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11. 发明申请

US20130004612A1 DIE, DIE PRODUCTION METHOD, AND PRODUCTION OF ANTIREFLECTION FILM 有权
标题翻译： DIE，DIE生产方法和生产抗反射膜
公开(公告)号：US20130004612A1
公开(公告)日：2013-01-03
申请号：US13580524
申请日：2011-02-08
申请人： Akinobu Isurugi , Kiyoshi Minoura , Hidekazu Hayashi
发明人： Akinobu Isurugi , Kiyoshi Minoura , Hidekazu Hayashi
IPC分类号： C25D5/00 , B29C33/42 , G02B1/12 , C25D5/48
CPC分类号： G02B1/118 , B29C33/38 , B29L2007/00 , B29L2023/00 , C25D11/12 , C25D11/16 , C25D11/24
摘要： One of the objects of the present invention is to provide a method for readily manufacturing a seamless mold in the form of a roll which has a porous alumina layer over its surface. The mold manufacturing method of the present invention is a method for manufacturing a mold which has a porous alumina layer over its surface, including the steps of: providing a hollow cylindrical support; forming an insulating layer on an outer perimeter surface of the hollow cylindrical support; depositing aluminum on the insulating layer to form an aluminum film; and anodizing a surface of the aluminum film to form a porous alumina layer which has a plurality of minute recessed portions.
摘要翻译：本发明的目的之一是提供一种容易地制造在其表面上具有多孔氧化铝层的辊形式的无缝模具的方法。本发明的模具制造方法是一种在其表面上具有多孔氧化铝层的模具的制造方法，包括以下步骤：提供中空圆柱形支撑件; 在所述中空圆柱形支撑件的外周表面上形成绝缘层; 在绝缘层上沉积铝以形成铝膜; 并对所述铝膜的表面进行阳极氧化，以形成具有多个微小凹部的多孔氧化铝层。

12. 发明申请

US20120208048A1 BATTERIES FOR POWER TOOLS AND METHODS OF MOUNTING BATTERY TERMINALS TO BATTERY HOUSINGS 审中-公开
标题翻译：用于电动工具的电池和将电池端子安装到电池外壳的方法
公开(公告)号：US20120208048A1
公开(公告)日：2012-08-16
申请号：US13396173
申请日：2012-02-14
申请人： Hironori OGURA , Hideyuki TAGA , Hidekazu HAYASHI
发明人： Hironori OGURA , Hideyuki TAGA , Hidekazu HAYASHI
IPC分类号： H01M2/06 , H01M2/00 , H01M10/04 , H01M2/30
CPC分类号： H01M2/1022 , H01M2/1066 , H01M2/30 , H01M10/46 , Y10T29/49108
摘要： A battery includes a battery housing and a plurality of battery terminals. The battery housing has a terminal mounting portion made of resin. The battery terminals are connectible with external terminals and are mounted to the terminal mounting portion so as to extend through the terminal mounting portion, so that each of the battery terminals has a first end positioned on one side of the terminal mounting portion and a second end positioned on an opposite side of the terminal mounting portion. At least one of the battery terminals is integrated with the terminal mounting portion, so that there is no substantial clearance between the at least one of the battery terminals and a part of the terminal mounting portion, through which the at least one of the battery terminals extends.
摘要翻译：电池包括电池壳体和多个电池端子。电池壳体具有由树脂制成的端子安装部。电池端子可与外部端子连接，并且安装到端子安装部分以便延伸通过端子安装部分，使得每个电池端子具有位于端子安装部分的一侧上的第一端和第二端位于端子安装部分的相对侧上。电池端子中的至少一个与端子安装部分一体化，使得至少一个电池端子和端子安装部分的一部分之间没有实质的间隙，至少一个电池端子延伸。

