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91. 发明授权

US08025923B2 Method for manufacturing a structure 失效
标题翻译：制造结构的方法
公开(公告)号：US08025923B2
公开(公告)日：2011-09-27
申请号：US12202972
申请日：2008-09-02
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takaemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takaemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
IPC分类号： B05D1/32
CPC分类号： B81C1/00111 , Y10S977/70 , Y10S977/84 , Y10S977/89 , Y10S977/892 , Y10T428/24802
摘要： A method of manufacturing a structure, including forming a composite film composed of a coating film and an organic or inorganic film on top of a substrate by forming the coating film on the surface of a template provided on top of the substrate; forming the organic or inorganic film on the surface of the coating film, and removing a portion of the organic or inorganic film and a portion of the coating film; forming a second coating film on the surface of the composite film; forming an organic coating film on the substrate that covers the second coating film; removing a portion of the second coating film; and forming a structure composed of a metal or metal oxide later on the substrate by removing all residues left on the substrate except for the coating film and the second coating film.
摘要翻译：一种结构的制造方法，其特征在于，在基板顶部的模板表面上形成涂膜，在基板顶部形成由涂膜和有机或无机膜构成的复合膜; 在涂膜表面上形成有机或无机膜，除去一部分有机或无机膜和一部分涂膜; 在复合膜的表面上形成第二涂膜; 在覆盖第二涂膜的基板上形成有机涂膜; 去除所述第二涂膜的一部分; 并且通过除去除了涂膜和第二涂膜之外残留在基板上的所有残留物，在基板上形成由金属或金属氧化物组成的结构。

92. 发明授权

US08017300B2 Compound, positive resist composition and method for forming resist pattern 有权
标题翻译：化合物，正性抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08017300B2
公开(公告)日：2011-09-13
申请号：US12299371
申请日：2007-03-20
申请人： Daiju Shiono , Taku Hirayama , Hideo Hada
发明人： Daiju Shiono , Taku Hirayama , Hideo Hada
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： C07C69/712 , C07C2603/74 , G03F7/0045 , G03F7/0392
摘要： Disclosed are a compound that can be used for a resist composition, a positive resist composition that includes the compound, and a method for forming a resist pattern.Specifically disclosed is a compound represented by a formula (A-1). In the formula (A-1), R11 to R17 each represents an alkyl group or an aromatic hydrocarbon group; g and j each represents an integer of 1 or greater, and k and q each represents an integer of 0 or greater, provided that g+j+k+q is not greater than 5; b represents an integer of 1 or greater, and l and m each represents an integer of 0 or greater, provided that b+l+m is not greater than 4; c represents an integer of 1 or greater, and n and o each represents an integer of 0 or greater, provided that c+n+o is not greater than 4; A represents a trivalent aromatic cyclic group, alkyl group or aliphatic cyclic group, or a trivalent organic group having an aromatic cyclic group or an aliphatic cyclic group; and Z represents a group represented by a formula (z1). In the formula (z1), Y represents an alkylene group, a divalent aromatic hydrocarbon group or aliphatic cyclic group, or a divalent organic group having an aromatic hydrocarbon group or an aliphatic cyclic group; and R′ represents an acid dissociable, dissolution inhibiting group.
摘要翻译：公开了可用于抗蚀剂组合物的化合物，包含该化合物的正型抗蚀剂组合物和形成抗蚀剂图案的方法。具体公开的是由式（A-1）表示的化合物。式（A-1）中，R 11〜R 17表示烷基或芳香族烃基， g和j各自表示1或更大的整数，并且k和q各自表示0或更大的整数，条件是g + j + k + q不大于5; b表示1或更大的整数，并且l和m各自表示0或更大的整数，条件是b + 1 + m不大于4; c表示1或更大的整数，并且n和o各自表示0或更大的整数，条件是c + n + o不大于4; A表示三价芳族环状基团，烷基或脂肪族环状基团，或具有芳香族环状基团或脂肪族环状基团的三价有机基团， Z表示由式（z1）表示的基团。式（z1）中，Y表示亚烷基，二价芳香族烃基或脂肪族环状基团，或具有芳香族烃基或脂肪族环状基团的二价有机基团，并且R'表示酸解离，溶解抑制基团。

93. 发明授权

US07855044B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07855044B2
公开(公告)日：2010-12-21
申请号：US11993005
申请日：2006-06-16
申请人： Masaru Takeshita , Hideo Hada , Takeshi Iwai
发明人： Masaru Takeshita , Hideo Hada , Takeshi Iwai
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/0045 , Y10S430/111
摘要： A positive resist composition including a resin component (A) and an acid generator component (B), the resin component (A) including a copolymer (A1) having a structural unit (a1) derived from an acrylate ester having a monocyclic or polycyclic group-containing acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing cyclic group, a structural unit (a3) derived from an acrylate ester having a hydroxyl group and/or cyano group-containing polycyclic group, and a structural unit (a4) represented by general formula (a4-1) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; R′ represents a hydrogen atom, a lower alkyl group or an alkoxy group of 1 to 5 carbon atoms; and f represents 0 or 1.
摘要翻译：包含树脂组分（A）和酸产生剂组分（B）的正型抗蚀剂组合物，所述树脂组分（A）包含具有衍生自具有单环或多环基团的丙烯酸酯的结构单元（a1）的共聚物（A1）含有可离解的溶解抑制基团，衍生自具有含内酯环状基团的丙烯酸酯的结构单元（a2），衍生自具有羟基和/或含氰基的丙烯酸酯的结构单元（a3）多环基和由以下通式（a4-1）表示的结构单元（a4）：其中R表示氢原子，卤素原子，低级烷基或卤代低级烷基; R'表示氢原子，低级烷基或碳原子数1〜5的烷氧基。 f表示0或1。

