中的基板的传送路线来指定作为分类缺陷的发生原因的处理部分，并且判断是否存在指定处理部的异常，其中转移控制装置控制基板转移机构，以传递旁路通过缺陷处理指定装置判断为异常的处理部的基板。

13. 发明申请

US20120032016A1 Pretensioner, seat belt retractor, seat belt device and method for assembling pretensioner 有权
标题翻译：预紧器，安全带卷收器，安全带装置以及组装预紧器的方法
公开(公告)号：US20120032016A1
公开(公告)日：2012-02-09
申请号：US13137205
申请日：2011-07-28
申请人： Hiroshi Tomita , Yuichiro Hodatsu
发明人： Hiroshi Tomita , Yuichiro Hodatsu
IPC分类号： B60R22/46 , B23P17/04 , B60R22/36
CPC分类号： B60R22/4628 , B60R2022/4642 , Y10T29/49826
摘要： A plurality of driving force transmitting members, a piston, a spring and a gas generator are inserted into the pipe from the end of the pipe where the gas generator is mounted. The gas generator is press-fitted in the pipe while the flat faces thereof are deformed by a pair of protrusions of the pipe. Accordingly, the gas generator is temporarily held by the protrusions of the pipe. Then, one end of the pipe is firmly pressed and the gas generator is mounted in the pipe.
摘要翻译：多个驱动力传递构件，活塞，弹簧和气体发生器从安装有气体发生器的管的端部插入到管中。气体发生器压配合在管中，而其平面由管的一对突起变形。因此，气体发生器被管道的突起暂时保持。然后，将管的一端牢固地按压，将气体发生器安装在管道中。

14. 发明申请

US20120031441A1 SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD 审中-公开
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：US20120031441A1
公开(公告)日：2012-02-09
申请号：US13277251
申请日：2011-10-20
申请人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
发明人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
IPC分类号： B08B3/00
CPC分类号： H01L21/67057 , B08B3/08 , B08B3/10
摘要： A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture.
摘要翻译：一种基板清洗装置，包括保持含有过氧化氢溶液和硫酸的混合物的处理罐，用于清洗浸在所述混合物中的基板; 所述循环管道在所述处理罐的初级侧之间延伸，所述处理罐的所述混合物被注入到所述处理罐中，所述处理罐的二次侧在所述处理罐的二次侧上从所述处理罐排出所述混合物，并且具有用于使所述混合物循环的泵 ; 设置在所述循环管道中的加热器，被配置为将所述混合物加热至预定温度; 化学注入管，被配置为在所述处理罐的初级侧和位于所述加热器的下游侧的次级侧之间的位置处将过氧化氢溶液注入到所述循环管道中; 以及设置在所述循环管道中的过滤器，其构造成去除所述混合物中的颗粒。

15. 发明授权

US08094344B2 Optimum noise filter setting for a scanner in a closed loop system 有权
标题翻译：闭环系统中扫描仪的最佳噪声滤波器设置
公开(公告)号：US08094344B2
公开(公告)日：2012-01-10
申请号：US11364439
申请日：2006-02-28
申请人： Paul Cattrone , Hiroshi Tomita , Vivek Pathak
发明人： Paul Cattrone , Hiroshi Tomita , Vivek Pathak
IPC分类号： G06T5/00
CPC分类号： H04N1/4078 , H04N1/409
摘要： Disclosed is a method for determining optimum noise filter setting to be used by a scanner in a system including a printer and a detector forming a closed loop system. A test image including a plurality of horizontal lines, vertical lines, slanted lines and dots are printed using the printer and scanned back using the scanner. The scanned test image data is compared to the input test image data representing the test image, and based on such comparison, the optimum noise filter setting for the printer/scanner pair is determined and stored for future use. This method is particularly useful for printing barcodes having high data capacity.
摘要翻译：公开了一种用于确定由包括打印机和形成闭环系统的检测器的系统中的扫描仪使用的最佳噪声滤波器设置的方法。使用打印机打印包括多个水平线，垂直线，倾斜线和点的测试图像，并使用扫描仪进行扫描。将扫描的测试图像数据与表示测试图像的输入测试图像数据进行比较，并且基于这样的比较，确定并存储打印机/扫描仪对的最佳噪声滤波器设置以备将来使用。该方法对于打印具有高数据容量的条形码特别有用。

16. 发明申请

US20110139192A1 SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE 审中-公开
标题翻译：表面处理装置和半导体基板的方法
公开(公告)号：US20110139192A1
公开(公告)日：2011-06-16
申请号：US12887332
申请日：2010-09-21
申请人： Tatsuhiko KOIDE , Shinsuke KIMURA , Yoshihiro OGAWA , Hisashi OKUCHI , Hiroshi TOMITA
发明人： Tatsuhiko KOIDE , Shinsuke KIMURA , Yoshihiro OGAWA , Hisashi OKUCHI , Hiroshi TOMITA
IPC分类号： B08B3/00
CPC分类号： H01L21/02057 , H01L21/3065 , H01L21/31 , H01L21/31116 , H01L21/324 , H01L21/67028
摘要： In one embodiment, a surface treatment apparatus for a semiconductor substrate includes a holding unit, a first supply unit, a second supply unit, a third supply unit, a drying treatment unit, and a removal unit. The holding unit holds a semiconductor substrate with a surface having a convex pattern formed thereon. The first supply unit supplies a chemical solution to the surface of the semiconductor substrate, to perform cleaning and oxidation. The second supply unit supplies pure water to the surface of the semiconductor substrate, to rinse the semiconductor substrate. The third supply unit supplies a water repelling agent to the surface of the semiconductor substrate, to form a water repellent protective film on the surface of the convex pattern. The drying treatment unit dries the semiconductor substrate. The removal unit removes the water repellent protective film while making the convex pattern remain.
摘要翻译：在一个实施例中，用于半导体衬底的表面处理装置包括保持单元，第一供应单元，第二供应单元，第三供应单元，干燥处理单元和拆卸单元。保持单元保持其上形成有凸起图案的表面的半导体衬底。第一供给单元向半导体基板的表面供给化学溶液，进行清洗和氧化。第二供给单元向半导体基板的表面供给纯水，以冲洗半导体基板。第三供给单元向半导体基板的表面供给防水剂，在凸形图案的表面上形成防水保护膜。干燥处理单元干燥半导体基板。去除单元在保持凸起图案的同时去除防水保护膜。

