专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

131. 发明申请

US20070285767A1 Catadioptric imaging system with beam splitter 审中-公开
标题翻译：反射折射成像系统与分束器
公开(公告)号：US20070285767A1
公开(公告)日：2007-12-13
申请号：US11723630
申请日：2007-03-21
申请人： Aurelian Dodoc
发明人： Aurelian Dodoc
IPC分类号： G02B17/08
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0892
摘要： A catadioptric imaging system for imaging an on-axis object field arranged in an object surface of the imaging system onto an on-axis image field arranged in an image surface of the imaging system while creating at least one intermediate image has at least two imaging subsystems concatenated at an intermediate image such that the intermediate image formed by an imaging subsystem immediately upstream of that intermediate image forms the object of a subsequent imaging subsystem immediately downstream of that intermediate image. Each imaging subsystem includes a pupil surface and at least one of the imaging subsystems is a catadioptric or catoptric imaging subsystem including a concave mirror. The imaging system includes a geometric beam splitter having at least one planar beam splitter surface formed by a fully reflecting mirror, the beam splitter surface being arranged at or optically near to a pupil surface.
摘要翻译：用于将布置在成像系统的物体表面中的轴上物体场成像到布置在成像系统的图像表面中的同轴图像场同时创建至少一个中间图像的反折射成像系统具有至少两个成像子系统在中间图像处连接，使得由紧邻该中间图像上游的成像子系统形成的中间图像形成紧邻该中间图像下游的后续成像子系统的对象。每个成像子系统包括瞳孔表面，并且成像子系统中的至少一个是包括凹面镜的反射折射或反射成像子系统。成像系统包括几何分束器，其具有由完全反射镜形成的至少一个平面分束器表面，分束器表面布置在光学或光学上靠近瞳孔表面。

132. 发明申请

US20060268253A1 Imaging system, in particular for a microlithographic projection exposure apparatus 有权
标题翻译：成像系统，特别是用于微光刻投影曝光装置
公开(公告)号：US20060268253A1
公开(公告)日：2006-11-30
申请号：US11441482
申请日：2006-05-26
申请人： Aurelian Dodoc
发明人： Aurelian Dodoc
IPC分类号： G03B27/54
CPC分类号： G03F7/70225 , G03F7/70275
摘要： The invention concerns imaging systems, in particular for a microlithographic projection exposure apparatus, for imaging a mask which can be positioned in an object plane of the imaging system on to a photosensitive layer which can be positioned in an image plane of the imaging system. An imaging system according to the invention comprises: an object plane-side subsystem which produces a first intermediate image with an object plane-side imaging scale βo, at least one further subsystem which produces a further intermediate image between the first intermediate image and the image plane, and an image plane-side subsystem which images the further intermediate image into the image plane with an image plane-side imaging scale βi, wherein the condition 0.75≦βo*βi≦1.25 is satisfied.
摘要翻译：本发明涉及用于成像系统，特别是用于微光刻投影曝光设备，用于将可以位于成像系统的物平面中的掩模成像到可位于成像系统的图像平面中的感光层上。根据本发明的成像系统包括：物体平面侧子系统，其产生具有物平面侧成像比例尺的第一中间图像，至少一个另外的子系统，其产生另外的中间图像在第一中间图像和图像平面之间，以及图像平面侧子系统，其将另外的中间图像成像到具有图像平面侧成像比例β的像平面中，其中条件0.75 < =β <β> <= 1.25。

133. 发明申请

US20060256447A1 Projection objective 有权
标题翻译：投影目标
公开(公告)号：US20060256447A1
公开(公告)日：2006-11-16
申请号：US11412925
申请日：2006-04-28
申请人： Aurelian Dodoc
发明人： Aurelian Dodoc
IPC分类号： G02B3/00
CPC分类号： G02B3/12 , G02B13/143 , G02B17/0812 , G02B17/0844 , G02B17/0892 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective using ultraviolet radiation has a plurality of optical elements including transparent optical elements transparent for radiation at an operating wavelength λ, where 260 nm>λ>150 nm, an image-side pupil surface arranged between the object surface and the image surface, and an aperture-defining lens group arranged between the image-side pupil surface and the image surface for converging radiation coming from the image-side pupil surface towards the image surface to define an image-side numerical aperture NA, where 0.7≦NA≦1.4. The aperture-defining lens group includes at least one high-index lens made from a transparent high-index material having a refractive index nHI, where nHI>nSIO2 and where nSIO2 is the refractive index of silicon dioxide (SiO2) at the operating wavelength.
摘要翻译：用于使用紫外线辐射将布置在投影物镜的物体表面中的图案成像到投影物镜的图像表面上的图案的投影物镜具有多个光学元件，包括透明的用于工作波长λ的辐射的透明光学元件，其中260nm> λ= 150nm，布置在物体表面和图像表面之间的图像侧光瞳表面，以及布置在图像侧瞳孔表面和图像表面之间的孔径限定透镜组，用于会聚来自图像侧瞳孔的辐射表面朝向图像表面以限定图像侧数值孔径NA，其中0.7 <= NA <= 1.4。孔径限定透镜组包括至少一个高折射率透镜，该透镜由具有折射率为n 的透明高折射率材料制成，其中n < > SIO 2，其中n 2 S 2 2是在工作波长处的二氧化硅（SiO 2/2）的折射率。

134. 发明申请

US20060132931A1 Catadioptric projection objective 审中-公开
标题翻译：反射折射投影物镜
公开(公告)号：US20060132931A1
公开(公告)日：2006-06-22
申请号：US11237749
申请日：2005-09-29
申请人： Alexander Epple , Aurelian Dodoc
发明人： Alexander Epple , Aurelian Dodoc
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging a pattern arranged in the object plane (102) of the projection objective into the image plane (104) of the projection objective has a catadioptric first objective part (105) having at least one concave mirror (106), and a dioptric second objective part (108) in which there is situated a pupil surface (111) near the image. At least one concave lens (140, 145) with a concave surface (140′, 145′) directed towards the pupil surface (111) is arranged in a near zone (160) of the pupil surface. There are no lenses with a strongly curved concave surface directed towards the image plane between the pupil surface and the image plane. Such projection objectives can be produced in a way which saves material in conjunction with good optical correction, and are relatively insensitive to production-induced deviations from the ideal design.
摘要翻译：用于将布置在投影物镜的物平面（102）中的图案成像到投影物镜的像平面（104）中的反射折射投射物镜具有反射折射的第一物镜部分（105），其具有至少一个凹面镜（106），以及其中在图像附近设置瞳孔表面（111）的屈光度第二目标部分（108）。具有指向瞳孔表面（111）的凹表面（140'，145'）的至少一个凹透镜（140,145）被布置在瞳孔表面的近区域（160）中。没有透镜具有朝向瞳孔表面和图像平面之间的图像平面的强弯曲凹面。这样的投影物镜可以以与良好的光学校正相结合的方式产生，并且对生产诱导的与理想设计的偏差相对不敏感。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式