专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明申请

US20010041511A1 Printing of polishing pads 审中-公开
标题翻译：印刷抛光垫
公开(公告)号：US20010041511A1
公开(公告)日：2001-11-15
申请号：US09766155
申请日：2001-01-19
发明人： Craig D. Lack , Chau H. Duong , David B. James
IPC分类号： B24B001/00
CPC分类号： B24B37/24 , B24B37/26 , B24D3/28 , B24D11/001 , B24D18/009
摘要： A polishing pad includes a flexible substrate and a polymeric polishing layer that has a repeatable pattern of polymeric asperities that are manufactured by printing, according to a gravure printing process or a screen printing process.
摘要翻译：抛光垫包括柔性基底和聚合物抛光层，聚合物抛光层具有根据凹版印刷方法或丝网印刷方法通过印刷制造的聚合物凹凸的可重复图案。

92. 发明申请

US20010031615A1 Chemical mechanical planarization or polishing pad with sections having varied groove patterns 失效
标题翻译：化学机械平面化或抛光垫，具有不同凹槽图案的部分
公开(公告)号：US20010031615A1
公开(公告)日：2001-10-18
申请号：US09870212
申请日：2001-05-30
申请人： Lam Research Corporation
发明人： Alan J. Jensen , Brian S. Thornton
IPC分类号： B24B021/00
CPC分类号： B24B37/26 , B24B21/04 , B24D11/001 , B24D11/04
摘要： A CMP polishing pad improves overall material removal rate uniformity by combining multiple polishing pad sections in a serially linked manner, where the polishing pad sections are characterized by at least two different material removal rate profiles. The polishing pad is designed by determining a wafer polishing profile for each of a group of polishing pads where each polishing pad has a unique groove configuration, determining a combination of polishing pad segments, each of the segments constructed with one of the unique groove configurations, that will combine to achieve an improved uniformity in the polishing profile, and manufacturing a polishing pad having pad sections corresponding to the analytically determined pad sections.
摘要翻译： CMP抛光垫通过以串联方式组合多个抛光垫部分来提高整体材料去除速率均匀性，其中抛光垫部分的特征在于至少两种不同的材料去除速率曲线。抛光垫的设计是通过确定一组抛光垫中的每一个的晶片抛光轮廓来设计的，其中每个抛光垫具有唯一的凹槽构造，确定抛光垫片段的组合，每个片段由独特的凹槽配置之一构成，这将结合以实现抛光轮廓的改进的均匀性，以及制造具有对应于分析确定的垫部分的衬垫部分的抛光垫。

93. 发明申请

US20010002362A1 Coated abrasive discs 有权
标题翻译：涂层研磨盘
公开(公告)号：US20010002362A1
公开(公告)日：2001-05-31
申请号：US09737986
申请日：2000-12-15
发明人： Olivier Leon-Marie Fernand Guiselin
IPC分类号： B24B005/00 , B24B007/16 , B24B007/00
CPC分类号： B24D7/14 , B24D3/004 , B24D11/001 , B24D18/00
摘要： The invention provides individually made abrasive discs with the primary abrasive surface around the periphery of the disc where the bulk of the abrading action occurs when the disc is in use. The invention also provides a process by which these discs can be made using a unique grain feeding technique which is capable of depositing abrasive grain on a backing surface accurately and in annular patterns.
摘要翻译：本发明提供单独制造的研磨盘，其中主磨料表面围绕盘的周边，其中当盘被使用时发生大量的研磨作用。本发明还提供了一种使用独特的颗粒输送技术制造这些盘的方法，该技术能够精确地并以环形图案将磨料颗粒沉积在背衬表面上。

