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    • 110. 发明授权
    • Polyphosphazene polymers containing pyrazole or imidazole substituents
    • 含有吡唑或咪唑取代基的聚磷腈聚合物
    • US4258170A
    • 1981-03-24
    • US67985
    • 1979-08-20
    • William L. HergenrotherAdel F. Halasa
    • William L. HergenrotherAdel F. Halasa
    • C08G79/00C08G79/02C08G83/00
    • C08G79/025
    • Polyphosphazene polymers are prepared which contain repeating units represented by the formulas: ##STR1## wherein X is represented by one or more of the following structural formulas: ##STR2## wherein R.sub.1-11 are independently selected from the group consisting of hydrogen, halogen, cyano, nitro, and substituted and unsubstituted alkyl, aryl, alkoxy, aryloxy, alkylmercapto, and dialkylamino radicals, and R.sub.1 or 3 and R.sub.2, or R.sub.5 and R.sub.6 taken together can form a substituted or unsubstituted benzene ring structure; X' can represent one or more substituents from the group consisting of a halogen radical, substituted and unsubstituted alkoxy, aryloxy, amino and mercapto radicals which are known in the state of the art in poly(phosphazene) technology and which are compatible with the copolymer substituents. The polymer can contain from 20 to 50,000 of such units such that 20.ltoreq.(w+y+z).ltoreq.50,000.The polymers of the invention can be utilized to form protective films and can also be utilized in applications such as for molding, coatings, foams, and the like.
    • 制备含有由下式表示的重复单元的聚磷腈聚合物:其中X由以下结构式中的一个或多个表示:其中R 11-11独立地选自氢,卤素,氰基 硝基,取代和未取代的烷基,芳基,烷氧基,芳氧基,烷基巯基和二烷基氨基,R1或3和R2或R5和R6一起可以形成取代或未取代的苯环结构; X'可以表示在聚(磷腈)技术中在现有技术中已知的并且与共聚物相容的卤素基团,取代和未取代的烷氧基,芳氧基,氨基和巯基的一个​​或多个取代基 取代基。 聚合物可以含有20-50,000个这样的单元,使得20(w + y + z)= 50,000。 本发明的聚合物可以用于形成保护膜,并且还可以用于诸如模塑,涂料,泡沫等的应用中。