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101. 发明授权

US5216105A Silicone polymers and positive working light-sensitive compositions comprising the same 失效
标题翻译：硅胶聚合物和正极工作的含有它的光敏组合物
公开(公告)号：US5216105A
公开(公告)日：1993-06-01
申请号：US550446
申请日：1992-07-10
申请人： Toshiaki Aoai , Kazuyoshi Mizutani
发明人： Toshiaki Aoai , Kazuyoshi Mizutani
IPC分类号： C08G77/22 , C08G77/382 , G03F7/075
CPC分类号： C08G77/22 , C08G77/382 , G03F7/0757 , Y10S430/122 , Y10S430/126
摘要： A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.

102. 发明授权

US4950582A Light-sensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US4950582A
公开(公告)日：1990-08-21
申请号：US176196
申请日：1988-03-31
申请人： Toshiaki Aoai , Keitaro Aoshima , Yasuo Okamoto
发明人： Toshiaki Aoai , Keitaro Aoshima , Yasuo Okamoto
IPC分类号： G03C1/72 , C08G18/38 , C08G18/83 , G03F7/021 , G03F7/022 , G03F7/023 , G03F7/035 , G03F7/095
CPC分类号： C08G18/83 , C08G18/3857 , G03F7/0217 , G03F7/0233 , G03F7/035 , G03F7/095 , Y10S430/107
摘要： A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The light-sensitive composition is excellent in developing properties in an aqueous alkaline developer and coating properties. In addition, the images obtained from the composition are good in wear resistance and exhibit high adhesion to the substrate. Thus, the composition is very suitable for use in making IC circuits, photomasks and PS plates which provide lithographic printing plates exhibiting high printing durability.
摘要翻译：光敏性组合物包含至少一种具有N-磺酰胺基，N-磺酰基脲基或N-氨基磺酰胺基的水不溶性和水溶性的碱溶性聚氨酯树脂。感光性组合物在碱性显影剂的水性和显色性中的显影性优异。此外，由组合物获得的图像具有良好的耐磨性，并且对基材表现出高粘合性。因此，该组合物非常适用于制造提供具有高印刷耐久性的平版印刷版的IC电路，光掩模和PS板。

103. 发明授权

US4741985A Light-sensitive composition comprising a diazonium salt condensate and a modified polyvinyl acetal polymer. 失效
标题翻译：包含重氮盐缩合物和改性聚乙烯醇缩醛聚合物的感光组合物。
公开(公告)号：US4741985A
公开(公告)日：1988-05-03
申请号：US871343
申请日：1986-06-06
申请人： Toshiaki Aoai , Kazuo Maemoto , Akihiko Kamiya , Toshiyuki Sekiya
发明人： Toshiaki Aoai , Kazuo Maemoto , Akihiko Kamiya , Toshiyuki Sekiya
IPC分类号： C08F8/00 , G03F7/021 , G03C1/52
CPC分类号： C08F8/00 , G03F7/0215
摘要： A light-sensitive composition comprising a diazonium compound and a polymer having the recurring units represented by the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group; R.sub.2 represents an unsubstituted alkyl group; R.sub.3 represents an aliphatic or aromatic hydrocarbon group having a carboxyl group; R.sub.4 represents an aliphatic or aromatic hydrocarbon group which has at least one hydroxyl or nitrile group and which may be further substituted; n.sub.1, n.sub.2, n.sub.3, n.sub.4 and n.sub.5 represent the molar percents of the respective recurring units, provided that n.sub.1 is from about 5 to about 85 mol %, n.sub.2 is from 0 to about 60 mol %, n.sub.3 is from 0 to about 20 mol %, n.sub.4 is from about 3 to about 60 mol % and n.sub.5 is from greater than 0 to about 60 mol %.
摘要翻译：一种感光性组合物，其包含重氮化合物和具有由以下通式（I）表示的重复单元的聚合物：其中R 1表示氢原子或取代或未取代的烷基; R2表示未取代的烷基; R3表示具有羧基的脂族或芳族烃基; R4表示具有至少一个羟基或腈基并且可以进一步被取代的脂族或芳族烃基; n1，n2，n3，n4和n5表示各个重复单元的摩尔百分数，条件是n1为约5至约85摩尔％，n2为0至约60摩尔％，n3为0至约20摩尔％，n4为约3至约60mol％，n5为大于0至约60mol％。

