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101. 发明申请

US20110126406A1 Lithographic Apparatus and Method of Manufacturing an Electrostatic Clamp for a Lithographic Apparatus 有权
标题翻译：平版印刷设备和制造用于平版印刷设备的静电夹具的方法
公开(公告)号：US20110126406A1
公开(公告)日：2011-06-02
申请号：US13020399
申请日：2011-02-03
申请人： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
发明人： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
IPC分类号： H01B13/00
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
摘要翻译：本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

102. 发明申请

US20110013157A1 LITHOGRAPHIC APPARATUS COMPRISING A MAGNET, METHOD FOR THE PROTECTION OF A MAGNET IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：包含磁铁的平面设备，用于保护磁铁的方法和设备制造方法
公开(公告)号：US20110013157A1
公开(公告)日：2011-01-20
申请号：US12735823
申请日：2009-02-19
申请人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
发明人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
IPC分类号： G03B27/32 , H01F7/02
CPC分类号： G03F7/70933 , G03F7/70808 , G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.
摘要翻译：光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

103. 发明授权

US07714306B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07714306B2
公开(公告)日：2010-05-11
申请号：US11512432
申请日：2006-08-30
申请人： Johannes Hubertus Josephina Moors , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
发明人： Johannes Hubertus Josephina Moors , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
IPC分类号： G21K5/10
CPC分类号： G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.
摘要翻译：光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及被配置为调节辐射束的光学部件，辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。

104. 发明申请

US20100085547A1 SOURCE MODULE, RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
标题翻译：源模块，辐射源和平面设备
公开(公告)号：US20100085547A1
公开(公告)日：2010-04-08
申请号：US12566060
申请日：2009-09-24
申请人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels
发明人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： B41F3/30 , A61N5/06
CPC分类号： H05G2/001 , H05G2/003
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.
摘要翻译：辐射源被配置成产生极紫外辐射。辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。

105. 发明授权

US07684012B2 Lithographic device, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷装置，装置制造方法和由此制造的装置
公开(公告)号：US07684012B2
公开(公告)日：2010-03-23
申请号：US11391731
申请日：2006-03-29
申请人： Johannes Henricus Wilhelmus Jacobs , Vadim Yevgenyevich Banine , Barrie Dudley Brewster , Vladimir Vitalevitch Ivanov , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Robert Gordon Livesey , Bastiaan Theodoor Wolschrijn
发明人： Johannes Henricus Wilhelmus Jacobs , Vadim Yevgenyevich Banine , Barrie Dudley Brewster , Vladimir Vitalevitch Ivanov , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Robert Gordon Livesey , Bastiaan Theodoor Wolschrijn
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
摘要翻译：光刻设备被配置为将图案从图案形成装置投影到基板上。该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和氩和氢的混合物。

106. 发明授权

US07515245B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07515245B2
公开(公告)日：2009-04-07
申请号：US10942102
申请日：2004-09-16
申请人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine
发明人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an infrared radiation source for providing infrared radiation into a measurement zone within the lithographic apparatus, and a detector for receiving the infrared radiation from the infrared radiation source after having passed through the measurement zone, and for outputting a signal indicative of the presence of a gas present within the measurement zone.
摘要翻译：公开了一种光刻设备。该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于使投影光束在其横截面上具有图案。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于将红外辐射提供到光刻设备内的测量区域的红外辐射源，以及用于接收来自红外线辐射源的红外辐射在经过测量区域之后，并且用于输出指示存在于测量区域内的气体的信号。

107. 发明授权

US07485881B2 Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system 失效
标题翻译：平版印刷设备，照明系统，过滤系统以及用于冷却这种过滤系统的支撑件的方法
公开(公告)号：US07485881B2
公开(公告)日：2009-02-03
申请号：US11319199
申请日：2005-12-28
申请人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
发明人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
IPC分类号： G02B5/08 , G03B27/54 , G21G5/00
CPC分类号： G03F7/70916
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。冷却系统还被布置成将气体注入到间隙中。

108. 发明授权

US07473908B2 Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface 失效
标题翻译：用于光刻设备的吸气剂和清洁装置以及用于清洁表面的方法
公开(公告)号：US07473908B2
公开(公告)日：2009-01-06
申请号：US11486386
申请日：2006-07-14
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Wouter Anton Soer
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Wouter Anton Soer
IPC分类号： A61N5/00 , A61N5/06 , G21G5/00 , G01J3/10 , H05G2/00
CPC分类号： G03F7/70925 , G03F7/70916
摘要： A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.
摘要翻译：光刻设备包括辐射源和具有构造成保持金属污染物的第一表面的物体。该表面具有吸气剂的功能。在光刻处理期间，第一表面基本上布置在由辐射源产生的辐射束穿过的区域的外侧。第一表面可以进一步用于保持在清洁方法中产生的挥发性污染物。

109. 发明申请

US20080315134A1 OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD FOR MEASURING A CONTAMINATION STATUS OF EUV-REFLECTIVE ELEMENTS 有权
标题翻译：用于辐射EUV波长范围的光学系统和测量EUV反射元件的污染状态的方法
公开(公告)号：US20080315134A1
公开(公告)日：2008-12-25
申请号：US11855849
申请日：2007-09-14
申请人： Dirk Heinrich EHM , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastian Theodor Wolschrijn
发明人： Dirk Heinrich EHM , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastian Theodor Wolschrijn
IPC分类号： A61N5/06 , G03B27/54
CPC分类号： G03F7/70916 , G03F7/7085 , G03F7/70941
摘要： An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.
摘要翻译：一种用于EUV波长范围的辐射的光学系统，特别是具有至少一个真空容器的投影曝光装置，包括：至少一个设置在光路中的EUV反射光学元件，以及一个保持器，该保持器包括至少一个样品元件，样品元件具有暴露于光路外部的入射EUV辐射的光学表面，样品元件在影响光学元件的入射EUV辐射的影响下对化学变化敏感。光学系统还包括至少一个检测单元，用于在将样品元件暴露于入射的EUV辐射期间在线检测样品元件的污染状态。

110. 发明授权

US07372623B2 Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权
标题翻译：多层光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US07372623B2
公开(公告)日：2008-05-13
申请号：US11091923
申请日：2005-03-29
申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Salashchenko
发明人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Salashchenko
IPC分类号： G02B5/20
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
摘要翻译：多层光谱纯度过滤器提高了极紫外（EUV）辐射的光谱纯度，并且还收集了辐射源发射的碎屑。

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