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11. 发明授权

US08041106B2 Methods and systems for detecting defects on a reticle 有权
标题翻译：用于检测光罩上的缺陷的方法和系统
公开(公告)号：US08041106B2
公开(公告)日：2011-10-18
申请号：US12328862
申请日：2008-12-05
申请人： Patrick Tung-Sing Pak , Wee-Teck Chia , Aaron Geurdon Chin , Irfan Malik , Brian Duffy
发明人： Patrick Tung-Sing Pak , Wee-Teck Chia , Aaron Geurdon Chin , Irfan Malik , Brian Duffy
IPC分类号： G01K9/00
CPC分类号： G01N21/956 , G01N2021/95676 , G06T7/001 , G06T2207/30148
摘要： Methods and systems for detecting defects on a reticle are provided. One method includes printing a single die reticle in first areas of a wafer using different values of a parameter of a lithography process and at least one second area using a nominal value of the parameter. The method also includes acquiring first images of the first areas and second image(s) of the at least one second area. In addition, the method includes separately comparing the first images acquired for different first areas to at least one of the second image(s). The method further includes detecting defects on the reticle based on first portions of the first images in which variations in the first images compared to the at least one second image are greater than second portions of the first images and the first portions that are common to two or more of the first images.
摘要翻译：提供了用于检测光罩上的缺陷的方法和系统。一种方法包括使用光刻工艺的参数的不同值和使用参数的标称值的至少一个第二区域在晶片的第一区域中印刷单个模具掩模版。该方法还包括获取至少一个第二区域的第一区域和第二图像的第一图像。此外，该方法包括将对于不同的第一区域获取的第一图像分别与第二图像中的至少一个进行比较。该方法还包括基于第一图像的第一部分来检测标线上的缺陷，其中与至少一个第二图像相比的第一图像的变化大于第一图像的第二部分和第二图像的两个共同的第一部分或更多的第一图像。

12. 发明授权

US07877722B2 Systems and methods for creating inspection recipes 有权
标题翻译：用于创建检验食谱的系统和方法
公开(公告)号：US07877722B2
公开(公告)日：2011-01-25
申请号：US11960157
申请日：2007-12-19
申请人： Brian Duffy , Ashok Kulkarni
发明人： Brian Duffy , Ashok Kulkarni
IPC分类号： G06F17/50
CPC分类号： G03F7/7065 , G03F7/70525
摘要： Systems and methods for creating inspection recipes are provided. One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process. The method also includes creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed. The first and second designs are different. The inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process.
摘要翻译：提供了用于创建检查配方的系统和方法。用于创建检查配方的一种计算机实现的方法包括采用制造过程获取第一设计和用于印刷第一设计的晶片的检查系统的输出的一个或多个特性。该方法还包括使用第一设计和为其上印刷有第一设计的晶片获取的输出的一个或多个特性来创建用于第二设计的检查配方。第一和第二种设计是不同的。在使用制造工艺将第二设计印刷在晶片上之后，检查配方将用于检查晶片。

13. 发明申请

US20090037134A1 SEMICONDUCTOR DEVICE PROPERTY EXTRACTION, GENERATION, VISUALIZATION, AND MONITORING METHODS 有权
标题翻译：半导体器件属性提取，生成，可视化和监控方法
公开(公告)号：US20090037134A1
公开(公告)日：2009-02-05
申请号：US11830485
申请日：2007-07-30
申请人： Ashok Kulkarni , Chien-Huei (Adam) Chen , Cecelia Campochiaro , Richard Wallingford , Yong Zhang , Brian Duffy
发明人： Ashok Kulkarni , Chien-Huei (Adam) Chen , Cecelia Campochiaro , Richard Wallingford , Yong Zhang , Brian Duffy
IPC分类号： G06F15/00
CPC分类号： G01N21/9501
摘要： Various methods, carrier media, and systems for monitoring a characteristic of a specimen are provided. One computer-implemented method for monitoring a characteristic of a specimen includes determining a property of individual pixels on the specimen using output generated by inspecting the specimen with an inspection system. The method also includes determining a characteristic of individual regions on the specimen using the properties of the individual pixels in the individual regions. The method further includes monitoring the characteristic of the specimen based on the characteristics of the individual regions.
摘要翻译：提供了各种方法，载体介质和用于监测试样特征的系统。一种用于监测样本特征的计算机实现方法包括使用通过用检查系统检查样本产生的输出来确定样本上的各个像素的特性。该方法还包括使用各个区域中的各个像素的特性来确定样本上的各个区域的特征。该方法还包括基于各个区域的特征来监测样本的特性。

