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    • 10. 发明授权
    • Floating-gate semiconductor structures
    • 浮栅半导体结构
    • US07548460B2
    • 2009-06-16
    • US10915107
    • 2004-08-09
    • Christopher J. DiorioTodd E. Humes
    • Christopher J. DiorioTodd E. Humes
    • G11C11/34
    • H01L29/66825H01L27/115H01L27/11521H01L27/11558H01L29/7883H01L29/7885
    • Hot-electron injection driven by hole impact ionization in the channel-to-drain junction of a p-channel MOSFET provides a new mechanism for writing a floating-gate memory. Various pFET floating-gate structures use a combination of this mechanism and electron tunneling to implement nonvolatile analog memory, nonvolatile digital memory, or on-line learning in silicon. The memory is nonvolatile because the devices use electrically isolated floating gates to store electronic charge. The devices enable on-line learning because the electron injection and tunneling mechanisms that write the memory can occur during normal device operation. The memory updates and learning are bidirectional because the injection and tunneling mechanisms add and remove electrons from the floating gate, respectively. Because the memory updates depend on both the stored memory and the pFETs terminal voltages, and because they are bidirectional, the devices can implement on-line learning functions.
    • 通过p沟道MOSFET的沟道到漏极结中的空穴冲击电离驱动的热电子注入为写入浮栅存储器提供了一种新的机制。 各种pFET浮栅结构使用这种机制和电子隧道的组合来实现非易失性模拟存储器,非易失性数字存储器或在线学习。 存储器是非易失性的,因为器件使用电隔离的浮动门来存储电子电荷。 这些器件允许在线学习,因为写入存储器的电子注入和隧道机制可能在正常的器件操作期间发生。 存储器更新和学习是双向的,因为注入和隧道机制分别从浮动栅极添加和去除电子。 因为存储器更新取决于存储的存储器和pFET端子电压,并且由于它们是双向的,所以器件可以实现在线学习功能。