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    • 142. 发明授权
    • High voltage FET gate structure
    • 高压FET栅极结构
    • US07375398B2
    • 2008-05-20
    • US11138888
    • 2005-05-26
    • Bin WangChih-Hsin Wang
    • Bin WangChih-Hsin Wang
    • H01L23/62
    • H01L29/4983H01L29/0653H01L29/4916H01L29/7833H01L29/7835H01L29/7836
    • A FET device for operation at high voltages includes a substrate, a first well and a second well within the substrate that are doped with implants of a first type and second type, respectively. The first and second wells define a p-n junction. A field oxide layer within the second well defines a first surface region to receive a drain contact. A third well is located at least partially in the first well, includes doped implants of the second type, and is adapted to receive a source contact. As such, the third well defines a channel between itself and the second well within the first well. A gate is disposed over the channel. At least a first portion of the gate is disposed over the p-n junction, and includes doped implants of the first type. A number of permutations are allowed for doping the remainder of the gate.
    • 用于在高电压下操作的FET器件包括分别掺杂有第一类型和第二类型的植入物的衬底,衬底内的第一阱和第二阱。 第一和第二阱限定p-n结。 第二阱内的场氧化物层限定了接收漏极接触的第一表面区域。 第三阱至少部分地位于第一阱中,包括第二类型的掺杂植入物,并且适于接收源极接触。 这样,第三井在第一井内定义了自身与第二井之间的通道。 通道上设置一个门。 栅极的至少第一部分设置在p-n结上方,并且包括第一类型的掺杂植入物。 许多排列允许掺杂栅极的其余部分。
    • 143. 发明申请
    • Non-volatile memory with programming through band-to-band tunneling and impact ionization gate current
    • 非易失性存储器,通过带 - 带隧穿和冲击电离栅极电流进行编程
    • US20080056010A1
    • 2008-03-06
    • US11601474
    • 2006-11-16
    • Andrew E. Horch
    • Andrew E. Horch
    • G11C16/04G11C11/34
    • G11C16/12
    • Electronic circuitry is described having a first transistor having a first gate dielectric located between an electrically floating gate and a semiconductor substrate. The first injection current flows through the first gate dielectric to establish a first amount of electrical charge on the gate electrode. The electronic circuitry also includes a second transistor having a second gate dielectric located between the gate electrode and the semiconductor substrate. A band-to-band tunneling current flows between valence and conduction bands of the second transistor to create a second injection current that flows through the second gate dielectric to establish the first amount of electrical charge on the gate electrode. Non volatile memory cell circuits having the above described circuitry are also described.
    • 电子电路被描述为具有位于电浮置栅极和半导体衬底之间的第一栅极电介质的第一晶体管。 第一注入电流流过第一栅极电介质以在栅电极上建立第一量的电荷。 电子电路还包括具有位于栅电极和半导体衬底之间的第二栅极电介质的第二晶体管。 带间隧穿电流在第二晶体管的价带和导带之间流动,以产生流过第二栅极电介质的第二注入电流,以在栅电极上建立第一量的电荷。 还描述了具有上述电路的非易失性存储单元电路。
    • 149. 发明申请
    • Determining authentication of RFID tags for indicating legitimacy of their associated items
    • 确定用于指示其相关项目合法性的RFID标签的认证
    • US20070136585A1
    • 2007-06-14
    • US11637479
    • 2006-12-11
    • Christopher DiorioGregory Kavounas
    • Christopher DiorioGregory Kavounas
    • H04L9/00
    • G06F21/35G06Q30/06
    • RFID readers, computers, and methods are provided for determining the authentication of one or more RFID tags associated with a proffered item. In some embodiments, an Item Identifier (II) is input from the tags, along with a Declared Password (DP) corresponding to the II. A question is generated about whether the DP is regarded as proper for the II by a reference database, and applied to data of the reference database. A host of the database uses special permissions, such that an answer to the question does not reveal the good password, unless the DP is already the right one. Beyond the authentication of the tag, the answer can further indicate the legitimacy of the proffered item, such as for a supply chain or at a Customs Office.
    • RFID读取器,计算机和方法被提供用于确定与提供的项目相关联的一个或多个RFID标签的认证。 在一些实施例中,从标签输入项目标识符(II)以及对应于II的声明密码(DP)。 产生关于DP被参考数据库视为是否适合II并且应用于参考数据库的数据的问题。 数据库的主机使用特殊权限,这样一来,问题的答案就不会显示出良好的密码,除非DP已经是正确的密码了。 除了标签的认证之外,答案可以进一步表明所提供项目的合法性,例如供应链或海关。