14. 发明申请

US20070039252A1 Fungus strip 审中-公开
标题翻译：真菌条
公开(公告)号：US20070039252A1
公开(公告)日：2007-02-22
申请号：US11199519
申请日：2005-08-08
申请人： Sudhir Railkar , Adem Chich , Brian Duffy , Walter Zarate
发明人： Sudhir Railkar , Adem Chich , Brian Duffy , Walter Zarate
IPC分类号： B61D17/14
CPC分类号： E04D13/002
摘要： A fungus strip that release ions when precipitation flows down on the strip that are deleterious to fungus and algae. The strip is positioned on a building material. The strip has a length, width and thickness. The ions are preferably of zinc or tin. The building material can be asphaltic roofing shingles, non-asphaltic roofing, or siding.
摘要翻译：当沉淀物在条带上向真菌和藻类有害时，释放离子的真菌条带。该条被定位在建筑材料上。条具有长度，宽度和厚度。离子优选为锌或锡。建筑材料可以是沥青屋面板，非沥青屋顶或侧板。

15. 发明授权

US08537349B2 Monitoring of time-varying defect classification performance 有权
标题翻译：监测时变缺陷分类性能
公开(公告)号：US08537349B2
公开(公告)日：2013-09-17
申请号：US12811319
申请日：2010-06-23
申请人： Patrick Huet , Brian Duffy , Martin Plihal , Thomas Trautzsch , Chris Maher
发明人： Patrick Huet , Brian Duffy , Martin Plihal , Thomas Trautzsch , Chris Maher
IPC分类号： G01N21/00
CPC分类号： G01R31/2656 , G01R31/2894 , G05B19/41875 , G05B2219/37224 , H01L22/12 , H01L22/20 , H01L2924/0002 , Y02P90/22 , H01L2924/00
摘要： Systems and methods for monitoring time-varying classification performance are disclosed. A method may include, but is not limited to: receiving one or more signals indicative of one or more properties of one or more samples from one or more scanning inspection tools; determining populations of one or more defect types for the one or more samples according an application of one or more classification rules to the one or more signals received from the one or more scanning inspection tools; determining populations of the one or more defect types for the one or more samples using one or more high-resolution inspection tools; and computing one or more correlations between populations of one or more defect types for one or more samples determined from application of one or more classification rules applied to one or more signals received from the one or more scanning inspection tools and populations of the one or more defect types for the one or more samples determined using the one or more high-resolution inspection tools.
摘要翻译：公开了用于监视时变分类性能的系统和方法。方法可以包括但不限于：从一个或多个扫描检查工具接收指示一个或多个样品的一个或多个特性的一个或多个信号; 根据一个或多个分类规则对从一个或多个扫描检查工具接收的一个或多个信号的应用来确定一个或多个样本的一个或多个缺陷类型的种群; 使用一个或多个高分辨率检查工具确定所述一个或多个样品的一种或多种缺陷类型的种群; 以及计算一个或多个缺陷类型的群体之间的一个或多个相关性，所述一个或多个缺陷类型的群体由应用于从所述一个或多个扫描检查工具和所述一个或多个扫描检查工具的群体接收到的一个或多个信号应用的一个或多个分类规则确定使用一个或多个高分辨率检查工具确定的一个或多个样品的缺陷类型。

17. 发明申请

US20100142800A1 METHODS AND SYSTEMS FOR DETECTING DEFECTS ON A RETICLE 有权
标题翻译：用于检测有缺陷的方法和系统
公开(公告)号：US20100142800A1
公开(公告)日：2010-06-10
申请号：US12328862
申请日：2008-12-05
申请人： Patrick Tung-Sing Pak , Wee-Teck Chia , Aaron Geurdon Chin , Irfan Malik , Brian Duffy
发明人： Patrick Tung-Sing Pak , Wee-Teck Chia , Aaron Geurdon Chin , Irfan Malik , Brian Duffy
IPC分类号： G06K9/00
CPC分类号： G01N21/956 , G01N2021/95676 , G06T7/001 , G06T2207/30148
摘要： Methods and systems for detecting defects on a reticle are provided. One method includes printing a single die reticle in first areas of a wafer using different values of a parameter of a lithography process and at least one second area using a nominal value of the parameter. The method also includes acquiring first images of the first areas and second image(s) of the at least one second area. In addition, the method includes separately comparing the first images acquired for different first areas to at least one of the second image(s). The method further includes detecting defects on the reticle based on first portions of the first images in which variations in the first images compared to the at least one second image are greater than second portions of the first images and the first portions that are common to two or more of the first images.
摘要翻译：提供了用于检测光罩上的缺陷的方法和系统。一种方法包括使用光刻工艺的参数的不同值和使用参数的标称值的至少一个第二区域在晶片的第一区域中印刷单个模具掩模版。该方法还包括获取至少一个第二区域的第一区域和第二图像的第一图像。此外，该方法包括将对于不同的第一区域获取的第一图像分别与第二图像中的至少一个进行比较。该方法还包括基于第一图像的第一部分来检测标线上的缺陷，其中与至少一个第二图像相比的第一图像的变化大于第一图像的第二部分和第二图像的两个共同的第一部分或更多的第一图像。

