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91. 发明申请

US20120064658A1 Entrance and Exit Roll Seal Configuration for a Vapor Deposition System 失效
标题翻译：蒸气沉积系统的入口和出口辊密封配置
公开(公告)号：US20120064658A1
公开(公告)日：2012-03-15
申请号：US12977543
申请日：2010-12-23
申请人： Christopher Rathweg
发明人： Christopher Rathweg
IPC分类号： H01L31/18 , C23C16/458 , C23C16/455
CPC分类号： C23C14/24 , C23C14/0629 , C23C14/568 , H01L21/67126 , H01L21/67173 , H01L21/67706 , H01L21/6776 , H01L31/1828 , H01L31/1876 , Y02E10/543 , Y02P70/521
摘要： An apparatus is provided for vapor deposition of a sublimated source material as a thin film on discrete photovoltaic (PV) module substrates conveyed in a continuous non-stop manner through said apparatus. The apparatus includes a vapor deposition head configured for receipt and sublimation of a source material, and for distributing the sublimated source material onto an upper surface of substrates conveyed through a deposition area. A roll seal configuration is provided at each of an entry slot and an exit slot for the substrates conveyed through the apparatus. The roll seal configuration further includes a cylinder rotatably supported at a defined gap height above a conveyance plane of the substrates such that the cylinder is not in continuous rolling contact with the substrates within the window of finished active semiconductor material. The cylinder is floatable in a vertical direction relative to the conveyance plane of the substrates such that the cylinder rolls up and over surface variations in the substrates that exceed the gap height as the substrates are conveyed under the cylinder.
摘要翻译：提供了一种装置，用于将升华的源材料作为薄膜蒸发沉积在以连续不间断方式通过所述装置输送的离散光伏（PV）模块基板上。该装置包括构造成用于接收和升华源材料并用于将升华的源材料分配到通过沉积区域输送的衬底的上表面上的蒸镀头。在用于通过设备输送的基板的入口槽和出口槽中的每一个处设置有辊密封构造。辊密封结构还包括可旋转地支撑在衬底的输送平面上方的限定的间隙高度的圆筒，使得圆筒不与最终活性半导体材料的窗内的基底连续滚动接触。圆柱体可相对于基板的输送平面在垂直方向上浮动，使得当基板在圆筒下传送时，圆筒滚动超过间隙高度的基板的上表面变化。

92. 发明授权

US08110509B2 Method of fabricating light emitting devices 有权
标题翻译：制造发光器件的方法
公开(公告)号：US08110509B2
公开(公告)日：2012-02-07
申请号：US12203802
申请日：2008-09-03
申请人： Shunpei Yamazaki , Masakazu Murakami
发明人： Shunpei Yamazaki , Masakazu Murakami
IPC分类号： H01L21/302
CPC分类号： H01L21/67745 , C23C14/12 , C23C14/243 , C23C14/568 , H01L21/67276 , H01L51/001 , Y10S414/135 , Y10S438/908
摘要： A manufacturing apparatus is provided, which can improve a utilization efficiency of an evaporation material, reduce manufacturing costs of a light emitting device having an organic light emitting element, and shorten manufacturing time necessary to manufacture a light emitting device. According to the present invention, a multi-chamber manufacturing apparatus having plural film forming chambers includes a first film forming chamber for subjecting a first substrate to evaporation and a second film forming chamber for subjecting a second substrate to evaporation. In each film forming chamber, plural organic compound layers are laminated, thereby improving the throughput. Further, it is possible that the respective substrates in the plural film forming chambers are subjected to evaporation in the same manner in parallel, while another film forming chamber undergoes cleaning.
摘要翻译：提供一种制造装置，其可以提高蒸发材料的利用效率，降低具有有机发光元件的发光装置的制造成本，并缩短制造发光装置所需的制造时间。根据本发明，具有多个成膜室的多室制造装置包括用于使第一基板蒸发的第一成膜室和用于使第二基板蒸发的第二成膜室。在每个成膜室中层叠多个有机化合物层，从而提高生产量。此外，可以以相同的方式平行地对多个成膜室中的各个基板进行蒸发，而另一个成膜室进行清洁。