94. 发明授权

US06190246B1 Sanding devices and the like for removing materials 失效
标题翻译：砂光装置等用于去除材料
公开(公告)号：US06190246B1
公开(公告)日：2001-02-20
申请号：US08773629
申请日：1996-12-23
申请人： Brian H. Parrott , Roger W. Mason
发明人： Brian H. Parrott , Roger W. Mason
IPC分类号： B24D1102
CPC分类号： B24D11/001 , B24D11/02 , B24D15/02
摘要： Perforated sheet steel or wire mesh to which tungsten carbide grit is copper braze welded to provide a device which can be cut to a desired size and shaped into or used as a substrate for tools used for sanding, filing, grinding, deburring, deflashing, cutting, sawing, filing and the like. The sheet steel being perforated provides apertures or recesses wherein removed material can collect and/or pass through reducing the clogging of the grit and frequency of cleaning the working surface of the tool or device. The apertures also provide for the flow of air, cooling the device in certain applications. Tungsten carbide gritted wire mesh is particularly good in providing a surface which tends to renew itself due to grit adhering to the side of the wire strands but not such as to clog the holes. Welding the grit to the wire mesh or cloth also causes the strands of the cloth to be welded together providing for a strong, yet flexible device or substrate.
摘要翻译：钎焊碳化钨粗铜的穿孔钢板或金属丝网钎焊焊接，以提供可切割成所需尺寸并成型为或用作用于打磨，锉磨，研磨，去毛刺，去屑，切割的工具的基材的装置，锯切，归档等。被穿孔的钢板提供孔或凹槽，其中去除的材料可以收集和/或通过以减少砂粒的堵塞和清洁工具或装置的工作表面的频率。孔也提供空气流，在某些应用中冷却装置。碳化钨砂网在提供由于砂砾附着在钢丝绳的侧面而倾向于更新自身的表面方面特别好，但不能堵塞孔。将砂砾焊接到金属丝网或布上也使得布的线被焊接在一起，提供强而又灵活的装置或基底。

95. 发明授权

US6159087A End effector for pad conditioning 有权
标题翻译：末端执行器用于垫调节
公开(公告)号：US6159087A
公开(公告)日：2000-12-12
申请号：US241910
申请日：1999-02-02
申请人： Manoocher Birang , John Prince
发明人： Manoocher Birang , John Prince
IPC分类号： B24B53/007 , B24B53/017 , B24D3/28 , B24D11/00 , B24B1/00
CPC分类号： B24B53/017 , B24D11/001 , B24D3/28
摘要： An end effector is provided for conditioning pads used to polish semiconductor wafers. The end effector has a substrate with a matrix (preferably a polymer) disposed thereon. Abrasive particles such as diamond crystals are embedded in the matrix. Preferred particle size and number/spacing is provided for optimal conditioning. The particles are embedded by at least a predetermined amount (e.g., 75%) so as to provide uniform/repeatable conditioning while avoiding dislodged particles. The particles may be embedded such that the tips thereof are coplanar, or such that the profile of diamond tips form a plurality of curved regions. A method for checking end effector quality is also provided.
摘要翻译：提供端部执行器用于调整用于抛光半导体晶片的衬垫。末端执行器具有设置在其上的基体（优选聚合物）的基底。磨料颗粒如金刚石晶体嵌入基质中。提供优选的粒度和数量/间距用于最佳调理。颗粒被嵌入至少预定量（例如75％），以便提供均匀/可重复的调理，同时避免脱落的颗粒。颗粒可以被嵌入，使得其尖端是共面的，或者使得金刚石尖端的轮廓形成多个弯曲区域。还提供了一种用于检查末端执行器质量的方法。

