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111. 发明申请

US20080017628A1 Multizone heater for furnace 失效
标题翻译：多功能加热器用于炉
公开(公告)号：US20080017628A1
公开(公告)日：2008-01-24
申请号：US11485547
申请日：2006-07-12
申请人： Joseph Yudovsky
发明人： Joseph Yudovsky
IPC分类号： F27B5/14
CPC分类号： F27B17/0025 , H01L21/67109
摘要： The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor processing chamber. The furnace comprises a heater surrounding side walls of the semiconductor processing chamber, wherein the heater comprises a plurality of heating elements connected in at least two independently controlled zones, and a shell surrounding the heater.
摘要翻译：本发明涉及加热半导体处理室的装置和方法。本发明的一个实施例提供一种用于加热半导体处理室的炉。炉包括围绕半导体处理室的侧壁的加热器，其中加热器包括连接在至少两个独立控制区域中的多个加热元件和围绕加热器的外壳。

112. 发明申请

US20070252299A1 Synchronization of precursor pulsing and wafer rotation 审中-公开
标题翻译：前驱脉冲和晶片旋转的同步
公开(公告)号：US20070252299A1
公开(公告)日：2007-11-01
申请号：US11413658
申请日：2006-04-27
申请人： Maitreyee Mahajani , Joseph Yudovsky , Yi-Chiau Huang , Kaushal Singh , Veronica McCarthy
发明人： Maitreyee Mahajani , Joseph Yudovsky , Yi-Chiau Huang , Kaushal Singh , Veronica McCarthy
IPC分类号： C23C16/01
CPC分类号： C23C16/45546 , C23C16/4584
摘要： A method for synchronizing the rotation of a substrate boat with material deposition is disclosed. Whenever support rods of the substrate boat rotate past a deposition source, they will block deposition gas from reaching certain portions of the substrate. By stopping the deposition gas whenever the support rods are located between the substrate and the deposition source, a uniform deposition can be achieved.
摘要翻译：公开了一种使衬底舟的旋转与材料沉积同步的方法。每当衬底舟的支撑杆旋转经过沉积源时，它们将阻挡沉积气体到达衬底的某些部分。每当支撑杆位于基板和沉积源之间时，通过停止沉积气体，可以实现均匀的沉积。

113. 发明授权

US07222636B2 Electronically actuated valve 有权
标题翻译：电动阀
公开(公告)号：US07222636B2
公开(公告)日：2007-05-29
申请号：US10644598
申请日：2003-08-20
申请人： Anh N. Nguyen , Joseph Yudovsky , Mark A. Alexander , Hungsuk A. Yoon , Chiliang L. Chen
发明人： Anh N. Nguyen , Joseph Yudovsky , Mark A. Alexander , Hungsuk A. Yoon , Chiliang L. Chen
IPC分类号： F16K31/06
CPC分类号： F16K31/0655 , F16K31/0675 , Y10T137/0419 , Y10T137/4259
摘要： The present invention relates to a method and apparatus for delivery of reactants to a substrate processing chamber. An electronically controlled valve assembly is provided for rapid delivery of pulses of reactants to the chamber. The valve assembly comprises a valve body having a valve seat, and at least one gas inlet and one gas outlet below the seat. The piston is selectively movable within the valve body to open and close the valve. In order to actuate the valve assembly, current is sent to a solenoid coil within the valve body. The solenoid coil generates a magnetic field that acts on an adjacent magnetic member. The solenoid coil, magnetic member and piston are arranged such that relative movement of the coil and magnetic member cause the piston to be moved relative to the valve seat.
摘要翻译：本发明涉及一种将反应物递送到基板处理室的方法和装置。提供电子控制阀组件，用于将反应物的脉冲快速输送到室。阀组件包括具有阀座的阀体，以及座下方的至少一个气体入口和一个气体出口。活塞可选择性地在阀体内移动以打开和关闭阀。为了致动阀组件，电流被送到阀体内的螺线管线圈。螺线管线圈产生作用在相邻磁性部件上的磁场。电磁线圈，磁性构件和活塞被布置成使得线圈和磁性构件的相对运动导致活塞相对于阀座移动。

114. 发明申请

US20070084408A1 BATCH PROCESSING CHAMBER WITH DIFFUSER PLATE AND INJECTOR ASSEMBLY 审中-公开
标题翻译：具有扩散板和注射器组件的批处理室
公开(公告)号：US20070084408A1
公开(公告)日：2007-04-19
申请号：US11381966
申请日：2006-05-05
申请人： Joseph Yudovsky , Tai Ngo , Cesar Tejamo , Maitreyee Mahajani , Brendan McDougall , Yi-Chiau Huang , Robert Cook , Yeong Kim , Alexander Tam , Adam Brailove , Steve Ghanayem
发明人： Joseph Yudovsky , Tai Ngo , Cesar Tejamo , Maitreyee Mahajani , Brendan McDougall , Yi-Chiau Huang , Robert Cook , Yeong Kim , Alexander Tam , Adam Brailove , Steve Ghanayem
IPC分类号： C23C16/00
CPC分类号： C23C16/46 , C23C16/45578 , H01L21/67109
摘要： An apparatus for batch processing of a wafer is disclosed. In one embodiment the batch processing apparatus includes a bell jar furnace having a diffuser disposed between gas inlets and the substrate positioned within the furnace to direct flows within the chamber around the perimeter of the substrate.
摘要翻译：公开了一种用于批处理晶片的设备。在一个实施例中，批处理设备包括钟罩式炉，其具有设置在气体入口之间的扩散器和位于炉内的基板，以引导室内围绕衬底周边的流动。