93. 发明授权

US08101054B2 Magnetic particle trapper for a disk sputtering system 有权
标题翻译：用于磁盘溅射系统的磁粉捕集器
公开(公告)号：US08101054B2
公开(公告)日：2012-01-24
申请号：US12474207
申请日：2009-05-28
申请人： Jinliang Chen , Kinya Nippa
发明人： Jinliang Chen , Kinya Nippa
IPC分类号： C23C14/34
CPC分类号： C23C14/568 , C23C14/50 , C23C14/564
摘要： A magnetic particle trapper for use in a sputtering system includes a roller cover plate having a plurality of openings arranged and dimensioned to accommodate a plurality of rollers associated with a mechanical transport mechanism of the sputtering system, and a plurality of magnets to trap magnetic particles, the plurality of magnets being attached to the roller cover plate in locations proximate to the plurality of openings.
摘要翻译：用于溅射系统的磁性颗粒捕集器包括：辊盖板，其具有多个开口，其布置和尺寸设置成容纳与溅射系统的机械传送机构相关联的多个辊;以及多个磁体，用于捕获磁性颗粒，所述多个磁体在靠近所述多个开口的位置附接到所述滚子盖板。

94. 发明授权

US08088473B2 High infrared reflection coatings, thin film coating deposition methods and associated technologies 有权
标题翻译：高红外反射涂层，薄膜涂层沉积方法及相关技术
公开(公告)号：US08088473B2
公开(公告)日：2012-01-03
申请号：US13023582
申请日：2011-02-09
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： B32B7/02
CPC分类号： E06B3/6715 , C03C17/36 , C03C17/3613 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/211 , C03C2217/216 , C03C2217/78 , C03C2218/153 , C03C2218/154 , C23C14/568 , E06B9/24 , E06B2009/2417 , Y10T428/24612 , Y10T428/24942 , Y10T428/2495 , Y10T428/24975 , Y10T428/31504
摘要： The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.
摘要翻译：本发明提供高反射红外辐射的低发射率涂层。该涂层包括三个红外反射膜区域，其可以各自包含银。

95. 发明申请

US20110303153A1 DEVICE AND METHOD FOR FABRICATING THIN FILMS BY REACTIVE EVAPORATION 有权
标题翻译：通过反应蒸发来制造薄膜的装置和方法
公开(公告)号：US20110303153A1
公开(公告)日：2011-12-15
申请号：US13219380
申请日：2011-08-26
申请人： Brian H. Moeckly , Ward S. Ruby
发明人： Brian H. Moeckly , Ward S. Ruby
IPC分类号： C23C16/448 , H01L39/24 , H01L41/22 , C23C16/458 , H01L21/00
CPC分类号： H01L39/2487 , C23C14/067 , C23C14/24 , C23C14/568 , H01L39/2451 , Y10T29/49014
摘要： A device for fabricating thin films on a substrate includes a vacuum chamber, a rotatable platen configured to hold one or more substrates within the vacuum chamber, and a housing disposed within the vacuum chamber. The housing contains a heating element and is configured to enclose an upper surface of the platen and a lower portion configured to partially enclose an underside surface of the platen which forms a reaction zone. A heated evaporation cell is operatively coupled to the lower portion of the housing and configured to deliver a pressurized metallic reactant to the reaction zone. The device includes a deposition zone disposed in the vacuum chamber and isolated from the reaction zone and is configured to deposit a deposition species to the exposed underside of the substrates when the substrates are not contained in the reaction zone.
摘要翻译：用于在衬底上制造薄膜的器件包括真空室，被配置为保持真空室内的一个或多个衬底的可旋转压板以及设置在真空室内的壳体。壳体包含加热元件，并且被构造成封闭压板的上表面，并且下部构造成部分地封闭形成反应区的压板的下表面。加热的蒸发池可操作地联接到壳体的下部并且被配置成将加压的金属反应物输送到反应区。该装置包括设置在真空室中并与反应区隔离的沉积区，并且构造成当基底不包含在反应区中时，将沉积物质沉积到基底的暴露下侧。