104. 发明授权

US4536464A Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone 失效
标题翻译：具有邻醌二叠氮化合物和二元酚和醛或酮缩合物的光敏组合物
公开(公告)号：US4536464A
公开(公告)日：1985-08-20
申请号：US550420
申请日：1983-11-10
申请人： Akira Nagashima , Akira Hasegawa , Toshiaki Aoai , Teruo Nagano
发明人： Akira Nagashima , Akira Hasegawa , Toshiaki Aoai , Teruo Nagano
IPC分类号： C08G8/20 , C08K5/28 , G03C1/72 , G03F7/008 , G03F7/023 , G03C1/60 , G03C1/54 , G03F7/08
CPC分类号： G03F7/0236 , C08G8/20 , C08K5/28 , G03C1/72
摘要： The photosensitive composition suitable as a posi-posi photosensitive composition for photosensitive lithographic printing plates is composed of a high molecular compound shown by following general formula I or II and an o-naphthoquinonediazide compound; ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms and R.sub.2 and R.sub.3 each is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.When the photosensitive composition is used as a photosensitive layer of a photosensitive lithographic printing plate and the plate is developed by rubbing with a sponge containing a developer, the photosensitive composition at the exposed areas is completely removed leaving no patches of the composition.
摘要翻译：适合作为光敏平版印刷版的磷光敏组合物的光敏组合物由以下通式I或II所示的高分子化合物和邻萘醌二叠氮化合物组成; 其中R 1是氢原子，具有1至8个碳原子的烷基，R 2和R 3各自是氢原子或具有1至4个碳原子的烷基。当感光性组合物用作感光性平版印刷版的感光层时，通过用含有显影剂的海绵进行摩擦而使印版显影，曝光区域的感光性组合物被完全除去，不存在组合物的斑块。

105. 发明授权

US08304083B2 Hydrophilic member and process for producing the same 有权
标题翻译：亲水性成员及其制造方法
公开(公告)号：US08304083B2
公开(公告)日：2012-11-06
申请号：US12067607
申请日：2006-11-16
申请人： Satoshi Hoshi , Toshiaki Aoai , Kazuto Shimada , Satoshi Tanaka , Kazuto Kunita
发明人： Satoshi Hoshi , Toshiaki Aoai , Kazuto Shimada , Satoshi Tanaka , Kazuto Kunita
IPC分类号： B32B17/06 , B05D3/02
CPC分类号： C03C17/32 , C03C17/30 , C03C2204/02 , C03C2218/113 , C03C2218/31 , C08J7/047 , C08J2367/02 , Y10T428/31504 , Y10T428/31612
摘要： A hydrophilic member comprising a substrate and a hydrophilic coating film provided on the substrate, wherein the hydrophilic coating film is produced by coating a substrate with an aqueous solution containing (a) a hydrophilic polymer, (b) an alkoxide of a metal selected from the group consisting of Si, Ti, Zr, and Al, and (c) a metal complex catalyst, and heat-drying the solution applied.
摘要翻译：一种亲水性构件，其包括基材和设置在基材上的亲水涂膜，其中亲水性涂膜通过用含有（a）亲水性聚合物的水溶液涂布基材而制备，（b）选自以下的金属的醇盐：由Si，Ti，Zr和Al组成的组，和（c）金属络合物催化剂，并对所施加的溶液进行加热干燥。

106. 发明申请

US20090263605A1 SURFACE-HYDROPHILIC STRUCTURE 审中-公开
标题翻译：表面 - 水文结构
公开(公告)号：US20090263605A1
公开(公告)日：2009-10-22
申请号：US12067495
申请日：2006-11-16
申请人： Satoshi Hoshi , Toshiaki Aoai , Kazuto Kunita , Satoshi Tanaka , Kazuto Shimada
发明人： Satoshi Hoshi , Toshiaki Aoai , Kazuto Kunita , Satoshi Tanaka , Kazuto Shimada
IPC分类号： B32B33/00 , B32B17/06 , B05D3/02
CPC分类号： C08J7/047 , C09J7/29 , Y10T428/1414 , Y10T428/273 , Y10T428/31663
摘要： A structure comprising: an adhesive layer; a plastic substrate; and a hydrophilic coating film, provided in this order, wherein the hydrophilic coating film includes a cross-linked structure produced by hydrolysis and polycondensation with an aqueous solution containing (a) a hydrophilic polymer and (b) an alkoxide of a metal selected from the group consisting of Si, Ti, Zr, and Al.
摘要翻译：一种结构，包括：粘合剂层; 塑料基材; 和亲水性涂膜，其中亲水性涂膜包括通过与含有（a）亲水性聚合物和（b）选自以下的金属的醇盐的水溶液进行水解和缩聚制备的交联结构：由Si，Ti，Zr和Al组成的组。

