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121. 发明授权

US07809303B2 Image forming apparatus having an air passage and outlet 有权
标题翻译：具有空气通道和出口的图像形成装置
公开(公告)号：US07809303B2
公开(公告)日：2010-10-05
申请号：US11533564
申请日：2006-09-20
申请人： Hiroshi Igarashi
发明人： Hiroshi Igarashi
IPC分类号： G03G21/20
CPC分类号： G03G21/206
摘要： An image forming apparatus is provided which includes a process unit including image formation units, each of the image formation units having an image carrier, a charger, and a developing device, a scanner unit disposed facing the process unit and configured to expose the image carrier in each of the image formation units to light, and a fixing device disposed in the first direction with respect to the process unit. Also, the image forming device includes a first passage configured to channel air between the process unit and the scanner unit to an outlet in the first direction and a second passage configured to channel air in the vicinity of the fixing device to the outlet in a second direction that is substantially perpendicular to the first direction.
摘要翻译：提供了一种图像形成装置，其包括包括图像形成单元的处理单元，每个图像形成单元具有图像载体，充电器和显影装置，与所述处理单元相对设置并被配置为暴露图像载体在每个图像形成单元中进行点亮，并且固定装置相对于处理单元设置在第一方向上。此外，图像形成装置还包括第一通道，其构造成将处理单元和扫描仪单元之间的空气沿第一方向通向出口，第二通道构造成在第二方向上将定影装置附近的空气引导到出口方向基本上垂直于第一方向。

122. 发明授权

US07804515B2 Image-forming device with scanner unit 有权
标题翻译：具有扫描仪单元的图像形成装置
公开(公告)号：US07804515B2
公开(公告)日：2010-09-28
申请号：US12320328
申请日：2009-01-23
申请人： Yasuo Tamaru , Hiroshi Igarashi , Yasushi Okabe
发明人： Yasuo Tamaru , Hiroshi Igarashi , Yasushi Okabe
IPC分类号： B41J15/14 , B41J27/00
CPC分类号： G03G15/16 , G03G15/01 , G03G15/0189 , G03G15/0194 , G03G21/1609 , G03G21/1853 , G03G2215/0119 , G03G2215/0141 , G03G2221/1603 , G03G2221/1684 , G03G2221/183
摘要： An image-forming device includes: a housing; an endless belt; a plurality of process units; and a plurality of scanner units. Each scanner unit and each process unit are inclined obliquely to a vertical direction. At least a part of each process unit is inserted into and removed from the housing in an obliquely inclined direction.
摘要翻译：图像形成装置包括：壳体; 无尽的腰带多个处理单元; 和多个扫描器单元。每个扫描器单元和每个处理单元相对于垂直方向倾斜倾斜。每个处理单元的至少一部分以倾斜的方向插入壳体中并从壳体中移除。

123. 发明申请

US20100180697A1 TACTILE SENSOR 有权
标题翻译： TACTILE传感器
公开(公告)号：US20100180697A1
公开(公告)日：2010-07-22
申请号：US12524254
申请日：2007-12-21
申请人： Hiroshi Igarashi , Ryoji Matsuda
发明人： Hiroshi Igarashi , Ryoji Matsuda
IPC分类号： G01L1/22
CPC分类号： B25J15/0009 , B25J13/084
摘要： The present invention provides a tactile sensor which can reproduce a sensor surface in contact with a sensing object and contribute to a reduction in cost of an automation system which utilizes an industrial robot, the tactile sensor including: a contact-portion unit 12 composed of a flexible material; a contact-portion housing unit 11 which surrounds and houses the contact-portion unit in a removable state while forming a posture so that a top portion of the contact-portion unit may project; and a strain sensing element 15 or a pressure sensing element embedded into the contact-portion housing unit.
摘要翻译：本发明提供了一种触觉传感器，其可以再现与感测对象接触的传感器表面，并有助于降低利用工业机器人的自动化系统的成本，该触觉传感器包括：接触部分单元12，其由柔性材料; 接触部分壳体单元11，其在形成姿态的同时以接触部分单元的顶部突出的方式围绕并容纳接触部分单元处于可移除状态; 以及应变感测元件15或嵌入到接触部分壳体单元中的压力感测元件。

124. 发明授权

US07751748B2 Image-forming device 有权
标题翻译：图像形成装置
公开(公告)号：US07751748B2
公开(公告)日：2010-07-06
申请号：US11326404
申请日：2006-01-06
申请人： Hiroshi Igarashi
发明人： Hiroshi Igarashi
IPC分类号： G03G15/02
CPC分类号： G03G21/1647 , G03G21/1628 , G03G2221/1684
摘要： An image-forming device includes a plurality of photosensitive drums, a plurality of drum gears, a plurality of drive gears and a removal allowing unit. Each drum gear has a first target portion. Each drive gear has a second target portion. The removal allowing unit allows each photosensitive drum to be removed from the casing only when the first target portion of the drum gear is positionally in coincidence with a first position and when the second target portion of the drive gear is positionally in coincidence with a second position.
摘要翻译：图像形成装置包括多个感光鼓，多个鼓齿轮，多个驱动齿轮和移除允许单元。每个鼓齿轮具有第一目标部分。每个驱动齿轮具有第二目标部分。移动允许单元允许每个感光鼓只有当鼓齿轮的第一目标部分与第一位置位置一致时以及当驱动齿轮的第二目标部分与第二位置重合时才从壳体移除。

