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    • 95. 发明授权
    • Method of continuously casting steel
    • 连铸钢的方法
    • US4545424A
    • 1985-10-08
    • US554037
    • 1983-11-21
    • Takayuki Sato
    • Takayuki Sato
    • B22D11/04B22D11/05B22D11/112
    • B22D11/112B22D11/05
    • This invention provides a method of continuously casting steel with the use of a copper or copper alloy mold comprising a pair of long side mold pieces and a pair of short side mold pieces slidable along the long side mold pieces for changing the width of the slab to be produced, the method being characterized by inserting into the mold at each corner thereof a cooling member made of a material identical or substantially identical with the steel to be cast and slidingly moving the short side mold pieces under reduced clamping pressure acting between the long side mold pieces and the short side mold pieces in contact therewith.
    • 本发明提供一种使用铜或铜合金模具连续铸造钢的方法,所述铜或铜合金模具包括一对长边模具件和沿着长边模具件滑动的一对短边模具件,用于将板坯的宽度改变为 该方法的特征在于,在其每个角部处在模具中插入由与要铸造的钢相同或基本相同的材料制成的冷却构件,并且在作用在长边之间的减小的夹紧压力下滑动地移动短边模具 模具片和与其接触的短边模具片。
    • 96. 发明授权
    • Photoresist compositions
    • 光刻胶组合物
    • US4268603A
    • 1981-05-19
    • US61306
    • 1979-07-27
    • Takayuki Sato
    • Takayuki Sato
    • C09K3/00C08K5/16C08L7/00C08L21/00C09K9/00C09K9/02G03C1/00G03F7/004G03F7/008G03F7/038H01L21/027G03C1/60G03C1/70G03C1/71
    • G03F7/0085
    • The invention presents a novel photoresist composition used in the photoetching in the manufacture of various electronic semiconductor devices, in which the phenomenon of halation adversely affecting the fidelity of the etching patterns can be very much reduced. The photoresist composition of the invention comprises (a) a cyclized rubber, (b) a bisazide compound, (c) a photoextinction agent which is a 4-phenylazo-N,N-disubstituted aniline compound or a related bis derivative of biphenyl or diphenyl ether, and (d) a fluorescent agent which is a N,N'-di(substituted methylene) derivative of a phenylenediamine or hydrazine.With this formulation, the loss of ultraviolet absorption at about 360 nm caused by the photodecomposition of the component (b) is compensated for by the absorption of the photodecomposition product of the component (c) while the component (d) has no absorption at about 360 nm but emits a fluorescence in the range of 380 to 450 nm.
    • 本发明提供了一种用于制造各种电子半导体器件的光刻中的新型光致抗蚀剂组合物,其中可以极大地减少不利地影响蚀刻图案的保真度的卤化现象。 本发明的光致抗蚀剂组合物包含(a)环化橡胶,(b)双叠氮化合物,(c)作为4-苯基偶氮-N,N-二取代的苯胺化合物或联苯或二苯基的相关双衍生物的光降解剂 醚,和(d)作为苯二胺或肼的N,N'-二(取代亚甲基)衍生物的荧光剂。 利用该配方,由组分(b)的光分解引起的在约360nm处的紫外吸收的损失由组分(c)的光分解产物的吸收补偿,而组分(d)在约 360nm,但发射在380至450nm范围内的荧光。