专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

121. 发明申请

US20160332421A1 COMPOSITION FOR FORMING RELEASE LAYER, RELEASE LAYER, LAMINATE INCLUDING RELEASE LAYER, METHOD OF PREPARING LAMINATE, AND METHOD OF TREATING LAMINATE 有权
标题翻译：用于形成释放层，释放层的组合物，包括释放层的层压体，制备层压体的方法和处理层压体的方法
公开(公告)号：US20160332421A1
公开(公告)日：2016-11-17
申请号：US15139920
申请日：2016-04-27
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Takahiro YOSHIOKA , Koki TAMURA , Hirofumi IMAI , Atsushi KUBO
IPC分类号： B32B7/06 , B32B7/12 , C09J7/02 , H01L21/683
CPC分类号： B32B7/06 , B32B7/12 , B32B9/04 , B32B27/283 , B32B2250/02 , B32B2255/26 , B32B2307/542 , B32B2307/748 , B32B2457/14 , C08G77/28 , C08L83/04 , C08L83/06 , C09D183/00 , C09D183/06 , C09D183/08 , C09J7/40 , C09J7/401 , C09J2483/005 , H01L21/6835 , H01L2221/68318 , H01L2221/68327 , H01L2221/6834 , H01L2221/68381
摘要： A laminate is formed by laminating a substrate and a support plate through an adhesive layer and a release layer. The release layer is formed by applying a composition containing a reactive polysilsesquioxane and a crosslinkable group-containing siloxane onto the surface of the support plate or the surface of the substrate and heating the composition to polymerize the reactive polysilsesquioxane and the crosslinkable group-containing siloxane.
摘要翻译：通过粘合剂层和剥离层层叠基板和支撑板而形成层压体。通过将含有反应性聚倍半硅氧烷和含可交联基团的硅氧烷的组合物施加到载体板或基板的表面上并加热组合物以使反应性聚倍半硅氧烷和含可交联基团的硅氧烷聚合来形成剥离层。

122. 发明申请

US20160306276A1 COMPOSITION FOR NANOIMPRINT AND NANOIMPRINT PATTERN FORMING METHOD 有权
标题翻译： NANOIMPRINT和NANOIMPRINT PATTERN形成方法的组合物
公开(公告)号：US20160306276A1
公开(公告)日：2016-10-20
申请号：US15097772
申请日：2016-04-13
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Kenri KONNO
IPC分类号： G03F7/00 , C09D183/04
CPC分类号： G03F7/0002 , C08G77/18 , C08G77/20 , C08L83/06 , C09D183/04 , C09D183/06 , G03F7/0046 , G03F7/0388 , G03F7/0757 , C08L33/16
摘要： A composition for nanoimprinting including a siloxane polymer which includes a polymerizable group polymerized by irradiation with light; a polymerization initiator; and a fluorine-containing polymeric compound in which the fluorine-containing polymeric compound has a constituent unit represented by the following formula (f1-1) in which R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Rf102 and Rf103 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Rf102 and Rf103 may be the same as or different from each other, nf1 represents an integer of 1 to 5, and Rf101 represents an organic group including a fluorine atom.

123. 发明申请

US20160291469A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION 审中-公开
标题翻译：化学放大型阳离子型光敏树脂组合物
公开(公告)号：US20160291469A1
公开(公告)日：2016-10-06
申请号：US15074124
申请日：2016-03-18
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Shota KATAYAMA , Aya MOMOZAWA
IPC分类号： G03F7/039 , G03F7/32 , G03F7/16 , G03F7/20
CPC分类号： G03F7/0397 , C07C2603/18 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/28 , G03F7/004 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/162 , G03F7/168 , H01L21/0274 , H01L21/0337 , H01L21/31116
摘要： A photosensitive resin composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The photosensitive resin composition may be used to form a plated article on a metal surface of a substrate The composition includes an acid generator that, when irradiated with an active ray or radiation, generates an acid, a resin that, under an action of an acid, undergoes an increase in solubility thereof in alkali, and a fluorene compound represented by the formula (1).

