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11. 发明授权

US06885431B2 Exposure apparatus and method of manufacturing a semiconductor device using the same 有权
标题翻译：制造使用其的半导体器件的曝光装置和方法
公开(公告)号：US06885431B2
公开(公告)日：2005-04-26
申请号：US10658207
申请日：2003-09-10
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： H01L21/027 , G03F7/20 , G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70933 , G03F7/709
摘要： An exposure apparatus has a structure supported by a vibration isolating mechanism and a partition wall inserted in at least part of the optical path of exposure light used in the exposure apparatus. The structure and partition wall are coupled by an elastic seal member to form a closed space, and the interior of the partition wall is partitioned from the remaining space.
摘要翻译：曝光装置具有由防振机构和插入到曝光装置中使用的曝光光的光路的至少一部分中的分隔壁支撑的结构。结构和分隔壁通过弹性密封构件联接以形成封闭空间，并且分隔壁的内部与剩余空间分隔开。

12. 发明授权

US06493062B2 Driving apparatus and exposure apparatus 有权
标题翻译：驱动装置和曝光装置
公开(公告)号：US06493062B2
公开(公告)日：2002-12-10
申请号：US09286447
申请日：1999-04-06
申请人： Yukio Tokuda , Nobuyoshi Deguchi , Shigeyuki Uzawa , Yukio Takabayashi , Hiromichi Hara
发明人： Yukio Tokuda , Nobuyoshi Deguchi , Shigeyuki Uzawa , Yukio Takabayashi , Hiromichi Hara
IPC分类号： G03B2742
CPC分类号： F16F15/02 , G03B27/42 , G03F7/70725 , G03F7/709
摘要： A driving apparatus for moving an object has a stage which moves the object mounted thereon, a base member supporting the stage, a reaction force reception structure for receiving a reaction force generated upon driving the stage, a damp member for damping transmission of vibration with a predetermined frequency range from the reaction force reception structure to a floor and an actuator for generating a force between the base member and the reaction force reception structure.
摘要翻译：用于移动物体的驱动装置具有使安装在其上的物体移动的台阶，支撑台的基座部件，用于接收在驱动台架时产生的反作用力的反作用力接收结构，用于阻止振动传播的阻尼部件从反作用力接收结构到地面的预定频率范围和用于在基部构件和反作用力接收结构之间产生力的致动器。

13. 发明授权

US5881987A Vibration damping apparatus 失效
标题翻译：减震装置
公开(公告)号：US5881987A
公开(公告)日：1999-03-16
申请号：US831760
申请日：1997-04-01
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03F9/00 , F16F15/027 , F16F15/04 , G03F7/20 , H01L21/027 , F16M13/00 , F16M1/00 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70691 , F16F15/0275 , G03F7/70833 , G03F7/709
摘要： An air-pressure vibration-damping apparatus, supporting an upper apparatus between a mounting floor and the upper apparatus. The vibration damping apparatus has four or more air springs for supporting the upper apparatus, a vibration-damping controller for controlling inner air pressures of the air springs so as to damp vibration from the mounting floor to the upper apparatus and suppress vibration of the upper apparatus, and a communicating pipe passing air between at least one couple of the air springs. When the couple of air springs mutually connected via the communicating pipe are regarded as one air spring, the number of air springs is three. Regarding this couple of air springs, the vibration-damping controller controls air pressure of at least one air spring.
摘要翻译：一种气压减振装置，在安装地板和上装置之间支撑上装置。减震装置具有四个或更多个用于支撑上部装置的空气弹簧，用于控制空气弹簧的内部空气压力的减振控制器，以便阻止从安装地板到上部装置的振动，并抑制上部装置的振动，以及连通管，其在至少一对空气弹簧之间通过空气。当通过连通管相互连接的空气弹簧对被认为是一个空气弹簧时，空气弹簧的数量是三个。关于这对空气弹簧，减振控制器控制至少一个空气弹簧的空气压力。