13. 发明申请

US20120186097A1 SUPERCRITICAL DRYING DEVICE AND METHOD 审中-公开
标题翻译：超临界干燥装置及方法
公开(公告)号：US20120186097A1
公开(公告)日：2012-07-26
申请号：US13160350
申请日：2011-06-14
申请人： Hidekazu HAYASHI , Hiroshi Tomita , Hisashi Okuchi , Yohei Sato , Yukiko Kitajima
发明人： Hidekazu HAYASHI , Hiroshi Tomita , Hisashi Okuchi , Yohei Sato , Yukiko Kitajima
IPC分类号： F26B3/00 , F26B25/06
CPC分类号： F26B3/00
摘要： Certain embodiments provide a supercritical drying device, comprising a sealable first vessel; a fluorine adsorbent provided inside the first vessel; a second vessel being provided inside the first vessel and housing a semiconductor substrate; a heater heating the inside of the first vessel; a pipe connected to the first vessel; and a valve provided on the pipe. Free fluorine generated by heating a fluorine containing solvent is adsorbed to the fluorine adsorbent.
摘要翻译：某些实施例提供了一种超临界干燥装置，包括可密封的第一容器; 设置在第一容器内的氟吸附剂; 第二容器设置在第一容器的内部并容纳半导体衬底; 加热器加热第一容器的内部; 连接到第一船的管道; 以及设置在管上的阀。通过加热含氟溶剂产生的游离氟吸附到氟吸附剂上。

14. 发明申请

US20120048304A1 SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING SYSTEM 审中-公开
标题翻译：超临界干燥方法和超临界干燥系统
公开(公告)号：US20120048304A1
公开(公告)日：2012-03-01
申请号：US13029776
申请日：2011-02-17
申请人： Yukiko KITAJIMA , Hiroshi TOMITA , Hidekazu HAYASHI , Hisashi OKUCHI , Yohei SATO
发明人： Yukiko KITAJIMA , Hiroshi TOMITA , Hidekazu HAYASHI , Hisashi OKUCHI , Yohei SATO
IPC分类号： B08B3/00
CPC分类号： H01L21/67034 , H01L21/02101
摘要： According to an embodiment, a supercritical drying method includes: introducing a semiconductor substrate of which a surface is wet with a supercritical displacement solvent into a chamber; supplying a first supercritical fluid being based on first carbon dioxide to the chamber; supplying a second supercritical fluid which is based on second carbon dioxide to the chamber, after the supplying of the first supercritical fluid; and lowering an inside pressure of the chamber to gasify the second supercritical fluid and to discharge the gasified second supercritical fluid from the chamber. The first carbon dioxide is generated by recovering and recycling the carbon dioxide discharged from the chamber. The second carbon dioxide contains no supercritical displacement solvent or contains the supercritical displacement solvent in a concentration lower than that in the first carbon dioxide.
摘要翻译：根据一个实施方案，超临界干燥方法包括：将超临界位移溶剂表面被湿润的半导体衬底引入腔室; 将基于第一二氧化碳的第一超临界流体供应到所述室; 在供应第一超临界流体之后，向腔室供应基于第二二氧化碳的第二超临界流体; 并且降低所述室的内部压力以使所述第二超临界流体气化并从所述室排出所述气化的第二超临界流体。第一种二氧化碳是通过回收和循环从室排出的二氧化碳产生的。第二种二氧化碳不含超临界置换溶剂，或含有浓度低于第一种二氧化碳浓度的超临界置换溶剂。

15. 发明申请

US20120018613A1 DIE AND METHOD OF MANUFACTURING SAME 有权
标题翻译：其制造方法及其制造方法
公开(公告)号：US20120018613A1
公开(公告)日：2012-01-26
申请号：US13263459
申请日：2010-04-06
申请人： Hidekazu Hayashi , Kiyoshi Minoura , Akinobu Surugi
发明人： Hidekazu Hayashi , Kiyoshi Minoura , Akinobu Surugi
IPC分类号： B29C33/42
CPC分类号： G02B1/118 , B29C33/38 , B29C33/3814 , B29C33/424 , B29C33/56 , C25D11/12 , C25D11/24
摘要： A mold of the present invention includes: a base 12 made of glass or plastic; an inorganic underlayer 14 provided on a surface of the base 12; a buffer layer 16 provided on the inorganic underlayer 14, the buffer layer 16 containing aluminum; an aluminum layer 18a provided on a surface of the buffer layer 16; and a porous alumina layer 20 provided on a surface of the aluminum layer 18a. The porous alumina layer 20 has a plurality of recessed portions 22 whose two-dimensional size viewed in a direction normal to the surface is not less than 10 nm and less than 500 nm. The mold of the present invention has excellent adhesion between the aluminum layer and the base.
摘要翻译：本发明的模具包括：由玻璃或塑料制成的基座12; 设置在基体12的表面上的无机底层14; 设置在无机底层14上的缓冲层16，含有铝的缓冲层16; 设置在缓冲层16的表面上的铝层18a; 以及设置在铝层18a的表面上的多孔氧化铝层20。多孔氧化铝层20具有多个凹部22，其在与该表面垂直的方向上观察的二维尺寸不小于10nm且小于500nm。本发明的模具在铝层和基体之间具有优异的粘附性。

