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    • 122. 发明授权
    • Beam data processing apparatus and particle beam therapy system
    • 光束数据处理装置和粒子束治疗系统
    • US09327140B2
    • 2016-05-03
    • US14115028
    • 2011-08-23
    • Taizo HondaYuichi YamamotoYuehu Pu
    • Taizo HondaYuichi YamamotoYuehu Pu
    • G01K1/08A61N5/10G21K5/04
    • A61N5/1048A61N5/1043A61N5/1075A61N5/1077A61N2005/1074A61N2005/1087G21K5/04
    • A beam data processing apparatus has a plurality of channel data conversion units that convert a plurality of analogue signals outputted from a position monitor into digital signals, a position size processing unit that calculates a beam position, based on voltage information items obtained through processing by the plurality of channel data conversion units, an abnormality determination processing unit that determines the beam position and generates a position abnormality signal, and an integrated control unit that controls the plurality of channel data conversion units in such a way that while a beam is stopped at an irradiation spot, digital signal conversion processing is implemented two or more times; the channel data conversion unit has a plurality of A/D converters, a demultiplexer that distributes analogue signals, and a multiplexer that switches respective digital signals processed by the A/D converters so as to output them to the position size processing unit.
    • 波束数据处理装置具有多个通道数据转换单元,其将从位置监视器输出的多个模拟信号转换为数字信号,位置大小处理单元,基于通过处理所获得的电压信息项,计算波束位置 多个通道数据转换单元,确定光束位置并产生位置异常信号的异常判定处理单元,以及控制多个通道数据转换单元的集成控制单元,使得当光束停止在 照射点,数字信号转换处理两次以上; 信道数据转换单元具有多个A / D转换器,分配模拟信号的多路分解器和切换由A / D转换器处理的各个数字信号的多路复用器,以便将它们输出到位置大小处理单元。
    • 124. 发明授权
    • Substrate processing system and substrate processing method
    • 基板加工系统和基板加工方法
    • US08909364B2
    • 2014-12-09
    • US13114103
    • 2011-05-24
    • Wataru TsukinokiYuichi Yamamoto
    • Wataru TsukinokiYuichi Yamamoto
    • H01L21/67H01L21/677
    • H01L21/67276H01L21/67745H01L21/67778
    • Provided is a substrate processing system including a group controller which determines a combination of processing apparatuses having the shortest total processing time including the processing end time in a final processing apparatus, determines a predictable elapsed time up to a processing start time by a predetermined downstream processing apparatus for a wafer lot from a processing end time of the wafer lot by a predetermined processing apparatus in the combination of the processing apparatuses, and determines a timing of discharging the substrate to the predetermined processing apparatus or an upstream processing apparatus of the predetermined processing apparatus so that the predictable elapsed time is set within a predetermined time when the predictable elapsed time exceeds the predetermined time.
    • 提供了一种基板处理系统,其包括:组控制器,其确定在最终处理装置中包括处理结束时间的具有最短总处理时间的处理装置的组合,通过预定的下游处理确定直到处理开始时间的可预测经过时间 在处理装置的组合中,通过预定的处理装置从晶片块的处理结束时间开始的晶片批次装置,并且确定将基板排出到预定处理装置或预定处理装置的上游处理装置的定时 使得可预测的经过时间设定在可预测的经过时间超过预定时间的预定时间内。
    • 126. 发明授权
    • Substrate transfer method for performing processes including photolithography sequence
    • 用于执行包括光刻序列的处理的基板转印方法
    • US08702370B2
    • 2014-04-22
    • US13495611
    • 2012-06-13
    • Yuichi YamamotoTadayuki YamaguchiYasuhito SaigaYoshiaki Yamada
    • Yuichi YamamotoTadayuki YamaguchiYasuhito SaigaYoshiaki Yamada
    • H01L21/677
    • H01L21/67225G03F7/70525G03F7/7075G03F7/70991H01L21/67727H01L21/67733Y10S414/135
    • A substrate transfer method for transferring target substrates proceeds in a substrate processing system for performing processes including a photolithography sequence on the target substrates. The system includes a first automated substrate transfer line configured to transfer the target substrates among a plurality of process sections for respectively performing processes on the target substrates, and a second automated substrate transfer line of a cyclical type dedicated to a plurality of process apparatuses of a photolithography process section, which are configured to perform a series of processes in the photolithography sequence, the second automated substrate transfer line being located relative to the first automated substrate transfer line so as for the target substrates to be transferred therebetween. The method includes, in order to proceed with the photolithography sequence, transferring the target substrates among the process apparatuses in the photolithography process section by use of the second automated substrate transfer line.