14. 发明授权

US4083834A Process for producing polymer having functional groups at its chain terminals 失效
标题翻译：在其末端具有官能团的聚合物的制备方法
公开(公告)号：US4083834A
公开(公告)日：1978-04-11
申请号：US605699
申请日：1975-08-18
申请人： Koei Komatsu , Akinori Nishioka , Noboru Ohshima , Masanobu Takahashi , Hiromichi Hara
发明人： Koei Komatsu , Akinori Nishioka , Noboru Ohshima , Masanobu Takahashi , Hiromichi Hara
IPC分类号： C08C19/44 , C08F36/04 , C08F8/08 , C08F8/34
CPC分类号： C08C19/44 , C08F36/04
摘要： A process for producing a polymer having functional groups at its chain terminals, which comprises reacting a polymer having alkali metal atoms at its chain terminals with an alkylene oxide or sulfide in a hydrocarbon medium having a solubility parameter of 7.2 or less at 25.degree. C. This process makes it possible to produce the said polymer in a short period of time without necessitating a large power for agitation. According to this process, there can be produced a polymer having a functionality near the theoretical functionality in a short period of time.
摘要翻译：一种制备在其末端具有官能团的聚合物的方法，其包括使其末端具有碱金属原子的聚合物与环氧烷或硫化物在溶解度参数为7.2以下的烃介质中在25℃下反应。该方法使得可以在短时间内生产所述聚合物，而不需要大的搅拌功率。根据该方法，可以在短时间内产生具有接近理论官能度的官能团的聚合物。

15. 发明授权

US07060414B2 Radiation-sensitive resin composition 有权
公开(公告)号：US07060414B2
公开(公告)日：2006-06-13
申请号：US11080400
申请日：2005-03-16
申请人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
发明人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
IPC分类号： G03F7/04
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/118 , Y10S430/122
摘要： A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.

16. 发明申请

US20050158657A1 Radiation-sensitive resin composition 有权
公开(公告)号：US20050158657A1
公开(公告)日：2005-07-21
申请号：US11080400
申请日：2005-03-16
申请人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
发明人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
IPC分类号： C08K5/375 , C08K5/42 , C08L25/18 , C09K3/00 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/76
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/118 , Y10S430/122
摘要： A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.

17. 发明授权

US06862077B2 Anti-vibration system for exposure apparatus 失效
标题翻译：曝光装置的防振系统
公开(公告)号：US06862077B2
公开(公告)日：2005-03-01
申请号：US10263311
申请日：2002-10-03
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： F16F15/02 , G03F7/20 , H01L21/027 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70725 , G03F7/70833 , G03F7/709
摘要： An anti-vibration system includes air dampers of high natural frequency, in a compact space. A pair of air dampers are disposed with their driving directions opposed to each other, and inside pressures of these dampers are variably controlled so as to set the natural vibration frequency.
摘要翻译：防振系统包括在较小的空间中具有高固有频率的空气阻尼器。一对空气阻尼器的驱动方向彼此相反地设置，并且这些阻尼器的内部压力被可变地控制，以便设定固有的振动频率。

18. 发明授权

US06512571B2 Anti-vibration system for exposure apparatus 有权
标题翻译：曝光装置的防振系统
公开(公告)号：US06512571B2
公开(公告)日：2003-01-28
申请号：US09300521
申请日：1999-04-28
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03B2742
CPC分类号： G03F7/70725 , G03F7/70833 , G03F7/709
摘要： An anti-vibration system with air dampers of high natural frequency, in a compact space. A pair of air dampers are disposed with their driving directions opposed to each other, and inside pressures of these dampers are variably controlled so as set the natural vibration frequency.
摘要翻译：在紧凑的空间内，具有高固有频率的空气阻尼器的防振系统。一对空气阻尼器的驱动方向彼此相反地设置，并且这些阻尼器的内部压力被可变地控制以设定固有的振动频率。

19. 发明授权

US07944546B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07944546B2
公开(公告)日：2011-05-17
申请号：US12361296
申请日：2009-01-28
申请人： Masatomi Yoshida , Hiromichi Hara
发明人： Masatomi Yoshida , Hiromichi Hara
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03B27/58 , G03F7/70833 , G03F7/709
摘要： An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.
摘要翻译：曝光装置包括被配置为将原稿的图案投影到基板上的部件，被配置为支撑部件的结构，被配置为支撑结构的支撑件，位于结构和支撑件之间并被配置为支撑所述结构和容纳在所述气弹簧的内部空间中的止动件，以防止所述结构相对于所述支撑件移动超过允许水平。

20. 发明申请

US20060023180A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20060023180A1
公开(公告)日：2006-02-02
申请号：US11190898
申请日：2005-07-28
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70841 , G03F7/709
摘要： Disclosed is an apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, a first anti-vibration mount being supported by the first unit and for supporting a first constituent element of the exposure system, and a second anti-vibration mount being supported by the second unit and for supporting a second constituent element of the exposure system.
摘要翻译：公开了一种装置，其包括用于将基板暴露于能量图案的曝光系统，具有外壁的真空室，该外壁包括彼此分离的第一和第二单元;第一防振安装件，由第一单元支撑并且用于支撑曝光系统的第一组成元件，以及由第二单元支撑并用于支撑曝光系统的第二构成元件的第二防振安装座。

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