107. 发明授权

US07538149B2 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate 有权
标题翻译：油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版
公开(公告)号：US07538149B2
公开(公告)日：2009-05-26
申请号：US11418220
申请日：2006-05-05
申请人： Toshiaki Aoai
发明人： Toshiaki Aoai
IPC分类号： C09D11/00
CPC分类号： C09D11/101
摘要： An ink composition is provided that includes (a) a polymerizable compound, (b) a polymerization initiator, (c) a coloring agent, and (d) a fragrance. There is also provided an inkjet recording method that includes a step of discharging the ink composition onto a recording medium, and a step of irradiating the discharged ink composition with radiation so as to cure the ink composition.
摘要翻译：提供一种油墨组合物，其包含（a）可聚合化合物，（b）聚合引发剂，（c）着色剂和（d）香料。还提供了一种喷墨记录方法，其包括将油墨组合物排出到记录介质上的步骤，以及用放射线照射排出的油墨组合物以固化油墨组合物的步骤。

108. 发明授权

US07138217B2 Positive resist composition 有权
公开(公告)号：US07138217B2
公开(公告)日：2006-11-21
申请号：US10099981
申请日：2002-03-19
申请人： Toshiaki Aoai , Kazuyoshi Mizutani , Shinichi Kanna
发明人： Toshiaki Aoai , Kazuyoshi Mizutani , Shinichi Kanna
IPC分类号： G03F7/004 , G03F7/038 , G03F7/26 , G03F7/32
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprises: (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, wherein the resin (A) contains a specified repeating unit.

109. 发明申请

US20060213391A1 Ink composition 审中-公开
标题翻译：墨水组成
公开(公告)号：US20060213391A1
公开(公告)日：2006-09-28
申请号：US11386820
申请日：2006-03-23
申请人： Masaharu Sugai , Toshiaki Aoai
发明人： Masaharu Sugai , Toshiaki Aoai
IPC分类号： C09D11/00
CPC分类号： C09D11/101 , B41C1/1066 , B41M7/0072
摘要： (Problem) Providing an ink composition, particularly an ink composition for use in inkjet recording, which can form an image with good adhesion and high quality and which is excellent in storage stability, and an inkjet recording method and a printed matter using it, as well as a lithographic plate which can record an image with no blot, high sensitivity and high adhesion to a recording medium and a method for making such plate. (Solving Means) The foregoing problem may be achieved by an ink composition comprising: (a) A cationically polymerizable compound; (b) a compound generating an acid by irradiation of radiant ray; and (c) plasticizer, particularly at least one ester compound selected from the group consisting of phosphate ester, dicarboxylic acid ester and tricarboxylic acid ester.
摘要翻译：（问题）提供油墨组合物，特别是用于喷墨记录的油墨组合物，其可以形成具有良好粘附性和高质量并且储存稳定性优异的图像，以及喷墨记录方法和使用它的印刷品，如以及可以记录没有印迹，高灵敏度和对记录介质的高粘附性的图像的平版印刷版和制备这种印版的方法。（解决方案）上述问题可以通过以下方式实现：油墨组合物，其包含：（a）阳离子聚合性化合物; （b）通过辐射线照射产生酸的化合物; 和（c）增塑剂，特别是至少一种选自磷酸酯，二羧酸酯和三羧酸酯的酯化合物。

110. 发明授权

US06720128B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US06720128B2
公开(公告)日：2004-04-13
申请号：US10062497
申请日：2002-02-05
申请人： Yutaka Adegawa , Toshiaki Aoai , Ippei Nakamura
发明人： Yutaka Adegawa , Toshiaki Aoai , Ippei Nakamura
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115
摘要： A positive resist composition comprises: a compound capable of directly or indirectly generating a radical (A) on irradiation with an energy ray; or a cyclic ether compound.
摘要翻译：正性抗蚀剂组合物包含：能量线照射时能够直接或间接产生自由基（A）的化合物; 或环醚化合物。

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