专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20160333217A1 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, BLOCK COPOLYMER COMPOSITION, AND ORGANIC SOLVENT USED FOR BLOCK COPOLYMER COMPOSITION 审中-公开
标题翻译：生产包含相分离结构的结构的方法，嵌段共聚物组合物和用于嵌段共聚物组合物的有机溶剂
公开(公告)号：US20160333217A1
公开(公告)日：2016-11-17
申请号：US15149515
申请日：2016-05-09
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Hitoshi YAMANO , Tasuku MATSUMIYA , Tsuyoshi KUROSAWA , Taku HIRAYAMA , Ken MIYAGI , Katsumi OHMORI
IPC分类号： C09D153/00 , B05D3/04 , B05D7/00
CPC分类号： C09D153/00 , G03F7/0002 , H01L21/0271
摘要： A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance RaPS(MPa1/2) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1). 4. 1≦RaPS≦9 (1)

2. 发明申请

US20160280906A1 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE 审中-公开
标题翻译：生产包含相分离结构的结构的方法和形成相分离结构的树脂组合物
公开(公告)号：US20160280906A1
公开(公告)日：2016-09-29
申请号：US15076097
申请日：2016-03-21
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Tsuyoshi KUROSAWA , Tasuku MATSUMIYA , Masahito YAHAGI , Hitoshi YAMANO , Ken MIYAGI , Daiju SHIONO , Taku HIRAYAMA , Katsumi OHMORI
IPC分类号： C08L53/00 , C08L33/12
CPC分类号： C08L53/00 , B82Y40/00 , C08L33/12 , C09D133/12 , C09D153/00 , G03F7/0002
摘要： A method of producing a structure containing a phase-separated structure, which includes mixing a block copolymer which includes a hydrophobic polymer block and a hydrophilic polymer block and is incapable of forming a phase-separated structure, with a homopolymer compatible with the hydrophilic polymer block or a homopolymer compatible with the hydrophobic polymer block.
摘要翻译：一种制备包含相分离结构的结构的方法，其包括将包含疏水性聚合物嵌段和亲水性聚合物嵌段的嵌段共聚物与不能形成相分离结构的嵌段共聚物与与亲水性聚合物嵌段相容的均聚物或与疏水性聚合物嵌段相容的均聚物。

3. 发明申请

US20160363860A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20160363860A1
公开(公告)日：2016-12-15
申请号：US15174216
申请日：2016-06-06
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Taku HIRAYAMA , Daisuke KAWANA , Yoshitaka KOMURO , Masatoshi ARAI , Shogo MATSUMARU , Kenta SUZUKI , Takashi KAMIZONO , Tatsuya FUJII
IPC分类号： G03F7/039 , G03F7/20 , G03F7/32 , G03F7/038
CPC分类号： G03F7/0388 , G03F7/0045 , G03F7/0397
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.

4. 发明申请

US20160209745A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20160209745A1
公开(公告)日：2016-07-21
申请号：US14995987
申请日：2016-01-14
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Taku HIRAYAMA , Daisuke KAWANA , Shogo MATSUMARU , Kenta SUZUKI , Takashi KAMIZONO , Masahito YAHAGI , Tatsuya FUJII
IPC分类号： G03F7/038 , G03F7/32 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator (B) which generates acid upon exposure, the base component (A) including a resin component having a structural unit (a0) represented by general formula (a0-1) shown below, and the acid generator component (B) containing a compound having a cation moiety having an electron withdrawing group (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya represents a carbon atom; Xa represents an atomic group required to form an alicyclic hydrocarbon group with Ya; and Ra01 represents an aromatic hydrocarbon group optionally having a substituent).
摘要翻译：一种抗蚀剂组合物，其在曝光后产生酸，并且在酸作用下在显影液中表现出改变的溶解性，所述抗蚀剂组合物包含在酸和酸产生剂（B）的作用下在显影液中显示出改变的溶解度的碱成分（A）所述碱成分（A）含有具有下述通式（a0-1）表示的结构单元（a0）的树脂成分和含有具有阳离子部分的化合物的酸产生剂成分（B）具有吸电子基团（其中R表示氢原子，1至5个碳原子的烷基或1至5个碳原子的卤代烷基; Ya表示碳原子; Xa表示形成脂环族基团所需的原子团具有Ya的烃基; Ra01表示任选具有取代基的芳香族烃基）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式