96. 发明授权

US5975987A Method and apparatus for knurling a workpiece, method of molding an article with such workpiece, and such molded article 失效
标题翻译：用于滚花工件的方法和装置，用这种工件成型制品的方法和这种模塑制品
公开(公告)号：US5975987A
公开(公告)日：1999-11-02
申请号：US894978
申请日：1997-09-03
申请人： Timothy L. Hoopman , Stanley B. Collins , James A. Servatius
发明人： Timothy L. Hoopman , Stanley B. Collins , James A. Servatius
IPC分类号： B21H7/14 , B23B27/24 , B24D3/30 , B24D3/34 , B24D11/00 , B24D18/00 , B24B1/00
CPC分类号： B24D18/0036 , B23B27/24 , B24D11/001 , B24D3/30 , B24D3/344 , B21H7/14
摘要： A method and apparatus for knurling a workpiece in which the knurl pattern has an oblique helix angle relative to the longitudinal axis of the cylindrical workpiece. Also disclosed is a method of molding a molded article with the knurled workpiece to impart the inverse of the knurl pattern onto the molded article, such a molded article, a method of forming a structured abrasive article with the molded article, and such an abrasive article.
摘要翻译： PCT No.PCT / US95 / 13074 Sec。 371日期：1997年9月3日 102（e）1997年9月3日PCT PCT 1995年10月5日PCT公布。出版物WO97 / 日期1997年04月10日用于滚花工件的方法和装置，其中滚花图案相对于圆柱形工件的纵向轴线具有倾斜的螺旋角。还公开了一种用滚花工件模制成型制品的方法，以将滚花图案的倒数赋予模塑制品，这种模塑制品，用模塑制品形成结构化的磨料制品的方法，以及这种磨料制品。

97. 发明授权

US5885149A Homogenous abrasive tool 失效
标题翻译：均匀研磨工具
公开(公告)号：US5885149A
公开(公告)日：1999-03-23
申请号：US680378
申请日：1996-07-15
申请人： Thierry Gillet , Theodore Holsteyns
发明人： Thierry Gillet , Theodore Holsteyns
IPC分类号： B24D5/12 , B24D11/00 , B24B33/02 , C09K3/14
CPC分类号： B24D5/12 , B24D11/001
摘要： An abrasive tool and a method for its manufacture is provided in which the structural body of the tool, including both the central core and the outer, abrasive-containing portion, is fabricated of a homogeneous material, with abrasive particles dispersed throughout the consumable abrasive-containing portion to grindingly remove workpiece material during rotation of the structural body. A porous lattice of diamond grains encased in a cladding material is first formed by sintering as a continuous annulus or as arcuate segments. The skeletal lattice is then placed in a mold and a homogeneous material in liquid state is introduced into the mold to simultaneously form the central core and to flow into at least a portion of the porous lattice of clad diamond grains to provide an integrally molded, unity tool when the core material solidifies.
摘要翻译：提供了一种研磨工具及其制造方法，其中包括中心芯和外部磨料的部分的工具的结构体由均匀的材料制成，其中磨料颗粒分散在整个可消耗的磨料 - 在结构体的旋转期间，能够磨削去除工件材料。封装在包层材料中的金刚石晶粒的多孔晶格首先通过烧结形成为连续环形或弧形段。然后将骨架晶格放置在模具中，并将液态的均匀材料引入模具中以同时形成中心芯并流入包覆金刚石晶粒的多孔晶格的至少一部分，以提供整体模制的单位核心材料凝固时的工具。