94. 发明授权

US07776510B2 Resist composition, method of forming resist pattern, compound and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
公开(公告)号：US07776510B2
公开(公告)日：2010-08-17
申请号：US12135680
申请日：2008-06-09
申请人： Takeshi Iwai , Hideo Hada , Keita Ishiduka , Akiya Kawaue , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo
发明人： Takeshi Iwai , Hideo Hada , Keita Ishiduka , Akiya Kawaue , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo
IPC分类号： G03F7/004 , G03F7/30 , C07C381/12
CPC分类号： C07C309/06 , C07C309/04 , C07C309/10 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0397 , Y10S430/111 , Y10S430/123
摘要： A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.
摘要翻译：由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸由通式（b1-14）表示的化合物构成的发光体（B1）：其中，R7“〜R9”各自独立地表示芳基或烷基，其中，R7“〜R9”中的2个可以相互键合而成与硫原子形成环，并且R 7“至R 9”中的至少一个表示其中一部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代的取代芳基; X-表示阴离子。

95. 发明申请

US20100183974A1 COMPOUND, METHOD FOR PRODUCING SAME, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 失效
标题翻译：化合物，其生产方法，阳性组合物和形成耐药性图案的方法
公开(公告)号：US20100183974A1
公开(公告)日：2010-07-22
申请号：US12067255
申请日：2006-09-13
申请人： Daiju Shiono , Takahiro Dazai , Taku Hirayama , Kohei Kasai , Hideo Hada
发明人： Daiju Shiono , Takahiro Dazai , Taku Hirayama , Kohei Kasai , Hideo Hada
IPC分类号： G03F7/20 , C07C69/708 , C07C59/31 , G03F7/004
CPC分类号： C07C69/712 , C07C59/70 , C07C59/72 , C07C2601/14 , C07C2603/74 , G03F7/0392
摘要： A compound of the present invention is a compound represented by a general formula (A-1) [wherein, R′ represents a hydrogen atom or an acid-dissociable, dissolution-inhibiting group, provided that at least one R′ group is an acid-dissociable, dissolution-inhibiting group, R11 to R17 each represent an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, which may include a hetero atom within the structure; g and j each represent an integer of 1 or greater, and k and q each represent an integer of 0 or greater, provided that g+j+k+q is not greater than 5; a represents an integer from 1 to 3; b represents an integer of 1 or greater, and l and m each represent an integer of 0 or greater, provided that b+l+m is not greater than 4; c represents an integer of 1 or greater, and n and o each represent an integer of 0 or greater, provided that c+n+o is not greater than 4; and A represents a group represented by a general formula (Ia) shown below, a group represented by a general formula (Ib) shown below, or an aliphatic cyclic group].
摘要翻译：本发明化合物是由通式（A-1）表示的化合物[其中，R'表示氢原子或酸解离的溶解抑制基团，条件是至少一个R'基团为酸可溶解抑制基团，R 11至R 17各自表示1-10个碳原子的烷基或芳族烃基，其可以包括结构内的杂原子; g和j分别表示1以上的整数，k和q各自表示0以上的整数，条件是g + j + k + q不大于5; a表示1〜3的整数， b表示1或更大的整数，并且l和m各自表示0或更大的整数，条件是b + 1 + m不大于4; c表示1或更大的整数，n和o各自表示0或更大的整数，条件是c + n + o不大于4; A表示由下述通式（Ia）表示的基团，由下述通式（Ib）表示的基团或脂族环基]表示。

96. 发明授权

US07736842B2 Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern 有权
标题翻译：用于电子束或EUV（极紫外）的抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07736842B2
公开(公告)日：2010-06-15
申请号：US11573884
申请日：2005-09-01
申请人： Hideo Hada , Daiju Shiono , Hiroo Kinoshita , Takeo Watanabe
发明人： Hideo Hada , Daiju Shiono , Hiroo Kinoshita , Takeo Watanabe
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S430/143
摘要： A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure, wherein the component (B) comprises at least one onium salt selected from the group consisting of onium salts having an anion represented by formula (b-0-1) or (b-0-2) shown below: wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted with a fluorine atom.
摘要翻译：一种电子束或极紫外线抗蚀剂组合物（EUV），其包含在酸作用下表现出碱溶性变化的树脂组分（A）和曝光时产生酸的光致酸产生剂组分（B），其中组分（B）包含至少一种选自由下式（b-0-1）或（b-0-2）表示的阴离子的鎓盐组成的组中的鎓盐：其中X表示碳原子数2〜6的亚烷基其中至少一个氢原子被氟原子取代; Y和Z各自独立地表示具有1〜10个原子的烷基，其中至少一个氢原子被氟原子取代。