96. 发明授权

US08025777B2 Processes and device for the deposition of films on substrates 有权
标题翻译：用于在基材上沉积膜的方法和装置
公开(公告)号：US08025777B2
公开(公告)日：2011-09-27
申请号：US12399887
申请日：2009-03-06
申请人： Andrey E. Yakshin , Wolfgang Fukarek
发明人： Andrey E. Yakshin , Wolfgang Fukarek
IPC分类号： C23C14/34
CPC分类号： C23C14/024 , C23C14/0635 , C23C14/14 , C23C14/30 , C23C14/351 , C23C14/568 , C23C14/5833
摘要： It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.
摘要翻译：本发明的目的是改进用于制造多层系统的电流沉积方法和装置，以更好地控制在沉积的不同阶段的能量贡献。这通过在提供热化颗粒的方案中通过溅射沉积膜来实现。可以通过选择工作气体压力和目标和基板之间的距离来获得热化颗粒，以产生小于目标和基板之间的距离的颗粒的平均自由程，或导致压力和距离的乘积大于2.0cmPa 。

97. 发明申请

US20110201150A1 Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor 审中-公开
标题翻译：溅射装置，薄膜形成方法和场效应晶体管的制造方法
公开(公告)号：US20110201150A1
公开(公告)日：2011-08-18
申请号：US13123728
申请日：2009-10-09
申请人： Takaomi Kurata , Junya Kiyota , Makoto Arai , Yasuhiko Akamatsu , Satoru Ishibashi , Kazuya Saito
发明人： Takaomi Kurata , Junya Kiyota , Makoto Arai , Yasuhiko Akamatsu , Satoru Ishibashi , Kazuya Saito
IPC分类号： H01L21/36 , C23C14/34 , C23C14/08
CPC分类号： C23C14/352 , C23C14/568 , H01J37/32752 , H01J37/3408
摘要： [Object] To provide a sputtering apparatus, a thin-film forming method, and a manufacturing method for a field effect transistor, which are capable of reducing damage of a base layer.[Solving Means] The sputtering apparatus 100 includes a conveying mechanism, a first target Tc1, a second target (Tc2 to Tc5), and a sputtering means. The conveying mechanism conveys a supporting portion, which is arranged in an inside of a vacuum chamber and supports a substrate, linearly along a conveying surface parallel to the surface to be processed of the substrate. The first target Tc1 is opposed to the conveying surface with a first space therebetween. The second target (Tc2 to Tc5) is arranged on a downstream side in a conveying direction of the substrate with respect to the first target Tc1, and is opposed to the conveying surface with a second space smaller than the first space therebetween. The sputtering means sputters each target. According to this sputtering apparatus 100, the damage received by the base layer is small, and hence it is possible to form a thin-film having good film-forming properties.
摘要翻译：本发明提供能够降低基底层损伤的溅射装置，薄膜形成方法和场效晶体管的制造方法。 [解决方案]溅射装置100包括传送机构，第一目标Tc1，第二目标（Tc2至Tc5）和溅射装置。传送机构传送支撑部分，其布置在真空室的内部并且沿着平行于待处理基板的表面的输送表面线性地支撑基板。第一目标Tc1与其间具有第一空间的输送表面相对。第二靶（Tc2〜Tc5）相对于第一靶Tc1布置在基板的输送方向的下游侧，并且与输送面相对，第二空间小于第一空间。溅射意味着喷射每个目标。根据该溅射装置100，由基底层接收的损伤小，因此可以形成具有良好成膜性能的薄膜。