115. 发明申请

US20070084406A1 Reaction chamber with opposing pockets for gas injection and exhaust 审中-公开
标题翻译：反应室具有相对的气体注入和排气口袋
公开(公告)号：US20070084406A1
公开(公告)日：2007-04-19
申请号：US11249555
申请日：2005-10-13
申请人： Joseph Yudovsky , Robert Cook , Yeong Kim , Alexander Tam , Maitreyee Mahajani , Adam Brailove , Steve Ghanayem
发明人： Joseph Yudovsky , Robert Cook , Yeong Kim , Alexander Tam , Maitreyee Mahajani , Adam Brailove , Steve Ghanayem
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： C23C16/45578 , C23C16/46 , H01L21/67109
摘要： The present invention generally provides a batch processing chamber having a quartz chamber, at least one heater block, an inject assembly coupled to one side of the quartz chamber, and an exhaust assembly coupled to an opposite side of the quartz chamber. In one embodiment, the inject assembly is independently temperature controlled. In another embodiment, at least one temperature sensor is disposed outside the quartz chamber.
摘要翻译：本发明通常提供了具有石英室，至少一个加热器块，耦合到石英腔的一侧的注射组件以及耦合到石英腔的相对侧的排气组件的批处理室。在一个实施例中，注射组件是独立温度控制的。在另一个实施例中，至少一个温度传感器设置在石英腔外部。

116. 发明申请

US20070056950A1 Removable heater 失效
标题翻译：可拆卸加热器
公开(公告)号：US20070056950A1
公开(公告)日：2007-03-15
申请号：US11233826
申请日：2005-09-09
申请人： Joseph Yudovsky , Robert Cook
发明人： Joseph Yudovsky , Robert Cook
IPC分类号： A21B1/00 , A21B1/22 , F27D11/00
CPC分类号： F27B17/0025 , F27B5/04 , F27D99/0006
摘要： A batch processing chamber comprising a top plate having at least one opening, and sidewalls, wherein the sidewalls and the top plate define a process volume. At least one removable heater is generally disposed in the process volume, wherein the at least one removable heater can be inserted or removed from the at least one opening of the top plate. In one embodiment, the at least one removable heater is resistive heater constructed in ceramic. In another embodiment, at least one heater container is disposed in the process volume via the at least one opening of the top plate and the at least one heater may operate in atmospheric conditions.
摘要翻译：批处理室包括具有至少一个开口的顶板和侧壁，其中所述侧壁和所述顶板限定处理体积。至少一个可移除加热器通常设置在处理体积中，其中至少一个可移除加热器可以从顶板的至少一个开口插入或移除。在一个实施例中，所述至少一个可拆卸加热器是以陶瓷构造的电阻加热器。在另一个实施例中，至少一个加热器容器经由顶板的至少一个开口设置在处理容积中，并且至少一个加热器可在大气条件下操作。

117. 发明授权

US06868859B2 Rotary gas valve for pulsing a gas 失效
标题翻译：用于脉冲气体的旋转气阀
公开(公告)号：US06868859B2
公开(公告)日：2005-03-22
申请号：US10354794
申请日：2003-01-29
申请人： Joseph Yudovsky
发明人： Joseph Yudovsky
IPC分类号： F16K11/074 , F16K31/04 , F16K11/06
CPC分类号： F16K11/074 , F16K31/041 , Y10T137/0318 , Y10T137/86405
摘要： A gas valve for pulsing a gas comprises a housing having at least one inlet port, an outlet port, and a selector disk mounted in the housing and comprising at least one timing slot, wherein rotation of the selector disk periodically couples at least one inlet port to the outlet port through the timing slot.
摘要翻译：用于脉冲气体的气阀包括具有安装在壳体中的至少一个入口端口，出口端口和选择器盘的壳体，其包括至少一个定时槽，其中选择盘的旋转周期性地连接至少一个入口端口通过定时槽到出口。