    • 用于转移目标衬底的衬底转移方法在用于在目标衬底上执行包括光刻序列的处理的衬底处理系统中进行。 该系统包括:第一自动化基板传送线,其被配置为在用于分别在目标基板上执行处理的多个处理部中传送目标基板;以及专用于多个处理装置的循环型第二自动基板传送线 光刻处理部分,被配置为在光刻序列中执行一系列处理,第二自动化基板传送线相对于第一自动基板传送线定位,以使目标基板在其间传输。 该方法包括为了继续进行光刻顺序,通过使用第二自动基板传送线在光刻处理部中的处理装置之间传送目标基板。
    • 127. 发明申请
    • BEAM DATA PROCESSING APPARATUS AND PARTICLE BEAM THERAPY SYSTEM
    • 光束数据处理装置和粒子束治疗系统
    • US20140061498A1
    • 2014-03-06
    • US14115028
    • 2011-08-23
    • Taizo HondaYuichi YamamotoYuehu Pu
    • Taizo HondaYuichi YamamotoYuehu Pu
    • A61N5/10
    • A61N5/1048A61N5/1043A61N5/1075A61N5/1077A61N2005/1074A61N2005/1087G21K5/04
    • A beam data processing apparatus has a plurality of channel data conversion units that convert a plurality of analogue signals outputted from a position monitor into digital signals, a position size processing unit that calculates a beam position, based on voltage information items obtained through processing by the plurality of channel data conversion units, an abnormality determination processing unit that determines the beam position and generates a position abnormality signal, and an integrated control unit that controls the plurality of channel data conversion units in such a way that while a beam is stopped at an irradiation spot, digital signal conversion processing is implemented two or more times; the channel data conversion unit has a plurality of A/D converters, a demultiplexer that distributes analogue signals, and a multiplexer that switches respective digital signals processed by the ND converters so as to output them to the position size processing unit.
    • 波束数据处理装置具有多个通道数据转换单元,其将从位置监视器输出的多个模拟信号转换为数字信号,位置大小处理单元,基于通过处理所获得的电压信息项,计算波束位置 多个通道数据转换单元,确定光束位置并产生位置异常信号的异常判定处理单元,以及控制多个通道数据转换单元的集成控制单元,使得当光束停止在 照射点,数字信号转换处理两次以上; 信道数据转换单元具有多个A / D转换器,分配模拟信号的多路分解器,以及多路复用器,其切换由ND转换器处理的各个数字信号,以将其输出到位置大小处理单元。
    • 129. 发明申请
    • ELECTROMAGNETIC CONTACTOR
    • 电磁接触器
    • US20130229248A1
    • 2013-09-05
    • US13878366
    • 2012-05-09
    • Shoji YokoyamaYuichi Yamamoto
    • Shoji YokoyamaYuichi Yamamoto
    • H01H9/36
    • H01H9/362H01H9/346H01H9/443H01H50/02H01H50/546H01H51/065H01H2050/025
    • An electromagnetic contactor has an arc extinguishing chamber housing a contact mechanism having a pair of fixed contacts and a movable contact that contacts with the pair of fixed contacts. The arc extinguishing chamber has a plate-shaped fixed contact support insulating substrate including through holes to fix at least the pair of fixed contacts and formed with a metal foil on an outer peripheral circumferential edge of one surface by a metalizing process. The pair of fixed contacts and a metal cylindrical body are brazed and joined to the metal foils of the fixed contact support insulating substrate, and an insulating cylindrical body is disposed on an inner peripheral surface of the metal cylindrical body.
    • 电磁接触器具有容纳接触机构的消弧室,该接触机构具有一对固定触点和与一对固定触点接触的可动触点。 灭弧室具有板状固定接触支撑绝缘基板,该基板包括通孔,用于固定至少一对固定触点,并通过金属化工艺在一个表面的外周周缘上形成金属箔。 一对固定触头和金属圆筒体钎焊并接合到固定触头支撑绝缘基板的金属箔上,绝缘筒体设置在金属圆筒体的内周面上。