97. 发明申请

US20100119974A1 Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
标题翻译：抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
公开(公告)号：US20100119974A1
公开(公告)日：2010-05-13
申请号：US12591152
申请日：2009-11-10
申请人： Hideo Hada , Yoshiyuki Utsumi , Takehiro Seshimo , Akiya Kawaue
发明人： Hideo Hada , Yoshiyuki Utsumi , Takehiro Seshimo , Akiya Kawaue
IPC分类号： G03F7/20 , G03F7/004 , C07C309/19 , C07C313/06
CPC分类号： G03F7/027 , C07C309/12 , C07C311/46 , C07C311/48 , C07C2601/08 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/30 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/124 , Y10S430/126
摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).
摘要翻译：一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中具有改变的溶解性的碱成分（A）和包含（b1-1）表示的化合物的酸产生剂成分（B），由（b1- 1'）和/或（b1-1“）表示的化合物（R1”-R3“表示芳基或烷基，条件是R1”-R3“中的至少一个表示被由（b1-1-0）表示的基团和R1“-R3”中的两个可以相互键合形成与硫原子的环; X表示C3-C30烃基; Q1表示含羰基的二价连接基团; X10表示C1-C30烃基; Q3表示单键或二价连接基团; Y10表示-C（= O） - 或-SO2-;表示C1-C10烷基或氟化烷基： Q2表示单键或亚烷基; W表示C2-C10亚烷基）。

98. 发明申请

US20100015552A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR 有权
标题翻译：抗菌组合物，形成耐药性图案，化合物和酸产生剂的方法
公开(公告)号：US20100015552A1
公开(公告)日：2010-01-21
申请号：US12499610
申请日：2009-07-08
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , C07C309/09 , C07C309/10 , C07C309/17 , C07C311/48 , C07C311/51 , C07C317/04 , C07C317/10 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/92 , C07D307/94 , C07D493/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below:wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A）以及在暴露时产生酸的酸发生剂组分（B），其中所述酸发生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“ R 9“各自独立地表示芳基或烷基，其中R 7”至R 9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个 “表示具有下述通式（I）表示的基团的取代芳基作为取代基; X-表示阴离子; Rf表示氟化烷基。

99. 发明授权

US07648816B2 Positive resist composition, method for forming resist pattern and compound 有权
标题翻译：正性抗蚀剂组合物，形成抗蚀剂图案和化合物的方法
公开(公告)号：US07648816B2
公开(公告)日：2010-01-19
申请号：US11817012
申请日：2006-02-20
申请人： Daiju Shiono , Taku Hirayama , Hideo Hada
发明人： Daiju Shiono , Taku Hirayama , Hideo Hada
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C07C39/04
CPC分类号： G03F7/0397 , C07C69/712 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which either a portion of, or all of, the hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound with a molecular weight of 300 to 2,500 represented by a general formula (I) shown below have been substituted with at least one group selected from the group consisting of acid-dissociable, dissolution-inhibiting groups represented by a general formula (II) shown below and acid-dissociable, dissolution-inhibiting groups represented by a general formula (III) shown below.
摘要翻译：一种正性抗蚀剂组合物，其包含含有酸解离的溶解抑制基团并且在酸的作用下表现出增加的碱溶解性的基材成分（A）和暴露时产生酸的酸产生剂成分（B），其中基材成分（A）含有化合物（A1），其中分子量为300〜2,500的多元酚化合物中的酚羟基的氢原子的一部分或全部由通式下述的（I）所示的化合物被选自由下述通式（II）表示的酸解离性，溶解抑制基团和酸解离性，通式式（III）如下所示。

100. 发明授权

US07544460B2 Resist composition, multilayer body, and method for forming resist pattern 有权
标题翻译：抗蚀剂组合物，多层体和形成抗蚀剂图案的方法
公开(公告)号：US07544460B2
公开(公告)日：2009-06-09
申请号：US10563705
申请日：2004-07-07
申请人： Hideo Hada , Kazuhito Sasaki , Satoshi Fujimura , Takeshi Iwai
发明人： Hideo Hada , Kazuhito Sasaki , Satoshi Fujimura , Takeshi Iwai
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/40 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170° C.
摘要翻译：公开了一种抗蚀剂组合物，其能够使用收缩方法形成良好的抗蚀剂图案，其中，在形成抗蚀剂图案之后，使用诸如加热的处理来缩小抗蚀剂图案，并且还公开了层压体和方法形成使用这种抗蚀剂组合物的抗蚀剂图案。该抗蚀剂组合物包含在酸的作用下显示出碱溶解性变差的树脂成分（A）和曝光时产生酸的酸发生剂成分（B）。组分（A）含有衍生自（甲基）丙烯酸酯的结构单元，其玻璃化转变温度为120-170℃。

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