16. 发明授权

US08097538B2 Method of manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US08097538B2
公开(公告)日：2012-01-17
申请号：US12715727
申请日：2010-03-02
申请人： Tatsuhiko Koide , Hisashi Okuchi , Hidekazu Hayashi , Hiroshi Tomita
发明人： Tatsuhiko Koide , Hisashi Okuchi , Hidekazu Hayashi , Hiroshi Tomita
IPC分类号： H01L21/461
CPC分类号： H01L21/31144 , H01L21/0206 , H01L21/02071 , H01L21/32139 , H01L27/101 , H01L27/24 , Y10S438/906
摘要： A metal member layer on a silicon member layer is patterned. A sidewall film is formed on a surface of the metal member layer. The silicon member layer is patterned to form a structure including the silicon member layer and the metal member layer, the surface of which is covered with the sidewall film. After the surface of the structure is cleaned, a water-repellent protective film is formed on the surface of the structure before the surface of the structure is dried.
摘要翻译：图案化硅构件层上的金属构件层。在金属构件层的表面上形成侧壁膜。图案化硅构件层以形成包括硅构件层和金属构件层的结构，其表面被侧壁膜覆盖。在清洁结构表面之后，在结构表面干燥之前，在结构的表面上形成防水保护膜。

17. 发明申请

US20100291317A1 PRODUCTION METHOD OF NANOIMPRINT FILM, DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE 有权
标题翻译：纳米薄膜的制造方法，显示装置和液晶显示装置
公开(公告)号：US20100291317A1
公开(公告)日：2010-11-18
申请号：US12735298
申请日：2008-11-07
申请人： Takao Imaoku , Tokio Taguchi , Hidekazu Hayashi , Kazuhiko Tsuda
发明人： Takao Imaoku , Tokio Taguchi , Hidekazu Hayashi , Kazuhiko Tsuda
IPC分类号： B29C59/16
CPC分类号： G02B1/118 , B29C59/046 , B29C2035/0827 , B29C2059/023 , B29C2791/001 , B29K2105/243 , G02B5/208
摘要： A method is disclosed for efficiently producing a nanoimprint film with high-accurately formed nanostructures even if a base on which the nanoimprint film is formed is capable of absorbing UV light. The production method of at least one embodiment of the present invention is a production method of a nanoimprint film formed on a base, the nanoimprint film having a surface with nanosized protrusions and recesses formed thereon. In at least one embodiment, the production method includes a first step of applying a UV-curable resin on a base containing a UV-absorbing component to form a film; a second step of irradiating the film with UV light from a top-side surface of the film to form a semi-cured film; a third step of imprinting nanosized protrusions and recesses on the semi-cured film to form a film having a surface with protrusions and recesses formed thereon; and a fourth step of curing the film with protrusions and recesses to form a nanoimprint film.
摘要翻译：公开了一种用于有效地制造具有高精度形成的纳米结构的纳米压印膜的方法，即使形成有纳米压印膜的基底能够吸收紫外光。本发明的至少一个实施方式的制造方法是在基材上形成的纳米压印膜的制造方法，其中，纳米压印膜具有在其上形成有纳米尺寸的突起和凹部的表面。在至少一个实施方案中，制备方法包括在包含UV吸收组分的基底上施加UV可固化树脂以形成膜的第一步骤; 第二步骤，用来自薄膜顶面的UV光照射薄膜，形成半固化薄膜; 在半固化膜上印刷纳米尺寸的突起和凹部的第三步骤，以形成具有形成在其上的突起和凹部的表面的膜; 以及用突起和凹部固化膜以形成纳米压印膜的第四步骤。