124. 发明申请

US20160280906A1 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE 审中-公开
标题翻译：生产包含相分离结构的结构的方法和形成相分离结构的树脂组合物
公开(公告)号：US20160280906A1
公开(公告)日：2016-09-29
申请号：US15076097
申请日：2016-03-21
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Tsuyoshi KUROSAWA , Tasuku MATSUMIYA , Masahito YAHAGI , Hitoshi YAMANO , Ken MIYAGI , Daiju SHIONO , Taku HIRAYAMA , Katsumi OHMORI
IPC分类号： C08L53/00 , C08L33/12
CPC分类号： C08L53/00 , B82Y40/00 , C08L33/12 , C09D133/12 , C09D153/00 , G03F7/0002
摘要： A method of producing a structure containing a phase-separated structure, which includes mixing a block copolymer which includes a hydrophobic polymer block and a hydrophilic polymer block and is incapable of forming a phase-separated structure, with a homopolymer compatible with the hydrophilic polymer block or a homopolymer compatible with the hydrophobic polymer block.
摘要翻译：一种制备包含相分离结构的结构的方法，其包括将包含疏水性聚合物嵌段和亲水性聚合物嵌段的嵌段共聚物与不能形成相分离结构的嵌段共聚物与与亲水性聚合物嵌段相容的均聚物或与疏水性聚合物嵌段相容的均聚物。

125. 发明申请

US20160274459A1 METHOD FOR FORMING PHOTOSENSITIVE RESIN LAYER, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE 审中-公开
标题翻译：用于形成感光树脂层的方法，用于制造光刻胶图案的方法，以及用于生产模制品的方法
公开(公告)号：US20160274459A1
公开(公告)日：2016-09-22
申请号：US15066767
申请日：2016-03-10
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Eiichi SHIMURA , Shinji KUMADA , Aya MOMOZAWA
IPC分类号： G03F7/039 , G03F7/32 , G03F7/20
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , G03F7/09 , G03F7/168 , G03F7/40
摘要： A method of forming a photosensitive resin layer including laminating a photosensitive resin layer including a chemically amplified positive-type photosensitive resin composition which includes an acid generator which generates an acid upon light exposure and generates an acid by heating on a metal surface having catalytic activity, a resin whose solubility in alkali increases under the action of an acid, and an organic solvent, on an catalytic activity-containing metal surface of a substrate; and heating the photosensitive resin layer, so that the solubility in alkali of the photosensitive resin layer increases as the layer becomes closer to an interface with the substrate.
摘要翻译：一种形成感光性树脂层的方法，包括层叠包含化学放大正型感光性树脂组合物的感光性树脂层，所述感光性树脂层包含在曝光后产生酸的酸发生剂，并且通过在具有催化活性的金属表面上加热而生成酸，在碱的作用下在碱中的溶解度增加的树脂和有机溶剂在基材的含催化活性的金属表面上; 并且加热感光性树脂层，使得感光性树脂层的溶解度随着与基板的界面接近而增加。

126. 发明申请

US20160274458A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND 有权
标题翻译：抗蚀剂组合物，形成耐火图案，酸发生器和化合物的方法
公开(公告)号：US20160274458A1
公开(公告)日：2016-09-22
申请号：US15072004
申请日：2016-03-16
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Takashi NAGAMINE , Hideto NITO , Daichi TAKAKI
IPC分类号： G03F7/004 , G03F7/20 , C07C321/30 , C07J31/00 , C07C211/05 , G03F7/038 , G03F7/32
CPC分类号： G03F7/0045 , C07J31/006 , G03F7/0046 , G03F7/038 , G03F7/0397 , G03F7/20 , G03F7/325
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B0-1) represented by general formula (b0) shown below (in the formula, Yx01 represents a divalent linking group; n represents an integer of 1 to 3; and M′m+ represents an organic cation having a valency of m.

127. 发明申请

US20160273805A1 REFLECTIVE MIRROR FOR LIGHT CONCENTRATING SYSTEM, AND LIGHT CONCENTRATING SYSTEM 审中-公开
标题翻译：用于光浓缩系统和光浓缩系统的反射镜
公开(公告)号：US20160273805A1
公开(公告)日：2016-09-22
申请号：US15037184
申请日：2013-11-19
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Clement PILLETTE
IPC分类号： F24J2/16 , F24J2/38
CPC分类号： F24S23/77 , F24S23/74 , F24S23/82 , F24S30/425 , F24S50/20 , G02B5/0825 , G02B5/10 , G02B7/183 , G02B19/0023 , G02B19/0042 , Y02E10/45 , Y02E10/47
摘要： A reflective mirror for a light concentrating system, having high reflectance and superior durability; and a light concentrating system including this reflective mirror for a light concentrating system. The reflective mirror includes a substrate and a reflective layer provided on the substrate, in which the reflective layer includes a material having a refractive index at a wavelength of 2500 nm of no less than 2.5 and having a Mohs hardness of 12 to 15. The light concentrating system includes the reflective mirror and a light receiving part that receives light reflected by the reflective mirror.
摘要翻译：一种聚光系统的反射镜，具有高反射率和优异的耐久性; 以及包括用于聚光系统的该反射镜的聚光系统。反射镜包括基板和设置在基板上的反射层，其中反射层包括具有2500nm以上的折射率不小于2.5并且莫氏硬度为12至15的折射率的材料。该光集中系统包括反射镜和接收由反射镜反射的光的光接收部分。