18. 发明申请

US20100119144A1 METHODS AND SYSTEMS FOR UTILIZING DESIGN DATA IN COMBINATION WITH INSPECTION DATA 审中-公开
标题翻译：与检验数据组合使用设计数据的方法和系统
公开(公告)号：US20100119144A1
公开(公告)日：2010-05-13
申请号：US12692018
申请日：2010-01-22
申请人： Ashok Kulkarni , Brian Duffy , Kais Maayah , Gordon Rouse
发明人： Ashok Kulkarni , Brian Duffy , Kais Maayah , Gordon Rouse
IPC分类号： G06K9/00
CPC分类号： G06F17/5045 , H01L21/67005
摘要： Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space. The method also includes determining if the design data in the portions is at least similar based on results of the comparing step. In addition, the method includes binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar. The method further includes storing results of the binning step in a storage medium.
摘要翻译：提供了与检测数据结合使用设计数据的各种方法和系统。用于对在晶片上检测到的缺陷进行合并的计算机实现的方法包括将设计数据的部分靠近设计数据空间中的缺陷的位置进行比较。该方法还包括基于比较步骤的结果确定部分中的设计数据是否至少相似。此外，该方法包括将组中的缺陷合并成使得设计数据中靠近每个组中的缺陷的位置的部分至少相似。该方法还包括将合并步骤的结果存储在存储介质中。

19. 发明申请

US20080250384A1 SYSTEMS AND METHODS FOR CREATING INSPECTION RECIPES 有权
标题翻译：用于创建检验录像的系统和方法
公开(公告)号：US20080250384A1
公开(公告)日：2008-10-09
申请号：US11960157
申请日：2007-12-19
申请人： Brian Duffy , Ashok Kulkarni
发明人： Brian Duffy , Ashok Kulkarni
IPC分类号： G06F17/50
CPC分类号： G03F7/7065 , G03F7/70525
摘要： Systems and methods for creating inspection recipes are provided. One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process. The method also includes creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed. The first and second designs are different. The inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process.
摘要翻译：提供了用于创建检查配方的系统和方法。用于创建检查配方的一种计算机实现的方法包括采用制造过程获取第一设计和用于印刷第一设计的晶片的检查系统的输出的一个或多个特性。该方法还包括使用第一设计和为其上印刷有第一设计的晶片获取的输出的一个或多个特性来创建用于第二设计的检查配方。第一和第二种设计是不同的。在使用制造工艺将第二设计印刷在晶片上之后，检查配方将用于检查晶片。

20. 发明申请

US20070230770A1 METHODS AND SYSTEMS FOR DETERMINING A POSITION OF INSPECTION DATA IN DESIGN DATA SPACE 有权
标题翻译：用于确定设计数据空间中检验数据位置的方法和系统
公开(公告)号：US20070230770A1
公开(公告)日：2007-10-04
申请号：US11759607
申请日：2007-06-07
申请人： Ashok Kulkarni , Brian Duffy , Kais Maayah , Gordon Rouse , Eugene Shifrin
发明人： Ashok Kulkarni , Brian Duffy , Kais Maayah , Gordon Rouse , Eugene Shifrin
IPC分类号： G06K9/00
CPC分类号： G06F17/5045 , G06T7/0006 , G06T7/33 , G06T2207/30148 , H01L21/67005
摘要： Various methods and systems for determining a position of inspection data in design data space are provided. One computer-implemented method includes determining a centroid of an alignment target formed on a wafer using an image of the alignment target acquired by imaging the wafer. The method also includes aligning the centroid to a centroid of a geometrical shape describing the alignment target. In addition, the method includes assigning a design data space position of the centroid of the alignment target as a position of the centroid of the geometrical shape in the design data space. The method further includes determining a position of inspection data acquired for the wafer in the design data space based on the design data space position of the centroid of the alignment target.
摘要翻译：提供了用于确定设计数据空间中检查数据位置的各种方法和系统。一种计算机实现的方法包括使用通过对晶片成像获得的对准目标的图像来确定形成在晶片上的对准目标的质心。该方法还包括将质心对准描述对准目标的几何形状的质心。此外，该方法包括将对准目标的质心的设计数据空间位置分配为设计数据空间中几何形状的质心的位置。该方法还包括基于对准目标的质心的设计数据空间位置确定在设计数据空间中为晶片获取的检查数据的位置。

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