18. 发明授权

US06504197B2 Magnetic memory element and magnetic memory using the same 失效
标题翻译：磁存储元件和使用其的磁存储器
公开(公告)号：US06504197B2
公开(公告)日：2003-01-07
申请号：US09810862
申请日：2001-03-16
申请人： Ryoji Minakata , Masashi Michijima , Hidekazu Hayashi
发明人： Ryoji Minakata , Masashi Michijima , Hidekazu Hayashi
IPC分类号： H01L2972
CPC分类号： B82Y25/00 , H01F10/3254 , H01F10/3286 , H01L43/08
摘要： A magnetic memory element has a first ferromagnetic layer, a second ferromagnetic layer, and a non-magnetic layer disposed between these ferromagnetic layers. The non-magnetic layer has an electrical characteristic that is changeable depending on an external magnetic field applied to the non-magnetic layer.
摘要翻译：磁存储元件具有第一铁磁层，第二铁磁层和设置在这些铁磁层之间的非磁性层。非磁性层具有根据施加到非磁性层的外部磁场而变化的电特性。

19. 发明授权

US06442064B1 Magnetic tunnel junction element and magnetic memory using the same 有权
标题翻译：磁隧道结元件和磁记忆体使用相同
公开(公告)号：US06442064B1
公开(公告)日：2002-08-27
申请号：US09785635
申请日：2001-02-17
申请人： Masashi Michijima , Hidekazu Hayashi , Ryoji Minakata
发明人： Masashi Michijima , Hidekazu Hayashi , Ryoji Minakata
IPC分类号： G11C1114
CPC分类号： H01F10/3254 , B82Y10/00 , B82Y25/00 , G11C11/16 , H01F10/123 , H01L43/08
摘要： A magnetic tunnel junction element includes a first magnetic layer and a second magnetic layer acting as a memory layer, and a first insulating layer sandwiched between the first and second magnetic layers. Further, the magnetic tunnel junction element includes a third magnetic layer on a side of the second magnetic layer opposite from the first insulating layer. This third magnetic layer constitutes a closed magnetic circuit together with the second magnetic layer.
摘要翻译：磁性隧道结元件包括作为存储层的第一磁性层和第二磁性层以及夹在第一和第二磁性层之间的第一绝缘层。此外，磁性隧道结元件包括在与第一绝缘层相反的第二磁性层侧的第三磁性层。该第三磁性层与第二磁性层一起构成闭合磁路。

20. 发明授权

US08889220B2 Mold release treatment method, mold, method for producing anti-reflective film, mold release treatment device, and washing/drying device for mold 有权
标题翻译：脱模处理方法，模具，抗反射膜的制造方法，脱模处理装置以及模具的洗涤/干燥装置
公开(公告)号：US08889220B2
公开(公告)日：2014-11-18
申请号：US13579094
申请日：2011-03-07
申请人： Hidekazu Hayashi , Takao Imaoku
发明人： Hidekazu Hayashi , Takao Imaoku
IPC分类号： B29C33/58 , B29C33/60
CPC分类号： B29C33/58 , B29C33/60
摘要： A mold release treatment method of the present invention includes: the step of providing a mold releasing agent and a mold which has a porous alumina layer over its surface, the mold releasing agent containing a fluoric compound which has mold releasability and a solvent; the step of applying over the surface of the mold a solvent that is capable of dissolving the fluoric compound; and thereafter, the step of applying the mold releasing agent over the surface of the mold according to a spray coating method. According to the present invention, a mold release treatment can be performed over a surface of the mold which has the porous alumina layer over its surface, without causing uneven application.
摘要翻译：本发明的脱模处理方法包括：提供脱模剂和在其表面上具有多孔氧化铝层的模具的步骤，脱模剂含有具有脱模性的氟化合物和溶剂; 在模具的表面上施加能够溶解氟化合物的溶剂的步骤; 然后，按照喷涂法将脱模剂涂布在模具的表面上的工序。根据本发明，可以在其表面上具有多孔氧化铝层的模具的表面上进行脱模处理，而不会引起不均匀的应用。

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