118. 发明授权

US06730175B2 Ceramic substrate support 有权
标题翻译：陶瓷基板支撑
公开(公告)号：US06730175B2
公开(公告)日：2004-05-04
申请号：US10055634
申请日：2002-01-22
申请人： Joseph Yudovsky , Salvador P. Umotoy , Shamouil Shamouilian , Ron Rose , Rita Dukes , Xiaoxiong Yuan
发明人： Joseph Yudovsky , Salvador P. Umotoy , Shamouil Shamouilian , Ron Rose , Rita Dukes , Xiaoxiong Yuan
IPC分类号： H01L2100
CPC分类号： C23C16/45521 , C23C16/4581 , C23C16/4586 , H01J2237/2001 , H01L21/67092
摘要： A substrate support assembly for supporting a substrate during processing is provided. In one embodiment, a support assembly includes a ceramic body having an embedded heating element and a base plate. The base plate and the ceramic body define a channel therebetween adapted to supply purge gas to a perimeter of a substrate disposed on the support assembly. The base plate is fastened to the body by brazing, adhering, fastening, press fitting or by mating engaging portions of a retention device such as a bayonet fitting.
摘要翻译：提供了一种用于在处理期间支撑基板的基板支撑组件。在一个实施例中，支撑组件包括具有嵌入式加热元件和基板的陶瓷体。基板和陶瓷体在它们之间限定了一个通道，用于将净化气体供应到设置在支撑组件上的基板的周边。基板通过钎焊，粘合，紧固，压配合或通过配合诸如卡口配件的保持装置的接合部分而紧固到主体。

119. 发明授权

US06555164B1 Shadow ring and guide for supporting the shadow ring in a chamber 失效
标题翻译：阴影环和引导件用于支撑室内的阴影环
公开(公告)号：US06555164B1
公开(公告)日：2003-04-29
申请号：US09717706
申请日：2000-11-20
申请人： Joseph Yudovsky
发明人： Joseph Yudovsky
IPC分类号： C23C1604
CPC分类号： H01L21/68721 , H01L21/68 , H01L21/68728 , H01L21/68735
摘要： The invention generally relates to a processing system and related methods that include a chamber, a pedestal disposed in the chamber, a shadow ring and a set of alignment and support tabs which receive and directly align a substrate with a shadow ring, substantially independently of the pedestal. In one aspect of the invention, a shadow ring is provided which includes an upper shielding portion and a lower alignment and support member. The alignment and support member preferably includes one or more alignment and support tabs. A set of lift pins are preferably disposed in the chamber that may align the substrate and shadow ring with the pedestal. At least one pedestal recess may be located in the pedestal to receive the alignment and support tabs when the pedestal is in a raised position and in some instances to align the substrate and shadow ring to the pedestal.
摘要翻译：本发明一般涉及一种处理系统和相关方法，其包括腔室，设置在腔室中的基座，阴影环和一组对准和支撑突片，其接收并直接对准基底与阴影环，基本上独立于座。在本发明的一个方面，提供了一种阴影环，其包括上屏蔽部分和下对准和支撑部件。对准和支撑构件优选地包括一个或多个对准和支撑突片。一组提升销优选地设置在腔室中，其可以使衬底和阴影环与基座对准。当基座处于升高位置时，至少一个基座凹部可以位于基座中以接收对准和支撑突片，并且在一些情况下将基板和阴影环对准基座。

120. 发明授权

US06464795B1 Substrate support member for a processing chamber 失效
标题翻译：用于处理室的基板支撑构件
公开(公告)号：US06464795B1
公开(公告)日：2002-10-15
申请号：US09563573
申请日：2000-05-03
申请人： Semyon Sherstinsky , Calvin Augason , Leonel A. Zuniga , Jun Zhao , Talex Sajoto , Leonid Selyutin , Joseph Yudovsky , Maitreyee Mahajani , Steve G. Ghanayem , Tai T. Ngo , Arnold Kholodenko
发明人： Semyon Sherstinsky , Calvin Augason , Leonel A. Zuniga , Jun Zhao , Talex Sajoto , Leonid Selyutin , Joseph Yudovsky , Maitreyee Mahajani , Steve G. Ghanayem , Tai T. Ngo , Arnold Kholodenko
IPC分类号： G23C1600
CPC分类号： C23C16/45521 , C23C16/4586 , H01L21/67109 , H01L21/6838 , H01L21/68785
摘要： A support member for supporting a substrate in a process chamber, the support member having a substrate support surface with one or more isolated recessed areas. A vacuum channel and a gas channel are formed in the support member along a common plane and are coupled to a vacuum source and gas source respectively. The gas channel comprises two or more concentrically disposed annular gas channels encompassing the vacuum channel. The vacuum channel is coupled to the support surface, and in particular to the one or more recessed areas, by a plurality of conduits. A portion of the conduits is disposed diametrically exterior to at least one of the annular gas channels and communicates with the vacuum channel via bypass channels.
摘要翻译：一种用于在处理室中支撑衬底的支撑构件，所述支撑构件具有具有一个或多个隔离的凹陷区域的衬底支撑表面。真空通道和气体通道沿着公共平面形成在支撑构件中，并且分别耦合到真空源和气体源。气体通道包括包围真空通道的两个或更多个同心设置的环形气体通道。真空通道由多个管道联接到支撑表面，特别是连接到一个或多个凹陷区域。导管的一部分沿直径设置在至少一个环形气体通道的外部，并通过旁通通道与真空通道连通。

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