128. 发明申请

US20160257838A1 UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING BLOCK COPOLYMER 审中-公开
标题翻译：底层试剂和形成含嵌段共聚物层的图案的方法
公开(公告)号：US20160257838A1
公开(公告)日：2016-09-08
申请号：US15156170
申请日：2016-05-16
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Takahiro SENZAKI , Ken MIYAGI , Tsuyoshi KUROSAWA , Daiju SHIONO , Tasuku MATSUMIYA , Kenichiro MIYASHITA , Katsumi OHMORI
IPC分类号： C09D125/14 , B05D7/00 , B05D3/14 , C09D125/02
CPC分类号： C09D125/14 , B05D3/145 , B05D7/544 , C09D125/02 , C09D133/02 , C09D133/08 , C09D133/18 , C09D133/22 , C09D135/06 , C09D143/04 , C09J133/06 , C09J133/14
摘要： An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.
摘要翻译：一种底涂剂，其包含嵌段共聚物，该嵌段共聚物具有在基材上形成的多个块结合。底涂剂含有包含具有芳环的结构单元和不具有芳香环的结构单元的树脂组分，该树脂组分包括可与底物相互作用并且不包括3至7元的醚含环状基团; 以及形成含有嵌段共聚物的层的图案的方法。该方法包括将底涂剂施用于基材以形成含有底涂剂的层; 形成含有具有多个嵌段的嵌段共聚物的层，所述嵌段共聚物在包含所述底涂层的层的表面上接合，然后分离含有所述嵌段共聚物的层; 并且选择性地除去包含构成嵌段共聚物的至少一个多个嵌段的相。

129. 发明申请

US20160231651A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR THICK FILM 有权
标题翻译：化学电位放大型阳离子型光敏性树脂组合物
公开(公告)号：US20160231651A1
公开(公告)日：2016-08-11
申请号：US15006473
申请日：2016-01-26
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Yuta Yamamoto , Yasushi Kuroiwa
IPC分类号： G03F7/038 , G03F7/20 , G03F7/32 , G03F7/16
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A chemically amplified positive-type photosensitive resin composition for a thick film including an acid generator which is capable of producing an acid when irradiated with an active beam or radiation and includes a compound having a carboxyl group; a resin whose solubility in alkali increases under the action of an acid and which includes an acrylic resin containing a structural unit derived from acrylic ester having a cyclic group containing —SO2— or a cyclic group containing lactone; and an organic solvent.
摘要翻译：一种用于厚膜的化学放大正型感光性树脂组合物，其包括酸产生剂，其能够在用活性束或辐射照射时能够产生酸，并且包括具有羧基的化合物; 一种在酸的作用下在碱中的溶解度增加的树脂，其包含含有衍生自含有-SO 2 - 的环状基团的丙烯酸酯或含有内酯的环状基团的结构单元的丙烯酸树脂; 和有机溶剂。

130. 发明授权

US09405200B2 Resist composition and method of forming resist pattern 有权
标题翻译：抗蚀剂图案的抗蚀剂组成和方法
公开(公告)号：US09405200B2
公开(公告)日：2016-08-02
申请号：US13624639
申请日：2012-09-21
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Tsuyoshi Nakamura , Jiro Yokoya , Hiroaki Shimizu , Hideto Nito
IPC分类号： G03F7/004 , G03F7/38 , G03F7/20 , G03F7/038 , G03F7/039 , G03F7/075
CPC分类号： G03F7/38 , G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/0755 , G03F7/0758 , G03F7/20
摘要： A method of forming a resist pattern, including: a step (1) in which a resist film is formed by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound (F) containing at least one selected from the group consisting of a fluorine atom and a silicon atom and containing no acid decomposable group which exhibits increased polarity by the action of acid on a substrate; a step (2) in which the resist film is subjected to exposure; a step (3) in which baking is conducted after the step (2); and a step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern, and a resist composition used in the step (1).
摘要翻译：一种形成抗蚀剂图案的方法，包括：步骤（1），其中通过涂覆抗蚀剂组合物形成抗蚀剂膜，所述抗蚀剂组合物包括在碱性显影液中表现出增加的溶解度的碱性组分（A），光产生剂组分（C），酸性供给成分（Z）和含有选自氟原子和硅原子中的至少一种的化合物（F），并且不含显示出极性增加的酸分解基团通过酸在基底上的作用; 其中抗蚀剂膜被曝光的步骤（2）; 步骤（3），其中在步骤（2）之后进行烘烤; 以及步骤（4），其中抗蚀剂膜经受碱显影，从而形成负色调抗蚀剂图案，以及在步骤（1）中使用的抗蚀剂组合物。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式