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    • 112. 发明申请
    • Non-volatile memory and the fabrication method
    • 非易失性存储器及其制造方法
    • US20050093043A1
    • 2005-05-05
    • US10980309
    • 2004-11-04
    • Kiyoyuki MoritaNoboru YamadaAkihito MiyamotoTakashi OhtsukaHideyuki Tanaka
    • Kiyoyuki MoritaNoboru YamadaAkihito MiyamotoTakashi OhtsukaHideyuki Tanaka
    • G11C16/02H01L27/11H01L27/24H01L45/00H01L29/76H01L21/48
    • G11C13/0004G11C14/009H01L27/1104H01L27/24H01L45/04H01L45/145
    • A non-volatile memory comprising: a first substrate (100) and a second substrate (110), the first substrate (100) having a plurality of switching elements (4) arranged in matrix, and a plurality of first electrodes (18) connected to the switching element (4), the second substrate (110) having a conductive film (32), and a recording layer (34) whose resistance value changes by application of an electric pulse, wherein the plurality of first electrodes (18) are integrally covered by the recording layer (34), the recording layer (34) thereby being held between the plurality of first electrodes (18) and the conductive film (32); the first substrate (100) further comprising a second electrode (22), the second electrode (22) being electrically connected to the conductive film (32), the voltage of which is maintained at a set level while applying current to the recording layer (34). This non-volatile memory achieves high integration at low cost.
    • 一种非易失性存储器,包括:第一基板(100)和第二基板(110),所述第一基板(100)具有布置成矩阵的多个开关元件(4),并且多个第一电极(18)被连接 至所述开关元件(4),所述第二基板(110)具有导电膜(32)以及其电阻值通过施加电脉冲而改变的记录层(34),其中所述多个第一电极(18)为 由记录层(34)整体覆盖,记录层(34)由此保持在多个第一电极(18)和导电膜(32)之间; 所述第一基板(100)还包括第二电极(22),所述第二电极(22)电连接到所述导电膜(32),其电压保持在设定电平,同时向所述记录层施加电流( 34)。 这种非易失性存储器以低成本实现高集成度。
    • 113. 发明申请
    • Information recording medium, method of manufacturing the same, and sputtering target
    • 信息记录介质,其制造方法和溅射靶
    • US20050082162A1
    • 2005-04-21
    • US10947187
    • 2004-09-23
    • Mayumi UnoRie KojimaNoboru Yamada
    • Mayumi UnoRie KojimaNoboru Yamada
    • C23C14/00C23C14/08C23C14/34G11B7/243G11B7/26B32B3/02G11B7/24
    • C23C14/3414C23C14/0036C23C14/08G11B7/243G11B7/26G11B2007/24316G11B2007/2432
    • When manufacturing a write-once recording medium which contains an oxide having a lower oxygen content as a main component, if film formation of a recording layer is performed by introducing a large amount of oxygen into the film forming gas and the sputtering target does not contain oxygen, each medium produced has different properties, because a variation of oxygen flow in the gas easily occurs and the composition ratio of oxygen which is contained in the recording layer easily varies. To solve the problems above, an information recording medium, having at least a recording layer on a substrate and being able to record and reproduce information, contains an oxide A-O or A-O-M (A is a material which contains at least any one of Te, Sb, Ge, Sn, In, Zn, Mo and W, and M is a material which contains at least any one of a metal element, a semi-metal element, and a semiconductor-metal element), and a sputtering target used in the process of producing the layer contains at least A-O and, A and/or M. In this way, a recording layer having high reproducibility and stable properties can be produced, even in a mass production line.
    • 当制造含有氧含量较低的氧化物作为主要成分的一次写入记录介质时,如果通过向成膜气体中引入大量的氧而进行记录层的成膜,并且溅射靶不含有 氧,每种产生的介质具有不同的性质,因为气体中的氧气流的变化容易发生,并且包含在记录层中的氧的组成比容易变化。 为了解决上述问题,在基板上至少具有记录层并且能够记录和再现信息的信息记录介质包含氧化物AO或AOM(A是包含Te,Sb中的至少一种的材料 ,Ge,Sn,In,Zn,Mo和W中的至少任一种的材料,M是含有金属元素,半金属元素和半导体金属元素中的至少任一种的材料),以及用于 生产该层的方法至少包含AO和A和/或M.这样,即使在大规模生产线中也可以生产具有高重现性和稳定性能的记录层。