98. 发明申请

US20110195187A1 DIRECT LIQUID VAPORIZATION FOR OLEOPHOBIC COATINGS 审中-公开
标题翻译：直接液体挥发氧化涂料
公开(公告)号：US20110195187A1
公开(公告)日：2011-08-11
申请号：US13024964
申请日：2011-02-10
申请人： Douglas Joseph Weber , Naoto Matsuyuki
发明人： Douglas Joseph Weber , Naoto Matsuyuki
IPC分类号： C23C16/448 , C23C16/52 , B05D5/00
CPC分类号： C23C14/243 , C23C14/12 , C23C14/246 , C23C14/568
摘要： This is directed to a liquid vaporization process for depositing an oleophobic ingredient on a surface of an electronic device component using a PVD process. A raw liquid material that includes the oleophobic ingredient can be placed in a liquid supply system coupled to a vacuum chamber. The liquid supply system can be pressured by an inert gas to prevent undesired chemical reactions between the oleophobic ingredient and air. The liquid, including the oleophobic ingredient, can vaporize upon reaching the vaporizing unit, and the oleophobic ingredient can be deposited on the component.
摘要翻译：这涉及用于使用PVD工艺将疏油成分沉积在电子器件部件的表面上的液体蒸发过程。包含疏油成分的原料液体材料可以放置在耦合到真空室的液体供应系统中。液体供应系统可以通过惰性气体加压，以防止疏油成分与空气之间的不希望的化学反应。包括疏油成分的液体在到达蒸发单元时可以蒸发，并且疏油成分可以沉积在组分上。

99. 发明申请

US20110162704A1 RELIABILITY OF BACK END OF LINE PROCESS BY ADDING PVD OXIDE FILM 审中-公开
标题翻译：通过添加PVD氧化膜对线工艺后端的可靠性
公开(公告)号：US20110162704A1
公开(公告)日：2011-07-07
申请号：US12965251
申请日：2010-12-10
申请人： Hien-Minh Huu Le , Mohd Fadzli Anwar Hassan , David Tanner
发明人： Hien-Minh Huu Le , Mohd Fadzli Anwar Hassan , David Tanner
IPC分类号： H01L31/0216 , C23C14/34 , H01L31/18
CPC分类号： H01L31/075 , C23C14/083 , C23C14/18 , C23C14/568 , H01L31/028 , H01L31/0304 , H01L31/0322 , H01L31/0368 , H01L31/0376 , H01L31/056 , H01L31/076 , H01L31/1868 , Y02E10/52 , Y02E10/541 , Y02E10/544 , Y02E10/547 , Y02E10/548 , Y02P70/521 , Y10T29/5313
摘要： A method and apparatus for forming a protective coating on a photovoltaic device is provided. The photovoltaic device is formed by depositing photoelectric conversion units on a substrate, and by forming conductive layers and contacts on the photoelectric conversion units. The protective coating is formed by a deposition process, such as physical or chemical vapor deposition.
摘要翻译：提供了一种用于在光伏器件上形成保护涂层的方法和设备。光电器件通过在基板上沉积光电转换单元，并且通过在光电转换单元上形成导电层和接触而形成。保护涂层通过诸如物理或化学气相沉积的沉积工艺形成。

100. 发明申请

US20110114483A1 SPUTTERING DEPOSITION APPARATUS 审中-公开
标题翻译：溅射沉积装置
公开(公告)号：US20110114483A1
公开(公告)日：2011-05-19
申请号：US12728261
申请日：2010-03-21
申请人： CHUNG-PEI WANG
发明人： CHUNG-PEI WANG
IPC分类号： C23C14/34
CPC分类号： C23C14/3464 , C23C14/50 , C23C14/505 , C23C14/56 , C23C14/568 , H01J37/32779 , H01J37/34 , H01L21/6776
摘要： A sputtering deposition apparatus includes a chamber device, a conveyor, a number of carriers, and a number of pairs of targets. The chamber device defines a chamber therein. The conveyor is received in the chamber and includes a smoothly extending loop rail, a conveyor belt shaped as the rail and slidably disposed on the rail, and an actuator configured to drive the conveyor belt to slide along the rail. The carriers are disposed on the conveyor belt, each of which is configured for carrying a number of substrates to be deposited with. The pairs of targets arranged along the rail, each of which are oppositely disposed outside and inside the rail.
摘要翻译：溅射沉积设备包括室装置，输送机，多个载体和多个目标对。腔室装置在其中限定腔室。传送带被容纳在腔室中，并且包括平滑延伸的环形轨道，形状为轨道并可滑动地设置在轨道上的传送带，以及构造成驱动传送带沿着轨道滑动的致动器。载体设置在传送带上，每个传送带被构造成承载要沉积的许多基底。沿着轨道布置的目标对，其中每一个相对设置在轨道的内部和内部。

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