98. 发明授权

US5755946A Abrasive member for dry grinding and polishing 失效
标题翻译：制造用于干磨和抛光的研磨件的方法
公开(公告)号：US5755946A
公开(公告)日：1998-05-26
申请号：US716892
申请日：1996-09-20
申请人： Sandro Giovanni Giuseppe Ferronato
发明人： Sandro Giovanni Giuseppe Ferronato
IPC分类号： B23H5/08 , B24D3/00 , B24D3/06 , B24D11/00 , B24D11/02 , B24D18/00 , B24D3/10
CPC分类号： B23H5/08 , B24D11/001 , B24D11/02 , B24D18/0018 , B24D3/002 , B24D3/06 , Y10T428/24372 , Y10T428/2438 , Y10T428/24413 , Y10T428/24802
摘要： A flexible abrasive member comprising a first porous layer of mesh, non-woven or perforated sheet, conductive or non-conductive material to which on one side deposits are deposited by way of any metal plating technique of either the electrolytic, electroless or vacuum deposition type, or any galvanic process, abrasive particles being embedded in the metal deposits, a layer of filling material, such as a resin, being present between the deposits which filling material is bonded to said first porous layer and/or the deposits, and at least a second porous layer of mesh, non-woven or perforated sheet, conductive or non-conductive material being present and being laid substantially along one side of the first porous layer. The side edge of the deposit has at least one annular groove along at least part of the circumference of the deposit.
摘要翻译：一种柔性研磨件，其包括网状的第一多孔层，无纺布或穿孔的片材，导电或非导电材料，其一面通过电解，无电镀或真空沉积型的任何金属电镀技术沉积或任何电镀工艺，磨料颗粒嵌入在金属沉积物中，一层填充材料（例如树脂）存在于沉积物之间，填充材料结合到所述第一多孔层和/或沉积物，并且至少网状物，无纺布或多孔片材的第二多孔层，导电或非导电材料存在并且基本沿着第一多孔层的一侧铺设。沉积物的侧边缘沿着沉积物的圆周的至少一部分具有至少一个环形凹槽。

99. 发明授权

US5704952A Abrasive article comprising an antiloading component 失效
公开(公告)号：US5704952A
公开(公告)日：1998-01-06
申请号：US689960
申请日：1996-08-16
申请人： Kam W. Law , Walter L. Harmer , Alan R. Kirk , Ernest L. Thurber
发明人： Kam W. Law , Walter L. Harmer , Alan R. Kirk , Ernest L. Thurber
IPC分类号： B24D3/00 , B24D3/28 , B24D3/34 , B24D11/00 , B24D11/02
CPC分类号： B24D3/346 , B24D11/001 , B24D11/02 , B24D3/004 , B24D3/28 , B24D3/344
摘要： An abrasive article, for example, a coated, bonded, or nonwoven abrasive article comprising a binder, a plurality of abrasive particles, and an antiloading component.

100. 发明授权

US5654078A Abrasive member for dry grinding and polishing 失效
标题翻译：用于干磨和抛光的磨料
公开(公告)号：US5654078A
公开(公告)日：1997-08-05
申请号：US499490
申请日：1995-07-07
申请人： Sandro Giovanni Giuseppe Ferronato
发明人： Sandro Giovanni Giuseppe Ferronato
IPC分类号： B23H5/08 , B24D3/00 , B24D3/06 , B24D11/00 , B24D11/02 , B24D18/00 , B24D3/10
CPC分类号： B23H5/08 , B24D11/001 , B24D11/02 , B24D18/0018 , B24D3/002 , B24D3/06 , Y10T428/24372 , Y10T428/2438 , Y10T428/24413 , Y10T428/24802
摘要： A flexible abrasive member comprising a first porous layer of mesh, non-woven or perforated sheet, conductive or non-conductive material to which on one side deposits are deposited by way of any metal plating technique of either the electrolytic, electroless or vacuum deposition type, or any galvanic process, abrasive particles being embedded in the metal deposits, a layer of filling material, such as a resin, being present between the deposits which filling material is bonded to said first porous layer and/or the deposits, and at least a second porous layer of mesh, non-woven or perforated sheet, conductive or non-conductive material being present and being laid substantially along one side of the first porous layer. The side edge of the deposit has at least one annular groove along at least part of the circumference of the deposit.
摘要翻译：一种柔性研磨件，其包括网状的第一多孔层，无纺布或穿孔的片材，导电或非导电材料，其一面通过电解，无电镀或真空沉积型的任何金属电镀技术沉积或任何电镀工艺，磨料颗粒嵌入在金属沉积物中，一层填充材料（例如树脂）存在于沉积物之间，填充材料结合到所述第一多孔层和/或沉积物，并且至少网状物，无纺布或多孔片材的第二多孔层，导电或非导电材料存在并且基本沿着第一多孔层的一侧铺设。沉积物的侧边缘沿着沉积物的圆周的至少一部分具有至少一个环形凹槽。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式