125. 发明授权

US07654291B2 Purging apparatus and purging method 失效
标题翻译：清洗装置和清洗方法
公开(公告)号：US07654291B2
公开(公告)日：2010-02-02
申请号：US10554504
申请日：2004-04-28
申请人： Toshihiko Miyajima , Hiroshi Igarashi , Hitoshi Suzuki
发明人： Toshihiko Miyajima , Hiroshi Igarashi , Hitoshi Suzuki
IPC分类号： H01L21/673 , H01L21/677
CPC分类号： H01L21/67772 , H01L21/67017 , H01L21/67389 , Y10S414/135
摘要： It is an object of the present invention to easily and securely perform the removal operation of contaminant or the like from a wafer housed in a FOUP. To achieve the object, a purging apparatus of the present invention removes contaminant or the like from a wafer by moving a gas supply nozzle along a direction in which wafers are superimposed at the front of an opening while a lid of the FOUP is separated from a body and spraying clean gas on each wafer from the gas supply nozzle.
摘要翻译：本发明的目的是从容纳在FOUP中的晶片容易且可靠地执行污染物等的去除操作。为了实现该目的，本发明的清洗装置通过沿着开口的前部的晶片叠合方向移动气体供给喷嘴，同时将FOUP的盖子与并从气体供应喷嘴在每个晶片上喷射清洁气体。

126. 发明授权

US07653328B2 Image forming device capable of closing door with high accuracy 有权
标题翻译：具有高精度闭门的图像形成装置
公开(公告)号：US07653328B2
公开(公告)日：2010-01-26
申请号：US11773587
申请日：2007-07-05
申请人： Hiroshi Igarashi , Yoshiteru Hattori
发明人： Hiroshi Igarashi , Yoshiteru Hattori
IPC分类号： G03G21/00
CPC分类号： H05K5/0217 , B41J29/13 , G03G21/1633 , G03G2221/169 , H04N1/00546 , H04N2201/0082
摘要： An image forming device includes a main body and a door. The main body is provided with first and second contacting parts and an abutting surface. When the door is closed, the first and second contacting parts contact a door frame of the door, thereby determining the horizontal position of the door with respect to the main body. Also a vertical positioning stopper formed to the door frame abuts the abutting surface from above, thereby determining the vertical position of the door with respect to the main body. Further, a reactive force generated at a lock mechanism and an urging force of a spring increase a pressure to contact areas of the door with the first and second contacting parts and the abutting surface.
摘要翻译：图像形成装置包括主体和门。主体设置有第一和第二接触部分和邻接表面。当门关闭时，第一和第二接触部分接触门的门框，从而确定门相对于主体的水平位置。另外，形成在门框上的垂直定位止动件从上方抵接抵接面，从而确定门相对于主体的垂直位置。此外，在锁定机构处产生的反作用力和弹簧的作用力增加了与第一和第二接触部分和邻接表面接触门的区域的压力。

127. 发明授权

US07614840B2 Wafer processing apparatus having dust proof function 有权
公开(公告)号：US07614840B2
公开(公告)日：2009-11-10
申请号：US10706977
申请日：2003-11-14
申请人： Tsutomu Okabe , Hiroshi Igarashi
发明人： Tsutomu Okabe , Hiroshi Igarashi
IPC分类号： H01L21/677 , B65G1/133
CPC分类号： H01L21/67772 , Y10S414/135 , Y10S414/139
摘要： The wafer processing apparatus includes a chamber that is pressurized to a pressure that is higher than the pressure of the exterior thereof, an opening portion through which the interior and the exterior of the chamber are in communication with each other, and a door that closes the opening portion. When the opening portion is closed by the door, a portion of the opening remains as an aperture uncovered by the door. In conventional semiconductor wafer processing apparatus, the interior of the apparatus is sealed and pressurized in order to keep a high degree of cleanness in the wafer processing portion, and therefore airflow is generated due to a pressure difference between the interior and the exterior of the apparatus. With the above feature of the invention, it is possible to suppress creation of such airflow and prevent dust from entering the wafer processing apparatus to eliminate wafer contamination.