17. 发明申请

US20110068480A1 SEMICONDUCTOR DEVICE AND ADHESIVE SHEET 有权
标题翻译：半导体器件和粘合片
公开(公告)号：US20110068480A1
公开(公告)日：2011-03-24
申请号：US12730007
申请日：2010-03-23
申请人： Hidekazu Hayashi , Hiroshi Tomita , Junya Sagara , Shinya Takyu , Norihiro Togasaki , Tetsuya Kurosawa , Yukiko Kitajima
发明人： Hidekazu Hayashi , Hiroshi Tomita , Junya Sagara , Shinya Takyu , Norihiro Togasaki , Tetsuya Kurosawa , Yukiko Kitajima
IPC分类号： H01L23/12 , C08K3/34 , C08L63/00 , C08K3/10
CPC分类号： C09J163/00 , C08K3/08 , C08K5/0091 , C08L63/00 , H01L23/3121 , H01L24/29 , H01L24/32 , H01L24/33 , H01L24/48 , H01L24/73 , H01L25/0657 , H01L2224/29 , H01L2224/2919 , H01L2224/2929 , H01L2224/293 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/484 , H01L2224/732 , H01L2224/73265 , H01L2225/0651 , H01L2924/00013 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01012 , H01L2924/01013 , H01L2924/01014 , H01L2924/0102 , H01L2924/01024 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/0104 , H01L2924/01051 , H01L2924/01073 , H01L2924/01079 , H01L2924/01082 , H01L2924/01083 , H01L2924/01088 , H01L2924/0665 , H01L2924/181 , H01L2924/1815 , H01L2924/00 , H01L2924/00012 , H01L2224/29099 , H01L2224/29199 , H01L2224/29299 , H01L2224/45099 , H01L2224/05599
摘要： The present invention provides a semiconductor device which comprises a substrate, a first semiconductor chip on a substrate, a second semiconductor chip on the first semiconductor chip, and an adhesive sheet between the first and second semiconductor chips. The second semiconductor chip has a mirrored back surface, and the adhesive sheet contains a metal impurity ion trapping agent.
摘要翻译：本发明提供一种半导体器件，其包括衬底，衬底上的第一半导体芯片，第一半导体芯片上的第二半导体芯片以及第一和第二半导体芯片之间的粘合片。第二半导体芯片具有镜像背面，并且粘合片含有金属杂质离子捕获剂。

18. 发明授权

US07727871B2 Manufacturing method of semiconductor device using etching solution 失效
标题翻译：使用蚀刻溶液的半导体器件的制造方法
公开(公告)号：US07727871B2
公开(公告)日：2010-06-01
申请号：US11702575
申请日：2007-02-06
申请人： Hiroshi Tomita , Hiroyasu Iimori
发明人： Hiroshi Tomita , Hiroyasu Iimori
IPC分类号： H01L21/3205 , H01L21/4763
CPC分类号： H01L21/02071 , C09K13/08 , H01L21/0206 , H01L21/31111
摘要： This disclosure concerns a manufacturing method of a semiconductor device comprising an etching process using an etching solution having ozone dissolved by 10 ppm or more into a liquid containing H2SO4 by 86 wt % to 97.9 wt %, HF by 0.1 wt % to 10 wt %, and H2O by 2 wt % to 4 wt %.
摘要翻译：本公开涉及一种半导体器件的制造方法，其包括使用具有溶解10ppm或更多的臭氧的蚀刻溶液的腐蚀工艺，所述蚀刻溶液含有包含H 2 SO 4的液体为86重量％至97.9重量％，HF为0.1重量％至10重量％和H 2 O 2重量％至4重量％。

19. 发明授权

US07669769B2 Systems and methods for preserving and maintaining document integrity 有权
公开(公告)号：US07669769B2
公开(公告)日：2010-03-02
申请号：US11090224
申请日：2005-03-28
申请人： Hiroshi Tomita
发明人： Hiroshi Tomita
IPC分类号： G06K7/10
CPC分类号： G06F17/24 , G06F17/2288
摘要： Systems and methods consistent with embodiments of the present invention provide for a method for preserving and maintaining document integrity. In some methods for preserving and maintaining document integrity, the contents of a document, or contents of a document layer may be encoded into a machine-readable form. In some embodiments, the encoded information may be represented using a 2-dimensional bar code. In some methods for preserving and maintaining document integrity, the machine-readable code is printed along with contents of the document based on space available in the document. In some embodiments, a printed document containing the machine-readable code may be scanned and digitized, and content extracted from the scanned data. In some embodiments, the machine-readable code printed on the document is used to recreate layer data from the printed document.

20. 发明申请

US20100047702A1 RESIST PATTERN FORMING METHOD 有权
标题翻译：电阻图案形成方法
公开(公告)号：US20100047702A1
公开(公告)日：2010-02-25
申请号：US12610907
申请日：2009-11-02
申请人： Kunie OGATA , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
发明人： Kunie OGATA , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
IPC分类号： G03F7/20 , G03B27/32
CPC分类号： H01L21/67253 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.
摘要翻译：使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。这导致操作者的工作量减少，并且可以执行适当的修改。

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