128. 发明授权

US07607880B2 Wafer processing apparatus having dust proof function 有权
标题翻译：晶圆加工设备具有防尘功能
公开(公告)号：US07607880B2
公开(公告)日：2009-10-27
申请号：US10706914
申请日：2003-11-14
申请人： Tsutomu Okabe , Hiroshi Igarashi
发明人： Tsutomu Okabe , Hiroshi Igarashi
IPC分类号： H01L21/677 , B65G1/133
CPC分类号： H01L21/67772 , Y10S414/135 , Y10S414/139
摘要： The wafer processing apparatus includes a chamber that is pressurized to a pressure that is higher than the pressure of the exterior thereof, an opening portion through which the interior and the exterior of the chamber are in communication with each other, and a door that closes the opening portion. When the opening portion is closed by the door, a portion of the opening remains as an aperture uncovered by the door. In conventional semiconductor wafer processing apparatus, the interior of the apparatus is sealed and pressurized in order to keep a high degree of cleanness in the wafer processing portion, and therefore airflow is generated due to a pressure difference between the interior and the exterior of the apparatus. With the above feature of the invention, it is possible to suppress creation of such airflow and prevent dust from entering the wafer processing apparatus to eliminate wafer contamination.
摘要翻译：晶片处理装置包括被加压到比其外部的压力高的压力的室，室的内部和外部通过该开口部彼此连通，以及关闭开口部分。当开口部分被门关闭时，开口的一部分保持为未被门覆盖的孔。在传统的半导体晶片处理装置中，为了在晶片处理部分保持高度的清洁度，装置的内部被密封和加压，因此由于装置的内部和外部之间的压差而产生气流。利用本发明的上述特征，可以抑制这种气流的产生，防止灰尘进入晶片处理装置以消除晶片污染。

129. 发明申请

US20090190955A1 Image Forming Apparatus and Image Forming Unit 有权
标题翻译：图像形成装置和图像形成单元
公开(公告)号：US20090190955A1
公开(公告)日：2009-07-30
申请号：US12419624
申请日：2009-04-07
申请人： Hiroshi Igarashi , Naoya Kamimura , Yoshiya Tomatsu
发明人： Hiroshi Igarashi , Naoya Kamimura , Yoshiya Tomatsu
IPC分类号： G03G21/18
CPC分类号： G03G21/1846 , G03G15/0178 , G03G15/0194 , G03G21/1619 , G03G21/1661 , G03G21/18 , G03G21/1821 , G03G21/1842 , G03G2215/0119 , G03G2221/1846
摘要： Image forming apparatuses include: a casing; an image forming unit removable from the casing in a first direction; and plural developer cartridges. The cartridges may be attached and detached with respect to the image forming unit in a second direction that is inclined toward the first direction. Other image forming apparatuses include: a casing; an exposure device; a plurality of cartridges configured to be attached and detached with respect to the casing in a first direction; and a recording medium transport system for transporting recording media adjacent the photosensitive members in a second direction. The first direction may be inclined with respect to the second direction, and at least a portion of optical paths of the light emitted from the exposure device may extend parallel with the first direction. Aspects also relate to image forming units, e.g., for use in image forming apparatuses as described above.
摘要翻译：图像形成装置包括：壳体; 图像形成单元，其沿着第一方向从所述壳体移除; 和多个显影剂盒。盒可以相对于图像形成单元在朝向第一方向倾斜的第二方向上被附接和分离。其他图像形成装置包括：壳体; 曝光装置; 多个盒，其构造成在第一方向上相对于所述壳体被附接和分离; 以及用于在第二方向上传送与感光构件相邻的记录介质的记录介质传送系统。第一方向可以相对于第二方向倾斜，并且从曝光装置发射的光的至少一部分光路可以与第一方向平行地延伸。方面还涉及图像形成单元，例如用于如上所述的图像形成装置。

130. 发明授权

US07360985B2 Wafer processing apparatus including clean box stopping mechanism 有权
标题翻译：晶圆加工设备包括清洁箱停止机构
公开(公告)号：US07360985B2
公开(公告)日：2008-04-22
申请号：US10330098
申请日：2002-12-30
申请人： Tsutomu Okabe , Hiroshi Igarashi , Toshihiko Miyajima
发明人： Tsutomu Okabe , Hiroshi Igarashi , Toshihiko Miyajima
IPC分类号： B65G1/00 , E04H6/00 , H01L21/677 , A01H5/08
CPC分类号： H01L21/67772
摘要： The semiconductor wafer processing apparatus includes a clean box having an opening, a lid for closing the opening, a door to be in contact with the lid and to detach the lid from the clean box, a first stopper adapted to move in conjunction with movement of the clean box without a change in its relative positional relationship with the clean box, and an unmoved second stopper. With this structure, it is possible to prevent the clean box moved on the semiconductor wafer processing apparatus from colliding with the apparatus, even if the clean box manufactured by molding using a reinforced plastic in accordance with a prescribed standard includes a manufacturing error in its size.
摘要翻译：半导体晶片处理装置包括具有开口的清洁盒，用于封闭开口的盖，与盖接触并将盖与清洁盒分离的门，第一挡块，其适于随着干净的盒子与其相对的位置关系不会改变，并且有一个不动的第二个止动器。利用这种结构，即使根据规定的标准通过使用强化塑料的成型而制造的清洁盒包括其尺寸的制造误差，也可以防止在半导体晶片处理装置上移动的清洁盒与装置碰撞。

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